KR970052725A - Method of removing nitride film of semiconductor device - Google Patents
Method of removing nitride film of semiconductor device Download PDFInfo
- Publication number
- KR970052725A KR970052725A KR1019950047315A KR19950047315A KR970052725A KR 970052725 A KR970052725 A KR 970052725A KR 1019950047315 A KR1019950047315 A KR 1019950047315A KR 19950047315 A KR19950047315 A KR 19950047315A KR 970052725 A KR970052725 A KR 970052725A
- Authority
- KR
- South Korea
- Prior art keywords
- nitride film
- semiconductor device
- oxide film
- solution
- silicon substrate
- Prior art date
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- Weting (AREA)
Abstract
본 발명은 반도체 제조공정중 필드산화막이 형성된 실리콘기판상의 질화막을 제거하는 방법을 제공하는 것으로, 인산용액에 불산 및 질산의 혼합용액을 첨가하는 습식식각방법으로 필드산화막이 형성된 실리콘기판상의 질화막 및 실리콘층을 제거하므로서 소자의 수율을 향상시킬 수 있는 효과가 있다.The present invention provides a method for removing a nitride film on a silicon substrate on which a field oxide film is formed during a semiconductor manufacturing process. There is an effect that can improve the yield of the device by removing the layer.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1A도 내지 제1D도는 본 발명에 따른 반도체 소자의 질화막 제거방법을 설명하기 위한 소자의 단면도.1A to 1D are cross-sectional views of a device for explaining a method of removing a nitride film of a semiconductor device according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950047315A KR970052725A (en) | 1995-12-07 | 1995-12-07 | Method of removing nitride film of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950047315A KR970052725A (en) | 1995-12-07 | 1995-12-07 | Method of removing nitride film of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970052725A true KR970052725A (en) | 1997-07-29 |
Family
ID=66593702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950047315A KR970052725A (en) | 1995-12-07 | 1995-12-07 | Method of removing nitride film of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970052725A (en) |
-
1995
- 1995-12-07 KR KR1019950047315A patent/KR970052725A/en not_active Application Discontinuation
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WITN | Withdrawal due to no request for examination |