KR970015302U - 반도체 웨이퍼 세정장치 - Google Patents

반도체 웨이퍼 세정장치

Info

Publication number
KR970015302U
KR970015302U KR2019950024636U KR19950024636U KR970015302U KR 970015302 U KR970015302 U KR 970015302U KR 2019950024636 U KR2019950024636 U KR 2019950024636U KR 19950024636 U KR19950024636 U KR 19950024636U KR 970015302 U KR970015302 U KR 970015302U
Authority
KR
South Korea
Prior art keywords
cleaning device
semiconductor wafer
wafer cleaning
semiconductor
wafer
Prior art date
Application number
KR2019950024636U
Other languages
English (en)
Other versions
KR0128207Y1 (ko
Inventor
이경희
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950024636U priority Critical patent/KR0128207Y1/ko
Publication of KR970015302U publication Critical patent/KR970015302U/ko
Application granted granted Critical
Publication of KR0128207Y1 publication Critical patent/KR0128207Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019950024636U 1995-09-13 1995-09-13 반도체 웨이퍼 세정장치 KR0128207Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950024636U KR0128207Y1 (ko) 1995-09-13 1995-09-13 반도체 웨이퍼 세정장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950024636U KR0128207Y1 (ko) 1995-09-13 1995-09-13 반도체 웨이퍼 세정장치

Publications (2)

Publication Number Publication Date
KR970015302U true KR970015302U (ko) 1997-04-28
KR0128207Y1 KR0128207Y1 (ko) 1998-12-01

Family

ID=19423221

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950024636U KR0128207Y1 (ko) 1995-09-13 1995-09-13 반도체 웨이퍼 세정장치

Country Status (1)

Country Link
KR (1) KR0128207Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100623174B1 (ko) * 1998-07-10 2006-12-04 삼성전자주식회사 반도체 장치 제조용 케미컬 재순환 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100469130B1 (ko) * 1997-07-25 2005-05-03 삼성전자주식회사 반도체장치이송용진공튀저의세정장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100623174B1 (ko) * 1998-07-10 2006-12-04 삼성전자주식회사 반도체 장치 제조용 케미컬 재순환 장치

Also Published As

Publication number Publication date
KR0128207Y1 (ko) 1998-12-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
O032 Opposition [utility model]: request for opposition
O131 Decision on opposition [utility model]
O062 Revocation of registration by opposition: final registration of opposition [utility model]
LAPS Lapse due to unpaid annual fee