KR950023953U - Semiconductor plasma etching device - Google Patents

Semiconductor plasma etching device

Info

Publication number
KR950023953U
KR950023953U KR2019940000204U KR19940000204U KR950023953U KR 950023953 U KR950023953 U KR 950023953U KR 2019940000204 U KR2019940000204 U KR 2019940000204U KR 19940000204 U KR19940000204 U KR 19940000204U KR 950023953 U KR950023953 U KR 950023953U
Authority
KR
South Korea
Prior art keywords
plasma etching
etching device
semiconductor plasma
semiconductor
plasma
Prior art date
Application number
KR2019940000204U
Other languages
Korean (ko)
Other versions
KR200165864Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019940000204U priority Critical patent/KR200165864Y1/en
Publication of KR950023953U publication Critical patent/KR950023953U/en
Application granted granted Critical
Publication of KR200165864Y1 publication Critical patent/KR200165864Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019940000204U 1994-01-08 1994-01-08 Semiconductor plasma etching apparatus KR200165864Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940000204U KR200165864Y1 (en) 1994-01-08 1994-01-08 Semiconductor plasma etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940000204U KR200165864Y1 (en) 1994-01-08 1994-01-08 Semiconductor plasma etching apparatus

Publications (2)

Publication Number Publication Date
KR950023953U true KR950023953U (en) 1995-08-23
KR200165864Y1 KR200165864Y1 (en) 2000-01-15

Family

ID=19375378

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940000204U KR200165864Y1 (en) 1994-01-08 1994-01-08 Semiconductor plasma etching apparatus

Country Status (1)

Country Link
KR (1) KR200165864Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200076065A (en) 2018-12-19 2020-06-29 주식회사 에이피피 Atmospheric pressure plasma etching equipment applicable to large-area OLED panels

Also Published As

Publication number Publication date
KR200165864Y1 (en) 2000-01-15

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
O032 Opposition [utility model]: request for opposition
O131 Decision on opposition [utility model]
O062 Revocation of registration by opposition: final registration of opposition [utility model]
LAPS Lapse due to unpaid annual fee