KR20150114254A - Deposit removers and thereof manufacturing method - Google Patents

Deposit removers and thereof manufacturing method Download PDF

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KR20150114254A
KR20150114254A KR1020140038624A KR20140038624A KR20150114254A KR 20150114254 A KR20150114254 A KR 20150114254A KR 1020140038624 A KR1020140038624 A KR 1020140038624A KR 20140038624 A KR20140038624 A KR 20140038624A KR 20150114254 A KR20150114254 A KR 20150114254A
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fluoride
sodium
surfactant
high boiling
alcohol
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KR1020140038624A
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Korean (ko)
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김성임
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(주) 삼진씨앤씨
김성임
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions

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  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
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  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
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Abstract

Disclosed are a vapor deposition remover to remove a vapor-deposited film vapor-deposited on a surface of a panel material, and a manufacturing method thereof. According to the present invention, the vapor deposition remover comprises: 5-30 wt% of an alkali chemical; 35-59.7 wt% of water; 3-35 wt% of a high boiling point alcohol; 0.1-10 wt% of a surface active agent; 0.1-10 wt% of ethyl alcohol (C_2H_5OH); and 0.1-10 wt% of methanol (CH_3OH), wherein the ethyl alcohol and the methanol are high boiling point alcohols. Accordingly, TiO_2, SiO_2, ZnO_3, Al, Sn, Ni, etc., which have been vapor-deposited on a glass surface, are biodegraded using an alkaline water-soluble etching cleansing agent; thereby increasing productivity by preventing corrosion of the surfaces of the materials such as glass, and preventing environmental pollution due to water-solubility.

Description

증착제거제 및 그의 제조방법{Deposit removers and thereof manufacturing method}[0001] Deposit removers and their manufacturing methods [0002]

본 발명은 증착제거제 및 그의 제조방법에 관한 것으로, 더욱 상세하게는 대상물의 표면에 형성된 증착막을 제거하되 표면 손상을 방지할 수 있는 증착제거제 및 그의 제조방법에 관한 것이다. More particularly, the present invention relates to a deposition remover capable of removing a deposition film formed on a surface of an object and preventing surface damage, and a method of manufacturing the same.

일반적으로 전자제품, 휴대전화 등에 부착되는 터치패널의 종류에는 아크릴계, PET계, 유리 등이 있는데 이러한 소재는 높은 투과율과 원하는 칼라를 얻기 위하여 터치패널표면에 진공 증착을 한다. In general, there are acrylic, PET, glass, and the like which are attached to electronic products, mobile phones, and the like. These materials are vacuum deposited on the surface of a touch panel to obtain a high transmittance and a desired color.

편의상 TiO2, SiO2, ZnO3, Al, Sn, Ni등 금속을 이용하여 진공 증착기를 사용하여 증착막을 생성시키고 있다.For the sake of convenience, a vapor deposition film is formed using a vacuum evaporator using metals such as TiO 2 , SiO 2 , ZnO 3 , Al, Sn, and Ni.

이후 인쇄 등 2차 가공 후 필요부분을 부분적으로 에칭하여 제품을 완성하게 된다.After the second processing such as printing, necessary parts are partially etched to complete the product.

국내 공개특허 10-2012-0104214호에는 "증착물 제거 방법"이 개시되어 있다. A "deposition material removal method" is disclosed in Korean Patent Laid-Open Publication No. 10-2012-0104214.

상기 선행기술은 분자형 불소 또는 분자형 불소로부터 생성되는 활성종을 포함한 가스로 고형체 표면상의 실리콘 하이드라이드를 처리하는 것과 관련된다. The prior art relates to treating silicon hydrides on the solid surface with a gas containing active species generated from molecular fluorine or molecular fluorine.

그러나 종래에는 에칭 과정에서 산성계열, 특히 불화물을 활용하여 에칭을 하였으나 유리소재의 표면이 부식되는 문제점이 야기되었다. However, in the conventional etching process, etching has been carried out using acidic materials, particularly fluoride, but the surface of the glass material is corroded.

본 발명은 상기한 종래 기술의 문제점을 해소하기 위해 안출된 것으로, 유리표면의 손상과 인쇄등 2차 가공에서 표면 손상이 발생되지 않도록 하기 위해 알칼리계 약품과 계면활성제를 활용하여 에칭 할 수 있는 수용성의 증착제거제를 제공하는데 그 목적이 있다.The present invention has been made in order to solve the problems of the prior art described above, and it is an object of the present invention to provide a water-soluble And an object of the present invention is to provide a deposition remover of the present invention.

상기한 본 발명의 목적은, 패널 소재 표면에 증착된 증착막을 제거하는 증착제거제의 제조방법에 있어서, 알칼리약품을 조성하는 1단계; 고 비점 알코올을 조성하는 2단계; 계면활성제를 조성하는 3단계; 저 비점 알코올을 조성하는 4단계; 상기 1단계 내지 4단계의 알칼리약품, 고 비점 알코올, 계면활성제, 저 비점 알코올과 물을 혼합하여 교반하는 5단계;를 포함하는 것을 특징으로 하는 증착제거제의 제조방법에 의해 달성될 수 있다.It is an object of the present invention to provide a process for producing a deposition remover which removes a deposited film deposited on a surface of a panel material, High boiling point alcohol; A third step of preparing a surfactant; Low boiling alcohol; And a fifth step of mixing and stirring the alkaline agent, the high boiling point alcohol, the surfactant, the low boiling point alcohol and water in the first to fourth steps, and stirring the resultant mixture.

상기 알칼리약품은, 수산화칼륨(Potassium Hydroxide; KOH), 수산화나트륨(Sodium hydroxide; NaOH), 메타규산소다(Sodium silicate, Pentahydratte; Na2O SiO2 H2O), 액규산소다(Sodium silicate; NaO nSiO2H2O), 질산소다(Sodium nitrate; NaNO3), 불화소다(Sodium fluoride; NaF), 불화칼륨(Potassium fluoride; KF), 불화암몬(Ammonium hydrogen fluoride; NH4F), 유산소다(Sodium sulfate;Na2SO4·10H2O)로 이루어지는 군에서 선택되는 것을 특징으로 한다. The alkali agent is, a potassium hydroxide (Potassium Hydroxide; KOH), sodium hydroxide (Sodium hydroxide; NaOH), metasilicate soda (Sodium silicate, Pentahydratte; Na 2 O SiO 2 H 2 O), liquid sodium silicate (Sodium silicate; NaO nSiO 2 H 2 O), nitric acid soda (sodium nitrate; NaNO 3), fluoride soda (sodium fluoride; NaF), potassium fluoride (potassium fluoride; KF), fluoride Ammon (Ammonium hydrogen fluoride; the NH 4 F), aerobic ( Sodium sulfate; Na 2 SO 4 .10H 2 O).

상기 고 비점 알코올은 폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2)로 이루어지는 군에서 선택되는 것을 특징으로 한다. The high boiling point alcohol may be polypropylene glycol (nC3H8O2), polyethylene glycol (Polyethylene glycol; HOCH 2 (CH 2 OCH 2 ) nCH 2 OH], and hexylene glycol (C 6 H 14 O 2 ).

상기 계면활성제는 알킬폴리옥시 에텔에테르(Alkyl polyoxy ethylether)인 것을 특징으로 한다. The surfactant is an alkyl polyoxy ethyl ether.

상기 계면활성제의 보조제로서 모노에탄올아민(Monoethanolamine; H2NCH2CH2OH) 또는 트리에탄올아민(Triethanolamine; N(CH2CH2OH)3) 중 택일되는 것을 특징으로 한다. Monoethanolamine (H 2 NCH 2 CH 2 OH) or triethanolamine (N (CH 2 CH 2 OH) 3) is used as an auxiliary agent for the surfactant.

한편 상기한 본 발명의 목적은, 상기의 제조방법에 의해 제조되는 것으로, 알칼리약품 5~30wt%, 물 35~59.7wt%, 고 비점 알코올 3~35wt%, 계면활성제 0.1~10wt%, 저 비점 알코올인 에칠알콜(C2H5OH)과 메탄올(CH3OH)이 각각 0.1~10wt%가 혼합되어 이루어진 것을 특징으로 하는 증착제거제에 의해 달성될 수 있다. Meanwhile, an object of the present invention is to provide a process for producing a polyurethane foam, which comprises preparing 5 to 30 wt% of an alkali agent, 35 to 59.7 wt% of water, 3 to 35 wt% of a high boiling alcohol, 0.1 to 10 wt% of a surfactant, And 0.1 to 10% by weight of an alcohol ethanol (C 2 H 5 OH) and methanol (CH 3 OH), respectively, are mixed.

본 발명에 의한 세정제는 알칼리계 수용성 에칭 세정제로써 유리 표면에 증착된 TiO2, SiO2, ZnO3, Al, Sn, Ni 등을 생분해함으로써 유리 등 소재의 표면을 부식시키지 않으므로 생산성을 향상시킬 수 있고, 아울러 수용성이므로 환경오염을 방지할 수 있는 효과가 있다.
The cleaning agent according to the present invention does not corrode the surface of the glass material by biodegrading TiO 2 , SiO 2 , ZnO 3 , Al, Sn, Ni, etc. deposited on the glass surface as an alkaline water-soluble etching cleaner, , And is also water-soluble, so that environmental pollution can be prevented.

도 1은 본 발명에 따른 증착제거제의 제조방법을 나타낸 흐름도.BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flow chart showing a method for producing a deposition remover according to the present invention; FIG.

이하 본 발명의 바람직한 실시예를 첨부된 도면을 토대로 상세하게 설명하면 다음과 같다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

하기에서 설명될 실시예는 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자가 발명을 용이하게 실시할 수 있을 정도로 상세하게 설명하기 위한 것이며, 이로 인해 본 발명의 기술적인 사상 및 범주가 한정되는 것을 의미하지는 않는다.It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. It does not mean anything.

또한, 도면에 도시된 구성요소의 크기나 형상 등은 설명의 명료성과 편의상 과장되게 도시될 수 있으며, 본 발명의 구성 및 작용을 고려하여 특별히 정의된 용어들은 사용자, 운용자의 의도 또는 관례에 따라 달라질 수 있고, 이러한 용어들에 대한 정의는 본 명세서 전반에 걸친 내용을 토대로 내려져야 함을 밝혀둔다.
In addition, the sizes and shapes of the components shown in the drawings may be exaggerated for clarity and convenience of explanation, and the terms defined specifically in consideration of the configuration and operation of the present invention may vary depending on the intention or custom of the user, operator It should be noted that the definitions of these terms should be made on the basis of the contents throughout this specification.

첨부된 도 1은 본 발명에 따른 증착제거제의 제조방법을 나타낸 흐름도이다.
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flowchart illustrating a method of manufacturing a deposition remover according to the present invention. FIG.

도 1에 도시된 바와 같이, 본 발명에 따른 증착제거제의 제조방법은, 패널 소재 표면에 증착된 증착막을 제거하는 증착제거제의 제조방법에 있어서, 알칼리약품을 조성하는 1단계(S1); 고 비점 알코올을 조성하는 2단계(S2); 계면활성제를 조성하는 3단계(S3); 저 비점 알코올을 조성하는 4단계(S4); 상기 1단계(S1) 내지 4단계(S4)의 알칼리약품, 고 비점 알코올, 계면활성제, 저 비점 알코올과 물을 혼합하여 교반하는 5단계(S5);를 포함하여 구성된다.
As shown in FIG. 1, the method for producing a deposition eliminator according to the present invention comprises: a first step (S1) of forming an alkali chemical; A second step (S2) of forming a high boiling alcohol; (S3) of forming a surfactant; A fourth step (S4) of forming a low boiling alcohol; (S5) in which the alkali agent, the high boiling point alcohol, the surfactant, the low boiling point alcohol and the water of the first step (S1) to step (S4) are mixed and stirred.

각 단계를 보다 상세하게 설명하면 다음과 같다.
Each step will be described in more detail as follows.

1단계(S1) Step 1 (S1)

상기 알칼리약품은, The above-

수산화칼륨(Potassium Hydroxide; KOH), 수산화나트륨(Sodium hydroxide; NaOH), 메타규산소다(Sodium silicate, Pentahydratte; Na2O·SiO2 H2O), 액규산소다(Sodium silicate; NaO ·nSiO2H2O), 질산소다(Sodium nitrate; NaNO3), 불화소다(Sodium fluoride; NaF), 불화칼륨(Potassium fluoride; KF), 불화암몬(Ammonium hydrogen fluoride; NH4F), 유산소다(Sodium sulfate;Na2SO4·10H2O)로 이루어지는 군에서 선택된다.Potassium hydroxide (Potassium Hydroxide; KOH), sodium hydroxide (Sodium hydroxide; NaOH), metasilicate soda (Sodium silicate, Pentahydratte; Na 2 O · SiO 2 H 2 O), liquid sodium silicate (Sodium silicate; NaO · nSiO 2 H 2 O), sodium nitrate (NaNO 3 ), sodium fluoride (NaF), potassium fluoride (KF), ammonium hydrogen fluoride (NH 4 F), sodium sulfate Na 2 SO 4 .10H 2 O).

바람직하게는 상기 알칼리약품은 상기의 군에서 4개이상 선택되며, 5~30wt%로 조성된다. Preferably, the alkali agent is selected from four or more of the above-mentioned groups, and is composed of 5 to 30 wt%.

알칼리약품 조성비를 5wt%이하로 조성할 경우 에칭력이 크게 떨어지는 단점이 있다.When the alkali chemical composition ratio is 5 wt% or less, there is a disadvantage in that the etching power is significantly lowered.

반면에 알칼리약품 조성비가 32wt%이상인 경우에도 에칭력이 떨어질 뿐만 아니라 유리표면의 2차 가공된 인쇄부분의 손상이 발생하는 문제점이 있다.
On the other hand, when the alkali chemical composition ratio is more than 32 wt%, not only the etching power is lowered but also the secondary processed portion of the glass surface is damaged.

2단계(S2) Step S2 (S2)

상기 고 비점 알코올은 폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2)로 이루어지는 군에서 선택된다.The high boiling point alcohol may be polypropylene glycol (nC3H8O2), polyethylene glycol (Polyethylene glycol; HOCH 2 (CH 2 OCH 2 ) nCH 2 OH], and hexylene glycol (C 6 H 14 O 2 ).

바람직하게는 상기 고 비점 알코올은 상기의 군에서 3개 이상 선택되며, 40~10wt%로 조성된다.Preferably, the high boiling point alcohol is selected from three or more of the above-mentioned groups, and is composed of 40 to 10 wt%.

고 비점 알코올의 조성비를 40wt%이상으로 조성하는 것은 비 경제적인 단점이 있다.It is uneconomical to compose the composition ratio of high boiling alcohol to 40 wt% or more.

또한 고 비점 알코올의 조성비가 3wt%이하로 조성되는 경우에는 에칭력이 저하되는 문제점이 있다.
In addition, when the composition ratio of the high boiling point alcohol is 3 wt% or less, there is a problem that the etching power is lowered.

3단계(S3) Step S3 (S3)

계면활성제 0.1~10wt%를 조성한다. And 0.1 to 10 wt% of a surfactant.

계면활성제는 비이온 계면 활성제를 사용하고, 가장 적당한 것은 고급지방산(C12-C18)의 에틸렌 옥사이드부가(EO-5-16)의 글리콜형태를 사용 할 수 있다. Surfactants may be non-ionic surfactants, and the most suitable glycol form of ethylene oxide adducts of higher fatty acids (C12-C18) (EO-5-16) may be used.

계면활성제는 분해된 오염물질을 유화, 분산시키는 작용을 하며 사용량은 보통 0.1내지 10wt%가 적당하다.The surfactant acts to emulsify and disperse the degraded contaminants, and the amount of the surfactant is usually 0.1 to 10 wt%.

바람직하게는 계면활성제는 알킬폴리옥시 에텔에테르(Alkyl polyoxy ethylether)가 사용된다. Alkyl polyoxy ethyl ether is preferably used as the surfactant.

또한 계면활성제의 보조역할을 위한 보조제로서 모노에탄올아민(Monoethanolamine; H2NCH2CH2OH) 또는 트리에탄올아민(Triethanolamine; N(CH2CH2OH)3)이 포함된다.
Also included are monoethanolamine (H 2 NCH 2 CH 2 OH) or triethanolamine (N (CH 2 CH 2 OH) 3) as an adjuvant for the auxiliary role of the surfactant.

4단계(S4) Step S4 (S4)

저 비점 알코올인 에칠알콜(C2H5OH)과 메탄올(Methanol; CH3OH)을 각각 0.1~10wt%가 포함된다.0.1 to 10 wt% of ethoxylated alcohol (C2H5OH) and methanol (Methanol: CH3OH), which are low boiling point alcohols, are contained.

저 비점 알코올은 교반 후 수용액에 발생하는 수용액의 분리와 탁도를 제거하기 위하여 사용하게 된다.Low boiling alcohols are used to remove the turbidity and to separate the aqueous solution generated in the aqueous solution after stirring.

저 비점 알코올을 0.1wt%이하로 조성하는 경우에는 탁도가 여전히 발생하는 문제점이 야기되고, 반면 저 비점 알코올을 10wt%이상으로 조성하는 것은 비경제적이다.
When the low boiling point alcohol is used in an amount of 0.1 wt% or less, the turbidity still occurs. On the other hand, it is uneconomical to form the low boiling point alcohol in an amount of 10 wt% or more.

5단계(S5) Step 5 (S5)

상기 1단계 내지 4단계의 알칼리약품, 고 비점 알코올, 계면활성제, 저 비점 알코올과 물을 혼합한다.The alkali chemicals, high boiling point alcohols, surfactants, low boiling point alcohols and water are mixed with the above steps 1 to 4.

상기의 조성비를 혼합함에 있어서 반드시 40℃이하로 냉각시켜야 한다.When mixing the above composition ratios, it must be cooled to 40 ° C or lower.

이는 물과 수산화칼륨(Potassium Hydroxide; KOH), 수산화나트륨(Sodium hydroxide; NaOH), 메타규산소다(Sodium silicate, Pentahydratte; Na2O SiO2 H2O), 액규산소다(Sodium silicate; NaO nSiO2H2O), 질산소다(Sodium nitrate; NaNO3), 불화소다(Sodium fluoride; NaF), 불화칼륨(Potassium fluoride; KF), 불화암몬(Ammonium hydrogen fluoride; NH4F), 유산소다(Sodium sulfate;Na2SO4·10H2O)와 같은 알칼리약품을 혼합할 때 발생하는 열을 하강시켜서 고 비점 알코올인 폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2)의 혼합 시에 농도 및 색상의 변화를 방지하기 위해 반드시 냉각이 요구된다.
This water and potassium hydroxide (Potassium Hydroxide; KOH), sodium hydroxide (Sodium hydroxide; NaOH), metasilicate soda (Sodium silicate, Pentahydratte; Na 2 O SiO 2 H 2 O), liquid sodium silicate (Sodium silicate; NaO nSiO 2 H 2 O), sodium nitrate (NaNO 3 ), sodium fluoride (NaF), potassium fluoride (KF), ammonium hydrogen fluoride (NH 4 F), sodium sulfate ; Na 2 SO 4 · 10H 2 O) are mixed with a high boiling point alcohol such as polypropylene glycol (nC3H8O2), polyethylene glycol (Polyethylene glycol; HOCH 2 (CH 2 OCH 2) nCH 2 OH], hexylene glycol; a (Hexylene glycol C 6 H 14 O 2) must be cooled to prevent the change in color density and the time of mixing is required.

(실시예)(Example)

수산화칼륨(KOH)5wt%, 물50wt%, 메타규산소다(Na2OSiO2H2O)17wt%, 수산화나트륨(NaOH)5wt%, 질산소다(NaNO3)10wt%, 불화소다(NaF)0.1~5wt%, 불화칼륨(KF)0.5~20wt%, 폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2), 알킬 폴리 옥시 에텔에테르(Alkyl polyoxy ethylether)을 각각 3wt%씩, 5 wt% of potassium hydroxide (KOH), 50 wt% of water, 17 wt% of sodium metasilicate (Na 2 OSiO 2 H 2 O), 5 wt% of sodium hydroxide (NaOH), 10 wt% of sodium nitrate (NaNO 3 ) To 5 wt%, potassium fluoride (KF) 0.5 to 20 wt%, polypropylene glycol (nC 3 H 8 O 2 ), polyethylene glycol [polyethylene glycol] 3 wt% each of HOCH 2 (CH 2 OCH 2 ) nCH 2 OH], hexylene glycol (C 6 H 14 O 2 ) and alkyl polyoxyethylether,

계면활성제로서 알킬폴리옥시 에틸에테르(C12-C18)5wt% 및 5 wt% of alkyl polyoxyethyl ether (C 12 -C 18 ) as a surfactant and

에칠알콜(C2H5OH)과 메탄올(Methanol; CH3OH)을 각각 7 wt%를 상온에서 35℃로 냉각시키면서 충분히 교반하여 수용액의 분리와 탁도를 제거하였다.
7 wt% of ethyl alcohol (C 2 H 5 OH) and methanol (CH 3 OH) were stirred at room temperature and 35 ° C, respectively.

이러한 수용액과 종래에 사용하여 오던 세척법에 따라 물리적인 방법에 의하여 에칭력을 비교하여 보았고, 그 비교예는 다음과 같았다.
The etching powers of these aqueous solutions were compared by physical methods according to the conventional cleaning method, and comparative examples were as follows.

비교예1은 종래 기술에 의한 에칭이고, 비교예2는 본 발명에 의한 에칭이다.
Comparative Example 1 is etching according to the prior art, and Comparative Example 2 is etching according to the present invention.

비교예 1Comparative Example 1

기존 산성계열의 에칭제를 상온~40℃로 유지하고 유리소재를 침적 또는 스프레이 방법으로 10초~2분 에칭을 하였다. The existing acidic etchant was kept at room temperature ~ 40 ℃ and the glass material was etched for 10 seconds ~ 2 minutes by immersion or spray method.

수세 후 육안 검사 결과 소재의 표면에 부식이 발생되는 점을 발견하였다.
After washing with water, a visual inspection revealed that corrosion of the surface of the material occurred.

비교예 2Comparative Example 2

수산화칼륨(KOH)5wt%, 물50wt%, 메타규산소다(Na2OSiO2H2O)17wt%, 수산화나트륨(KOH)5wt%, 질산소다(NaNO3)10wt%, 불화소다(NaF)0.1~5wt%, 불화칼륨(KF)0.5~20wt%, 폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2), 알킬 폴리옥시 에텔에테르를 각각 3 wt%씩, 계면활성제로서 알킬폴리옥시 에틸에테르(Alkyl polyoxy ethylether)5wt% 및 에칠알콜(C2H5OH)과 메탄올(CH3OH)을 각각 7wt%를 혼합하여 본 발명에서 목적하는 알칼리계 증착제거제가 제조되었다.5 wt% of potassium hydroxide (KOH), 50 wt% of water, 17 wt% of sodium metasilicate (Na 2 OSiO 2 H 2 O), 5 wt% of sodium hydroxide (KOH), 10 wt% of sodium nitrate (NaNO 3 ) To 5 wt%, potassium fluoride (KF) 0.5 to 20 wt%, polypropylene glycol (nC 3 H 8 O 2 ), polyethylene glycol [polyethylene glycol] 3 wt% each of alkylene oxide, HOCH 2 (CH 2 OCH 2 ) nCH 2 OH], hexylene glycol (C 6 H 14 O 2 ) and alkyl polyoxyether ether, polyoxyethylether (5 wt%), and ethyl alcohol (C 2 H 5 OH) and methanol (CH 3 OH) were mixed in an amount of 7 wt% to prepare an alkali-based deposition remover of the present invention.

상기 본 발명에 따른 증착제거제 TiO2, SiO2, ZnO3, Al, Sn, Ni 등이 증착된 유리소재를 투입하여 1분~20분간 에칭 공정 후 세척과정을 거친 소재를 육안으로 검사한 결과 그 표면에 부식이 발생하지 않아 그만큼 생산성을 향상 시킬 수 있었다.The glass material deposited with the deposition remover TiO 2 , SiO 2 , ZnO 3 , Al, Sn, Ni and the like according to the present invention was put into the glass material, and the material subjected to the cleaning process after the etching process for 1 minute to 20 minutes was visually inspected. Corrosion on the surface did not occur, and the productivity was improved accordingly.

상기한 세정제는 수용성이여서 환경오염의 문제를 발생시키지는 않았다.
The detergent described above is water-soluble and does not cause environmental pollution.

비록 본 발명이 상기 언급된 바람직한 실시예와 관련하여 설명되어졌지만, 발명의 요지와 범위로부터 벗어남이 없이 다양한 수정 및 변형이 가능한 것은 당업자라면 용이하게 인식할 수 있을 것이며, 이러한 변경 및 수정은 모두 첨부된 청구의 범위에 속함은 자명하다.Although the present invention has been described in connection with the above-mentioned preferred embodiments, it will be apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit and scope of the invention, It is obvious that the claims fall within the scope of the claims.

S1 : 1단계 S2 : 2단계
S3 : 3단계 S4 : 4단계S1: Step 1 S2: Step 2
S3: Step 3 S4: Step 4

Claims (12)

패널 소재 표면에 증착된 증착막을 제거하는 증착제거제의 제조방법에 있어서,
알칼리약품을 조성하는 1단계;
고 비점 알코올을 조성하는 2단계;
계면활성제를 조성하는 3단계;
저 비점 알코올을 조성하는 4단계;
상기 1단계 내지 4단계의 알칼리약품, 고 비점 알코올, 계면활성제, 저 비점 알코올과 물을 혼합하여 교반하는 5단계;
를 포함하는 것을 특징으로 하는 증착제거제의 제조방법.A method for manufacturing a deposition eliminator for removing a deposited film deposited on a surface of a panel material,
Step 1 to form an alkaline chemical;
High boiling point alcohol;
A third step of preparing a surfactant;
Low boiling alcohol;
Mixing the alkali chemicals, the high boiling point alcohol, the surfactant, the low boiling point alcohol and water in the steps 1 to 4 and stirring the mixture;
≪ / RTI > 제 1항에 있어서,
상기 알칼리약품은,
수산화칼륨(Potassium Hydroxide; KOH), 수산화나트륨(Sodium hydroxide; NaOH), 메타규산소다(Sodium silicate, Pentahydratte; Na2O SiO2 H2O), 액규산소다(Sodium silicate; NaO nSiO2H2O), 질산소다(Sodium nitrate; NaNO3), 불화소다(Sodium fluoride; NaF), 불화칼륨(Potassium fluoride; KF), 불화암몬(Ammonium hydrogen fluoride; NH4F), 유산소다(Sodium sulfate;Na2SO4·10H2O)로 이루어지는 군에서 선택되는 것을 특징으로 하는 증착제거제의 제조방법.The method according to claim 1,
The above-
Potassium hydroxide (Potassium Hydroxide; KOH), sodium hydroxide (Sodium hydroxide; NaOH), metasilicate soda (Sodium silicate, Pentahydratte; Na 2 O SiO 2 H 2 O), liquid sodium silicate (Sodium silicate; NaO nSiO 2 H 2 O ), nitric acid soda (sodium nitrate; NaNO 3), fluoride soda (sodium fluoride; NaF), potassium fluoride (potassium fluoride; KF), fluoride Ammon (Ammonium hydrogen fluoride; NH 4 F), aerobic the (sodium sulfate; Na 2 SO 4揃 10H 2 O). 제 2항에 있어서,
상기 알칼리약품은 상기의 군에서 4개이상 선택되는 것을 특징으로 하는 증착제거제의 제조방법.3. The method of claim 2,
Wherein the alkaline agent is selected from the group consisting of four or more alkaline agents. 제 1항에 있어서,
상기 고 비점 알코올은
폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2)로 이루어지는 군에서 선택되는 것을 특징으로 하는 증착제거제의 제조방법.The method according to claim 1,
The high boiling alcohol
Polypropylene glycol (nC3H8O2), polyethylene glycol (Polyethylene glycol; HOCH 2 (CH 2 OCH 2 ) nCH 2 OH], and hexylene glycol (C 6 H 14 O 2 ). 제 4항에 있어서,
상기 고 비점 알코올은 상기의 군에서 3개 이상 선택되는 것을 특징으로 하는 증착제거제의 제조방법.5. The method of claim 4,
Wherein at least three of the high boiling alcohols are selected from the above group. 제 1항에 있어서,
상기 계면활성제는 알킬폴리옥시 에텔에테르(Alkyl polyoxy ethylether)인 것을 특징으로 하는 증착제거제의 제조방법.The method according to claim 1,
Wherein the surfactant is an alkyl polyoxy ethyl ether. ≪ RTI ID = 0.0 > 11. < / RTI > 제 1항에 있어서,
상기 계면활성제의 보조제로서 모노에탄올아민(Monoethanolamine; H2NCH2CH2OH) 또는 트리에탄올아민(Triethanolamine; N(CH2CH2OH)3) 중 택일되는 것을 특징으로 하는 증착제거제의 제조방법.The method according to claim 1,
Wherein the surfactant is selected from monoethanolamine (H 2 NCH 2 CH 2 OH) or triethanolamine (N (CH 2 CH 2 OH) 3) as an auxiliary agent for the surfactant. 제 1항 내지 제 7항 중 어느 한 항에 기재된 제조방법에 의해 제조되는 것으로,
알칼리약품 5~30wt%, 물 35~59.7wt%, 고 비점 알코올 3~35wt%, 계면활성제 0.1~10wt%, 저 비점 알코올인 에칠알콜(C2H5OH)과 메탄올(CH3OH)이 각각 0.1~10wt%가 혼합되어 이루어진 것을 특징으로 하는 증착제거제.A process for producing a semiconductor device, which is produced by the manufacturing method according to any one of claims 1 to 7,
(C 2 H 5 OH) and methanol (CH 3 OH), which are low boiling point alcohols, are added to the reaction mixture in an amount of 5 to 30 wt% of an alkali agent, 35 to 59.7 wt% of water, 3 to 35 wt% of a high boiling alcohol, And 0.1 to 10 wt%, respectively. 제 8항에 있어서,
상기 알칼리약품은,
수산화칼륨(Potassium Hydroxide; KOH), 수산화나트륨(Sodium hydroxide; NaOH), 메타규산소다(Sodium silicate, Pentahydratte; Na2O SiO2 H2O), 액규산소다(Sodium silicate; NaO nSiO2H2O), 질산소다(Sodium nitrate; NaNO3), 불화소다(Sodium fluoride; NaF), 불화칼륨(Potassium fluoride; KF), 불화암몬(Ammonium hydrogen fluoride; NH4F), 유산소다(Sodium sulfate;Na2SO4·10H2O)로 이루어지는 군에서 선택되는 것을 특징으로 하는 증착제거제.9. The method of claim 8,
The above-
Potassium hydroxide (Potassium Hydroxide; KOH), sodium hydroxide (Sodium hydroxide; NaOH), metasilicate soda (Sodium silicate, Pentahydratte; Na 2 O SiO 2 H 2 O), liquid sodium silicate (Sodium silicate; NaO nSiO 2 H 2 O ), nitric acid soda (sodium nitrate; NaNO 3), fluoride soda (sodium fluoride; NaF), potassium fluoride (potassium fluoride; KF), fluoride Ammon (Ammonium hydrogen fluoride; NH 4 F), aerobic the (sodium sulfate; Na 2 SO 4 · 10H 2 O). 제 8항에 있어서,
상기 고 비점 알코올은
폴리프로필렌글리콜(Polypropylene glycol; nC3H8O2), 폴리에칠렌글리콜[Polyethylene glycol; HOCH2(CH2OCH2)nCH2OH], 헥실렌글리콜(Hexylene glycol; C6H14O2)로 이루어지는 군에서 선택되는 것을 특징으로 하는 증착제거제.9. The method of claim 8,
The high boiling alcohol
Polypropylene glycol (nC3H8O2), polyethylene glycol (Polyethylene glycol; HOCH 2 (CH 2 OCH 2 ) nCH 2 OH], and hexylene glycol (C 6 H 14 O 2 ). 제 8항에 있어서,
상기 계면활성제는 알킬폴리옥시 에텔에테르(Alkyl polyoxy ethylether)인 것을 특징으로 하는 증착제거제.9. The method of claim 8,
Wherein the surfactant is an alkyl polyoxy ethyl ether. 제 8항에 있어서,
상기 계면활성제의 보조제로서 모노에탄올아민(Monoethanolamine; H2NCH2CH2OH) 또는 트리에탄올아민(Triethanolamine; N(CH2CH2OH)3) 중 택일되는 것을 특징으로 하는 증착제거제.9. The method of claim 8,
Wherein the surfactant is selected from monoethanolamine (H 2 NCH 2 CH 2 OH) or triethanolamine (N (CH 2 CH 2 OH) 3) as an auxiliary agent for the surfactant.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200007584A (en) * 2018-07-13 2020-01-22 솔브레인 주식회사 Composition for cleaning mask and method for cleaning mask using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200007584A (en) * 2018-07-13 2020-01-22 솔브레인 주식회사 Composition for cleaning mask and method for cleaning mask using the same

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