KR890002690A - Illumination optical system - Google Patents

Illumination optical system Download PDF

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Publication number
KR890002690A
KR890002690A KR1019880009631A KR880009631A KR890002690A KR 890002690 A KR890002690 A KR 890002690A KR 1019880009631 A KR1019880009631 A KR 1019880009631A KR 880009631 A KR880009631 A KR 880009631A KR 890002690 A KR890002690 A KR 890002690A
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KR
South Korea
Prior art keywords
optical system
angle
lens
light source
optical axis
Prior art date
Application number
KR1019880009631A
Other languages
Korean (ko)
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KR920010622B1 (en
Inventor
켄지 엔도우
신이치 나가다
Original Assignee
이시다 도쿠지로오
다이닛뽕스쿠링세이소오가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 이시다 도쿠지로오, 다이닛뽕스쿠링세이소오가부시키가이샤 filed Critical 이시다 도쿠지로오
Publication of KR890002690A publication Critical patent/KR890002690A/en
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Publication of KR920010622B1 publication Critical patent/KR920010622B1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/16Beam splitting or combining systems used as aids for focusing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/02Exposure apparatus for contact printing
    • G03B27/14Details
    • G03B27/16Illumination arrangements, e.g. positioning of lamps, positioning of reflectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)

Abstract

내용 없음No content

Description

조명용 광학계Illumination optical system

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제5도는 각각 제3도의 Ⅳ부 및Ⅴ부의 확대도.5 is an enlarged view of part IV and V of FIG. 3, respectively.

제6도는 제3도의 렌즈 광학계를 사용한 조명용 광학계를 모식적으로 나타낸 사시도.FIG. 6 is a perspective view schematically showing an optical system for illumination using the lens optical system of FIG.

제7도는 본 발명에 의한 조명용 광학계의 다른 실시예에 있어서의 프레넬렌즈를 나타낸 도면.7 shows a Fresnel lens in another embodiment of the optical system for illumination according to the present invention.

Claims (4)

광원으로부터 방사된 광을 피조사면으로 인도하기 위한 조명용 광학계에 있어서, 상기 광원과 상기 피조사면 사이에 배치되고, 입사면, 출사면 및 광축을 가진 렌즈광학계를 구비하고, 상기 피조사면상의 조사고 H에 있어서의 조도를 S(H)로 규정하고, 또한 상기 광원으로부터 상기 렌즈광학계의 상기 입사면으로 향하는 광선이 상기 광축과 이루는 각 θ와 상기 조사고 H와의 관계를 S(H) HdH=J(θ)sinθdθ로서 규정하는 것에 의하여 상기 렌즈 광학계의 임의의 입사고에 있어서의 상기 입사면이 상기 광축과 이루는 각 1 로 규정함과 동시에 상기 렌즈광학계의 임의의 출사고에 있어서의 상기 출사면이 상기 광축과 이루는 각 2로서 규정된 조명용 광학계.An illumination optical system for guiding light emitted from a light source to an irradiated surface, comprising: a lens optical system disposed between the light source and the irradiated surface, the lens optical system having an incidence surface, an exit surface, and an optical axis; The illuminance in H is defined as S (H), and the relationship between the angle θ of the light beam directed from the light source to the incidence plane of the lens optical system with the optical axis and the irradiation height H is S (H) HdH = J The angle at which the incident surface at any incident height of the lens optical system forms the optical axis by specifying (θ) sinθdθ. 1 The angle at which the exit surface at any exit of the lens optical system forms the optical axis 2 Optical system for illumination specified as. 단, 상기 식에서, n은 상시 렌즈광학계의 굴절율, J(θ)는 상기 광원의 상기 광축과 이루는 각이 θ방향의 방사강도, θ1은 상기 렌즈광학계 내부를 통하여 상기 출사면으로 향하는 광선이 상기 광축과 이루는 각, Φ는 상기 렌즈 광학계의 상기 출사면상의 상기 임의의 출사고로부터 상기 출사고 H로 향한 광선이 상기 광축과 이루는 각이다.Where n is the refractive index of the lens lens system at any time, J (θ) is the radiation intensity in the θ direction of the angle formed with the optical axis of the light source, and θ 1 is the light beam directed toward the exit surface through the lens optical system. An angle Φ formed by the optical axis is an angle formed by the light beam directed from the arbitrary exit on the exit surface of the lens optical system to the exit H. 제1항에 있어서, 상기 렌즈광학계는 프레넬렌즈를 포함하며, 상기 프레넬렌즈의 입사면은 평면으로 형성됨과 동시에 그 출사면은 동심상의 다수의 프레넬 광학면으로 형성되고, 또한 그 프레낼 광학면이 상기 광축과 이루는 각 2로 규정된 조명용 광학계.The optical system of claim 1, wherein the lens optical system includes a Fresnel lens, the incidence surface of the Fresnel lens is formed in a plane, and the exit surface is formed of a plurality of concentric optical Fresnel, The angle that the optical plane makes with the optical axis 2 Optical system for illumination specified by. 광원으로부터 방사된 광을 피조사면으로 인도하기 위한 광학계에 있어서, 반사면 및 광축을 가지며 상기 광원의 후방으로 배치되고 상기 광원의 전방의 상기 피조사면을 조사하는 광학계를 구비하고, 상기 피조사면상의 조사고 H에 있어서의 조도를 S(H)로 규정하고, 또한 상기 광원으로부터 미러광학계의 상기 반사면으로 향하는 광선이 상기 광축과 이루는 각 θ와 상기 조사고 H와의 관계를 S(H)HdH=J(θ1)sinθ11+ J(O)K(β)sinθdθ로 규정하는 것에 의하여 상기 미러광학계의 임의의 입사고에 있어서의 상기 반사면이 상기 광축과 이루는 각 3로 규정된 조명용 광학계.An optical system for guiding light emitted from a light source to an irradiated surface, comprising: an optical system having a reflecting surface and an optical axis, disposed to the rear of the light source, and irradiating the irradiated surface in front of the light source; The illuminance in the irradiation height H is defined as S (H), and the relationship between the angle? Of the light beam directed from the light source to the reflective surface of the mirror optical system and the irradiation height H and the relationship between the irradiation height H and S (H) HdH = The angle at which the reflecting surface at any incident height of the mirror optical system forms the optical axis by defining J (θ 1 ) sinθ 11 + J (O) K (β) sinθdθ. 3 Optical system for illumination specified by. 단, 상기 식에서, θ는 상기 광원으로부터 상기 미러광학계로 향하는 광선이 상기 광축과 이루는 각, θ1은상기 광원으로부터 집적 상기 조사고 H로 향하는 광선이 상기 광축과 이루는 각, J(θ1) 및 J(θ)는 상기 광원이 상기 광축과 이루는 각이 각각 θ1및 θ방향의 방사강도, K(β)는 입사각이 β로 될시의 상기 미러광학계의 반사율, Φ는 상기 미로광학계의 상기 임의의 입사고로부터 상기 조사고 H로 향하는 광선이 상기 광축과 이루는 각이다.Where θ is the angle at which the light beam directed from the light source to the mirror optical system forms the optical axis, and θ 1 is the angle at which the light beam directed from the light source toward the irradiation height H forms the optical axis, J (θ 1 ) and J (θ) is the radiation intensity in the θ 1 and θ directions, respectively, the angle of the light source to the optical axis, K (β) is the reflectance of the mirror optical system when the incident angle is β, Φ is the arbitrary of the maze optical system The light beam from the incident height toward the irradiation height H forms an angle with the optical axis. 제3항에 있어서, 상기 미러광학계는 프레넬 미러를 포함하고, 상기 프레넬 미러의 반사면은 동심상의 다수의 프레낼 광학면으로 형성된 조명용 광학계.4. The illumination optical system according to claim 3, wherein the mirror optical system comprises a Fresnel mirror, and the reflecting surface of the Fresnel mirror is formed of a plurality of concentric optical planes. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019880009631A 1987-07-31 1988-07-29 Optical lighting system KR920010622B1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP?62-193330 1987-07-31
JP19333087 1987-07-31
JP62-193330 1987-07-31
JP?63-153305 1988-06-20
JP63153305A JPH07104499B2 (en) 1987-07-31 1988-06-20 Lighting optics
JP63-153305 1988-06-30

Publications (2)

Publication Number Publication Date
KR890002690A true KR890002690A (en) 1989-04-11
KR920010622B1 KR920010622B1 (en) 1992-12-12

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Application Number Title Priority Date Filing Date
KR1019880009631A KR920010622B1 (en) 1987-07-31 1988-07-29 Optical lighting system

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US (2) US5010465A (en)
EP (1) EP0304666A3 (en)
JP (1) JPH07104499B2 (en)
KR (1) KR920010622B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100813959B1 (en) * 2004-10-19 2008-03-14 삼성전자주식회사 Illuminator

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JPH07104499B2 (en) * 1987-07-31 1995-11-13 大日本スクリーン製造株式会社 Lighting optics
US5400094A (en) * 1993-03-31 1995-03-21 Minnesota Mining And Manufacturing Company Condensers for overhead projectors
US5515123A (en) * 1994-02-17 1996-05-07 Minnesota Mining And Manufacturing Company Condensers for illumination systems
JP3286138B2 (en) * 1995-08-03 2002-05-27 日東電工株式会社 Light guide plate, surface light source device, polarized light source device, and liquid crystal display device
AT405212B (en) * 1997-01-15 1999-06-25 Photonic Optische Geraete Gmbh OPTICAL ELEMENT
AU2002350478A1 (en) * 2002-08-19 2004-03-11 Carl Zeiss Smt Ag Catadioptric reduction lens having a polarization beamsplitter

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US3476463A (en) * 1965-05-11 1969-11-04 Perkin Elmer Corp Coherent light optical system yielding an output beam of desired intensity distribution at a desired equiphase surface
US3598477A (en) * 1969-06-09 1971-08-10 Sylvania Electric Prod Lens having one spheric and one aspheric surface
US4242725A (en) * 1977-12-01 1980-12-30 Sun Chemical Corporation Light reflector structure
US4241389A (en) * 1979-04-25 1980-12-23 Kasper Instruments, Inc. Multiple apparent source optical imaging system
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DE3044470A1 (en) * 1980-11-26 1982-06-03 Kernforschungsanlage Jülich GmbH, 5170 Jülich METHOD FOR ILLUMINATING A SURFACE AS POSSIBLE AS POSSIBLE FROM A PARALLEL BEAM AND DEVICE FOR LASER DIAGNOSTICS
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JPH07104499B2 (en) * 1987-07-31 1995-11-13 大日本スクリーン製造株式会社 Lighting optics

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100813959B1 (en) * 2004-10-19 2008-03-14 삼성전자주식회사 Illuminator

Also Published As

Publication number Publication date
JPH01112246A (en) 1989-04-28
EP0304666A2 (en) 1989-03-01
US5010465A (en) 1991-04-23
KR920010622B1 (en) 1992-12-12
JPH07104499B2 (en) 1995-11-13
EP0304666A3 (en) 1989-11-02
US5084808A (en) 1992-01-28

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