KR860002741A - 광 센서 - Google Patents
광 센서 Download PDFInfo
- Publication number
- KR860002741A KR860002741A KR1019850007015A KR850007015A KR860002741A KR 860002741 A KR860002741 A KR 860002741A KR 1019850007015 A KR1019850007015 A KR 1019850007015A KR 850007015 A KR850007015 A KR 850007015A KR 860002741 A KR860002741 A KR 860002741A
- Authority
- KR
- South Korea
- Prior art keywords
- electrode
- photodiode
- thin film
- film transistor
- charging
- Prior art date
Links
- 239000010409 thin film Substances 0.000 claims description 11
- 239000003990 capacitor Substances 0.000 claims description 7
- 238000001514 detection method Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 5
- 239000010408 film Substances 0.000 claims description 5
- 238000009825 accumulation Methods 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/108—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the Schottky type
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Thin Film Transistor (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명을 구체화시킨 광 센서의 구성을 나타내는 평면도.
제2도는 제1도의 광 센서회로도.
제7도는 박막트랜지스터의 다른 구성을 나타내는 평면도이다.
1:기판, 2:포토다이오드, 3:박막트랜지스터, 4:충전용트랜지스터, 5:검출용트랜지스터, 6:캐패시터, 11:드레인전극, 12:소오스전극, 13,25:활성층, 14,23:절연층, 15,26:게이트전극층, 16:캐소우드전극, 17,22:a-Si:H막, 18:애노우드전극, 20:빛, 21,24:전극층, 28:출력증폭기, 41,42:온도의존성.
Claims (6)
- 회로기판(1)위에 형성된 무정형의 실리콘포토다이오드(2)로 구성되어지는 광 센서에 있어서, 상기 회로기판위에 전극사이의 용량(C)을 갖는 상기포토다이오드(2)와 일체적으로 형성되고, 게이트전극(15)과 이 게이트전극에 인가되는 제어전압에 응답하여 그 사이에 챈널(이챈널에는 제어전압에 의해 제어되는 챈널전류가 흐름)을 형성하는 드레인 전극(11)과 소오스전극(12)을 갖추며, 상기 드레인전극과 소오스전극 한쪽과 게이트전극 사이에 형성되는 무정형의 실리콘포토 다이오드(2)를 갖는 박막트랜지스터(3)와; 상기 포토다이오드(2)전극사이의 용량을 충전하는 충전수단(4,27);충전후 입사광(20)에 응답하여 변화하는 포토다이오드(2)전극사이의 용량전압에 의해 제어되는 박막트랜지스터(3)의 챈널전류를 검출하는 검출수단(5,6,28)을 구비한 것을 특징으로 하는 광 센서.
- 제1항에 있어서, 포토트랜지스터(2)는 캐소우드 전극(16)과, 투광성도전막으로 이루어진 애노우드전극(18), 캐소우드전극 및 애노우드전극에 의합 샌드위치되는 수소화무정형의 실리콘막(17)을 갖고서 캐소우드전극과 애노우드 전극이 각각 박막트랜지스터의 드레인전극(11)과 게이트 전극(12)에 전기적으로 접속된 것을 특징으로 하는 광 센서.
- 제1항에 있어서, 포토다이오드(2)는 캐소우드전극(16)과, 투광성도전막으로 이루어진 애노우드전극, 캐소우드 전극과 애노우드전극에 의해 샌드위치되는 수소화무정형의 실리콘막(17)을 갖고서 캐소우드전극과 애노우드전극이 각각 박막트랜지스터의 게이트전극(12)과 소오스전극(11)에 전기적으로 접속된 것을 특징으로 하는 광 센서.
- 제1항에 있어서, 충전수단은 직류전원(27)과 이 직류전원을 포토다이오드(2)에 결합시켜 그 전극사이의 용량(C)을 충전시킨 충전스위치소자(4)를 갖고, 상기 충전스위치소자는 외부에서 제공되는 제어신호에 의해 온.오프상태로 되는 회로기판위에 박막트랜지스터(3)와 포토다이오드(2)에 인접하여 형성되는 다른 박막 트랜지스터에서 형성된 것을 특징으로 하는 광 센서.
- 제1항에 있어서, 검출수단은 박막트랜지스터(3)에 결합되어 그 챈널전류에 의해 충전되는 전한축적용 캐패시터(6)와, 출력증폭기(28), 외부제어신호에 의해 온.오프상태로 되고 전하축적용캐패시터를 출력증폭기에 결합하기 위한 검출스위치(5)를 구비한 것을 특징으로 하는 광 센서.
- 제1항에 있어서, 검출수단은 박막트랜지스터(3)에 결합되고 그 챈널전류에 의해 충전되는 전하축적용 캐패시터(6); 광 센서의 출력신호를 취출하기 위한 출력증폭기(28); 외부제어신호에 의해 온.오프상태로 되어 전하축적용 캐패시터를 출력증폭기에 결합하기 위한 검출스위치 소자(5)를 구비하고, 검출스위치소자가 박막트랜지스터에서 형성되면서 전하축적용 캐패시터(6)와 검출스위치소자(5)가 회로기판(1)위에 형성된 것을 특징으로 하는 광 센서.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59204806A JPS6182466A (ja) | 1984-09-29 | 1984-09-29 | 光センサ |
JP59-204806 | 1984-09-29 | ||
JP204806 | 1984-09-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR860002741A true KR860002741A (ko) | 1986-04-28 |
KR900006952B1 KR900006952B1 (ko) | 1990-09-25 |
Family
ID=16496670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019850007015A KR900006952B1 (ko) | 1984-09-29 | 1985-09-24 | 광센서 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4823178A (ko) |
EP (1) | EP0177275B1 (ko) |
JP (1) | JPS6182466A (ko) |
KR (1) | KR900006952B1 (ko) |
DE (1) | DE3578269D1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100382817B1 (ko) * | 1999-01-20 | 2003-05-09 | 엘지.필립스 엘시디 주식회사 | 생체감지패턴 및 이를 이용한 박막트랜지스터형 광센서 |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2569053B2 (ja) * | 1987-06-26 | 1997-01-08 | キヤノン株式会社 | イメ−ジセンサ |
US4889983A (en) * | 1987-11-24 | 1989-12-26 | Mitsubishi Denki Kabushiki Kaisha | Image sensor and production method thereof |
EP1167999A1 (en) * | 1989-09-06 | 2002-01-02 | University of Michigan | Multi-element-amorphous-silicon-detector-array for real-time imaging and dosimetry of megavoltage photons and diagnostic x-rays |
JPH0734467B2 (ja) * | 1989-11-16 | 1995-04-12 | 富士ゼロックス株式会社 | イメージセンサ製造方法 |
US6008078A (en) * | 1990-07-24 | 1999-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a semiconductor device |
AU1995092A (en) * | 1991-05-10 | 1992-12-30 | Q-Dot. Inc. | High-speed peristaltic ccd imager with gaas fet output |
US5408113A (en) * | 1992-06-30 | 1995-04-18 | Ricoh Company, Ltd. | High sensitivity improved photoelectric imaging device with a high signal to noise ratio |
AU2002336341A1 (en) * | 2002-02-20 | 2003-09-09 | Planar Systems, Inc. | Light sensitive display |
US7053967B2 (en) * | 2002-05-23 | 2006-05-30 | Planar Systems, Inc. | Light sensitive display |
US7009663B2 (en) * | 2003-12-17 | 2006-03-07 | Planar Systems, Inc. | Integrated optical light sensitive active matrix liquid crystal display |
US7023503B2 (en) * | 2002-02-20 | 2006-04-04 | Planar Systems, Inc. | Image sensor with photosensitive thin film transistors |
JP2003332560A (ja) * | 2002-05-13 | 2003-11-21 | Semiconductor Energy Lab Co Ltd | 半導体装置及びマイクロプロセッサ |
JP4094386B2 (ja) * | 2002-09-02 | 2008-06-04 | 株式会社半導体エネルギー研究所 | 電子回路装置 |
JP4373063B2 (ja) | 2002-09-02 | 2009-11-25 | 株式会社半導体エネルギー研究所 | 電子回路装置 |
JP4574118B2 (ja) * | 2003-02-12 | 2010-11-04 | 株式会社半導体エネルギー研究所 | 半導体装置及びその作製方法 |
US20080084374A1 (en) * | 2003-02-20 | 2008-04-10 | Planar Systems, Inc. | Light sensitive display |
US20080048995A1 (en) * | 2003-02-20 | 2008-02-28 | Planar Systems, Inc. | Light sensitive display |
US7773139B2 (en) * | 2004-04-16 | 2010-08-10 | Apple Inc. | Image sensor with photosensitive thin film transistors |
JP5131508B2 (ja) * | 2005-11-14 | 2013-01-30 | Nltテクノロジー株式会社 | 受光回路 |
US20070109239A1 (en) * | 2005-11-14 | 2007-05-17 | Den Boer Willem | Integrated light sensitive liquid crystal display |
US7688947B2 (en) * | 2006-10-17 | 2010-03-30 | Varian Medical Systems, Inc. | Method for reducing sensitivity modulation and lag in electronic imagers |
KR101441429B1 (ko) * | 2007-09-21 | 2014-09-18 | 삼성디스플레이 주식회사 | 센서 박막 트랜지스터 및 이를 포함하는 박막 트랜지스터기판, 박막 트랜지스터 기판의 제조 방법 |
US9310923B2 (en) | 2010-12-03 | 2016-04-12 | Apple Inc. | Input device for touch sensitive devices |
US8928635B2 (en) | 2011-06-22 | 2015-01-06 | Apple Inc. | Active stylus |
US8638320B2 (en) | 2011-06-22 | 2014-01-28 | Apple Inc. | Stylus orientation detection |
US9329703B2 (en) | 2011-06-22 | 2016-05-03 | Apple Inc. | Intelligent stylus |
US8889461B2 (en) | 2012-05-29 | 2014-11-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | CIS image sensors with epitaxy layers and methods for forming the same |
US9176604B2 (en) | 2012-07-27 | 2015-11-03 | Apple Inc. | Stylus device |
US9652090B2 (en) | 2012-07-27 | 2017-05-16 | Apple Inc. | Device for digital communication through capacitive coupling |
US9557845B2 (en) | 2012-07-27 | 2017-01-31 | Apple Inc. | Input device for and method of communication with capacitive devices through frequency variation |
US10048775B2 (en) | 2013-03-14 | 2018-08-14 | Apple Inc. | Stylus detection and demodulation |
US9939935B2 (en) | 2013-07-31 | 2018-04-10 | Apple Inc. | Scan engine for touch controller architecture |
FR3026893B1 (fr) * | 2014-10-07 | 2018-01-12 | Saurea | Transistor a effet photovoltaique et moteur photovoltaique a puissance augmentee associe |
US10067618B2 (en) | 2014-12-04 | 2018-09-04 | Apple Inc. | Coarse scan and targeted active mode scan for touch |
US10474277B2 (en) | 2016-05-31 | 2019-11-12 | Apple Inc. | Position-based stylus communication |
US11428787B2 (en) | 2016-10-25 | 2022-08-30 | Trinamix Gmbh | Detector for an optical detection of at least one object |
CN107610604B (zh) * | 2017-09-25 | 2020-03-17 | 上海九山电子科技有限公司 | 一种led芯片、阵列基板、显示面板和显示装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739582B2 (ko) * | 1974-09-13 | 1982-08-21 | ||
JPS5850030B2 (ja) * | 1979-03-08 | 1983-11-08 | 日本放送協会 | 光電変換装置およびそれを用いた固体撮像板 |
JPS55128884A (en) * | 1979-03-28 | 1980-10-06 | Hitachi Ltd | Semiconductor photodetector |
JPS56135981A (en) * | 1980-03-28 | 1981-10-23 | Canon Inc | Photoelectric conversion element |
JPS56138965A (en) * | 1980-03-31 | 1981-10-29 | Canon Inc | Photoelectric converter |
DE3112907A1 (de) * | 1980-03-31 | 1982-01-07 | Canon K.K., Tokyo | "fotoelektrischer festkoerper-umsetzer" |
JPS5746224A (en) * | 1980-09-03 | 1982-03-16 | Canon Inc | Lens system equipped with auxiliary lens |
JPS57114292A (en) * | 1981-01-06 | 1982-07-16 | Fuji Xerox Co Ltd | Thin film image pickup element |
US4517733A (en) * | 1981-01-06 | 1985-05-21 | Fuji Xerox Co., Ltd. | Process for fabricating thin film image pick-up element |
US4471371A (en) * | 1981-01-06 | 1984-09-11 | Fuji Xerox Co., Ltd. | Thin film image pickup element |
JPS5922360A (ja) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Works Ltd | 光入力モス型トランジスタ |
JPS5925280A (ja) * | 1982-07-31 | 1984-02-09 | Matsushita Electric Works Ltd | 光入力mosトランジスタ |
US4651185A (en) * | 1983-08-15 | 1987-03-17 | Alphasil, Inc. | Method of manufacturing thin film transistors and transistors made thereby |
JPS60103676A (ja) * | 1983-11-11 | 1985-06-07 | Seiko Instr & Electronics Ltd | 薄膜トランジスタアレイの製造方法 |
US4598305A (en) * | 1984-06-18 | 1986-07-01 | Xerox Corporation | Depletion mode thin film semiconductor photodetectors |
-
1984
- 1984-09-29 JP JP59204806A patent/JPS6182466A/ja active Pending
-
1985
- 1985-09-24 KR KR1019850007015A patent/KR900006952B1/ko not_active IP Right Cessation
- 1985-09-26 US US06/780,598 patent/US4823178A/en not_active Expired - Lifetime
- 1985-09-26 DE DE8585306847T patent/DE3578269D1/de not_active Expired - Lifetime
- 1985-09-26 EP EP85306847A patent/EP0177275B1/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100382817B1 (ko) * | 1999-01-20 | 2003-05-09 | 엘지.필립스 엘시디 주식회사 | 생체감지패턴 및 이를 이용한 박막트랜지스터형 광센서 |
Also Published As
Publication number | Publication date |
---|---|
EP0177275A2 (en) | 1986-04-09 |
EP0177275B1 (en) | 1990-06-13 |
DE3578269D1 (de) | 1990-07-19 |
US4823178A (en) | 1989-04-18 |
EP0177275A3 (en) | 1988-09-07 |
JPS6182466A (ja) | 1986-04-26 |
KR900006952B1 (ko) | 1990-09-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR860002741A (ko) | 광 센서 | |
US4271420A (en) | Solid-state image pickup device | |
SE8703111L (sv) | Elektronisk elkopplare | |
ES8104686A1 (es) | Perfeccionamientos en interruptores disparados opticamente | |
DE3875655D1 (de) | Halbleiter mit kapazitiver auslese der ladungstraeger und integrierter gleichspannungszufuehrung. | |
JPS6441852A (en) | Hydrogen ion sensitive semiconductor sensor | |
JP3316702B2 (ja) | 画像読取装置 | |
JPS56138964A (en) | Photoelectric converter | |
JP3200760B2 (ja) | 光電変換素子及びその駆動方法 | |
JPS6472121A (en) | Active matrix type liquid crystal device | |
CN112926402B (zh) | 一种主动式像素电路、驱动方法及显示面板 | |
JPS56138965A (en) | Photoelectric converter | |
JPS5527772A (en) | Solid state pickup device | |
JPH0378261A (ja) | 光制御可能な半導体デバイス | |
JPS56138966A (en) | Photoelectric converter | |
JPH0216777A (ja) | 半導体光検出装置 | |
JPS5619276A (en) | Solid state image pickup device | |
JPH06103222B2 (ja) | 光検出装置 | |
SU767894A1 (ru) | Устройство дл защиты | |
JPS56138963A (en) | Photoelectric converter | |
JPS57203573A (en) | Thermal head | |
JPS57108782A (en) | Detecting element of radiant rays | |
JPS60214204A (ja) | 歪みゲ−ジセンサ | |
JPH0464193B2 (ko) | ||
JPS6486568A (en) | Photosensor and image sensor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20000829 Year of fee payment: 11 |
|
LAPS | Lapse due to unpaid annual fee |