KR960022658U - Sputtering device - Google Patents

Sputtering device

Info

Publication number
KR960022658U
KR960022658U KR2019940032999U KR19940032999U KR960022658U KR 960022658 U KR960022658 U KR 960022658U KR 2019940032999 U KR2019940032999 U KR 2019940032999U KR 19940032999 U KR19940032999 U KR 19940032999U KR 960022658 U KR960022658 U KR 960022658U
Authority
KR
South Korea
Prior art keywords
sputtering device
sputtering
Prior art date
Application number
KR2019940032999U
Other languages
Korean (ko)
Other versions
KR200187373Y1 (en
Inventor
박장식
박재범
강태수
Original Assignee
삼성코닝주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성코닝주식회사 filed Critical 삼성코닝주식회사
Priority to KR2019940032999U priority Critical patent/KR200187373Y1/en
Publication of KR960022658U publication Critical patent/KR960022658U/en
Application granted granted Critical
Publication of KR200187373Y1 publication Critical patent/KR200187373Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR2019940032999U 1994-12-06 1994-12-06 Sputtering apparatus KR200187373Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940032999U KR200187373Y1 (en) 1994-12-06 1994-12-06 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940032999U KR200187373Y1 (en) 1994-12-06 1994-12-06 Sputtering apparatus

Publications (2)

Publication Number Publication Date
KR960022658U true KR960022658U (en) 1996-07-20
KR200187373Y1 KR200187373Y1 (en) 2000-07-01

Family

ID=19400498

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940032999U KR200187373Y1 (en) 1994-12-06 1994-12-06 Sputtering apparatus

Country Status (1)

Country Link
KR (1) KR200187373Y1 (en)

Also Published As

Publication number Publication date
KR200187373Y1 (en) 2000-07-01

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090407

Year of fee payment: 10

EXPY Expiration of term