KR910001468A - Ultraviolet Photoresist Planarization Process Method - Google Patents

Ultraviolet Photoresist Planarization Process Method Download PDF

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Publication number
KR910001468A
KR910001468A KR1019890008303A KR890008303A KR910001468A KR 910001468 A KR910001468 A KR 910001468A KR 1019890008303 A KR1019890008303 A KR 1019890008303A KR 890008303 A KR890008303 A KR 890008303A KR 910001468 A KR910001468 A KR 910001468A
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KR
South Korea
Prior art keywords
planarization process
photoresist
process method
pattern material
ultraviolet photoresist
Prior art date
Application number
KR1019890008303A
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Korean (ko)
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KR910006043B1 (en
Inventor
문승찬
복철규
이용석
Original Assignee
정몽현
현대전자산업 주식회사
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Priority to KR1019890008303A priority Critical patent/KR910006043B1/en
Publication of KR910001468A publication Critical patent/KR910001468A/en
Application granted granted Critical
Publication of KR910006043B1 publication Critical patent/KR910006043B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

내용 없음No content

Description

자외선을 이용한 포토레지스트 평탄화 공정방법Ultraviolet Photoresist Planarization Process Method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 패턴물질 상부에 포토레지스트를 도포한 상태의 단면도,1 is a cross-sectional view of the photoresist is applied on the pattern material,

제3도는 제1도 공정후 본발명에 의한 경화공정을 실시하여 평탄화 정도를 나타낸 단면도,3 is a cross-sectional view showing the degree of planarization by performing a curing process according to the present invention after the process of FIG.

제4도는 평탄 계수를 나타내기 위한 단면도.4 is a cross-sectional view for showing the flatness coefficient.

Claims (2)

반도체 제조공정에서 실리콘기판, 또는 전도물질 또는 절연물질상에 패턴물질을 형성할시에 패턴물질 상부에 다른 물질을 형성하는 경우 발생되는 단자를 줄이기 위한 평탄화 공정으로 패턴물질 상부에 포토레지스트를 도포하고 경화시키는 평탄화 공정방법에 있어서, 상기 패턴물질이 형성된 기판 상부에 포토레지스트를 균일하게 도포하고 그위에 자외선을 수초간 조사하여 경화공정을 실시하는 것을 특징으로 하는 자외선을 이용한 포토레지스트 평탄화 공정방법.In the semiconductor manufacturing process, when the pattern material is formed on the silicon substrate, the conductive material or the insulating material, a photoresist is applied on the pattern material as a planarization process to reduce terminals generated when other materials are formed on the pattern material. A method of planarizing a photoresist using ultraviolet rays, wherein the step of curing is performed by uniformly applying a photoresist on the substrate on which the pattern material is formed, and irradiating ultraviolet rays for several seconds on the substrate. 제1항에 있어서, 상기 자외선의 파장은 350-450nm인 것을 특징으로 하는 자외선을 이용한 포토레지스트 평탄화 공정방법.The method of claim 1, wherein the wavelength of the ultraviolet ray is 350-450 nm. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019890008303A 1989-06-16 1989-06-16 Method for flatting photoresists with ultraviolet rays KR910006043B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019890008303A KR910006043B1 (en) 1989-06-16 1989-06-16 Method for flatting photoresists with ultraviolet rays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019890008303A KR910006043B1 (en) 1989-06-16 1989-06-16 Method for flatting photoresists with ultraviolet rays

Publications (2)

Publication Number Publication Date
KR910001468A true KR910001468A (en) 1991-01-30
KR910006043B1 KR910006043B1 (en) 1991-08-12

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ID=19287157

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890008303A KR910006043B1 (en) 1989-06-16 1989-06-16 Method for flatting photoresists with ultraviolet rays

Country Status (1)

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KR (1) KR910006043B1 (en)

Also Published As

Publication number Publication date
KR910006043B1 (en) 1991-08-12

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