KR880011018A - 클로로폴리실란의 제조방법 - Google Patents
클로로폴리실란의 제조방법 Download PDFInfo
- Publication number
- KR880011018A KR880011018A KR1019880002956A KR880002956A KR880011018A KR 880011018 A KR880011018 A KR 880011018A KR 1019880002956 A KR1019880002956 A KR 1019880002956A KR 880002956 A KR880002956 A KR 880002956A KR 880011018 A KR880011018 A KR 880011018A
- Authority
- KR
- South Korea
- Prior art keywords
- copper
- chloropolysilane
- compound
- preparing
- producing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (4)
- 실리콘을 염소처리하기 위하여 구리, 구리화합물 또는 구리혼합물과 섞여 있는시리콘입자에 고온으로 염소가스를 통과시키는 것으로 구성되어있는 것을 특징으로 하는 클로로폴리실란(SinCL2n=2,n≥2)의 제조방법.
- 제1항에 있어서, 구리화합물은 염화 제2동, 산화 제1동 그리고 산화 제2동으로이루어진 그룹에서 선택된 적어도 하나의 화합물인 것을 특징으로 하는 클로로폴리실란의 제조방법.
- 제1항에 있어서, 실리콘 입자와 혼합되는 구리, 구리화합물 또는 구리혼합물의양은 구리환산중량당 0.1~20%인 것을 특징으로 하는 클로로폴리실란의 제조방법.
- 제1항에 있어서, 반응온도는 140℃이상 300℃이하인 것을 특징으로 하는 클로로폴리실란의 제조방법.※참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP??62-65770 | 1987-03-23 | ||
JP62065770A JPS63233007A (ja) | 1987-03-23 | 1987-03-23 | クロロポリシランの製造方法 |
JP?62-65770 | 1987-03-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR880011018A true KR880011018A (ko) | 1988-10-25 |
KR940006541B1 KR940006541B1 (ko) | 1994-07-22 |
Family
ID=13296591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880002956A KR940006541B1 (ko) | 1987-03-23 | 1988-03-19 | 클로로폴리실란의 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4861574A (ko) |
EP (1) | EP0283905B1 (ko) |
JP (1) | JPS63233007A (ko) |
KR (1) | KR940006541B1 (ko) |
DE (1) | DE3863948D1 (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10044794A1 (de) * | 2000-09-11 | 2002-04-04 | Bayer Ag | Verfahren zur Herstellung von Trichlorsilan |
EA200802296A1 (ru) * | 2006-05-09 | 2009-04-28 | Норск Хюдро Аса | Способ производства тетрахлорида кремния |
DE102009027241A1 (de) * | 2009-06-26 | 2010-12-30 | Wacker Chemie Ag | Verfahren zur Herstellung von Oligohalogensilanen |
DE102009056437B4 (de) | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Verfahren und Vorrichtung zur Herstellung von kurzkettigen halogenierten Polysilanen |
DE102009056438B4 (de) | 2009-12-02 | 2013-05-16 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Hexachlordisilan |
JP5888337B2 (ja) | 2011-10-18 | 2016-03-22 | 東亞合成株式会社 | クロロポリシランの製造方法および流動床反応装置 |
EP2792640B1 (en) * | 2011-12-16 | 2016-11-16 | Toagosei Co., Ltd. | Method for producing high-purity chloropolysilane |
CN103011173B (zh) * | 2012-12-18 | 2014-04-16 | 江南大学 | 六氯乙硅烷的合成方法 |
DE102013207441A1 (de) * | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hexachlordisilan durch Spaltung von höheren Polychlorsilanen wie Octachlortrisilan |
CN107377009A (zh) * | 2017-07-18 | 2017-11-24 | 亚洲硅业(青海)有限公司 | 一种铜盐催化剂的再生方法及其应用 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2499009A (en) * | 1947-02-15 | 1950-02-28 | Linde Air Prod Co | Chlorosilanes |
DE1094719B (de) * | 1959-04-08 | 1960-12-15 | Bbc Brown Boveri & Cie | Verfahren zum Herstellen von Trichlorsilan |
GB945618A (en) * | 1959-06-24 | 1964-01-02 | Pechiney Prod Chimiques Sa | An improved process for the industrial manufacture of trichlorosilane |
US3376109A (en) * | 1965-04-30 | 1968-04-02 | Canadian Patents Dev | Preparation of silicon chlorides |
JPS57129817A (en) * | 1981-01-30 | 1982-08-12 | Osaka Titanium Seizo Kk | Manufacture of trichlorosilane |
JPS57156319A (en) * | 1981-03-19 | 1982-09-27 | Osaka Titanium Seizo Kk | Production of trichlorosilane |
JPS58161915A (ja) * | 1982-03-17 | 1983-09-26 | Shin Etsu Chem Co Ltd | トリクロロシランの製造方法 |
JPS59162121A (ja) * | 1983-03-02 | 1984-09-13 | Mitsui Toatsu Chem Inc | 高純度ポリクロロシランの製造方法 |
JPS59182222A (ja) * | 1983-03-30 | 1984-10-17 | Mitsui Toatsu Chem Inc | ポリクロロシランの製造方法 |
JPS59184720A (ja) * | 1983-04-04 | 1984-10-20 | Mitsui Toatsu Chem Inc | ポリクロロシラン類の製造方法 |
US4585643A (en) * | 1985-05-31 | 1986-04-29 | Union Carbide Corporation | Process for preparing chlorosilanes from silicon and hydrogen chloride using an oxygen promoter |
DE3623493A1 (de) * | 1985-07-11 | 1987-01-15 | Toa Gosei Chem Ind | Verfahren zur herstellung von siliciumhexachlorid |
-
1987
- 1987-03-23 JP JP62065770A patent/JPS63233007A/ja active Pending
-
1988
- 1988-03-02 US US07/163,262 patent/US4861574A/en not_active Expired - Fee Related
- 1988-03-15 EP EP88104108A patent/EP0283905B1/en not_active Expired - Lifetime
- 1988-03-15 DE DE8888104108T patent/DE3863948D1/de not_active Expired - Fee Related
- 1988-03-19 KR KR1019880002956A patent/KR940006541B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0283905A2 (en) | 1988-09-28 |
EP0283905B1 (en) | 1991-07-31 |
EP0283905A3 (en) | 1989-04-19 |
US4861574A (en) | 1989-08-29 |
KR940006541B1 (ko) | 1994-07-22 |
DE3863948D1 (de) | 1991-09-05 |
JPS63233007A (ja) | 1988-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR910002713A (ko) | 준안정성 실란 가수분해물 및 이의 제조방법 | |
KR880011018A (ko) | 클로로폴리실란의 제조방법 | |
KR960014139A (ko) | 하이드로겐알콕시실란의 제조방법 | |
KR880011017A (ko) | 다결정 실리콘의 제조방법 | |
KR920014821A (ko) | 실라알칸의 제조방법 | |
JPS53133600A (en) | Production of silicon nitride | |
JPS5465799A (en) | Preparation of organosilicon polymer | |
KR860002457A (ko) | 니트릴 화합물의 수화방법 | |
JPS55108850A (en) | Preparation of indole or indole derivative | |
GB1280648A (en) | Refractory compounds | |
JPS55108828A (en) | Preparation of chlorination product and ethyl benzene | |
KR860004024A (ko) | 인돌 제조방법 | |
JPS5236604A (en) | Preparation of methylchloride and its purification process | |
JPS52117948A (en) | Polyamide compositions | |
JPS541364A (en) | Purification of crude polyalkylene oxide | |
JPS56115759A (en) | Preparation of nitrile | |
JPS56166923A (en) | Decomposition of nitrogen oxide | |
JPS5266815A (en) | Steel improved sulfide corrosion cracking resistance | |
JPS56115776A (en) | Preparation of 2-bromo-trifluoromethylpyridine | |
JPS53149933A (en) | Preparation of methyl hydrogen polysilane | |
SU592774A1 (ru) | Эмаль | |
JPS5422600A (en) | Electrical insulating oil | |
JPS56166130A (en) | Preparation of alkynyl halide compound | |
DK522085A (da) | Fremstilling af vaerktoejsstaal under anvendelse af kemisk fremstillet v2o3 som vanadiumadditiv | |
JPS52141565A (en) | Manufacture of semiconductor unit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |