KR970030210A - Chemical Supply Control Tank of Semiconductor Manufacturing Equipment - Google Patents

Chemical Supply Control Tank of Semiconductor Manufacturing Equipment Download PDF

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Publication number
KR970030210A
KR970030210A KR1019950042900A KR19950042900A KR970030210A KR 970030210 A KR970030210 A KR 970030210A KR 1019950042900 A KR1019950042900 A KR 1019950042900A KR 19950042900 A KR19950042900 A KR 19950042900A KR 970030210 A KR970030210 A KR 970030210A
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KR
South Korea
Prior art keywords
tank
chemical
chemical supply
supply
semiconductor manufacturing
Prior art date
Application number
KR1019950042900A
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Korean (ko)
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KR0166208B1 (en
Inventor
권창구
Original Assignee
김광호
삼성전자 주식회사
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950042900A priority Critical patent/KR0166208B1/en
Publication of KR970030210A publication Critical patent/KR970030210A/en
Application granted granted Critical
Publication of KR0166208B1 publication Critical patent/KR0166208B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Weting (AREA)

Abstract

본 발명은 케미컬을 일정량씩 공급하기 위한 것으로, 소정의 용량을 갖고 밀폐된 탱크와, 상기 탱크에 케미컬을 저장하기 위한 공급파이프와, 상기 탱크에 저장된 케미컬을 배출하기 위한 배출파이프와, 상기 탱크내에 저장된 캐미컬이 소정높이에서 자동 배출되도록 하여 항상 일정한 량이 저장되도록 하는 오버 플로우 파이프를 구비하는 반도체 제조장치의 케미컬 공급량 조절탱크에 있어서, 상기 탱크내에 부레를 설치하고, 상기 부레를 승, 하강 수단이 수직방향으로 이동시키도록 된 구성이다. 따라서 케미컬 공급량이 간단하게 조절되어 작업성이 향상되고, 미세조절이 가능하여 정확한 혼합비가 유지됨으로써 공정의 안정화를 이룰 수 있으며, 설비의 가동중에도 조절이 가능하고 케미컬의 변화량을 육안으로 확인할 수 있어 편리한 효과가 있다.The present invention is to supply a chemical by a fixed amount, the tank having a predetermined capacity, a supply pipe for storing the chemical in the tank, a discharge pipe for discharging the chemical stored in the tank, and in the tank In the chemical feed amount control tank of the semiconductor manufacturing apparatus having an overflow pipe which is to automatically discharge the stored chemical at a predetermined height so that a constant amount is always stored, a tank is installed in the tank, and the means for raising and lowering the tank is It is configured to move in the vertical direction. Therefore, the chemical supply amount can be easily adjusted to improve workability, and fine adjustment is possible to maintain the correct mixing ratio, thereby achieving stabilization of the process, and to control the amount of chemical change while operating the equipment. It works.

Description

반도체 제조장치의 케미컬 공급량 조절탱크Chemical Supply Control Tank of Semiconductor Manufacturing Equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도는 본 발명에 케미컬 공급량 조절 탱크를 나타낸 부분 절개사시도이다.3 is a partial cutaway perspective view showing the chemical feed amount control tank according to the present invention.

제4도는 제3도 A-A선 확대 단면도이다.4 is an enlarged cross-sectional view taken along a line A-A of FIG.

Claims (7)

케미컬을 일정량씩 공급하기 위한 것으로, 소정의 용량을 갖고 밀폐된 탱크와, 상기 탱크에 케미컬을 저장하기 위한 공급파이프와, 상기 탱크에 저장된 케미컬을 배출하기 위한 배출파이프와, 상기 탱크내에 저장된 케미컬이 소정높이에서 자동 배출되도록 하여 항상 일정한 량이 저장되도록 하는 오버 플로우 파이프를 구비하는 반도체 제조장치의 케미컬 공급량 조절탱크에 있어서, 상기 탱크내에 설치된 부레와, 상기 부레를 수직방향으로 이동시키기 위한 승, 하강 수단을 부가하여 구성됨을 특징으로 하는 반도체 제조장치의 케미컬 공급량 조절탱크.In order to supply the chemical by a predetermined amount, the tank is sealed with a predetermined capacity, the supply pipe for storing the chemical in the tank, the discharge pipe for discharging the chemical stored in the tank, and the chemical stored in the tank In the chemical supply amount control tank of the semiconductor manufacturing apparatus having an overflow pipe that is automatically discharged at a predetermined height so that a constant amount is always stored, the tank provided in the tank and the lifting means for moving the tank in a vertical direction. Chemical supply amount control tank of the semiconductor manufacturing apparatus, characterized in that the configuration by adding. 제1항에 있어서, 상기 승, 하강 수단은 탱크에 수직방향으로 구비한 암나사부와, 일단은 탱크의 외부로 노출되고 타단은 탱크내의 부레에 연결되며 상기 암나사부에 나사맞춤되어 호전동작에 의해 수직방향으로 이동하는 나사봉으로 구성됨을 특징으로 하는 상기 반도체 제조장치의 케미컬 공급량 조절탱크.The method of claim 1, wherein the raising and lowering means is a female screw portion provided in the vertical direction to the tank, one end is exposed to the outside of the tank and the other end is connected to the beret in the tank and is screwed into the female screw portion by Chemical supply amount control tank of the semiconductor manufacturing apparatus, characterized in that consisting of a screw rod moving in the vertical direction. 제2항에 있어서, 상기 암나사부는 탱크의 상면에 내부로 관통시켜 고정한 보스에 형성됨을 특징으로 하는 상기 반도체 제조장치의 케미컬 공급량 조절탱크.The chemical supply tank of claim 2, wherein the female screw portion is formed in a boss fixed through the upper surface of the tank. 제2항에 있어서, 상기 승, 하강 수단인 나사봉은 모터로 구동시키고 모터로 자동제어하도록 구성됨을 특징으로 하는 상기 반도체 제조장치의 케미컬 공급량 조절탱크.3. The chemical supply amount control tank of claim 2, wherein the screw rod, which is the lifting and lowering means, is configured to be driven by a motor and automatically controlled by a motor. 제1항에 있어서, 상기 부레에 오버 플로우 파이프 및 공급파이프가 삽입되는 삽입구멍이 형성됨을 특징으로 하는 상기 반도체 제조장치의 케미컬 공급량 조절탱크.The chemical supply tank according to claim 1, wherein an insertion hole into which the overflow pipe and the supply pipe are inserted is formed in the buret. 제5항에 있어서, 상기 삽입구멍의 일측은 길이방향으로 개방시켜 구성됨을 특징으로 하는 상기 반도체 제조장치의 케미컬 공급량 조절탱크.6. The tank according to claim 5, wherein one side of the insertion hole is opened in the longitudinal direction. 제1항에 있어서, 상기 탱크내에 저장된 케미컬의 용량을 확인하기 위한 투명재질의 레벨 튜브(Level Tube)가 탱크의 외측에 설치됨을 특징으로 하는 상기 반도체 제조장치의 케미컬 공급량 조절탱크.The chemical supply tank of claim 1, wherein a level tube made of a transparent material for checking the capacity of the chemicals stored in the tank is installed outside the tank.
KR1019950042900A 1995-11-22 1995-11-22 A chemical supply control tank for semiconductor device fabrication equipment KR0166208B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950042900A KR0166208B1 (en) 1995-11-22 1995-11-22 A chemical supply control tank for semiconductor device fabrication equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950042900A KR0166208B1 (en) 1995-11-22 1995-11-22 A chemical supply control tank for semiconductor device fabrication equipment

Publications (2)

Publication Number Publication Date
KR970030210A true KR970030210A (en) 1997-06-26
KR0166208B1 KR0166208B1 (en) 1999-02-01

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Application Number Title Priority Date Filing Date
KR1019950042900A KR0166208B1 (en) 1995-11-22 1995-11-22 A chemical supply control tank for semiconductor device fabrication equipment

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100812081B1 (en) * 2003-12-31 2008-03-07 동부일렉트로닉스 주식회사 Bath Cleaner

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