KR910019202A - Ni-Co thin film manufacturing method - Google Patents

Ni-Co thin film manufacturing method Download PDF

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Publication number
KR910019202A
KR910019202A KR1019900006129A KR900006129A KR910019202A KR 910019202 A KR910019202 A KR 910019202A KR 1019900006129 A KR1019900006129 A KR 1019900006129A KR 900006129 A KR900006129 A KR 900006129A KR 910019202 A KR910019202 A KR 910019202A
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KR
South Korea
Prior art keywords
thin film
film manufacturing
epoxy
mica
substrate
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KR1019900006129A
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Korean (ko)
Inventor
추대호
Original Assignee
서주인
삼성전기 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 서주인, 삼성전기 주식회사 filed Critical 서주인
Priority to KR1019900006129A priority Critical patent/KR910019202A/en
Publication of KR910019202A publication Critical patent/KR910019202A/en

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  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

내용 없음No content

Description

Ni-Co 박막의 제조방법.Ni-Co thin film manufacturing method.

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 2 도는 본 발명에서의 통상적인 유리 기판상에 Ni-Co를 증착한 박막의 개략 단면도, 제 3 도는 본 발명에서의 Ni-Co박막의 제조공정도.2 is a schematic cross-sectional view of a thin film of Ni-Co deposited on a conventional glass substrate in the present invention, and FIG. 3 is a manufacturing process diagram of the Ni-Co thin film in the present invention.

Claims (3)

하기 (1), (2), (3) 및 (4) 공정으로 제조되는 것을 특징으로 하는 Ni-Co 박막의 제조방법, (1) 운모간이기판 상에 진공 증착법으로 Ni-Co박막을 제조하는 공정, (2) 통상의 유리 기판상에 스핀 코팅법으로 에폭시를 도포하는 공정, (3) 상기 제 (1) 공정에서 제조된 Ni-Co박막을 상기 제 (2) 공정에서 제조된 에폭시 상에 전사시키는 공정 및 (4) 운모 간이 기판을 제거하는 공정.A method for producing a Ni-Co thin film, which is prepared by the following steps (1), (2), (3) and (4), and (1) preparing a Ni-Co thin film by vacuum evaporation on a mica inter substrate. Process, (2) spin-coating the epoxy on a conventional glass substrate, (3) Ni-Co thin film produced in the above (1) step on the epoxy produced in the (2) step A step of transferring and (4) a step of removing the mica simple substrate. 제 1 항에 있어서, 상기 도포되는 에폭시 수지막의 두께가 1∼2μm인 것을 특징으로 하는 Ni-Co박막의 제조방법.The method for producing a Ni-Co thin film according to claim 1, wherein the epoxy resin film to be coated has a thickness of 1 to 2 m. 제 1 항에 있어서, 상기 Ni-Co박막의 두께가 400∼600A인 것을 특징으로 하는 Ni-Co 박막의 제조방법.The method of manufacturing a Ni-Co thin film according to claim 1, wherein the Ni-Co thin film has a thickness of 400 to 600 A. ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.※ Note: This is to be disclosed by the original application.
KR1019900006129A 1990-04-30 1990-04-30 Ni-Co thin film manufacturing method KR910019202A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900006129A KR910019202A (en) 1990-04-30 1990-04-30 Ni-Co thin film manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900006129A KR910019202A (en) 1990-04-30 1990-04-30 Ni-Co thin film manufacturing method

Publications (1)

Publication Number Publication Date
KR910019202A true KR910019202A (en) 1991-11-30

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KR1019900006129A KR910019202A (en) 1990-04-30 1990-04-30 Ni-Co thin film manufacturing method

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012047071A2 (en) * 2010-10-08 2012-04-12 한국과학기술원 Method for manufacturing flexible nanogenerator and flexible nanogenerator manufactured thereby

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012047071A2 (en) * 2010-10-08 2012-04-12 한국과학기술원 Method for manufacturing flexible nanogenerator and flexible nanogenerator manufactured thereby
WO2012047071A3 (en) * 2010-10-08 2012-08-23 한국과학기술원 Method for manufacturing flexible nanogenerator and flexible nanogenerator manufactured thereby

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