KR970015302U - 반도체 웨이퍼 세정장치 - Google Patents
반도체 웨이퍼 세정장치Info
- Publication number
- KR970015302U KR970015302U KR2019950024636U KR19950024636U KR970015302U KR 970015302 U KR970015302 U KR 970015302U KR 2019950024636 U KR2019950024636 U KR 2019950024636U KR 19950024636 U KR19950024636 U KR 19950024636U KR 970015302 U KR970015302 U KR 970015302U
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning device
- semiconductor wafer
- wafer cleaning
- semiconductor
- wafer
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950024636U KR0128207Y1 (ko) | 1995-09-13 | 1995-09-13 | 반도체 웨이퍼 세정장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950024636U KR0128207Y1 (ko) | 1995-09-13 | 1995-09-13 | 반도체 웨이퍼 세정장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970015302U true KR970015302U (ko) | 1997-04-28 |
KR0128207Y1 KR0128207Y1 (ko) | 1998-12-01 |
Family
ID=19423221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950024636U KR0128207Y1 (ko) | 1995-09-13 | 1995-09-13 | 반도체 웨이퍼 세정장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0128207Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100623174B1 (ko) * | 1998-07-10 | 2006-12-04 | 삼성전자주식회사 | 반도체 장치 제조용 케미컬 재순환 장치 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100469130B1 (ko) * | 1997-07-25 | 2005-05-03 | 삼성전자주식회사 | 반도체장치이송용진공튀저의세정장치 |
-
1995
- 1995-09-13 KR KR2019950024636U patent/KR0128207Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100623174B1 (ko) * | 1998-07-10 | 2006-12-04 | 삼성전자주식회사 | 반도체 장치 제조용 케미컬 재순환 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR0128207Y1 (ko) | 1998-12-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
O032 | Opposition [utility model]: request for opposition | ||
O131 | Decision on opposition [utility model] | ||
O062 | Revocation of registration by opposition: final registration of opposition [utility model] | ||
LAPS | Lapse due to unpaid annual fee |