KR960006318U - Gas injection device for semiconductor manufacturing - Google Patents

Gas injection device for semiconductor manufacturing

Info

Publication number
KR960006318U
KR960006318U KR2019940017322U KR19940017322U KR960006318U KR 960006318 U KR960006318 U KR 960006318U KR 2019940017322 U KR2019940017322 U KR 2019940017322U KR 19940017322 U KR19940017322 U KR 19940017322U KR 960006318 U KR960006318 U KR 960006318U
Authority
KR
South Korea
Prior art keywords
injection device
gas injection
semiconductor manufacturing
semiconductor
manufacturing
Prior art date
Application number
KR2019940017322U
Other languages
Korean (ko)
Other versions
KR0121318Y1 (en
Inventor
홍성규
최철열
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940017322U priority Critical patent/KR0121318Y1/en
Publication of KR960006318U publication Critical patent/KR960006318U/en
Application granted granted Critical
Publication of KR0121318Y1 publication Critical patent/KR0121318Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019940017322U 1994-07-13 1994-07-13 Gas ejection apparatus for manufacturing semiconductor device KR0121318Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940017322U KR0121318Y1 (en) 1994-07-13 1994-07-13 Gas ejection apparatus for manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940017322U KR0121318Y1 (en) 1994-07-13 1994-07-13 Gas ejection apparatus for manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
KR960006318U true KR960006318U (en) 1996-02-17
KR0121318Y1 KR0121318Y1 (en) 1998-08-01

Family

ID=19388259

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940017322U KR0121318Y1 (en) 1994-07-13 1994-07-13 Gas ejection apparatus for manufacturing semiconductor device

Country Status (1)

Country Link
KR (1) KR0121318Y1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100433285B1 (en) * 2001-07-18 2004-05-31 주성엔지니어링(주) Semiconductor device fabrication apparatus having multi-hole angled gas injection system
KR100584121B1 (en) * 2004-08-14 2006-05-30 에이피티씨 주식회사 Apparatus for providing gas having 3-dimension flow path and etching chamber containing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100433285B1 (en) * 2001-07-18 2004-05-31 주성엔지니어링(주) Semiconductor device fabrication apparatus having multi-hole angled gas injection system
KR100584121B1 (en) * 2004-08-14 2006-05-30 에이피티씨 주식회사 Apparatus for providing gas having 3-dimension flow path and etching chamber containing the same

Also Published As

Publication number Publication date
KR0121318Y1 (en) 1998-08-01

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Legal Events

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Payment date: 20090323

Year of fee payment: 12

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