KR940017173U - 자기헤드용 스퍼터링 지그 - Google Patents

자기헤드용 스퍼터링 지그

Info

Publication number
KR940017173U
KR940017173U KR2019920026153U KR920026153U KR940017173U KR 940017173 U KR940017173 U KR 940017173U KR 2019920026153 U KR2019920026153 U KR 2019920026153U KR 920026153 U KR920026153 U KR 920026153U KR 940017173 U KR940017173 U KR 940017173U
Authority
KR
South Korea
Prior art keywords
magnetic head
sputtering jig
jig
sputtering
magnetic
Prior art date
Application number
KR2019920026153U
Other languages
English (en)
Other versions
KR950006317Y1 (ko
Inventor
박영민
장한성
Original Assignee
삼성전기 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전기 주식회사 filed Critical 삼성전기 주식회사
Priority to KR92026153U priority Critical patent/KR950006317Y1/ko
Publication of KR940017173U publication Critical patent/KR940017173U/ko
Application granted granted Critical
Publication of KR950006317Y1 publication Critical patent/KR950006317Y1/ko

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/335—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only with saturated jig, e.g. for detecting second harmonic; balanced flux head
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Heads (AREA)
KR92026153U 1992-12-23 1992-12-23 자기헤드용 스퍼터링 지그 KR950006317Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92026153U KR950006317Y1 (ko) 1992-12-23 1992-12-23 자기헤드용 스퍼터링 지그

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92026153U KR950006317Y1 (ko) 1992-12-23 1992-12-23 자기헤드용 스퍼터링 지그

Publications (2)

Publication Number Publication Date
KR940017173U true KR940017173U (ko) 1994-07-25
KR950006317Y1 KR950006317Y1 (ko) 1995-08-05

Family

ID=19347295

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92026153U KR950006317Y1 (ko) 1992-12-23 1992-12-23 자기헤드용 스퍼터링 지그

Country Status (1)

Country Link
KR (1) KR950006317Y1 (ko)

Also Published As

Publication number Publication date
KR950006317Y1 (ko) 1995-08-05

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