KR850007824A - High efficiency chromium electrodeposition - Google Patents

High efficiency chromium electrodeposition Download PDF

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Publication number
KR850007824A
KR850007824A KR1019840002048A KR840002048A KR850007824A KR 850007824 A KR850007824 A KR 850007824A KR 1019840002048 A KR1019840002048 A KR 1019840002048A KR 840002048 A KR840002048 A KR 840002048A KR 850007824 A KR850007824 A KR 850007824A
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KR
South Korea
Prior art keywords
iron
acid
plating bath
metal
chromium
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Application number
KR1019840002048A
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Korean (ko)
Inventor
체스신 하이만 (외 1)
Original Assignee
윌리암 에취, 브류스터
엠.앤드.티 케미칼스 인코포레이티드
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Application filed by 윌리암 에취, 브류스터, 엠.앤드.티 케미칼스 인코포레이티드 filed Critical 윌리암 에취, 브류스터
Priority to KR1019840002048A priority Critical patent/KR850007824A/en
Publication of KR850007824A publication Critical patent/KR850007824A/en

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

내용 없음No content

Description

높은 효율의 크롬 전착방법High efficiency chromium electrodeposition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (11)

(a)기체금속에 부착성 철 또는 철합금을 도금하는데 충분한 시간과 전류밀도를 갖는 철 염 함유 도금조에서 철 또는 철 합금으로 기체금속을 도금하고, 다음(b)부착성 크롬을 도금하는데 충분한 시간과 전류밀도를 갖고 크롬과 옥소 유리화합물, 취소유리화합물과 이들의 혼합물로부터 선택한 할로겐 유리 화합물을 함유하는 크롬산 도금조에서 철 또는 철합금이 도금된 금속기체상에 크롬을 전착시킴을 특징으로 하는 금속기체에 부착성 크롬을 전착시키는 방법.(a) plating a base metal with iron or an iron alloy in an iron salt-containing plating bath having a time and current density sufficient to plate the adherent iron or ferroalloy on the base metal; and (b) sufficient to plate the adherent chromium. Characterized by electrodeposition of chromium on a metal substrate plated with iron or iron alloy in a chromic acid plating bath containing a halogen glass compound selected from chromium, oxo glass compounds, clear glass compounds and mixtures thereof with time and current density. Electrodeposition of adherent chromium on metal substrates. 청구범위 1의 방법에 있어서, 도금된 금속기체에 크롬을 전착시키기 전에 크롬산 함유도금조에서 기체금속상의 철 함유 전착물을 양극처리함을 특징으로 하는 상기방법.The method according to claim 1, characterized in that the iron-containing electrodeposition on the gaseous metal is anodized in a chromic acid-containing plating bath prior to electrodepositing chromium on the plated metal gas. 청구범위 1의 방법에 있어서, 철 또는 철 함유합금으로 금속기체를 도금하기 전에 금속기체를 활성화 처리함을 특징으로하는 상기 방법.The method according to claim 1, wherein the metal gas is activated before plating the metal gas with iron or an iron-containing alloy. 청구범위 2의 방법에 있어서, 철 또는 철 함유합금으로 금속기체를 도금하기 전에, 산 함유 도금조에서 철합금으로된 금속기체를 처리함을 특징으로하는 상기방법.The method according to claim 2, characterized in that the metal base of iron alloy is treated in an acid-containing plating bath before plating the metal base with iron or an iron-containing alloy. 청구범위 4의 방법에 있어서, 산 함유 도금조중의 산이 염화수소산임을 특징으로하는 상기 방법.The method according to claim 4, wherein the acid in the acid-containing plating bath is hydrochloric acid. 청구범위 4의 방법에 있어서, 산 함유 도금조중의 산이 황산임을 특징으로하는 상기 방법.The method according to claim 4, wherein the acid in the acid-containing plating bath is sulfuric acid. 청구범위 4의 방법에 있어서, 산 함유 도금조와 상기 철 염함유 도금조가 동일한 도금조임을 특징으로하는 상기 방법.The method according to claim 4, wherein the acid-containing plating bath and the iron salt-containing plating bath are the same plating bath. 청구범위 3의 방법에 있어서, 활성화 처리를 할로겐화물 함유 크롬산 도금조에서 행함을 특징으로하는 상기 방법.The method according to claim 3, wherein the activation treatment is performed in a halide-containing chromic acid plating bath. 청구범위 3의 방법에 있어서, 상기 활성화 처리가 상기금속기체를 전해처리하는 것을 특징으로하는 상기 방법.The method according to claim 3, wherein the activation treatment electrolyzes the metal gas. 청구범위 3의 방법에 있어서, 상기 활성화 처리 하는 것임을 특징으로하는 상기 방법.Method according to claim 3, characterized in that the activation process. 청구범위 1의 방법에 있어서, 상기 금속기체가 철 또는 철 함유 합금이고, 도금된 금속기체에 크롬을 전착시키기전에 산 함유 도금조에서 금속기체상의 철 함유전착물을 더 양극처리함을 특징으로하는 상기 방법.The method of claim 1, wherein the metal gas is iron or an iron-containing alloy, and further anodizes the iron-containing electrodeposition on the metal gas in an acid-containing plating bath before electrodepositing chromium on the plated metal gas. The method. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019840002048A 1984-04-18 1984-04-18 High efficiency chromium electrodeposition KR850007824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019840002048A KR850007824A (en) 1984-04-18 1984-04-18 High efficiency chromium electrodeposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019840002048A KR850007824A (en) 1984-04-18 1984-04-18 High efficiency chromium electrodeposition

Publications (1)

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KR850007824A true KR850007824A (en) 1985-12-09

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KR1019840002048A KR850007824A (en) 1984-04-18 1984-04-18 High efficiency chromium electrodeposition

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KR (1) KR850007824A (en)

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