KR940004310U - 회전형 웨이퍼 스테이지 방식 급속 열처리장치 - Google Patents

회전형 웨이퍼 스테이지 방식 급속 열처리장치

Info

Publication number
KR940004310U
KR940004310U KR2019920014128U KR920014128U KR940004310U KR 940004310 U KR940004310 U KR 940004310U KR 2019920014128 U KR2019920014128 U KR 2019920014128U KR 920014128 U KR920014128 U KR 920014128U KR 940004310 U KR940004310 U KR 940004310U
Authority
KR
South Korea
Prior art keywords
heat treatment
treatment system
wafer heat
rapid wafer
rapid
Prior art date
Application number
KR2019920014128U
Other languages
English (en)
Other versions
KR950006649Y1 (ko
Inventor
홍근봉
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92014128U priority Critical patent/KR950006649Y1/ko
Publication of KR940004310U publication Critical patent/KR940004310U/ko
Application granted granted Critical
Publication of KR950006649Y1 publication Critical patent/KR950006649Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
KR92014128U 1992-07-29 1992-07-29 회전형 웨이퍼 스테이지 방식 급속 열처리장치 KR950006649Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92014128U KR950006649Y1 (ko) 1992-07-29 1992-07-29 회전형 웨이퍼 스테이지 방식 급속 열처리장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92014128U KR950006649Y1 (ko) 1992-07-29 1992-07-29 회전형 웨이퍼 스테이지 방식 급속 열처리장치

Publications (2)

Publication Number Publication Date
KR940004310U true KR940004310U (ko) 1994-02-24
KR950006649Y1 KR950006649Y1 (ko) 1995-08-16

Family

ID=19337586

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92014128U KR950006649Y1 (ko) 1992-07-29 1992-07-29 회전형 웨이퍼 스테이지 방식 급속 열처리장치

Country Status (1)

Country Link
KR (1) KR950006649Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100794332B1 (ko) * 2006-05-26 2008-01-15 (주)유스텍 대상물 고정감지장치

Also Published As

Publication number Publication date
KR950006649Y1 (ko) 1995-08-16

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Legal Events

Date Code Title Description
A201 Request for examination
O032 Opposition [utility model]: request for opposition
E601 Decision to refuse application
O061 Decision on refusal after opposition [utility model]: decision to refuse application