KR900010943A - Microwave plasma processing equipment - Google Patents

Microwave plasma processing equipment

Info

Publication number
KR900010943A
KR900010943A KR1019890019740A KR890019740A KR900010943A KR 900010943 A KR900010943 A KR 900010943A KR 1019890019740 A KR1019890019740 A KR 1019890019740A KR 890019740 A KR890019740 A KR 890019740A KR 900010943 A KR900010943 A KR 900010943A
Authority
KR
South Korea
Prior art keywords
processing equipment
plasma processing
microwave plasma
microwave
equipment
Prior art date
Application number
KR1019890019740A
Other languages
Korean (ko)
Other versions
KR940002736B1 (en
Inventor
류조 호오진
나오끼 스즈끼
Original Assignee
마쯔시다덴기산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마쯔시다덴기산교 가부시기가이샤 filed Critical 마쯔시다덴기산교 가부시기가이샤
Publication of KR900010943A publication Critical patent/KR900010943A/en
Application granted granted Critical
Publication of KR940002736B1 publication Critical patent/KR940002736B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
KR1019890019740A 1988-12-27 1989-12-27 Treating apparatus using microwave plasma KR940002736B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63-332908 1988-12-27
JP63332908A JP2802083B2 (en) 1988-12-27 1988-12-27 Microwave plasma processing equipment

Publications (2)

Publication Number Publication Date
KR900010943A true KR900010943A (en) 1990-07-11
KR940002736B1 KR940002736B1 (en) 1994-03-31

Family

ID=18260148

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890019740A KR940002736B1 (en) 1988-12-27 1989-12-27 Treating apparatus using microwave plasma

Country Status (2)

Country Link
JP (1) JP2802083B2 (en)
KR (1) KR940002736B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5645644A (en) * 1995-10-20 1997-07-08 Sumitomo Metal Industries, Ltd. Plasma processing apparatus
JP3866590B2 (en) * 2002-03-08 2007-01-10 芝浦メカトロニクス株式会社 Plasma generator
KR20150050066A (en) * 2013-10-31 2015-05-08 삼성전기주식회사 Plasma generation device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274148A (en) * 1987-05-06 1988-11-11 Canon Inc Microwave plasma processing device
JPS63299338A (en) * 1987-05-29 1988-12-06 Matsushita Electric Ind Co Ltd Plasma treatment equipment

Also Published As

Publication number Publication date
JPH02177326A (en) 1990-07-10
KR940002736B1 (en) 1994-03-31
JP2802083B2 (en) 1998-09-21

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application
J2X1 Appeal (before the patent court)

Free format text: APPEAL AGAINST DECISION TO DECLINE REFUSAL

E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20060327

Year of fee payment: 13

LAPS Lapse due to unpaid annual fee