KR960010901A - 고체 유기화합물 전용 버블러 장치 - Google Patents

고체 유기화합물 전용 버블러 장치 Download PDF

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Publication number
KR960010901A
KR960010901A KR1019940025196A KR19940025196A KR960010901A KR 960010901 A KR960010901 A KR 960010901A KR 1019940025196 A KR1019940025196 A KR 1019940025196A KR 19940025196 A KR19940025196 A KR 19940025196A KR 960010901 A KR960010901 A KR 960010901A
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KR
South Korea
Prior art keywords
bubbler
organic compound
solid organic
porous thin
carrier gas
Prior art date
Application number
KR1019940025196A
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English (en)
Inventor
김대식
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019940025196A priority Critical patent/KR960010901A/ko
Priority to US08/536,819 priority patent/US5603169A/en
Priority to JP7253929A priority patent/JPH08333683A/ja
Publication of KR960010901A publication Critical patent/KR960010901A/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

본 발명은 유기금속 화학증착법(Metal-Organic Chemical Vapor Deposition:MOCVD)에 상용되는 고체 유기화합물을 기화시키는 버블러(Bubbler)장치에 관한 것으로, 더욱 구체적으로는 버블러 본체내부에 착탈가능하게 장착되는 다공질 박판을 운반기체주입구와 배출구측에 씰링되게 장착하여 운반기체가 시료를 통과하는 경로를 조절하므로써 시료의 공급효율과 시료농도 조절의 정밀도를 향상시킬 수 있도록 한 것에 관한 것이다.

Description

고체 유기화합물 전용 버블러 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제4도는 본 발명에 의한 버블러 장치의 개략도.

Claims (4)

  1. 유기금속 화학증착법에 사용되는 고체 유기화합물을 기화시키는 버블러 장치에 있어서, 버블러 본체(4A)에 내장되는 운반기체의 주입구와 배출구측에 다공질 박판(4H,4G)을 각각 씰링되게 장착하되, 상기 다공질 박판(4H,4G)은 버블러 본체(4A)에 대해 착탈가능하도록 장착됨을 특징으로 하는 고체 유기화합물 전용 버블러 장치.
  2. 제1항에 있어서, 상기 운반기체의 주입구측의 박판(4H)의 기공크기는 유기금속 시료(4E)의 입자크기 이하로 형성됨을 특징으로 하는 고체 유기화합물 전용 버블러 장치.
  3. 제1항에 있어서, 상기 다공질박판(4H,4G)은 상하면에 장착되는 O링(41)에 의해 버블러 본체(4A)에 대해 씰링됨을 특징으로 하는 고체 유기화합물 전용 버블러 장치.
  4. 제1항에 있어서, 상기 다공질 박판(4H,4G)은 외주면에 장착되는 금속 가스켓(4J)에 의해 버블러 본체(4A)에 대해 씰링됨을 특징으로 하는 고체 유기화합물 전용 버블러 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940025196A 1994-09-30 1994-09-30 고체 유기화합물 전용 버블러 장치 KR960010901A (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019940025196A KR960010901A (ko) 1994-09-30 1994-09-30 고체 유기화합물 전용 버블러 장치
US08/536,819 US5603169A (en) 1994-09-30 1995-09-29 Bubbler for solid metal-organic percursors
JP7253929A JPH08333683A (ja) 1994-09-30 1995-09-29 固体有機化合物専用バブラー装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940025196A KR960010901A (ko) 1994-09-30 1994-09-30 고체 유기화합물 전용 버블러 장치

Publications (1)

Publication Number Publication Date
KR960010901A true KR960010901A (ko) 1996-04-20

Family

ID=19394285

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940025196A KR960010901A (ko) 1994-09-30 1994-09-30 고체 유기화합물 전용 버블러 장치

Country Status (3)

Country Link
US (1) US5603169A (ko)
JP (1) JPH08333683A (ko)
KR (1) KR960010901A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100478473B1 (ko) * 1997-12-31 2005-07-07 주식회사 효성 알루미나촉매지지체의기공량증진방법
WO2014022219A1 (en) * 2012-07-30 2014-02-06 William Kimmerle Chemical precursor bubbler

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US5815942A (en) * 1996-12-13 1998-10-06 Kabushiki Kaisha Toshiba Vapor drying system and method
US6984415B2 (en) * 1999-08-20 2006-01-10 International Business Machines Corporation Delivery systems for gases for gases via the sublimation of solid precursors
US6444038B1 (en) * 1999-12-27 2002-09-03 Morton International, Inc. Dual fritted bubbler
DE60020781T2 (de) * 1999-08-20 2006-05-11 Rohm And Haas Chemicals Llc Sprudelvorrichtung mit zwei Fritten
US7300038B2 (en) * 2002-07-23 2007-11-27 Advanced Technology Materials, Inc. Method and apparatus to help promote contact of gas with vaporized material
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
JP4571787B2 (ja) * 2003-07-08 2010-10-27 東ソー・ファインケム株式会社 固体有機金属化合物用充填容器およびその充填方法
IN266811B (ko) * 2004-05-20 2015-06-03 Akzo Nobel Nv
US7722720B2 (en) 2004-12-08 2010-05-25 Rohm And Haas Electronic Materials Llc Delivery device
KR100697691B1 (ko) * 2005-07-27 2007-03-20 삼성전자주식회사 소스 가스 공급 유닛 및 이를 갖는 화학 기상 증착 장치
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
MX2008006791A (es) * 2005-11-29 2008-10-23 Air Diffusion Systems A John H Entrega de burbuja fina para agua potable, agua de desperdicio, y tratamiento de agua limpia.
DE102006022534A1 (de) * 2006-05-15 2007-11-22 Aixtron Ag Quellenbehälter einse VPE-Reaktors
EP1860208B1 (en) * 2006-05-22 2014-10-15 Rohm and Haas Electronic Materials LLC Film deposition method
US20080241805A1 (en) 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
GB2444143B (en) * 2006-11-27 2009-10-28 Sumitomo Chemical Co Apparatus of supplying organometallic compound
JP5690498B2 (ja) 2009-03-27 2015-03-25 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置
KR101765734B1 (ko) 2009-11-02 2017-08-07 시그마-알드리치 컴퍼니., 엘엘씨 고형 전구체 전달 어셈블리 및 관련 방법
JP2013229493A (ja) * 2012-04-26 2013-11-07 Sharp Corp Ｉｉｉ族窒化物半導体積層基板およびｉｉｉ族窒化物半導体電界効果トランジスタ
US10385452B2 (en) 2012-05-31 2019-08-20 Entegris, Inc. Source reagent-based delivery of fluid with high material flux for batch deposition
WO2016025367A1 (en) 2014-08-11 2016-02-18 Veeco Instruments Inc. Enhanced enclosures for acoustical gas concentration sensing and flow control
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법

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US3866332A (en) * 1972-06-06 1975-02-18 Crompton & Knowles Corp Fluidized bed dryer
US5243769A (en) * 1992-06-26 1993-09-14 Yazaki Corporation Process for rapidly drying a wet, porous gel monolith

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100478473B1 (ko) * 1997-12-31 2005-07-07 주식회사 효성 알루미나촉매지지체의기공량증진방법
WO2014022219A1 (en) * 2012-07-30 2014-02-06 William Kimmerle Chemical precursor bubbler

Also Published As

Publication number Publication date
US5603169A (en) 1997-02-18
JPH08333683A (ja) 1996-12-17

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