KR870007225A - 광중합성 조성물 및 이를 함유하는 광중합성 기록물질 - Google Patents
광중합성 조성물 및 이를 함유하는 광중합성 기록물질 Download PDFInfo
- Publication number
- KR870007225A KR870007225A KR870000568A KR870000568A KR870007225A KR 870007225 A KR870007225 A KR 870007225A KR 870000568 A KR870000568 A KR 870000568A KR 870000568 A KR870000568 A KR 870000568A KR 870007225 A KR870007225 A KR 870007225A
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- South Korea
- Prior art keywords
- photopolymerizable composition
- photopolymerizable
- group
- alkyl
- formula
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/163—Radiation-chromic compound
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- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (12)
- 일반식(Ⅰ)의 광호변이성 스피로-인돌리노 벤조피란을 추가로 함유함을 특징으로 하여a) 중합체 결합제 ;b) 적어도 하나의 말단 에틸렌성 이중결합 및 표준기압에서 100℃이상의 비점을 가지며, 유리 라디칼 방법에 의해 개시되는 중합반응에 의해 중합체를 생성시킬 수 있는 화합물 :c) 광개시제, 및d) 트리아릴메탄 염료의 류코염기를 필수성분으로 함유하는 광중합성 조성물.상기식에서,R은 수소원자 또는 C1내지 C16알킬그룹을 나타내고,R1,R2,R3및 R4는 동일하거나 상이하며 수소 또는 할로겐원자 C1내지 C4알킬 또는 알콕시그룹, 또는 니트로그룹을 나타내고 ;R5,R6,R7및 R8은 동일하거나 상이하며 수소 또는 할로겐원자, 니트로 또는 아미노그룹, C1내지 C5알킬 또는 알콕시그룹, 또는 C6내지 C10알킬그룹을 나타낸다.
- 제1항에 있어서, 그룹 R1,R2,R3및 R4중의 적어도 하나가 니트로그룹인 일반식(Ⅰ)의 화합물을 함유하는 광중합성 조성물.
- 제1항에 있어서, 그룹 R5,R6,R7및 R8중의 세개가 메틸그룹인 일반식(Ⅰ)의 화합물을 함유하는 광중합성 조성물.
- 제1항에 있어서, 류코염기가 트리스-(4-디알킬아미노페닐)-메탄인 광중합성 조성물.
- 제1항에 있어서, 0.05 내지 5.0중량%의 류코염기 및 0.01 내지 2.0중량%의 일반식(Ⅰ)의 화합물을 함유하는 광중합성 조성물.
- 제1항에 있어서, 광개시제가 2내지 5개의 융합된 환 및 헤테로 원자로서 적어도 하나의 질소원자를 함유하는 헤테로 사이클릭 화합물인 광중합성 조성물.
- 제6항에 있어서, 광개시제가 퀴놀린, 퀴녹살린, 펜아진 또는 아크리딘의 유도체인 광중합성 조성물.
- 제1항에 있어서, 중합체 결합체가 물에는 불용성이고 알칼리성 수용액에는 가용성인 광중합성 조성물.
- 제7항에 있어서, 중합체 결합제가 50 내지 350개의 산을 함유하는 광중합성 조성물.
- 일반식(Ⅰ)의 광호변이성 스피로-인돌리노-벤조피란을 추가로 함유하며,a) 중합체 결합제,b) 적어도 하나의 말단 에틸렌성 이중결합 및 표준 기압에서 100℃이상의 비점을 가지며 유리-라디칼 방법에 의해 개시되는 중합반응에 의해 중합체를 생성시킬 수 있는 화합물;c) 광개시제 ; 및d) 트리아릴메탄 염료의 류코염기를 필수성분으로 함유하는 광중합성 층 및 층지지체를 함유하는 광중합성 기록물질.상기식에서,R은 수소원자 또는 C1내지 C16알킬그룹을 나타내고 ;R1,R2,R3및 R4는 동일하거나 상이하며 수소 또는 할로겐원자, C1내지 C4알킬 또는 알콕시그룹, 도는 니트로그룹을 나타내고,R5,R6,R7및 R8은 동일하거나 상이하며 수소 또는 할로겐원자, 니트로 또는 아미노그룹, C1내지 C5알킬 또는 알콕시그룹, 또는 C6내지 C10아릴그룹을 나타낸다.
- 제10항에 있어서, 층지지체의 한 표면이 구리 또는 구리합금인 기록물질.
- 제10항에 청구된 광중합성 기록 재료를 노출시켜 상을 형성시키고, 수득된 착색상으로 노출의 정확도를 검사한 다음 광중합성층의 비노출부분을 세척 제거하여 양각상을 기록하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP3602215.2 | 1986-01-25 | ||
DE19863602215 DE3602215A1 (de) | 1986-01-25 | 1986-01-25 | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
Publications (1)
Publication Number | Publication Date |
---|---|
KR870007225A true KR870007225A (ko) | 1987-08-17 |
Family
ID=6292607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR870000568A KR870007225A (ko) | 1986-01-25 | 1987-01-24 | 광중합성 조성물 및 이를 함유하는 광중합성 기록물질 |
Country Status (10)
Country | Link |
---|---|
US (1) | US4780393A (ko) |
EP (1) | EP0230941B1 (ko) |
JP (1) | JPS62184455A (ko) |
KR (1) | KR870007225A (ko) |
AU (1) | AU589249B2 (ko) |
BR (1) | BR8700313A (ko) |
CA (1) | CA1302769C (ko) |
DE (2) | DE3602215A1 (ko) |
FI (1) | FI870275A (ko) |
ZA (1) | ZA87506B (ko) |
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JPS55110240A (en) * | 1979-02-19 | 1980-08-25 | Fujitsu Ltd | Photoresist |
JPS5635130A (en) * | 1979-08-31 | 1981-04-07 | Fujitsu Ltd | Resist material and method for forming resist pattern |
DE3131448A1 (de) * | 1981-08-07 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse |
JPS58156928A (ja) * | 1982-03-12 | 1983-09-19 | Hitachi Ltd | 放射線感応性組成物 |
JPS5969752A (ja) * | 1982-10-14 | 1984-04-20 | Sekisui Chem Co Ltd | 光重合可能な画像形成用組成物 |
JPS59107344A (ja) * | 1982-12-13 | 1984-06-21 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
JPS59178448A (ja) * | 1983-03-30 | 1984-10-09 | Sekisui Chem Co Ltd | 光重合可能な画像形成用組成物 |
JPS59219742A (ja) * | 1983-05-27 | 1984-12-11 | Fuotopori Ouka Kk | 発色画像形成性組成物 |
JPS59226002A (ja) * | 1983-06-06 | 1984-12-19 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS60140236A (ja) * | 1983-12-27 | 1985-07-25 | Toppan Printing Co Ltd | 画像形成材料 |
JPH0723468B2 (ja) * | 1984-12-10 | 1995-03-15 | ソニー株式会社 | フオトクロミツク感光性組成物 |
ATE184922T1 (de) * | 1994-07-07 | 1999-10-15 | Safety Cleen Sys Inc | Zusammensetzungen und verfahren zur behandlung von reinigungsflüssigkeiten |
-
1986
- 1986-01-25 DE DE19863602215 patent/DE3602215A1/de not_active Withdrawn
-
1987
- 1987-01-17 DE DE8787100590T patent/DE3781562D1/de not_active Expired - Fee Related
- 1987-01-17 EP EP87100590A patent/EP0230941B1/de not_active Expired - Lifetime
- 1987-01-22 FI FI870275A patent/FI870275A/fi not_active Application Discontinuation
- 1987-01-22 US US07/005,949 patent/US4780393A/en not_active Expired - Fee Related
- 1987-01-23 CA CA000527975A patent/CA1302769C/en not_active Expired - Fee Related
- 1987-01-23 ZA ZA87506A patent/ZA87506B/xx unknown
- 1987-01-23 AU AU68030/87A patent/AU589249B2/en not_active Ceased
- 1987-01-24 KR KR870000568A patent/KR870007225A/ko not_active Application Discontinuation
- 1987-01-26 BR BR8700313A patent/BR8700313A/pt not_active Application Discontinuation
- 1987-01-26 JP JP62014320A patent/JPS62184455A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE3781562D1 (de) | 1992-10-15 |
AU6803087A (en) | 1987-07-30 |
EP0230941B1 (de) | 1992-09-09 |
AU589249B2 (en) | 1989-10-05 |
EP0230941A3 (en) | 1987-10-28 |
FI870275A (fi) | 1987-07-26 |
FI870275A0 (fi) | 1987-01-22 |
CA1302769C (en) | 1992-06-09 |
JPS62184455A (ja) | 1987-08-12 |
EP0230941A2 (de) | 1987-08-05 |
DE3602215A1 (de) | 1987-07-30 |
BR8700313A (pt) | 1987-12-08 |
ZA87506B (en) | 1987-09-30 |
US4780393A (en) | 1988-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |