KR960008998A - 스테이지 장치 및 구동방법 - Google Patents
스테이지 장치 및 구동방법Info
- Publication number
- KR960008998A KR960008998A KR1019950027369A KR19950027369A KR960008998A KR 960008998 A KR960008998 A KR 960008998A KR 1019950027369 A KR1019950027369 A KR 1019950027369A KR 19950027369 A KR19950027369 A KR 19950027369A KR 960008998 A KR960008998 A KR 960008998A
- Authority
- KR
- South Korea
- Prior art keywords
- driving method
- stage device
- stage
- driving
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1994-201945 | 1994-08-26 | ||
JP6201945A JPH0864504A (ja) | 1994-08-26 | 1994-08-26 | ステージ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960008998A true KR960008998A (ko) | 1996-03-22 |
KR100392442B1 KR100392442B1 (ko) | 2003-10-11 |
Family
ID=16449384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950027369A KR100392442B1 (ko) | 1994-08-26 | 1995-08-26 | 스테이지장치및구동방법 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6166812A (ko) |
JP (1) | JPH0864504A (ko) |
KR (1) | KR100392442B1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11354417A (ja) * | 1998-06-11 | 1999-12-24 | Canon Inc | 走査型露光装置およびこれを用いたデバイス製造方法ならびにステージ制御装置 |
US7283200B2 (en) * | 2003-07-17 | 2007-10-16 | Nikon Corporation | System and method for measuring displacement of a stage |
JP2005078327A (ja) * | 2003-08-29 | 2005-03-24 | Seiko Epson Corp | 状態フィードバック制御装置 |
US7589911B2 (en) * | 2003-09-18 | 2009-09-15 | Canon Kabushiki Kaisha | Technique for positioning optical system element |
JP5151989B2 (ja) * | 2006-11-09 | 2013-02-27 | 株式会社ニコン | 保持装置、位置検出装置及び露光装置、並びにデバイス製造方法 |
CN110530257A (zh) * | 2019-09-26 | 2019-12-03 | 深圳市威富视界有限公司 | 飞秒激光器分布式干涉仪*** |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60119721A (ja) * | 1983-12-02 | 1985-06-27 | Nippon Telegr & Teleph Corp <Ntt> | 荷電ビ−ム露光装置における照射位置補正方法 |
JPH01191420A (ja) * | 1988-01-27 | 1989-08-01 | Canon Inc | 半導体焼付装置 |
JP2704734B2 (ja) * | 1988-09-05 | 1998-01-26 | キヤノン株式会社 | ステージ位置決め補正方法及び装置 |
JP2852078B2 (ja) * | 1989-09-01 | 1999-01-27 | 株式会社日立製作所 | 集束エネルギビーム照射方法及びその装置 |
US5506684A (en) * | 1991-04-04 | 1996-04-09 | Nikon Corporation | Projection scanning exposure apparatus with synchronous mask/wafer alignment system |
US5477304A (en) * | 1992-10-22 | 1995-12-19 | Nikon Corporation | Projection exposure apparatus |
-
1994
- 1994-08-26 JP JP6201945A patent/JPH0864504A/ja not_active Withdrawn
-
1995
- 1995-08-26 KR KR1019950027369A patent/KR100392442B1/ko not_active IP Right Cessation
-
1999
- 1999-08-30 US US09/385,965 patent/US6166812A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0864504A (ja) | 1996-03-08 |
US6166812A (en) | 2000-12-26 |
KR100392442B1 (ko) | 2003-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20080623 Year of fee payment: 6 |
|
LAPS | Lapse due to unpaid annual fee |