KR970021377A - Metal plate continuous electroplating method - Google Patents

Metal plate continuous electroplating method Download PDF

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Publication number
KR970021377A
KR970021377A KR1019960045116A KR19960045116A KR970021377A KR 970021377 A KR970021377 A KR 970021377A KR 1019960045116 A KR1019960045116 A KR 1019960045116A KR 19960045116 A KR19960045116 A KR 19960045116A KR 970021377 A KR970021377 A KR 970021377A
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KR
South Korea
Prior art keywords
metal plate
electroplating
zinc
mixture
continuous electroplating
Prior art date
Application number
KR1019960045116A
Other languages
Korean (ko)
Inventor
성명동
크리스띠앙 알렐리
에르베 바비슈
Original Assignee
성명동
봉따볼리 로제
쏠락(소시에떼 아노님)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 성명동, 봉따볼리 로제, 쏠락(소시에떼 아노님) filed Critical 성명동
Publication of KR970021377A publication Critical patent/KR970021377A/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

Abstract

본 발명의 방법에 있어서는, 불용성 양극과 염화물 전해도금욕을 갖는 전지에서 강판상에 아연 또는 아연합금을 전착하기 위해, 금속판을 음극으로 사용하고, 양극과 금속판 사이에 전류를 통전시키고, 전기도금하는 동안, 바람직하게 히드라진, 히드록실라민, 및 히드록실라민 하이드로클로라이드로부터 선택된 염화물 환원 혼합물을 도금욕의 수용액에 첨가한다.In the method of the present invention, in order to electrodeposit zinc or zinc alloy on a steel plate in a battery having an insoluble positive electrode and a chloride electroplating bath, a metal plate is used as a negative electrode, an electric current is passed between the positive electrode and the metal plate, and electroplating. During the addition, a chloride reduction mixture selected from hydrazine, hydroxylamine, and hydroxylamine hydrochloride is added to the aqueous solution of the plating bath.

양극에서 염화물의 방출이 억제되고, 적어도 100A/dm2의 전류밀도에서 수행할 수 있다.Emission of chloride at the anode is suppressed and can be carried out at a current density of at least 100 A / dm 2 .

Description

금속판 연속 전기도금방법Metal plate continuous electroplating method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (5)

하나 이상의 불용성 양극과 수용성 염화 전해욕을 포함하는 전지에서, 금속판, 특히 강판상에 아연 또는 아연합금을 연속 전기도금하는 방법으로서, 금속판이 음극으로부터 사용되고, 전류가 하나 이상의 양극과 금속판 사이에 통전되는 연속 전기도금방법에 있어서, 전기도금하는 동안, 상기 도금욕내의 염화물에 대해서는 환원제로서 역할을 하고, 금속판 부근에 있는 아연 또는 아연합금의 원소에 대해서는 비환원제로서 역할을 하는 혼합물을 상기 도금욕의 수용액에 첨가하는 것을 특징으로 하는 연속 전기도금방법.In a cell comprising at least one insoluble anode and a water soluble chlorine electrolytic bath, a method of continuous electroplating of zinc or zinc alloy on a metal plate, in particular a steel plate, wherein a metal plate is used from the cathode and a current is conducted between the at least one anode and the metal plate. In the continuous electroplating method, during electroplating, a mixture serving as a reducing agent for chlorides in the plating bath and as a non-reducing agent for elements of zinc or zinc alloy in the vicinity of the metal plate is prepared. Continuous electroplating method characterized in that the addition. 제1항에 있어서, 상기 도금욕의 pH가 5.5 이하인 경우, 수용액에 첨가되는 상기 혼합물은 히드라진, 히드록실라민, 및 히드록실라민 하이드로클로라이드로부터 선택되는 것을 특징으로 하는 연속 전기도금방법.The method of claim 1, wherein when the pH of the plating bath is 5.5 or less, the mixture added to the aqueous solution is selected from hydrazine, hydroxylamine, and hydroxylamine hydrochloride. 제2항에 있어서, 전기도금하는 동안, 상기 혼합물을 0.03내지 0.3물/ℓ의 농도로 수용액에 첨가하는 것을 특징으로 하는 연속 전기도금방법.The method of claim 2, wherein during the electroplating, the mixture is added to the aqueous solution at a concentration of 0.03 to 0.3 water / l. 제3항에 있어서, 상기 혼합물이 히드록실라민 하이드로클로라이드인 경우, 전기도금하는 동안, 도금욕에서의 그의 농도는 적어도 2g/ℓ에서 계속하여 유지되는 것을 특징으로 하는 연속 전기도금방법.4. The method of claim 3, wherein if the mixture is hydroxylamine hydrochloride, its concentration in the plating bath is maintained continuously at least 2 g / l during electroplating. 전항들 중 어느 한 항에 있어서, 하나 이상의 불용성 양극의 영역에서의 상기 전류밀도가 100A/dm2이상인 것을 특징으로 하는 연속 전기도금방법.The method of any one of the preceding claims, wherein the current density in the region of at least one insoluble anode is at least 100 A / dm 2 . ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019960045116A 1995-10-12 1996-10-10 Metal plate continuous electroplating method KR970021377A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9511973 1995-10-12
FR9511973A FR2739872B1 (en) 1995-10-12 1995-10-12 METHOD OF CONTINUOUS ELECTRODEPOSITION OF A METAL STRIP AND ASSOCIATED BATH

Publications (1)

Publication Number Publication Date
KR970021377A true KR970021377A (en) 1997-05-28

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ID=9483461

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Application Number Title Priority Date Filing Date
KR1019960045116A KR970021377A (en) 1995-10-12 1996-10-10 Metal plate continuous electroplating method

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JP (1) JPH09111492A (en)
KR (1) KR970021377A (en)
FR (1) FR2739872B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100358011B1 (en) * 1999-12-24 2002-10-25 주식회사 포스코 The method of gradient electroplating
KR101065104B1 (en) * 2008-10-22 2011-09-16 엘에스엠트론 주식회사 Electroplating method capable of lessening consumption of plating additive

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102747396A (en) * 2012-06-28 2012-10-24 贵州钢绳股份有限公司 Technology for electrogalvanizing of specially-shaped steel wire

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1278188B (en) * 1964-08-18 1968-09-19 Siemag Siegener Maschb Ges Mit Process for the production of base metals on more noble metals by chemical reduction of metal salts dissolved in water

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100358011B1 (en) * 1999-12-24 2002-10-25 주식회사 포스코 The method of gradient electroplating
KR101065104B1 (en) * 2008-10-22 2011-09-16 엘에스엠트론 주식회사 Electroplating method capable of lessening consumption of plating additive

Also Published As

Publication number Publication date
JPH09111492A (en) 1997-04-28
FR2739872B1 (en) 1997-11-14
FR2739872A1 (en) 1997-04-18

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