KR970063409A - Reticle management device and method - Google Patents

Reticle management device and method Download PDF

Info

Publication number
KR970063409A
KR970063409A KR1019960003628A KR19960003628A KR970063409A KR 970063409 A KR970063409 A KR 970063409A KR 1019960003628 A KR1019960003628 A KR 1019960003628A KR 19960003628 A KR19960003628 A KR 19960003628A KR 970063409 A KR970063409 A KR 970063409A
Authority
KR
South Korea
Prior art keywords
reticle
lot number
wafer
reticle management
lot
Prior art date
Application number
KR1019960003628A
Other languages
Korean (ko)
Other versions
KR0185060B1 (en
Inventor
이태룡
장영철
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960003628A priority Critical patent/KR0185060B1/en
Publication of KR970063409A publication Critical patent/KR970063409A/en
Application granted granted Critical
Publication of KR0185060B1 publication Critical patent/KR0185060B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

본 발명은 레티클 관리 장치 및 방법에 관한 것으로, 보다 상세하게는 공정 순서에 따라 입력된 레티클의 고유 번호와 작업자가 작업할 레티클의 고유번호를 비교, 판단하여 오작업을 방지하는 레티클 관리 장치 및 방법에 관한 것이다.The present invention relates to a reticle management apparatus and method, and more particularly, to a reticle management apparatus and method for preventing an erroneous operation by comparing and determining a unique number of a reticle input according to a process order and a unique number of a reticle to be worked by an operator .

이를 위한 본 발명은 작업할 복수개의 웨이퍼에 부여된 로트 고유 번호와 상기 로트 고유 번호에 해당하는 공정 순서가 저장된 반도체의 호스트 컴퓨터와, 레티클 관리 프로그램이 저장된 레티클 관리용 서버와, 상기 호스트 컴퓨터에서 출력되는 데이터와 레티클 관리 서버에서 발생되는 데이타에 따라 복수개의 레티클을 웨이퍼상에 노광하는 O.S.S프로그램이 내장된 작업장내의 퍼스널 컴퓨터로 구성한다.In order to achieve the above object, according to the present invention, there is provided a reticle management system, comprising: a semiconductor host computer in which a lot identification number assigned to a plurality of wafers to be worked and a process order corresponding to the lot identification number are stored; a reticle management server storing a reticle management program; And an OSS program for exposing a plurality of reticles on a wafer according to data generated by the reticle management server.

Description

레티클(Reticle) 관리 장치 및 방법Reticle management device and method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제2도는 본 발명에 따른 레티를 관리 장치의 구성을 개략적으로 나타낸 블록도.FIG. 2 is a block diagram schematically showing the configuration of a retry management apparatus according to the present invention; FIG.

Claims (2)

작업할 복수개의 웨이퍼에 부여된 로트 고유 번호와 상기 로트 고유번호에 해당하는 공정 순서가 저장된 반도체의 호스트 컴퓨터와, 레티클 관리 프로그램이 저장된 레티클 관리 서버와, 상기 호스트 컴퓨터에서 출력되는 데이터에 따라 복수개의 레티클을 웨이퍼상에 노광하는 O.S.S 프로그램이 내장된 작업장내의 퍼스널 컴퓨터를 포함하는 것을 특징으로 하는 레티클 관리 장치.A host computer of a semiconductor in which a lot number assigned to a plurality of wafers to be worked and a process order corresponding to the lot number are stored; a reticle management server in which a reticle management program is stored; And a personal computer in a workplace having an OSS program for exposing a reticle on a wafer. 웨이퍼의 로트 번호와 공정 순서와 레티클 번호를 입력시켜 투입하는 공정 투입 단계와, 상기 공정 투입단계를 수행시킨 후 웨이퍼의 로트 번호와 공정 순서 레티클 번호가 일치되는 지를 비교 판단하는 비교 판단 단계와, 상기 비교 판단 단계에서 비교된 로트 번호와 레티클 번호가 일치되지 않으면 처음의 공정 투입 단계로 되돌리고 일치되면 고정 순서에 따라 사진 작업을 진행하는 작업 진행단계를 포함하는 것을 특징으로 하는 레티클 관리 방법.A step of inputting a lot number of the wafer, a process order and a reticle number, and inputting the wafer lot lot number, a comparative judgment step of comparing and judging whether the lot number of the wafer and the process order reticle number match after performing the process input step, And if it is determined that the lot number and the reticle number do not match in the comparison and determination step, the process returns to the first process input step and, if the lot number and the reticle number agree with each other, the photographic work is progressed according to the fixed order. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960003628A 1996-02-14 1996-02-14 Apparatus and method for management of reticle KR0185060B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960003628A KR0185060B1 (en) 1996-02-14 1996-02-14 Apparatus and method for management of reticle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960003628A KR0185060B1 (en) 1996-02-14 1996-02-14 Apparatus and method for management of reticle

Publications (2)

Publication Number Publication Date
KR970063409A true KR970063409A (en) 1997-09-12
KR0185060B1 KR0185060B1 (en) 1999-10-15

Family

ID=19451274

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960003628A KR0185060B1 (en) 1996-02-14 1996-02-14 Apparatus and method for management of reticle

Country Status (1)

Country Link
KR (1) KR0185060B1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101656856B1 (en) 2014-06-13 2016-09-13 (주)더존코리아 Apparatus for separating solid and liquid
KR102204812B1 (en) 2018-06-12 2021-01-19 (주)더존코리아 Solid-liquid separator using centrifugal force
KR102212092B1 (en) 2019-12-24 2021-02-04 (주)더존코리아 Solid-liquid separator using centrifugal force
KR102227094B1 (en) 2020-02-07 2021-03-12 (주)신성엔지니어링 Solid-liquid separator

Also Published As

Publication number Publication date
KR0185060B1 (en) 1999-10-15

Similar Documents

Publication Publication Date Title
CN111897711A (en) Method and device for positioning bug in code, electronic equipment and readable storage medium
US8904360B2 (en) Automated identification of redundant method calls
CN109241042B (en) Data processing method and device and electronic equipment
KR970063409A (en) Reticle management device and method
CN111708756A (en) Method, device and equipment for automatically processing data warehouse and storage medium
US7281166B1 (en) User-customizable input error handling
KR970063408A (en) Automatic device and method for reticle reticle
CN116756014A (en) Code scanning method, scanning device and storage medium
JPS6111853A (en) Information processor
WO2021124512A1 (en) Information processing device, information processing method, and information processing program
JP2022177585A (en) Error check program, information processing apparatus, and error check method
CN114398198A (en) Embedded software fault anchor point positioning analysis method, device, equipment and medium
EP1417622B1 (en) Method and system for providing background data for use in studying maintenance claims
CN116048995A (en) Method, system, medium, equipment and terminal for configuring abnormal information
JP2006146503A (en) Batch processing verification apparatus, batch processing verification program and batch processing verification method
KR970066706A (en) How to set alignment exposure conditions by stepper
JP2547874B2 (en) Program check device
JPS60181867A (en) Processor switching control system
Aßmann A short review of high speed compilation
JPH08249193A (en) Checking system for language specification range of program
JPS5870361A (en) Input controlling system
JPH05143294A (en) Product name control method of media product
KR20010057800A (en) Method for simulating parallel program on single system
JPH04109379A (en) Ocr system
JPH02264332A (en) Retrieving and registering system for alphabetic name

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20061128

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee