KR970051926A - - Google Patents
Info
- Publication number
- KR970051926A KR970051926A KR19950066154A KR19950066154A KR970051926A KR 970051926 A KR970051926 A KR 970051926A KR 19950066154 A KR19950066154 A KR 19950066154A KR 19950066154 A KR19950066154 A KR 19950066154A KR 970051926 A KR970051926 A KR 970051926A
- Authority
- KR
- South Korea
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR19950066134 | 1995-12-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970051926A true KR970051926A (ja) | 1997-07-29 |
Family
ID=85705047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR19950066154A KR970051926A (ja) | 1995-12-29 | 1995-12-29 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970051926A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990054914A (ko) * | 1997-12-26 | 1999-07-15 | 김영환 | 방사성 동위원소를 이용한 초미세 정렬방법 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4374915A (en) * | 1981-07-30 | 1983-02-22 | Intel Corporation | High contrast alignment marker for integrated circuit fabrication |
JPS62296435A (ja) * | 1986-06-16 | 1987-12-23 | Nec Corp | アライメントマ−クの形状 |
JPH01140624A (ja) * | 1987-11-27 | 1989-06-01 | Hitachi Ltd | 半導体装置の製造方法 |
JPH021901A (ja) * | 1988-06-09 | 1990-01-08 | Fujitsu Ltd | 位置合わせマークの形成方法 |
JPH02266512A (ja) * | 1989-04-07 | 1990-10-31 | Oki Electric Ind Co Ltd | 半導体素子の製造方法 |
KR900019132A (ko) * | 1989-05-16 | 1990-12-24 | 오끼뎅끼 고오교오 가부시끼가이샤 | 웨이퍼 얼라인먼트 마크 및 그 제조방법 |
JPH03138920A (ja) * | 1989-10-24 | 1991-06-13 | Sony Corp | 半導体装置 |
-
1995
- 1995-12-29 KR KR19950066154A patent/KR970051926A/ko not_active Application Discontinuation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4374915A (en) * | 1981-07-30 | 1983-02-22 | Intel Corporation | High contrast alignment marker for integrated circuit fabrication |
JPS62296435A (ja) * | 1986-06-16 | 1987-12-23 | Nec Corp | アライメントマ−クの形状 |
JPH01140624A (ja) * | 1987-11-27 | 1989-06-01 | Hitachi Ltd | 半導体装置の製造方法 |
JPH021901A (ja) * | 1988-06-09 | 1990-01-08 | Fujitsu Ltd | 位置合わせマークの形成方法 |
JPH02266512A (ja) * | 1989-04-07 | 1990-10-31 | Oki Electric Ind Co Ltd | 半導体素子の製造方法 |
KR900019132A (ko) * | 1989-05-16 | 1990-12-24 | 오끼뎅끼 고오교오 가부시끼가이샤 | 웨이퍼 얼라인먼트 마크 및 그 제조방법 |
JPH03138920A (ja) * | 1989-10-24 | 1991-06-13 | Sony Corp | 半導体装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990054914A (ko) * | 1997-12-26 | 1999-07-15 | 김영환 | 방사성 동위원소를 이용한 초미세 정렬방법 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |