MY170314A - Sputtering target - Google Patents
Sputtering targetInfo
- Publication number
- MY170314A MY170314A MYPI2015701152A MYPI2015701152A MY170314A MY 170314 A MY170314 A MY 170314A MY PI2015701152 A MYPI2015701152 A MY PI2015701152A MY PI2015701152 A MYPI2015701152 A MY PI2015701152A MY 170314 A MY170314 A MY 170314A
- Authority
- MY
- Malaysia
- Prior art keywords
- sputtering target
- oxide
- phases
- contain
- sputtering
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title abstract 3
- 239000002184 metal Substances 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 239000000470 constituent Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Abstract
A sintered compact sputtering target having a structure in which metal phases and oxide phases are uniformly dispersed, wherein the metal phases contain Co, Pt and Mn as components, and the oxide phases contain an oxide having at least Mn as a constituent. The sputtering target of the present invention yields superior effects of being able to reduce the amount of particles generated during sputtering and improve the yield during deposition. Figure 1
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013049130 | 2013-03-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY170314A true MY170314A (en) | 2019-07-17 |
Family
ID=51536414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2015701152A MY170314A (en) | 2013-03-12 | 2014-01-20 | Sputtering target |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5801496B2 (en) |
MY (1) | MY170314A (en) |
SG (1) | SG11201501365WA (en) |
TW (1) | TWI608113B (en) |
WO (1) | WO2014141737A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6027699B1 (en) * | 2016-02-19 | 2016-11-16 | デクセリアルズ株式会社 | Mn—Zn—W—O-based sputtering target and method for producing the same |
MY184036A (en) | 2016-02-19 | 2021-03-17 | Jx Nippon Mining & Metals Corp | Sputtering target for magnetic recording medium, and magnetic thin film |
CN112585295B (en) * | 2018-08-09 | 2023-04-04 | Jx金属株式会社 | Sputtering target, magnetic film, and perpendicular magnetic recording medium |
TWI727322B (en) | 2018-08-09 | 2021-05-11 | 日商Jx金屬股份有限公司 | Sputtering target and magnetic film |
WO2020031459A1 (en) | 2018-08-09 | 2020-02-13 | Jx金属株式会社 | Sputtering target, granular film, and perpendicular magnetic recording medium |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080131735A1 (en) * | 2006-12-05 | 2008-06-05 | Heraeus Incorporated | Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recording |
JP2011514432A (en) * | 2007-09-07 | 2011-05-06 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Multi-element alloy powder containing silver and at least two non-silver containing elements |
WO2012011294A1 (en) * | 2010-07-20 | 2012-01-26 | Jx日鉱日石金属株式会社 | Ferromagnetic material sputtering target with little particle generation |
JP2012117147A (en) * | 2010-11-12 | 2012-06-21 | Jx Nippon Mining & Metals Corp | Sputtering target with remained cobalt oxide |
US20130213802A1 (en) * | 2010-12-22 | 2013-08-22 | Jx Nippon Mining & Metals Corporation | Sintered Compact Sputtering Target |
-
2014
- 2014-01-20 WO PCT/JP2014/050980 patent/WO2014141737A1/en active Application Filing
- 2014-01-20 SG SG11201501365WA patent/SG11201501365WA/en unknown
- 2014-01-20 JP JP2014533302A patent/JP5801496B2/en active Active
- 2014-01-20 MY MYPI2015701152A patent/MY170314A/en unknown
- 2014-01-24 TW TW103102624A patent/TWI608113B/en active
Also Published As
Publication number | Publication date |
---|---|
JP5801496B2 (en) | 2015-10-28 |
TWI608113B (en) | 2017-12-11 |
SG11201501365WA (en) | 2015-05-28 |
TW201443261A (en) | 2014-11-16 |
JPWO2014141737A1 (en) | 2017-02-16 |
WO2014141737A1 (en) | 2014-09-18 |
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