KR970064172U - 압력조절장치 - Google Patents
압력조절장치Info
- Publication number
- KR970064172U KR970064172U KR2019960011922U KR19960011922U KR970064172U KR 970064172 U KR970064172 U KR 970064172U KR 2019960011922 U KR2019960011922 U KR 2019960011922U KR 19960011922 U KR19960011922 U KR 19960011922U KR 970064172 U KR970064172 U KR 970064172U
- Authority
- KR
- South Korea
- Prior art keywords
- pressure regulating
- regulating device
- pressure
- regulating
- Prior art date
Links
- 230000001105 regulatory effect Effects 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45557—Pulsed pressure or control pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019960011922U KR200145599Y1 (ko) | 1996-05-15 | 1996-05-15 | 압력조절장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019960011922U KR200145599Y1 (ko) | 1996-05-15 | 1996-05-15 | 압력조절장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970064172U true KR970064172U (ko) | 1997-12-11 |
KR200145599Y1 KR200145599Y1 (ko) | 1999-06-15 |
Family
ID=19456139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019960011922U KR200145599Y1 (ko) | 1996-05-15 | 1996-05-15 | 압력조절장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200145599Y1 (ko) |
-
1996
- 1996-05-15 KR KR2019960011922U patent/KR200145599Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR200145599Y1 (ko) | 1999-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
O032 | Opposition [utility model]: request for opposition | ||
O131 | Decision on opposition [utility model] | ||
O062 | Revocation of registration by opposition: final registration of opposition [utility model] | ||
LAPS | Lapse due to unpaid annual fee |