KR890017185A - 기판용 다층보호피복, 이러한 피복의 플라즈마 증착에 의한 기판의 보호방법. 이에 의해 얻어진 피복 및 그의 용도 - Google Patents
기판용 다층보호피복, 이러한 피복의 플라즈마 증착에 의한 기판의 보호방법. 이에 의해 얻어진 피복 및 그의 용도 Download PDFInfo
- Publication number
- KR890017185A KR890017185A KR1019890006300A KR890006300A KR890017185A KR 890017185 A KR890017185 A KR 890017185A KR 1019890006300 A KR1019890006300 A KR 1019890006300A KR 890006300 A KR890006300 A KR 890006300A KR 890017185 A KR890017185 A KR 890017185A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- coating
- layer
- protecting
- nitrogen
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Compression Or Coding Systems Of Tv Signals (AREA)
- Wrappers (AREA)
- Formation Of Insulating Films (AREA)
- Magnetic Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
본도면은 본 발명의 공정을 수행하기 위한 장치의 1태양을 도시한 개략적인 단면도이다.
Claims (18)
- 주로 실리콘, 탄소, 질소, 산소 및 수소로 이루어지고, 기판상에 부착된 적어도 2개의 층으로 구성되며, 기판상에 부착된 2개의 층 중에서 제 1층이 하기식을 가짐을 특징으로 하는 기판용 디층피복.SiCx Ny Oz Ht(식중, X = 0.- 0.5 ; Y = 0 - 0.15 ; Z = 0.4 - 1 ; t= 0.6 - 1.2)
- 제 1 항에 있어서, Z = 0.6 - 0.8인 피복.
- 제 2 항에 있어서, 하기 식을 가지며, 제 1 층위에 부착된 제 2층을 포함하는 피복Si Cx' Ny' Oz' Ht'(식중 X' = 0.-5 ; Y' = 0.3 - 0.8 ; Z' = 1.3 - 2.5 ; t' = 0.5 - 1.2 ; 및 특히 X' = 0.3 - 1 ; Y' = 0.5 - 0.8 ; Z' = 1.3 - 2 ; t' = 0.6 - 1)
- 제 1 항에 있어서, 제 1층의 두께가 1 - 30mm인 피복.
- 제 4 항에 있어서, 제 1층의 두께가 5 - 80mm인 피복.
- 적어도 기판에 대하여 마이크로웨이브 플라즈마에 의한 전처리를 수행하는 단계. 전 처리된 기판의 표면을 실리콘의 가스상 전구체의 존재하에 마미크로웨이브 플라즈마에 노출시켜 제 1 층을 부착시키는 단계. 제 1 층이 제공된 기판에 대하여 플라즈마와 후 - 방전 중에서 선택된 어느 하나의 상태의 질소 및 실리콘의 가스상 전구체의 존재하에 마이크로웨이브 플라즈마로 처리하여 제 2층을 부착시키는 단계로 이루어짐을 특징으로 하여 실리콘, 탄소, 질소, 산소 및 수소로 주로 이루어진 다층피복의 부착에 의하여 기판을 보호하는 방법.
- 제 6항에 있어서, 전처리를 O2및 NH3플라즈마 중에서 선택된 어느하나에 의해 수행하는 방법.
- 제 6항에 있어서, 질소 전구체를 질소와 암모니아 중에서 선택하는 방법.
- 제 6항에 있어서, 제 2층을 부착시키는 경우, 플라즈마와 후방전중에서 선택된 어느 하나의 상태의 O2, N2, CH4CO2및 C2H4중에서 선택된 어느 하나를 추가로 도입시키는 것을 포함하는 방법.
- 제 6 항에 있어서, 실리콘의 전구체가 실란인 방법.
- 제10항에 있어서, 실란이 SiH4, Si2 H6및 Si3 Hg중에서 선택되는 방법.
- 제 6 항에 있어서, 기판이 폴리카르보네이트, 폴리메틸메타크릴레이트, 폴리스티렐-아크릴로니트릴 및 폴리스티렌 결정, 폴리이미드, 폴리에스테르, 폴리아미드, 폴리비닐클로라이드 중에서 선택된 중합체, 유리, 실리콘 및 알루미늄인 방법.
- 제 6 항에 있어서, 압력이 약 13.3 ×102pa이하인 방법.
- 제 6 항에 있어서, 압력이 약 0.665 ×102pa이하인 방법.
- 제 6 항에 있어서 따른 방법에 의해 수득할 수 있는 기판용 피복.
- 창 및 스크린을 보호하기 위한 제 1 항에 따른 피복의 용도.
- 창유리, 렌즈유리 및 안경유리중에서 선택된 어느하나를 보호하기 위한 제 1항에 따른 피복의 용도.
- 대전전하로부터 기판을 보호하기 위한 제 1 항에 따른 피복의 용도.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8806369A FR2631346B1 (fr) | 1988-05-11 | 1988-05-11 | Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications |
FR8806369 | 1988-05-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR890017185A true KR890017185A (ko) | 1989-12-15 |
Family
ID=9366231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890006300A KR890017185A (ko) | 1988-05-11 | 1989-05-11 | 기판용 다층보호피복, 이러한 피복의 플라즈마 증착에 의한 기판의 보호방법. 이에 의해 얻어진 피복 및 그의 용도 |
Country Status (11)
Country | Link |
---|---|
US (1) | US5116665A (ko) |
EP (1) | EP0345107B1 (ko) |
JP (1) | JPH0230764A (ko) |
KR (1) | KR890017185A (ko) |
AT (1) | ATE72544T1 (ko) |
DE (1) | DE68900824D1 (ko) |
DK (1) | DK228689A (ko) |
ES (1) | ES2038834T3 (ko) |
FI (1) | FI892268A (ko) |
FR (1) | FR2631346B1 (ko) |
NO (1) | NO891902L (ko) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5278243A (en) * | 1992-01-14 | 1994-01-11 | Soane Technologies, Inc. | High impact resistant macromolecular networks |
FR2661688B1 (fr) * | 1990-05-02 | 1992-07-17 | Air Liquide | Revetement multicouche pour substrat polycarbonate et procede d'elaboration d'un tel revetement. |
FR2664294B1 (fr) * | 1990-07-06 | 1992-10-23 | Plasmametal | Procede de metallisation d'une surface. |
JP2874298B2 (ja) * | 1990-07-24 | 1999-03-24 | 日本板硝子株式会社 | 磁気記録媒体およびその製造方法 |
US5234748A (en) * | 1991-06-19 | 1993-08-10 | Ford Motor Company | Anti-reflective transparent coating with gradient zone |
DE4404690A1 (de) * | 1994-02-15 | 1995-08-17 | Leybold Ag | Verfahren zur Erzeugung von Sperrschichten für Gase und Dämpfe auf Kunststoff-Substraten |
FR2741328B1 (fr) * | 1995-11-20 | 1997-12-19 | Commissariat Energie Atomique | Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique |
FR2756663B1 (fr) * | 1996-12-04 | 1999-02-26 | Berenguer Marc | Procede de traitement d'un substrat semi-conducteur comprenant une etape de traitement de surface |
US5879775A (en) * | 1996-12-12 | 1999-03-09 | Eastman Kodak Compnay | Protective inorganic and DLC coatings for plastic media such as plastic cards |
EP0848083A3 (en) * | 1996-12-12 | 2001-03-07 | Eastman Kodak Company | Protective inorganic and dlc coatings and method for making same at or close to room temperature |
FR2759362B1 (fr) * | 1997-02-10 | 1999-03-12 | Saint Gobain Vitrage | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
US6203898B1 (en) | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
US6251802B1 (en) | 1998-10-19 | 2001-06-26 | Micron Technology, Inc. | Methods of forming carbon-containing layers |
DE19958473A1 (de) * | 1999-12-04 | 2001-06-07 | Bosch Gmbh Robert | Verfahren zur Herstellung von Kompositschichten mit einer Plasmastrahlquelle |
KR100562783B1 (ko) * | 2003-08-08 | 2006-03-20 | 남상욱 | 렌즈 가공 시의 축 이동과 표면손상을 방지하기 위하여 보호막을 형성시킨 안경렌즈의 제조방법 |
US20050238816A1 (en) * | 2004-04-23 | 2005-10-27 | Li Hou | Method and apparatus of depositing low temperature inorganic films on plastic substrates |
BRPI0516670A (pt) * | 2004-10-29 | 2008-09-16 | Dow Global Technologies Inc | processo para preparar um revestimento de multicamadas, processo para preparar um revestimento sobre uma superfìcie de um substrato polimérico orgánico, estrutura composta, material de vitrificação e automóvel ou edifìcio |
DE102005007825B4 (de) * | 2005-01-10 | 2015-09-17 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht |
FR2976577B1 (fr) * | 2011-06-17 | 2014-03-28 | Saint Gobain | Procede de fabrication d'un vitrage comprenant une couche poreuse |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS554040A (en) * | 1978-06-26 | 1980-01-12 | Hitachi Ltd | Photoconductive material |
US4239819A (en) * | 1978-12-11 | 1980-12-16 | Chemetal Corporation | Deposition method and products |
BG32652A1 (en) * | 1980-03-13 | 1982-09-15 | Kolev | Method for surface laying of metals on synthetic, natural and artificial polymers |
DE3153301C2 (ko) * | 1980-05-08 | 1991-09-26 | Minolta Camera K.K., Osaka, Jp | |
JPS57177156A (en) * | 1981-04-24 | 1982-10-30 | Canon Inc | Photoconductive material |
EP0309000B1 (en) * | 1981-07-17 | 1992-10-14 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Amorphous semiconductor and amorphous silicon photovoltaic device |
JPS5826052A (ja) * | 1981-08-06 | 1983-02-16 | Asahi Glass Co Ltd | アルカリ拡散防止酸化ケイ素膜付ガラス体 |
US4460669A (en) * | 1981-11-26 | 1984-07-17 | Canon Kabushiki Kaisha | Photoconductive member with α-Si and C, U or D and dopant |
DE3307573A1 (de) * | 1982-03-04 | 1983-09-15 | Canon K.K., Tokyo | Fotoleitfaehiges aufzeichnungselement |
US4486521A (en) * | 1982-03-16 | 1984-12-04 | Canon Kabushiki Kaisha | Photoconductive member with doped and oxygen containing amorphous silicon layers |
US4490454A (en) * | 1982-03-17 | 1984-12-25 | Canon Kabushiki Kaisha | Photoconductive member comprising multiple amorphous layers |
JPS5996137A (ja) * | 1982-11-25 | 1984-06-02 | Shin Etsu Chem Co Ltd | 塩化ビニル系樹脂複合製品の製造方法 |
US4666808A (en) * | 1983-04-01 | 1987-05-19 | Kyocera Corp. | Amorphous silicon electrophotographic sensitive member |
JPS6014248A (ja) * | 1983-07-06 | 1985-01-24 | Fuji Photo Film Co Ltd | 電子写真用感光体 |
JPH0616177B2 (ja) * | 1983-07-27 | 1994-03-02 | キヤノン株式会社 | 電子写真用光導電部材 |
US4546008A (en) * | 1983-11-07 | 1985-10-08 | Canon Kabushiki Kaisha | Method for forming a deposition film |
DE3506657A1 (de) * | 1984-02-28 | 1985-09-05 | Sharp K.K., Osaka | Photoleitfaehige vorrichtung |
JPH0685391B2 (ja) * | 1984-10-09 | 1994-10-26 | キヤノン株式会社 | 堆積膜形成方法 |
US4668365A (en) * | 1984-10-25 | 1987-05-26 | Applied Materials, Inc. | Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition |
US4721631A (en) * | 1985-02-14 | 1988-01-26 | Sharp Kabushiki Kaisha | Method of manufacturing thin-film electroluminescent display panel |
JPH084071B2 (ja) * | 1985-12-28 | 1996-01-17 | キヤノン株式会社 | 堆積膜形成法 |
US4841328A (en) * | 1986-08-04 | 1989-06-20 | Sanyo Electric Co., Ltd. | Electrostatic recording apparatus |
US4847157A (en) * | 1986-08-28 | 1989-07-11 | Libbey-Owens-Ford Co. | Glass coating method and resulting article |
US4777090A (en) * | 1986-11-03 | 1988-10-11 | Ovonic Synthetic Materials Company | Coated article and method of manufacturing the article |
FR2614317B1 (fr) * | 1987-04-22 | 1989-07-13 | Air Liquide | Procede de protection de substrat polymerique par depot par plasma de composes du type oxynitrure de silicium et dispositif pour sa mise en oeuvre. |
-
1988
- 1988-05-11 FR FR8806369A patent/FR2631346B1/fr not_active Expired - Fee Related
-
1989
- 1989-05-10 FI FI892268A patent/FI892268A/fi not_active IP Right Cessation
- 1989-05-10 ES ES198989401290T patent/ES2038834T3/es not_active Expired - Lifetime
- 1989-05-10 DK DK228689A patent/DK228689A/da unknown
- 1989-05-10 NO NO89891902A patent/NO891902L/no unknown
- 1989-05-10 DE DE8989401290T patent/DE68900824D1/de not_active Expired - Lifetime
- 1989-05-10 AT AT89401290T patent/ATE72544T1/de not_active IP Right Cessation
- 1989-05-10 EP EP89401290A patent/EP0345107B1/fr not_active Expired - Lifetime
- 1989-05-11 US US07/351,942 patent/US5116665A/en not_active Expired - Fee Related
- 1989-05-11 KR KR1019890006300A patent/KR890017185A/ko not_active Application Discontinuation
- 1989-05-11 JP JP1116214A patent/JPH0230764A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
ES2038834T3 (es) | 1993-08-01 |
FR2631346B1 (fr) | 1994-05-20 |
FI892268A (fi) | 1989-11-12 |
FR2631346A1 (fr) | 1989-11-17 |
EP0345107A1 (fr) | 1989-12-06 |
FI892268A0 (fi) | 1989-05-10 |
EP0345107B1 (fr) | 1992-02-12 |
DE68900824D1 (de) | 1992-03-26 |
JPH0230764A (ja) | 1990-02-01 |
NO891902L (no) | 1989-11-13 |
ATE72544T1 (de) | 1992-02-15 |
US5116665A (en) | 1992-05-26 |
NO891902D0 (no) | 1989-05-10 |
DK228689D0 (da) | 1989-05-10 |
DK228689A (da) | 1989-11-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR890017185A (ko) | 기판용 다층보호피복, 이러한 피복의 플라즈마 증착에 의한 기판의 보호방법. 이에 의해 얻어진 피복 및 그의 용도 | |
KR890700647A (ko) | 기판 보호성 피복층, SiC_xN_yO_zH_t유형의 화합물을 플라즈마 피복시켜 기판을 보호하는 공정, 이로인해 얻어진 피복층 및 상기 공정을 실시하기 위한 장치 | |
TW363919B (en) | Coated plastic substrate | |
MX170794B (es) | Metodo de deposicion de oxido de silicio mejorada con plasma | |
KR960015223B1 (ko) | 피복제품 및 이의 생산 방법 | |
ATE166901T1 (de) | Verfahren zum erzeugen von siliciumoxidischen kratzfesten schichten auf kunststoffen durch plasmabeschichtung | |
US8704211B2 (en) | High integrity protective coatings | |
KR900006474A (ko) | 플라즈마 가공방법 및 이의 생성물 | |
MX9306910A (es) | Pelicula protectora para articulos, y metodo. | |
KR950001864A (ko) | 비정질 경질 탄소막 및 그 제조 방법 | |
DE69429150T2 (de) | Verfahren zum Aufbringen einer dünnen Schicht auf der Oberfläche eines Kunststoffsubstrat | |
JP3403219B2 (ja) | 金属支持体表面に珪素含有沈着物を形成させる方法および金属支持体の耐蝕処理方法 | |
US20040101636A1 (en) | Method for producing a coated synthetic body | |
KR950702040A (ko) | 플라스틱 광학 물품 및 이의 제조방법(Plastic optical article and process for producing the same) | |
KR910002520A (ko) | 기판에 대한 합성 다이아몬드 피복층의 접착력 개량 방법 | |
EP0543634A1 (en) | Improvements in coating processes | |
DE69817703D1 (de) | Verfahren zur Herstellung eines Motivs auf einem transparenten Substrat | |
KR940014883A (ko) | 밀착성이 우수한 경질 흑색성 박막 및 그 제조방법 | |
Vallon et al. | Adhesion of dielectric thin films on polymer substrates studied by UV) visible and infrared ellipsometry | |
Xu et al. | On the composite and intrinsic hardness of Ti (C, N) films |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |