KR890017486A - 조명 시스템 - Google Patents
조명 시스템 Download PDFInfo
- Publication number
- KR890017486A KR890017486A KR1019890005415A KR890005415A KR890017486A KR 890017486 A KR890017486 A KR 890017486A KR 1019890005415 A KR1019890005415 A KR 1019890005415A KR 890005415 A KR890005415 A KR 890005415A KR 890017486 A KR890017486 A KR 890017486A
- Authority
- KR
- South Korea
- Prior art keywords
- reflector
- condenser
- radiation source
- illumination system
- lens
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V7/00—Reflectors for light sources
- F21V7/0025—Combination of two or more reflectors for a single light source
- F21V7/0033—Combination of two or more reflectors for a single light source with successive reflections from one reflector to the next or following
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/04—Refractors for light sources of lens shape
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V7/00—Reflectors for light sources
- F21V7/04—Optical design
- F21V7/041—Optical design with conical or pyramidal surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
- G02B27/102—Beam splitting or combining systems for splitting or combining different wavelengths for generating a colour image from monochromatic image signal sources
- G02B27/1026—Beam splitting or combining systems for splitting or combining different wavelengths for generating a colour image from monochromatic image signal sources for use with reflective spatial light modulators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
- G02B27/102—Beam splitting or combining systems for splitting or combining different wavelengths for generating a colour image from monochromatic image signal sources
- G02B27/1046—Beam splitting or combining systems for splitting or combining different wavelengths for generating a colour image from monochromatic image signal sources for use with transmissive spatial light modulators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/143—Beam splitting or combining systems operating by reflection only using macroscopically faceted or segmented reflective surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/001—Axicons, waxicons, reflaxicons
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2066—Reflectors in illumination beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
- F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
- F21W2131/40—Lighting for industrial, commercial, recreational or military use
- F21W2131/402—Lighting for industrial, commercial, recreational or military use for working places
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Projection Apparatus (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 본 발명에 따른 조명 시스템의 제 1 실시예를 도시한 도면. 제 2 도는 상기 조명 시스템을 구비한 칼라 주사 텔레비젼을 도시한 도면.
Claims (10)
- 주축을 따라 방사선 빔을 방출시키는 방사선 소오스로서 작용하고, 방사선 소오스와 서로 다른 방향으로 부터의 방사선 소오스를 받고 다량의 방사선 빔을 형성하기 위해 방사선 소오스 주위에 배치된 콘데서 시스템과, 관련 빔을 주축방향으로 반사시키기 위해 각 빔의 경로에 배치된 제 1 반사기를 구비한 저급 처리능력 조명 시스템에 있어서, 빔 축을 주축 방향으로 편향시키기 위한 제 2 반사기는 빔이 서로 교차하는 위치에서 각 빔의 방사선 경로내에 위치하여, 제 2 반사기에 근접 위치한 상기 조명 시스템내의 출구면에서 최소폭으로 집속된 빔이 서로 분산되고, 주축에 대해 대칭적으로 위치하는 것을 특징으로하는 조명 시스템.
- 제 1 항에 있어서, 조명될 표면의 일정상에 빔 축들을 접속시키고, 상기 표면에서 콘덴서 동공의 중복 영상을 시키기 위해, 조명 시스템의 출구에 렌즈가 설치되는 것을 특징으로하는 조명 시스템.
- 제 1 항 또는 제 2 항에 있어서, 각 콘덴서는 비구면적인 최소 하나의 표면에 단일 렌즈 소자를 구비하는 것을 특징으로하는 조명 시스템.
- 제 3 항에 있어서, 각 비구면 콘덴서 렌즈 소자는 최소 하나의 특별 렌즈 소자에 의해 완성되는 것을 특징으로하는 조명 시스템.
- 제1,2,3 또는 4항에 있어서, 최소 하나의 추가적 반사기는 제 1 반사기와 제 2 반사기 사이의 각 빔내에 배치되는 것을 특징으로하는 조명 시스템.
- 제1,2,3,4 또는 5항에 있어서, 상기 조명 시스템의 출구면과 접하는 방사선 소오스의 전방면에는 두개의 콘덴서가 배치되고 상기 콘덴서의 광학축은 90°이하의 각도로 중심부에서 서로 교차하며, 상기 방사선 소오스의 후방부에는 후방면의 방사선 소오스에서 방출되는 방사선을 콘덴서 쪽으로 반사시키는 오목 반사기에 설치되며, 결합된 제 2 반사기는 첨두각이 90°이하이고 첨두 부분이 조명 시스템의 출구와 접하는 루프 미러를 구성하며, 콘덴서와 반사기에 의해 형성된 빔의 시스템 출구면에서의 단면부는 광학축을 통과하고 방사선 소오스의 수직 방향과 직교하는 서로 다른면의 평면상에 위치하고 있는 것을 특징으로하는 조명 시스템.
- 제1,2,3,4 또는 5항에 있어서, 콘덴서 시스템은 방사선 소오스 주위에 대칭적으로 설치된 4개의 콘덴서로 구성되어 방사선 소오스의 중심부에서 상기 콘덴서의 광학축이 서로 교차하며, 결합된 제 2 반사기는 피라미드형 미러를 구성하며, 콘덴서 및 반사기에서 형성된 4개 빔의 시스템 출구면에서의 단면부는 출구면 4분면내에 위치하는 것을 특징으로하는 조명 시스템.
- 제1,2,3,4 또는 5항에 있어서, 상기 콘덴서 시스템은 방사선 소오스를 둘러싸는 연속된 렌즈들로 구성되고 상기 결합된 렌즈는 환상형 빔을 형성하는 연속 방사선 빔을 공급하도록 환상형 렌즈를 구성하며, 제 1 반사기, 제 2 반사기는 각각 제 1 원추형 반사기, 제 2 원추형 반사기를 구성하고, 상기 환상형 렌즈와 반사기에 의해 형성된 빔은 출구면에서 주축이 중심이 되는 환상형 단면부를 갖는 것을 특징으로하는 조명 시스템.
- 조명 시스템과, 투사될 영상을 발생시키는 최소 하나의 표시 채널을 갖는 정보 표시 시스템과, 상기 영상을 스크린상에 투사하기 위한 투사 렌즈 시스템을 구비한 투사 장치에 있어서, 상기 조명 시스템은 제 1 항내지 제 8 항중의 한 조명 시스템이며, 정보 표시 패널상에 조명 시스템 콘덴서 동공의 중복 영상화를 위한 출력 렌즈를 구비한 것을 특징으로하는 투사 장치.
- 3원색인 적색, 녹색, 청색에 대해 분리 표시 패널을 각각 구비한 칼라 투사 장치에 있어서, 분리 빔을 색분리 수단을 경유하여 상기 세개의 칼라 채널에 공급시키기 위해 제 1 항 내지 제 8 항중의 한 조명 시스템을 구비한 것을 특징으로하는 칼라 투사장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8801348A NL8801348A (nl) | 1988-05-26 | 1988-05-26 | Belichtingsstelsel. |
NL8801348 | 1988-05-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR890017486A true KR890017486A (ko) | 1989-12-16 |
Family
ID=19852353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890005415A KR890017486A (ko) | 1988-05-26 | 1989-04-25 | 조명 시스템 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5046837A (ko) |
EP (1) | EP0343729B1 (ko) |
JP (1) | JPH0235407A (ko) |
KR (1) | KR890017486A (ko) |
CN (1) | CN1021670C (ko) |
DE (1) | DE68917210T2 (ko) |
HK (1) | HK45896A (ko) |
NL (1) | NL8801348A (ko) |
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EP0658811B1 (de) * | 1993-12-13 | 1998-06-17 | Carl Zeiss | Beleuchtungseinrichtung für eine Projektions-Mikrolithographie-Belichtungsanlage |
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JPH09512924A (ja) * | 1994-05-06 | 1997-12-22 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | ビーム合成装置及びこの装置を具える画像投射装置 |
CN1152358A (zh) * | 1994-05-31 | 1997-06-18 | 菲利浦电子有限公司 | 具有散射显示板的显示装置 |
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US4642740A (en) * | 1984-10-22 | 1987-02-10 | General Electric Company | Constant magnification light collection system |
JPS61148415A (ja) * | 1984-12-22 | 1986-07-07 | Canon Inc | 照明光学系 |
JPS62244055A (ja) * | 1986-04-16 | 1987-10-24 | Doujiyun Koki Kk | プリント基板等の焼付機に対する露光装置 |
EP0258927A3 (en) * | 1986-08-22 | 1991-01-09 | North American Philips Corporation | Display system |
-
1988
- 1988-05-26 NL NL8801348A patent/NL8801348A/nl not_active Application Discontinuation
-
1989
- 1989-03-02 US US07/318,090 patent/US5046837A/en not_active Expired - Fee Related
- 1989-04-25 KR KR1019890005415A patent/KR890017486A/ko not_active Application Discontinuation
- 1989-05-22 EP EP89201277A patent/EP0343729B1/en not_active Expired - Lifetime
- 1989-05-22 DE DE68917210T patent/DE68917210T2/de not_active Expired - Fee Related
- 1989-05-23 CN CN89103628A patent/CN1021670C/zh not_active Expired - Fee Related
- 1989-05-23 JP JP1127975A patent/JPH0235407A/ja active Pending
-
1996
- 1996-03-14 HK HK45896A patent/HK45896A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1021670C (zh) | 1993-07-21 |
HK45896A (en) | 1996-03-22 |
NL8801348A (nl) | 1989-12-18 |
EP0343729A1 (en) | 1989-11-29 |
CN1037970A (zh) | 1989-12-13 |
DE68917210D1 (de) | 1994-09-08 |
JPH0235407A (ja) | 1990-02-06 |
DE68917210T2 (de) | 1995-03-02 |
EP0343729B1 (en) | 1994-08-03 |
US5046837A (en) | 1991-09-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |