KR970077266A - Drying device for semiconductor wafers - Google Patents
Drying device for semiconductor wafers Download PDFInfo
- Publication number
- KR970077266A KR970077266A KR1019960015554A KR19960015554A KR970077266A KR 970077266 A KR970077266 A KR 970077266A KR 1019960015554 A KR1019960015554 A KR 1019960015554A KR 19960015554 A KR19960015554 A KR 19960015554A KR 970077266 A KR970077266 A KR 970077266A
- Authority
- KR
- South Korea
- Prior art keywords
- main body
- wafer
- drying apparatus
- steam
- steam generator
- Prior art date
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- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Abstract
본 발명은 반도체 웨이퍼의 건조 장치에 관한 것으로, 본 발명에 따른 웨이퍼 건조 장치는 축을 중심으로 원심 회전 가능한 건조 장치 본체와, 상기 본체를 밀봉하기 위한 커버와, 상기 본체 내에 회전 가능하게 설치되고, 증기를 발생시키는 증기 발생 장치와, 상기 증기 발생 장치로부터 공급되는 증기를 상기 본체 내에 분사할 수 있도록 상기 증기 발생 장치의 일단에서 방사 방향으로 설치된 복수의 분사 노즐과, 상기 본체 내에 설치되고 건조될 웨이퍼를 지지하는 웨이퍼 지지대를 포함한다. 본 발명에 의하면, IPA 증기를 이용한 웨이퍼 건조공정에서 웨이퍼가 고정 상태로 있지 않고 원심 회전되므로 반응성 파티클의 발생을 방지할 수 있다.The present invention relates to a drying apparatus for semiconductor wafers, and a wafer drying apparatus according to the present invention comprises a drying apparatus main body capable of centrifugal rotation about an axis, a cover for sealing the main body, A plurality of injection nozzles provided in a radial direction at one end of the steam generator so as to inject steam supplied from the steam generator into the main body; And a wafer support table for supporting the wafer. According to the present invention, in the wafer drying process using IPA vapor, since the wafer is not in a fixed state but centrifugally rotated, generation of reactive particles can be prevented.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도는 본 발명에 따른 웨이퍼 건조 장치의 구성을 개략적으로 나타낸 도면이다.FIG. 1 is a view schematically showing a configuration of a wafer drying apparatus according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960015554A KR970077266A (en) | 1996-05-11 | 1996-05-11 | Drying device for semiconductor wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960015554A KR970077266A (en) | 1996-05-11 | 1996-05-11 | Drying device for semiconductor wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970077266A true KR970077266A (en) | 1997-12-12 |
Family
ID=66220022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960015554A KR970077266A (en) | 1996-05-11 | 1996-05-11 | Drying device for semiconductor wafers |
Country Status (1)
Country | Link |
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KR (1) | KR970077266A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100490520B1 (en) * | 2001-10-03 | 2005-05-19 | 호야 가부시키가이샤 | Coating Film Drying Method, Coating Film Forming Method, and Coating Film Forming Apparatus |
-
1996
- 1996-05-11 KR KR1019960015554A patent/KR970077266A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100490520B1 (en) * | 2001-10-03 | 2005-05-19 | 호야 가부시키가이샤 | Coating Film Drying Method, Coating Film Forming Method, and Coating Film Forming Apparatus |
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Legal Events
Date | Code | Title | Description |
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WITN | Withdrawal due to no request for examination |