MY173082A - A method of fabricating a nanocomposite thin film with metallic nanoparticles - Google Patents

A method of fabricating a nanocomposite thin film with metallic nanoparticles

Info

Publication number
MY173082A
MY173082A MYPI2011003192A MYPI2011003192A MY173082A MY 173082 A MY173082 A MY 173082A MY PI2011003192 A MYPI2011003192 A MY PI2011003192A MY PI2011003192 A MYPI2011003192 A MY PI2011003192A MY 173082 A MY173082 A MY 173082A
Authority
MY
Malaysia
Prior art keywords
metallic
thin film
metallic nanoparticles
fabricating
depositing
Prior art date
Application number
MYPI2011003192A
Inventor
Lee Hing Wah Dr
Daniel Bien Chia Sheng Dr
Teh Aun Shih Dr
Original Assignee
Mimos Berhad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mimos Berhad filed Critical Mimos Berhad
Priority to MYPI2011003192A priority Critical patent/MY173082A/en
Priority to PCT/MY2012/000142 priority patent/WO2013006031A1/en
Publication of MY173082A publication Critical patent/MY173082A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/18Carbon
    • B01J21/185Carbon nanotubes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74Iron group metals
    • B01J23/745Iron
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0215Coating
    • B01J37/0225Coating of metal substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0238Impregnation, coating or precipitation via the gaseous phase-sublimation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/158Carbon nanotubes
    • C01B32/16Preparation
    • C01B32/162Preparation characterised by catalysts
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds

Abstract

The present invention provides a method for fabricating a nanocomposite thin film with a plurality of metallic nanoparticles. The method comprising depositing an insulating layer (102) onto the surface of a substrate (103); depositing a metallic film (104) on the surface of the insulating layer (102); annealing the metallic film (104), wherein annealing nucleates the metallic film (104) to form the metallic nanoparticles (101) on the insulating layer (102); and depositing a metallic thin film (105) onto the insulating layer (102) by a selective chemical vapour deposition technique, wherein depositing of the metallic thin film (105) partially embeds the metallic nanoparticles (101) within the metallic thin film (105), and the surfaces of the metallic nanoparticles (101) do not absorb the metallic thin film; wherein at least part of the outer surfaces of the metallic nanoparticles (101) are exposed in the metallic thin film (105).
MYPI2011003192A 2011-07-06 2011-07-06 A method of fabricating a nanocomposite thin film with metallic nanoparticles MY173082A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
MYPI2011003192A MY173082A (en) 2011-07-06 2011-07-06 A method of fabricating a nanocomposite thin film with metallic nanoparticles
PCT/MY2012/000142 WO2013006031A1 (en) 2011-07-06 2012-06-22 A method of fabricating a nanocomposite thin film with metallic nanoparticles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MYPI2011003192A MY173082A (en) 2011-07-06 2011-07-06 A method of fabricating a nanocomposite thin film with metallic nanoparticles

Publications (1)

Publication Number Publication Date
MY173082A true MY173082A (en) 2019-12-25

Family

ID=46796704

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011003192A MY173082A (en) 2011-07-06 2011-07-06 A method of fabricating a nanocomposite thin film with metallic nanoparticles

Country Status (2)

Country Link
MY (1) MY173082A (en)
WO (1) WO2013006031A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116695081B (en) * 2023-08-01 2023-12-15 中国科学院宁波材料技术与工程研究所 Composite amorphous carbon film pressure-sensitive material and preparation method thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW593730B (en) * 2002-03-25 2004-06-21 Ind Tech Res Inst Process of direct low-temperature growth of carbon nanotubes on a substrate
US8038926B2 (en) * 2008-03-07 2011-10-18 Drexel University Method for making carbon nanotubes with embedded nanoparticles
US20100227134A1 (en) * 2009-03-03 2010-09-09 Lockheed Martin Corporation Method for the prevention of nanoparticle agglomeration at high temperatures

Also Published As

Publication number Publication date
WO2013006031A1 (en) 2013-01-10

Similar Documents

Publication Publication Date Title
GB2496956B (en) Transparent conductor
WO2013036667A3 (en) Flowable silicon-carbon-nitrogen layers for semiconductor processing
SG195119A1 (en) Method of transferring thin films
MY185883A (en) Perovskite material layer processing
GB2498904A (en) Hole injection layers
WO2012057517A3 (en) Compound semiconductor device and method for manufacturing a compound semiconductor
WO2013134592A3 (en) Atomic layer deposition strengthening members and method of manufacture
WO2012118955A3 (en) Apparatus and process for atomic layer deposition
MY158420A (en) P-doped silicon layers
JP2012004549A5 (en) Semiconductor device
MY177552A (en) A method of fabricating a resistive gas sensor device
GB2509851A (en) Organic electronic device and method of manufacture
WO2012047069A3 (en) Light-emitting element and method for manufacturing same
PL412520A1 (en) Method for producing graphene film with set number of graphene layers
WO2012012026A3 (en) Metal film deposition
GB201216405D0 (en) Multilayer coated wear-resistant member and method for making the same
WO2013027041A3 (en) A semiconductor laser device and a method for manufacturing a semiconductor laser device
TW201129497A (en) silicon substrate having nanostructures and method for producing the same and application thereof
MX2016005564A (en) Oxidation barrier layer.
WO2011092017A8 (en) Method for producing a coated item by means of texture etching
WO2012105800A3 (en) Nano power-generating device, and method for manufacturing same
TW201612956A (en) Method of depositing a layer, method of manufacturing a transistor, layer stack for an electronic device, and an electronic device
EP3067438A4 (en) Method for forming intermediate layer formed between substrate and dlc film, method for forming dlc film, and intermediate layer formed between substrate and dlc film
WO2012166850A3 (en) Methods for repairing low-k dielectrics using carbon plasma immersion
MX2014004436A (en) Solar control glazing comprising a layer of an alloy containing nicu.