KR940027598U - Improved mask for semiconductor gym equipment - Google Patents

Improved mask for semiconductor gym equipment

Info

Publication number
KR940027598U
KR940027598U KR2019930009175U KR930009175U KR940027598U KR 940027598 U KR940027598 U KR 940027598U KR 2019930009175 U KR2019930009175 U KR 2019930009175U KR 930009175 U KR930009175 U KR 930009175U KR 940027598 U KR940027598 U KR 940027598U
Authority
KR
South Korea
Prior art keywords
semiconductor
improved mask
gym equipment
gym
equipment
Prior art date
Application number
KR2019930009175U
Other languages
Korean (ko)
Other versions
KR0116281Y1 (en
Inventor
박정렬
Original Assignee
엘지 반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지 반도체 주식회사 filed Critical 엘지 반도체 주식회사
Priority to KR2019930009175U priority Critical patent/KR0116281Y1/en
Publication of KR940027598U publication Critical patent/KR940027598U/en
Application granted granted Critical
Publication of KR0116281Y1 publication Critical patent/KR0116281Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019930009175U 1993-05-29 1993-05-29 Mask for semiconductor process KR0116281Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930009175U KR0116281Y1 (en) 1993-05-29 1993-05-29 Mask for semiconductor process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930009175U KR0116281Y1 (en) 1993-05-29 1993-05-29 Mask for semiconductor process

Publications (2)

Publication Number Publication Date
KR940027598U true KR940027598U (en) 1994-12-10
KR0116281Y1 KR0116281Y1 (en) 1998-04-18

Family

ID=19356079

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930009175U KR0116281Y1 (en) 1993-05-29 1993-05-29 Mask for semiconductor process

Country Status (1)

Country Link
KR (1) KR0116281Y1 (en)

Also Published As

Publication number Publication date
KR0116281Y1 (en) 1998-04-18

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application
J2X1 Appeal (before the patent court)

Free format text: APPEAL AGAINST DECISION TO DECLINE REFUSAL

B701 Decision to grant
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20061215

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee