KR910013334A - Plasma generator using microwave - Google Patents

Plasma generator using microwave Download PDF

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Publication number
KR910013334A
KR910013334A KR1019900020201A KR900020201A KR910013334A KR 910013334 A KR910013334 A KR 910013334A KR 1019900020201 A KR1019900020201 A KR 1019900020201A KR 900020201 A KR900020201 A KR 900020201A KR 910013334 A KR910013334 A KR 910013334A
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KR
South Korea
Prior art keywords
microwave
plasma
waveguide
mode transformer
circular
Prior art date
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KR1019900020201A
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Korean (ko)
Inventor
게쉐 로란트
크레츠메르 카알-하인츠
Original Assignee
원본미기재
라이볼트 악티엔게젤샤프트
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Application filed by 원본미기재, 라이볼트 악티엔게젤샤프트 filed Critical 원본미기재
Publication of KR910013334A publication Critical patent/KR910013334A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32293—Microwave generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

내용 없음.No content.

Description

마이크로파를 이용한 플라즈마의 발생장치Plasma generator using microwave

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 제1a도와 제1b도의 전자기파로 구성되어 있는 원편파를 도시한 도면,FIG. 2 is a diagram showing circularly polarized waves consisting of electromagnetic waves shown in FIGS. 1A and 1B;

제6도는 원편파가 원형 도파관을 통해 전송되어지는 플라즈마 원을 도시한 도면,6 shows a plasma source through which circularly polarized waves are transmitted through a circular waveguide,

제7도는 도량형의 마이크로파 방사장치를 도시한 도면.7 is a diagram showing a metrological microwave radiation device.

Claims (17)

a)마이크로파 발진기(17), b)마이크로파 발진기(17)에 접속되어 있는 모드 변압기(12), 및 c)플라즈마 챔버(1, 21, 64)를 포함하는 마이크로파의 원편파를 이용한 플라즈마(70) 발생장치에 있어서, d)모드 변압기(12)가 마이크로파의 선형의 편파를 마이크로파의 원형의 편파로 변형시키고, 이때 H11기본파가, 우선적으로 전파되어지며, e)원-원주형 혼-도파관(10,63) 이 그 입구는 전도 또는 부전도 되는 모드 변압기(12)와, 그 출구는 플라즈마 챔버(1, 2, 63)과 접속되어 있는 것을 특징으로 하는 마이크로파를 이용한 플라즈마 발생장치.Plasma 70 using a microwave circular polarization including a) microwave oscillator 17, b) mode transformer 12 connected to microwave oscillator 17, and c) plasma chambers 1, 21, 64. In the generator, d) the mode transformer 12 transforms the linear linear polarization of the microwave into a circular polarization of the microwave, wherein the H 11 fundamental wave propagates preferentially, e) a circular-circular horn-waveguide (10,63) A plasma generating device using microwaves, the inlet of which is connected to a mode transformer (12) that is conductive or nonconductive, and the outlet of which is connected to a plasma chamber (1, 2, 63). 제1항에 있어서, 모드 변압기(12)와 혼 도파관(10, 63) 사이에 H11기본파 만이 전달될 수 있는 둥근 중공의 도파관(11)이 구비되어 있는 것을 특징으로 하는 장치.2. The device according to claim 1, wherein a circular hollow waveguide (11) is provided between the mode transformer (12) and the horn waveguide (10, 63) to which only H 11 fundamental waves can be transmitted. 제1항에 있어서, 혼 도파관(10)이 원추형이면서 매끄러운 것을 특징으로 하는 장치.The device of claim 1, wherein the horn waveguide (10) is conical and smooth. 제1항에 있어서, 혼 도파관이 홈있는 혼(60)인 것을 특징으로 하는 장치.2. The device of claim 1, wherein the horn waveguide is a grooved horn (60). 제1항에 있어서, 플라즈마(70)가 적어도 소정의 세기를 갖는 정 자기장의 하나에 노출되는 것을 특징으로 하는 장치.2. An apparatus according to claim 1, wherein the plasma (70) is exposed to one of the static magnetic fields having at least a predetermined intensity. 제5항에 있어서, 정 자기장이 전자기파의 전기장에 수직으로 향해지는 것을 특징으로 하는 장치.6. An apparatus according to claim 5, wherein the static magnetic field is directed perpendicular to the electric field of the electromagnetic wave. 제5항에 있어서, 플라즈마실(70) 주위에 몇개의 자석(6, 7, 71, 73)이 배열되어 있는 것을 특징으로 하는 장치.6. Device according to claim 5, characterized in that several magnets (6, 7, 71, 73) are arranged around the plasma chamber (70). 제1항에 있어서, 둥근 중공의 도파관(11)이 그에 상응하는 2.456Hz 마이크로파 주파수에서 7.05cm와 9.16cm사이의 그 내부직경을 가지는 것을 특징으로 하는 장치.The device according to claim 1, wherein the round hollow waveguide (11) has an inner diameter of between 7.05 cm and 9.16 cm at a corresponding 2.456 Hz microwave frequency. 제8항에 있어서, 둥근 중공의 도파관(11)이 내부직경 8.36cm인 C25-중공의 도파관인 것을 특징으로 하는 장치.9. The device according to claim 8, wherein the round hollow waveguide (11) is a C25-hollow waveguide with an inner diameter of 8.36 cm. 제1항에 있어서, 종형의 부도체의 장치(72)에 의해 플라즈마 챔버가 마이크로파 방사 유닛쪽으로 부터 차단되는 것을 특징으로 하는 장치.The device of claim 1, wherein the plasma non-conductive device (72) is isolated from the microwave radiation unit. 제10항에 있어서, 플라즈마 챔버의 하단에 전압원(3)이 연결되어 있는 기판 캐리어(74)가 구비되어 있는 것을 특징으로 하는 장치.11. An apparatus according to claim 10, characterized in that a substrate carrier (74) is provided at the bottom of the plasma chamber, to which a voltage source (3) is connected. 제10항에 있어서, 장치(72)가 플라즈마로 솟는 첨단형 장을 발생시키는 고리형의 영구자석(73)으로 둘러싸여 있는 것을 특징으로 하는 장치.11. Device according to claim 10, characterized in that the device (72) is surrounded by an annular permanent magnet (73) which generates a peak field that rises into the plasma. 제1항에 있어서, 극초단파 발진기(17)와 모드변압기(12) 사이에 조절장치(14, 15)가 구비되어 있는 것을 특징으로 하는 장치.2. Device according to claim 1, characterized in that an adjusting device (14, 15) is provided between the microwave oscillator (17) and the mode transformer (12). 제13항에 있어서, 조절장치(14, 15)와 모드 변압기(12) 사이에 직사각형의 중공의 도파관(13)이 구비되어 있는 것을 특징으로 하는 장치.14. Device according to claim 13, characterized in that a rectangular hollow waveguide (13) is provided between the regulator (14, 15) and the mode transformer (12). 제1항에 있어서, 회전자(16)가 마이크로파 발진기(17)의 뒤에 접속되어 있는 것을 특징으로 하는 장치.2. Device according to claim 1, characterized in that the rotor (16) is connected behind the microwave oscillator (17). 제10항에 있어서, 장치(72)위에 고리형 전자석(71)이 구비되어 있는 것을 특징으로 하는 장치.Device according to claim 10, characterized in that an annular electromagnet (71) is provided on the device (72). 제1항에 있어서, 모드 변압기(12)가 직사각형의 중공의 도파관(13)에서 나오는 선형의 편파의 직각 부분을 원편파의 원형부분으로 변형시키는 것을 특징으로 하는 장치.2. Device according to claim 1, characterized in that the mode transformer (12) deforms the rectangular portion of the linear polarization exiting the rectangular hollow waveguide (13) into a circular portion of circular polarization. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900020201A 1989-12-23 1990-12-08 Plasma generator using microwave KR910013334A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3942963.6 1989-12-23
DE3942963 1989-12-23

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KR910013334A true KR910013334A (en) 1991-08-08

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EP (1) EP0434933B1 (en)
JP (1) JP3055806B2 (en)
KR (1) KR910013334A (en)
DE (1) DE59009135D1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69306007T2 (en) * 1992-01-30 1997-05-22 Hitachi Ltd Process and device for plasma generation and process for semiconductor processing
DE4239843A1 (en) * 1992-11-27 1994-06-01 Leybold Ag Appts for sputter coating substrates - using microwave resonator to improve coating
DE59402845D1 (en) * 1994-12-07 1997-06-26 Leybold Ag Device for thin-film processes for the treatment of large-area substrates
CN108736170B (en) * 2018-08-07 2021-03-16 南京邮电大学 Electromagnetic super-surface polarization converter based on solid plasma
DE102019111908B4 (en) 2019-05-08 2021-08-12 Dreebit Gmbh ECR ion source and method for operating an ECR ion source

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3287730A (en) * 1963-02-05 1966-11-22 John L Kerr Variable polarization antenna
KR880013424A (en) * 1987-04-08 1988-11-30 미타 가츠시게 Plasma device
JPH0754759B2 (en) * 1987-04-27 1995-06-07 日本電信電話株式会社 Plasma processing method and apparatus, and mode converter for plasma processing apparatus
JPH01179323A (en) * 1988-01-06 1989-07-17 Hitachi Ltd Plasma reaction apparatus
JPH0216732A (en) * 1988-07-05 1990-01-19 Mitsubishi Electric Corp Plasma reactor

Also Published As

Publication number Publication date
JPH05326189A (en) 1993-12-10
JP3055806B2 (en) 2000-06-26
DE59009135D1 (en) 1995-06-29
EP0434933A2 (en) 1991-07-03
EP0434933B1 (en) 1995-05-24
EP0434933A3 (en) 1992-01-02

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