KR20170052309A - Crucible for evaporation of effusion cell - Google Patents

Crucible for evaporation of effusion cell Download PDF

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Publication number
KR20170052309A
KR20170052309A KR1020150154606A KR20150154606A KR20170052309A KR 20170052309 A KR20170052309 A KR 20170052309A KR 1020150154606 A KR1020150154606 A KR 1020150154606A KR 20150154606 A KR20150154606 A KR 20150154606A KR 20170052309 A KR20170052309 A KR 20170052309A
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KR
South Korea
Prior art keywords
crucible
crucible body
evaporation source
vacuum evaporation
inlet
Prior art date
Application number
KR1020150154606A
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Korean (ko)
Inventor
황도원
문일권
차수영
임태균
Original Assignee
(주)알파플러스
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Priority to KR1020150154606A priority Critical patent/KR20170052309A/en
Publication of KR20170052309A publication Critical patent/KR20170052309A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/203—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/4807—Ceramic parts

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention relates to a crucible for a vacuum evaporation source, and more particularly, to a crucible for evaporation used in a vacuum evaporation source, in which a ceramic is used as a material of a crucible body containing a thin film forming material, It forms the crucible body in the same shape as an hourglass with a narrow inner diameter. By the open structure of the upper entrance of the crucible body as in the upper part of the hourglass, heat absorption is minimized and the temperature of the inlet is lowered. It is possible to prevent the aluminum from flowing over the inlet of the crucible body.

Description

{Crucible for evaporation of effusion cell}

The present invention relates to a crucible for a vacuum evaporation source, and more particularly, to a crucible for evaporating a thin film forming material such as aluminum, comprising a ceramic body and an upper part of the crucible body having an opening like an hourglass To a crucible for a vacuum evaporation source.

In general, a vacuum deposition apparatus is used to form a thin film made of a specific material on a wafer surface in a semiconductor manufacturing process, or to form a thin film of a desired substance on a surface of a glass substrate or the like in the manufacture of a large flat panel display device.

Such a vacuum deposition apparatus is a technique for heating and evaporating a thin film forming material in order to form a predetermined thin film on a substrate disposed in a chamber of high vacuum, and applying a vaporized thin film forming material to the surface of a relatively cold substrate to condense Respectively. Particularly, the material for forming a thin film is heated by using a vacuum evaporation source which is a core component of a vacuum deposition apparatus. The vacuum evaporation source includes a crucible for evaporation containing a substance for forming a thin film and a heater for heating the crucible for evaporation.

However, Al 2 O 3 , PBN, AlN and the like are used as a crucible of an aluminum vacuum evaporation source using aluminum as a thin film forming material in a conventional vacuum evaporation source. However, in the conventional crucible for vacuum evaporation source using such a crucible material, a phenomenon occurs that when aluminum as a thin film forming material evaporates, it flows over the inlet of the crucible, and the crucible materials react well with aluminum as a thin film forming material There is a problem that the aluminum is lost.

Further, when the temperature of the crucible inlet is lowered to prevent the aluminum from overflowing, there is a problem that aluminum is adhered to the upper inlet of the crucible.

Korean Patent Publication No. 10-2015-0070822

SUMMARY OF THE INVENTION The present invention has been made in order to solve all of the above problems, and it is an object of the present invention to provide an aluminum vacuum evaporation source in which a ceramic such as TiB 2 BN is used as a material of a crucible body, And an inlet at an upper portion of the crucible body is opened to minimize heat absorption, thereby dripping down the temperature of the inlet, thereby preventing the aluminum from overflowing.

Another object of the present invention is to provide a crucible for a vacuum evaporation source in which a metal band is attached to an outer circumference of an upper end of a crucible body or a metal is protruded over a coating or an upper surface of an inlet to drip the temperature of an inlet of the crucible body.

Another object of the present invention is to provide a crucible for a vacuum evaporation source in which a heater for heating a crucible body is separated into an upper heater at an upper portion of the crucible body and a lower heater at a lower portion to maintain the upper portion of the crucible body at a proper temperature by the upper heater .

In order to achieve the above object, a crucible for a vacuum evaporation source of the present invention is a crucible for evaporation used in a vacuum evaporation source, wherein the crucible is a material of a crucible body containing a material for forming a thin film, And the crucible body is formed in the shape of an hourglass whose inner diameter becomes narrower toward the middle portion in the upper region.

Further, it is preferable to further include a metal band attached to the outer periphery of the upper end of the crucible body for the purpose of heat reflection, or to coat the metal on the outer circumference of the upper end of the crucible body for heat reflection.

And a protruding portion protruding upward from an upper surface of the crucible body inlet.

In addition, it is preferable that the metal of the metal band attached for the use of the heat reflector or the metal coated for heat reflection is tantalum (Ta) or tungsten (W).

The thin film forming material is preferably aluminum (Al).

The ceramic of the crucible is preferably TiB 2 BN.

Further, it is preferable that the heater further comprises a heater for heating the crucible body, wherein the heater is divided into an upper heater for heating the upper portion of the crucible body and a lower heater for heating the lower portion.

According to the crucible for vacuum evaporation source of the present invention, as the upper part of the crucible body has an open structure such as the upper part of the hourglass, heat absorption is minimized and the temperature of the inlet is lowered so that aluminum as a thin film- It is possible to prevent the phenomenon of overflowing out of the inlet.

Also, the metal band attached to the outer circumference of the upper part of the crucible body or the protruding structure of the coated metal or the upper surface of the inlet has the effect of dropping the temperature of the inlet together with the open structure of the inlet.

Further, the upper heater is heated at an appropriate temperature by heating only the upper part of the crucible body, so that aluminum, which is a thin film forming material, flows down into the crucible body below without being buried in the inlet.

1 is a partial cross-sectional view schematically showing a vacuum evaporation source including a crucible for a vacuum evaporation source according to a first embodiment of the present invention.
2 is a cross-sectional view showing the structure of a crucible for a vacuum evaporation source according to a second embodiment of the present invention.
3 is a cross-sectional view showing the structure of a crucible for a vacuum evaporation source according to a third embodiment of the present invention.
4 is a cross-sectional view showing the structure of a crucible for a vacuum evaporation source according to a fourth embodiment of the present invention.

Hereinafter, preferred embodiments of a crucible for a vacuum evaporation source according to the present invention will be described in detail with reference to the accompanying drawings. It is to be understood that the present invention is not limited to the disclosed embodiments, but may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to inform.

1 is a partial cross-sectional view schematically showing a vacuum evaporation source including a crucible for a vacuum evaporation source according to a first embodiment of the present invention.

1, a vacuum evaporation source 100 including a crucible for a vacuum evaporation source according to a first embodiment of the present invention includes a crucible body 10, a heater 20, and a cooling unit 30 .

The crucible body 10 contains a material for forming a thin film such as aluminum, and the upper opening is opened so that the thin film forming material can be evaporated to the outside. The structure of the crucible for vacuum evaporation source including the crucible body 10 according to the present invention will be described in detail after the description of the vacuum evaporation source 100. [

The heater 20 is separated from the upper heater 20a and the lower heater 20b and is provided outside the crucible body 10 and serves to heat the crucible body 10. [ For example, the heater 20 may be a heating wire that receives power from the power supply unit 90 and generates heat. The lower heater 20b of the heater 20 is supported by the receiving portion 25. [ The support portion 25 supports the bottom surface of the lower heater 20b so that thermal expansion of the lower heater 20b can be performed only upward while preventing the lower heater 20b from moving downward while thermally expanding the lower heater 20b Lt; / RTI >

The cooling unit 30 is provided outside the crucible body 10 and serves to cool the crucible body 10 after the deposition process is completed. In addition, the vacuum evaporation source 100 may further include first and second cases (40) and (50). More specifically, the first case 40 houses the crucible body 10, the heater 20, and the receiving portion 25, and has a shape corresponding to the opening of the crucible body 10, have. The second case 50 may receive the first case 40 and have a shape corresponding to the opening of the first case 40 and open.

When the first and second cases 40 and 50 are further included, the cooling unit 30 is provided between the first case 40 and the second case 50, And the heat of the crucible body 10 can be cooled.

In addition, the vacuum evaporation source 100 may further include a support rod 70, a support base 80, and a power supply unit 90. The support rod 70 serves to support the first case 40 or the like to the support base 80 and the power supply unit 90 supplies current to the heater 20 described above.

Hereinafter, the specific structure and function of the crucible for vacuum evaporation source of the present invention included in the above-described vacuum evaporation source 100 will be described.

FIG. 1 shows the structure of a crucible for a vacuum evaporation source 1 according to a first embodiment of the present invention. The crucible 1 for a vacuum evaporation source according to the first embodiment of the present invention has a protrusion The crucible body 10 is supported on the upper surface of the first case 40 and the heater 20 is supported on the upper surface of the crucible body 10, And an upper heater 20a and a lower heater 20b which are separated from each other by the outer circumference of the lower part 4 and the lower part 3 and are installed as hot lines. A vertical long groove is formed in the crucible body 10 and an upper portion 4 connected to the lower portion 3 of the groove is sandwiched between the upper portion 4 and the intermediate portion 5, It is configured like a clock. Therefore, the inside of the crucible body 10 has a structure like a jar from the lower part 3 of the long groove to the middle part 5 of the upper part 4, and the entrance 4a ) Open outward to form an open, open structure.

Since the inlet 4a of the upper portion 4 of the crucible body 10 is opened to the outside by opening the opening 4a like the upper portion of the hourglass, the temperature of the inlet 4a is decreased by the opening of the crucible body 10, So that the aluminum contained in the thin film forming material is prevented from flowing over the inlet 4a when the aluminum is evaporated. When the thin film forming material is contained in the crucible body 10, it is preferable to use a ceramic such as TiB 2 BN which does not react well with a metal such as aluminum as a material of the crucible body 10.

Therefore, the internal structure of the crucible body 10 of the present invention and the ceramic material can be used as a stable evaporation source of a thin film forming material such as aluminum.

FIG. 2 is a cross-sectional view illustrating the structure of a crucible for a vacuum evaporation source according to a second embodiment of the present invention.

2, the crucible for vacuum evaporation source according to the second embodiment of the present invention includes an inlet 4a immediately below the upper end support jaw 2 as an outer circumference at the upper end of the crucible body 10, And a metal band 6 for the use of a heat reflecting plate is attached to the outer periphery so that the absorption of heat at the inlet 4a of the upper portion 4 of the crucible body 10 is minimized by the metal band 6, 4a, the temperature of the inlet 4a is decreased by the temperature of the inlet 4a to prevent the aluminum as the thin film forming material from overflowing out of the inlet 4a when evaporated. The constituents other than the metal band 6 are the same as those of the crucible for vacuum evaporation source 1 of the first embodiment, and the same reference numerals are given thereto.

3 is a cross-sectional view illustrating the structure of a crucible for a vacuum evaporation source according to a third embodiment of the present invention.

3, the crucible for a vacuum evaporation source according to the third embodiment of the present invention includes an inlet 4a immediately below the upper end support jaw 2 at an outer circumference of the upper end of the crucible body 10, The metal 7 is coated on the outer periphery for thermal reflection so as to minimize the absorption of heat at the inlet 4a of the upper portion 4 of the crucible body 10 by the coated metal 7, 4a, the temperature of the inlet 4a is decreased by the temperature of the inlet 4a to prevent the aluminum as the thin film forming material from overflowing out of the inlet 4a when evaporated. The constituents other than the coated metal 6 are the same as those of the crucible for vacuum evaporation source 1 of the first embodiment and are given the same reference numerals.

Tantalum (Ta) or tungsten (W) is used as the metal of the metal band (6) or the coated metal (7).

4 is a cross-sectional view illustrating the structure of a crucible for a vacuum evaporation source according to a fourth embodiment of the present invention.

4, the crucible for vacuum evaporation source according to the fourth embodiment of the present invention is constituted by a protruding portion 8 protruding upward at a predetermined height around the upper surface of the inlet 4a of the crucible body 10, By minimizing the absorption of heat at the top inlet 4a of the crucible body 10 by means of the projections 8, the temperature of the inlet 4a is reduced by the open open structure of the inlet 4a, Thereby preventing the aluminum material from flowing over the inlet 4a when evaporated.

On the other hand, the temperature of the upper inlet 4a of the crucible body 10 is decreased by the upper heater 20a so that aluminum as a thin film forming material does not adhere to the inlet 4a, 4 is appropriately raised and maintained so that aluminum flows down to the lower portion 3 in the crucible body 10 without being buried in the inlet 4a.

As shown in FIGS. 2 to 4, the temperature gradient of the crucible for the vacuum evaporation source according to the internal structure of the crucible for a vacuum evaporation source 10 according to the present invention can be varied from the lower portion 3 to the upper portion 4 ), The temperature gradually increases from the intermediate portion 5 to the upper portion through the inlet 4a. As a result, the temperature gradient appears to prevent the aluminum, which is a thin film forming material, from overflowing. do.

As described above, the crucible for a vacuum evaporation source according to the present invention has been described with reference to the drawings. However, the present invention is not limited to the embodiments and drawings disclosed in the present specification, It should be understood that various modifications may be made by those skilled in the art.

1: crucible of the present invention 2:
3: crucible body lower part 4: crucible body upper part
4a: Crucible inlet 5: Middle part
6: metal band 7: coated metal
8: protrusion 20: heater
20a: upper heater 20b: lower heater
30: cooling unit 40: first case
50: second case 70: support rod
80: Support 90: Power supply
100: vacuum evaporation source

Claims (8)

In a crucible for evaporation used in a vacuum evaporation source,
The crucible for a vacuum evaporation source according to any one of the preceding claims, wherein the crucible body is made of a material such as an hourglass whose inner diameter becomes narrower toward an intermediate portion in an upper region inside the crucible body, .
The method according to claim 1,
And a metal band attached to the outer circumference of the upper end of the crucible body for use as a heat reflector.
The method according to claim 1,
And a metal is coated on the outer periphery of the upper end of the crucible body for the purpose of heat reflection.
The method according to claim 1,
And a protruding portion protruding upward from an upper surface of an inlet of the crucible body.
The method according to claim 2 or 3,
Wherein the metal of the metal band attached for the use of the heat reflecting plate or the metal coated for heat reflection is tantalum (Ta) or tungsten (W).
5. The method according to any one of claims 1 to 4,
Wherein the thin film forming material is aluminum (Al).
The method according to claim 6,
Wherein the ceramic of the crucible is TiB 2 BN.
8. The method of claim 7,
Further comprising a heater for heating the crucible body, wherein the heater is divided into an upper heater for heating the upper portion of the crucible body and a lower heater for heating the lower portion of the crucible body.
KR1020150154606A 2015-11-04 2015-11-04 Crucible for evaporation of effusion cell KR20170052309A (en)

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KR1020150154606A KR20170052309A (en) 2015-11-04 2015-11-04 Crucible for evaporation of effusion cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150154606A KR20170052309A (en) 2015-11-04 2015-11-04 Crucible for evaporation of effusion cell

Publications (1)

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KR20170052309A true KR20170052309A (en) 2017-05-12

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