KR940013650U - 에트모스캔(atmoscan)튜브 - Google Patents
에트모스캔(atmoscan)튜브Info
- Publication number
- KR940013650U KR940013650U KR2019920021327U KR920021327U KR940013650U KR 940013650 U KR940013650 U KR 940013650U KR 2019920021327 U KR2019920021327 U KR 2019920021327U KR 920021327 U KR920021327 U KR 920021327U KR 940013650 U KR940013650 U KR 940013650U
- Authority
- KR
- South Korea
- Prior art keywords
- atmoscan tube
- atmoscan
- tube
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR92021327U KR950007919Y1 (ko) | 1992-11-02 | 1992-11-02 | 에트모스캔(atmoscan)튜브 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR92021327U KR950007919Y1 (ko) | 1992-11-02 | 1992-11-02 | 에트모스캔(atmoscan)튜브 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940013650U true KR940013650U (ko) | 1994-06-25 |
KR950007919Y1 KR950007919Y1 (ko) | 1995-09-25 |
Family
ID=19343085
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR92021327U KR950007919Y1 (ko) | 1992-11-02 | 1992-11-02 | 에트모스캔(atmoscan)튜브 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950007919Y1 (ko) |
-
1992
- 1992-11-02 KR KR92021327U patent/KR950007919Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR950007919Y1 (ko) | 1995-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20040820 Year of fee payment: 10 |
|
LAPS | Lapse due to unpaid annual fee |