KR20140103742A - Dust collector - Google Patents

Dust collector Download PDF

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Publication number
KR20140103742A
KR20140103742A KR1020130017596A KR20130017596A KR20140103742A KR 20140103742 A KR20140103742 A KR 20140103742A KR 1020130017596 A KR1020130017596 A KR 1020130017596A KR 20130017596 A KR20130017596 A KR 20130017596A KR 20140103742 A KR20140103742 A KR 20140103742A
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South Korea
Prior art keywords
cleaning liquid
main body
injection nozzle
gas
discharged
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KR1020130017596A
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Korean (ko)
Inventor
홍은표
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(주)씨앤지테크
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Priority to KR1020130017596A priority Critical patent/KR20140103742A/en
Publication of KR20140103742A publication Critical patent/KR20140103742A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2247/00—Details relating to the separation of dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D2247/08—Means for controlling the separation process

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Separation Of Particles Using Liquids (AREA)

Abstract

The present invention relates to a washing machine having a tubular shape in which a cleaning liquid is stored, a main body having a gas inlet hole through which gas containing contaminants from the outside is introduced from the outside and a gas outlet hole through which the gas cleaned by the cleaning liquid is discharged to the outside, A first injection nozzle connected to the inside of the main body so as to have a tubular shape rounded upward so that the other end faces the lower portion of the main body and to discharge the gas introduced into the gas inflow hole to the surface of the cleaning liquid, A first obstruction plate for causing a cleaning liquid in a droplet state to be scattered by a gas injected and discharged through the first injection nozzle to collide with each other, And discharges the gas moving after being discharged through the first injection nozzle to the surface of the cleaning liquid again A second baffle plate connected to the inside of the main body to cause a cleaning liquid in a droplet state to be scattered by the gas sprayed and discharged through the second baffle nozzle to collide with the second baffle plate; And a controller for controlling the level of the cleaning liquid in the main body so as to adjust the level of the cleaning liquid in the main body, the main body being connected to one side of the main body to remove remaining contaminants and droplet state cleaning liquid from the gas and droplet state cleaning liquid, The present invention also provides a water-based cleaning and dust collecting apparatus comprising:

Description

Dust collector Dust collector

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a washing type washing and dust collecting apparatus, and more particularly, to a washing type washing and collecting apparatus for removing dust and harmful substances from air and gas discharged from an incinerator or an industrial site.

In general, hazardous gases and dusts generated from industrial sites or incinerators cause not only environmental pollution but also fatal diseases when they are absorbed into the human body through air. Therefore, a dust collecting device for removing contaminants and dust contained in gas and air is used do.

In addition, the dust collecting apparatus is divided into a dry dust collecting apparatus and a wet dust collecting apparatus. The dry separating apparatus uses a filter to remove dust and harmful substances contained in the air. However, the structure is simple, There is a low problem. In comparison, the wet type dust collecting device is mainly used in recent years by spraying water and removing the harmful gas and dust by colliding with the dust.

Such a wet type dust collecting apparatus for spraying water and coagulating and removing noxious gas and dust is disclosed in Korean Patent Registration No. 0312816 and Korean Utility Model No. 0204943.

However, in the conventional wet type dust collecting apparatus, a spray nozzle facility for fine spraying of a cleaning liquid for agglomerating noxious gas and dust is used, so that the spray nozzle facility is clogged by sludge when used for a long time, . In addition, since a rotary driving facility for forming an oil film is required when spraying a cleaning liquid by a spray nozzle facility, there is a problem that a facility maintenance cost is increased.

In order to solve such a problem, the present applicant has proposed a cleaning dust collecting apparatus for Korean Patent No. 0745810. [

However, since the cleaning dust collecting device is sprayed and discharged through an orifice formed in one gas inlet pipe, pollutants in the gas due to the swirling flow of the cleaning liquid generated between the impingement plates are absorbed. At this time, So that the pollutant treatment efficiency is lowered.

SUMMARY OF THE INVENTION An object of the present invention is to provide a water-washing cleaning and dust collecting apparatus capable of increasing the dust collecting efficiency with respect to a gas containing contaminants.

The present invention relates to a washing machine having a tubular shape in which a cleaning liquid is stored, a gas inflow hole through which a gas containing a contaminant flows from the outside, and a gas discharge hole for discharging the gas cleaned by the cleaning liquid to the outside, A first injection part connected to the inside of the main body so as to have a tubular shape rounded upward so that one end and the other end face the lower part of the main body respectively and to discharge the gas introduced into the gas inflow hole to the surface of the cleaning liquid, A first disturbing plate connected to the inside of the main body and configured to cause the cleaning liquid in a droplet state to be scattered by the gas sprayed and discharged through the first spray nozzle to collide with one another; The first injection nozzle is connected to the inside of the main body in a state of having a tubular shape rounded upward upwardly, And a second spray nozzle connected to the inside of the main body for spraying and discharging the gas moving back to the surface of the cleaning liquid again after being discharged from the second spray nozzle, A second obstruction plate for causing the cleaning liquid of the droplet state cleaning liquid to collide with a gas and a droplet state cleaning liquid which is installed in the main body and which is not collided with the second obstruction plate after being discharged from the second injection nozzle, And a water level adjusting unit installed at one side of the main body to adjust the level of the cleaning liquid in the main body.

The lower end of the main body may have a venturi shape, and a drain nozzle may be formed at a lower end of the main body so as to discharge pollutants settled in the cleaning liquid to the outside after being separated from the gas.

In addition, the first injection nozzle and the second injection nozzle are coupled and supported in the body so as to be connected to each other, and the gas introduced from the gas inlet hole is connected to the first injection nozzle A guide wall for sequentially moving the second injection nozzle from the second injection nozzle to the demister may be coupled to the second injection nozzle.

One end of the first injection nozzle into which the gas is introduced and one end of the second injection nozzle may be disposed below the other end of the first injection nozzle from which the gas is discharged and below the other end of the second injection nozzle have.

In addition, the first injection nozzle may be formed to have a smaller diameter from one end to the other end, and the second injection nozzle may have a larger diameter from one end to the other end.

In addition, one end of the first injection nozzle and one end of the second injection nozzle may be locked to the cleaning liquid in the main body.

The water level adjusting portion is divided into a cleaning liquid supply space and a cleaning liquid discharge space by partition walls provided therein, and each of the cleaning liquid supply space and the cleaning liquid discharge space communicates with the lower end of the main body. And a supply control valve for regulating the supply amount of the cleaning liquid is provided at one end of the cleaning liquid supply space, the supply control valve being connected to the cleaning liquid supply space of the level control case so as to supply the cleaning liquid supplied from the outside to the main body. A supply water level control buoyancy valve connected to the supply control valve and operating the supply control valve while lifting and lowering in accordance with the buoyancy of the cleaning liquid supplied to the cleaning liquid supply space, And is vertically penetrated into the cleaning liquid discharge space of the level control case, And a cleaning liquid discharge control pipe for discharging the cleaning liquid stored in the discharge space to the outside of the water level control case.

In addition, the cleaning liquid discharge control pipe may be screwed into the water level control case so as to adjust the vertical position, thereby adjusting the position of the upper surface of the water level control case to adjust the discharge amount of the cleaning liquid in the cleaning liquid discharge space .

In the wet type cleaning and dust collecting apparatus according to the present invention, after the gas containing the pollutant is injected into the cleaning liquid in the main body through the first injection nozzle, the pollutant is removed by the swirl of the cleaning liquid sprayed in the droplet state, The gas is again injected into the cleaning liquid in the main body through the second injection nozzle, and the cleaning liquid and the gas are mixed with each other in the droplet state, and the contaminants in the gas are removed again. Therefore, the pollutant removal efficiency with respect to the gas containing the pollutant is increased.

1 is an overall cross-sectional view of a water-based cleaning and dust collecting apparatus according to an embodiment of the present invention.
Fig. 2 is a cleaning dust collecting state of Fig. 1. Fig.
3 is an enlarged cross-sectional view of the water level adjusting portion shown in Fig.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to the preferred embodiments of the present invention, examples of which are illustrated in the accompanying drawings.

FIG. 1 is an overall sectional view of a water washing type washing and collecting apparatus according to an embodiment of the present invention, and FIG. 2 is a washing and collecting state in FIG. 1. 1 and 2, the fluid type cleaning and collecting apparatus includes a main body 100, a first injection nozzle 200, a first obstruction plate 300, a second injection nozzle 400, a second obstruction plate 500, a demister 600, and a water level controller 700.

The main body 100 is a space portion in which a cleaning operation for removing contaminants from the gas is performed while a cleaning liquid for removing contaminants from the contaminated gas flowing from the outside is stored. The main body 100 has a cylindrical shape in which the space for the gas to be supplied from the outside can be stored while storing the cleaning liquid, and the lower end can easily collect the contaminants deposited after being separated from the gas As shown in Fig. A drain nozzle 130 is connected to the lower portion of the main body 100 to allow the pollutants precipitated with the cleaning liquid to be selectively discharged to the outside of the main body 100.

A gas inlet hole 110 is formed at one side of the main body 100 to receive the gas containing contaminants from the outside. The gas inlet hole 110 is connected to an external line for sucking and moving the gas containing contaminants. In addition, a gas discharging hole 120 is formed at one side of the main body 100 for discharging the gas, which has been cleaned in the main body 100 after the cleaning process, to the outside of the main body 100.

An operator may enter the main body 100 to replace the demister 600 or the inner wall of the main body 100 and the first injection nozzle 200, A manhole 150 for cleaning the first obstruction plate 300, the second injection nozzle 400, and the second obstruction plate 500 may be formed.

A guide wall 140 is coupled to the main body 100 to connect the first injection nozzle 200 and the second injection nozzle 400 to be installed in the main body 100 to be described later. The guide wall 140 guides the first injection nozzle 200 and the second injection nozzle 400, which will be described later, sequentially to the inside of the main body 100 through the gas inlet hole 110 And guides the gas discharged from the second injection nozzle 400 to the demister 600 in a sequential manner.

The first injection nozzle 200 injects the gas containing contaminants introduced from the outside through the gas inflow hole 110 into the cleaning liquid in the main body 100 and discharges the contaminants in the gas to the primary . The first injection nozzle 200 is connected to the inside of the main body 100 by the guide wall 140 described above. Here, the first injection nozzle 200 is formed in a tubular shape rounded upward.

At this time, the gas is introduced through one longitudinal end 201 of the first injection nozzle 200 and then discharged again through the other end 202 in the longitudinal direction. One end 201 of the first injection nozzle 200 And the other end 202 are formed to face the lower portion of the main body 100, respectively. In addition, one end (201) of the first injection nozzle (200) may be arranged to be locked to the cleaning liquid in the main body (100). Since the one end 201 of the first injection nozzle 200 is locked in the cleaning liquid, the gas introduced into the main body 100 through the gas inflow hole 110 flows into the first injection nozzle 200 so that the cleaning liquid can be scattered into the first injection nozzle 200 in a droplet state. By forming the first injection nozzle 200 in a round shape, the cleaning liquid in a droplet state, which is scattered through the inside of the first injection nozzle 200, moves in a vortex state. As a result, The cleaning efficiency becomes higher.

The first injection nozzle 200 may be formed to have a smaller diameter from one end 201 to the other end 202 in the longitudinal direction. Accordingly, the first injection nozzle 200 allows the gas, which is introduced through the one end 201 and discharged through the other end 202, to be jetted and discharged to the surface of the cleaning liquid contained in the main body 100 at high speed.

The gas introduced into the main body 100 through the gas inlet hole 110 flows into the main body 100 through the first end 201 of the first injection nozzle 200, The contaminants are primarily removed while being in contact with the cleaning liquid stored in the main body 100 at the time of discharging through the other end simultaneously with the cleaning by the movement.

The first obstruction plate 300 collides the cleaning liquid of a droplet scattered by the gas injected into and discharged from the cleaning liquid in the main body 100 through the first injection nozzle 200. That is, the first obstruction plate 300 suppresses the scattering of the cleaning liquid in the droplet state by the gas discharged from the first injection nozzle 200. The first obstruction plate 300 may be provided with a first obstruction nozzle 200 and a second obstruction nozzle 200. The first obstruction plate 300 may be provided with a first injection nozzle 200, (100) so as to be adjacent to the other end (202) of the main body (200). The first obstruction plate 300 is installed to be disposed between the first injection nozzle 200 and a second injection nozzle 400 to be described later, (100), and the lower end is disposed to be locked to the cleaning liquid in the main body (100). The gas ejected through the other end 202 of the first injection nozzle 200 is guided by the guide wall 140 and the second obstruction plate 300, As shown in FIG.

Here, the latching part 301 may be bent at the upper end of the first obstruction plate 300. After the gas and droplet of the cleaning liquid injected from the other end 202 of the first injection nozzle 200 collide with each other, the catching portion 301 and the gas-containing contaminant Is flowed into the cleaning liquid in the main body (100) through the first obstruction plate (300).

The second injection nozzle 400 injects and discharges the gas injected and discharged through the first injection nozzle 200 into the cleaning liquid in the main body 100 to remove secondary contaminants in the gas . The second injection nozzle 400 is connected to the inside of the main body 100 by the guide wall 140 described above. Here, the second injection nozzle 400 is formed in a tubular shape rounded upward like the first injection nozzle 200 described above.

The gas is introduced through one end 401 of the second injection nozzle 400 in the longitudinal direction and then discharged again through the other end 402 in the longitudinal direction. One end 401 of the second injection nozzle 400 And the other end 402 are formed to face the lower portion of the main body 100, respectively. In addition, one end 401 of the second injection nozzle 400 may be arranged to be locked to the cleaning liquid in the main body 100. Since the one end 401 of the second injection nozzle 400 is locked in the cleaning liquid, the gas discharged through the first injection nozzle 200 is discharged to one end of the second injection nozzle 400 401, the cleaning liquid can be scattered into the second injection nozzle 400 in a droplet state. As the second injection nozzle 400 is formed in a round shape, the cleaning liquid in a droplet state moving in a scattering manner through the inside of the second injection nozzle 400 moves in a vortex state, thereby increasing the connection rate with the gas. The cleaning efficiency becomes higher.

The second injection nozzle 400 may be formed to have a larger diameter from one end 401 to the other end 402 in the longitudinal direction. Accordingly, the second injection nozzle 200 flows into the interior of the second injection nozzle 201 through the one end 201, and then moves to the other end 202 at a high speed.

The gas ejected through the first injection nozzle 200 is cleaned by the cleaning liquid in the droplet state at the time of inflow into the inside through one end 401 of the second injection nozzle 400, The contaminants are secondarily removed while being in contact with the cleaning liquid stored in the main body 100.

One end 201 of the first injection nozzle 200 and one end 401 of the second injection nozzle 400 are disposed in the same horizontal position so that the same And can be placed in a locked state.

The second obstruction plate 500 is a plate member coupled to the inside of the main body 100. The second obstruction plate 500 collides against the cleaning liquid in the main body 100 while being jetted at high speed through the second injection nozzle 400, The contaminants in the gaseous body and the droplet state cleaning liquid are granulated again to descend with the cleaning liquid downward to collapse the contaminants in the gas while causing the gas and the cleaning liquid in the droplet state to collide with each other.

One end of the second obstruction plate 500 is fixedly coupled to the inside of the main body 100 so as to be disposed above the second injection nozzle 400, So that it can be freely dropped downward.

The demister 600 is a filter portion that removes residual contaminants and droplet state cleaning liquid contained in the gas in a cleaning liquid in a gas and droplet state that has not collided with the second obstruction plate 500. The demister 600 may be disposed above the second obstruction plate 500, that is, between the second obstruction plate 500 and the gas exhaust hole 120 of the body 100, As shown in Fig.

The water level adjusting unit 700 is connected to one side of the lower end of the main body 100 to adjust the level of the washing liquid stored in the main body 100. That is, the water level controller 700 supplies clean cleaning liquid from the outside to the inside of the main body 100 to maintain a predetermined level of water, and when the cleaning liquid in the main body 100 reaches a predetermined level or more, To be discharged to the outside. 3, the water level control unit 700 includes a water level control case 710, a cleaning liquid supply control pipe 720, a supply water level control buoyancy port 730, and a cleaning liquid discharge control pipe 740.

The water level control case 710 is connected to the lower end of the main body 100 to supply the cleaning liquid from the outside to the inside of the main body 100 at a predetermined water level, So as to be discharged. The water level control case 710 is divided into a cleaning liquid supply space 712 and a cleaning liquid discharge space 713 by partition walls 711 provided therein. Here, the cleaning liquid supply space 712 receives clean cleaning liquid from the outside to allow the cleaning liquid to flow into the main body 100, and the cleaning liquid discharge space 713 supplies the cleaning liquid contaminated in the main body 100 To be discharged to the outside. Therefore, the cleaning liquid supply space 712 and the cleaning liquid discharge space 713 are connected to the lower end of the main body 100, respectively.

The cleaning liquid supply regulating pipe 720 is a pipe for supplying clean external cleaning liquid to the cleaning liquid supply space 712 of the level control case 710. That is, the cleaning liquid supply control pipe 720 supplies the cleaning liquid supplied from the outside to the main body 100. The cleaning liquid supply control pipe 720 is coupled to the level control case 710 such that one end of the cleaning liquid supply control pipe 720 is positioned inside the cleaning liquid supply space 712 while being connected to an external cleaning liquid storage tank (not shown). A supply control valve 721 for controlling the supply amount of the cleaning liquid flowing into the cleaning liquid supply space 712 is mounted at one end of the cleaning liquid supply control line 720 located inside the cleaning liquid supply space 712 Respectively.

The supply water level control buoyancy port 730 may be opened and closed by locking the supply control valve 721 when the cleaning liquid is supplied to the inside of the cleaning liquid supply space 712 of the water level control case 710 at a predetermined water level, Thereby cutting off the supply of the cleaning liquid through the liquid line 720. That is, the supply water level control buoyancy port 730 automatically closes the cleaning liquid supply control line 720 when the cleaning liquid is within a predetermined level in the main body 100. The supply water leveling buoyancy port 730 is inserted into the rinsing liquid supply space 712 of the level control case 710 while being connected to the supply control valve 721. Therefore, the supply water level control buoyancy port 730 is lifted or lowered by buoyancy depending on the level of the cleaning liquid supplied into the cleaning liquid supply space 712, and when the liquid level control valve 721 is lifted or lowered, The control valve 720 is brought into the locked state while the cleaning liquid supply control pipe 720 by the supply control valve 721 is opened when the liquid is supplied.

The cleaning liquid discharge control pipe 740 discharges the cleaning liquid stored in the cleaning liquid discharge space 713 to the outside of the level control case 710. That is, the cleaning liquid discharge control pipe 740 discharges the cleaning liquid in the main body 100 to the outside. The cleaning liquid discharge control pipe 740 is vertically penetrated into the cleaning liquid discharge space 713 of the level control case 710 so that the other end thereof is disposed outside. At this time, the cleaning liquid discharge control pipe 740 is screwed into the water level control case 710 in a penetrating manner so as to adjust the vertical position. Therefore, the cleaning liquid discharge control pipe 740 is disposed inside the cleaning liquid discharge space 713, that is, inside the main body 100, while adjusting the position of the upper end on the cleaning liquid discharge space 713 of the water level control case 710. [ The amount of the cleaning liquid can be controlled. That is, when the upper end of the cleaning liquid discharge control pipe 740 moves downward, the discharge amount of the cleaning liquid in the main body 100 increases, and when the upper end of the cleaning liquid discharge control pipe 740 moves upward, 100) is relatively small.

The cleaning liquid supplied to the cleaning liquid supply space 712 of the level control case 710 by the cleaning liquid supply control pipe 720 is supplied to the cleaning liquid supply opening 712 by the supply control valve 721 And is continuously supplied into the main body 100 until the state of the main body 100 is reached. The cleaning liquid in the main body 100 flows into the cleaning liquid discharge space 713 of the water level control case 710 and then discharged to the outside until the liquid level is lower than the upper end of the cleaning liquid discharge control pipe 740 The cleaning liquid in the main body 100 can always maintain a constant water level.

The operation of the water-jet cleaning and dust collecting apparatus according to one embodiment of the present invention will now be described with reference to FIGS. 1 to 3. FIG.

The cleaning liquid stored in the main body 100 is continuously supplied to the inside of the main body 100 from the outside through the cleaning liquid supply control pipe 720. At this time, And a part of one end 401 of the second injection nozzle 400 is kept locked.

If one end 201 of the first injection nozzle 200 and one end 401 of the second injection nozzle 400 are not immersed in the cleaning liquid in the main body 100, The upper end of the cleaning liquid discharge control pipe 740 is moved upward. Thereafter, when one end 201 of the first injection nozzle 200 and one end 401 of the second injection nozzle 400 are locked in the cleaning liquid in the main body 100, the gas inlet holes 110 So that the contaminated gas can be introduced into the main body 100.

The gas introduced into the main body 100 through the gas inflow hole 110 first contacts the surface of the cleaning liquid in the main body 100 to partially remove contaminants, So that the contaminants are once again removed from the washing liquid in the main body 100. At this time, the cleaning liquid moves in the droplet state together with the gas into the first injection nozzle 200. In the droplet state, the cleaning liquid and the gas swirl in the first injection nozzle 200 So that the removal efficiency of the contaminants in the gas by the cleaning liquid in the droplet state is increased. Here, when the level of the cleaning liquid on one end 201 side of the first injection nozzle 200 is lowered by the pressure of the gas introduced through the gas inlet hole 110, the first spray nozzle 200 The gas discharged through the other end 202 of the first injection nozzle 200 is moved into the cleaning liquid in the main body 100 and the surface of the cleaning liquid while the water level on the other end 202 of the cleaning liquid 200 rises, Contact is made.

The gas, which is out of the cleaning liquid flow in a droplet state that generates a vapors in the first injection nozzle 200, is guided to move upward by the first baffle 300 and then move downward again. In the meantime, some of the droplet state cleaning liquid and the gas again come into contact with the cleaning liquid in the main body 100, and contaminants in the gas are removed.

In this way, the cleaning liquid and the base in the droplet state guided by the first obstruction plate 300 are injected and discharged again into the cleaning liquid in the main body 100 through the second injection nozzle 400, The material is removed.

Here, the pressure of the gas exhausted through the first injection nozzle 200 before the gas is injected into the cleaning liquid in the main body 100 again through the second injection nozzle 400, When the level of the cleaning liquid on the one end 401 side of the injection nozzle 400 is lowered, the water level on the other end 402 of the second injection nozzle 400 rises and the other end of the second injection nozzle 400 The gas discharged through the discharge port 402 may collide with the inside of the cleaning liquid in the main body 100 and the surface of the cleaning liquid so that efficient contact is achieved.

In this way, the gas discharged through the second injection nozzle 400 is re-contacted with the cleaning liquid in the main body 100, and the contaminant in the gas and the liquid state cleaning liquid are removed again. Then, the cleaning liquid injected by the gas discharged through the second injection nozzle 400 collides with the inner wall of the main body 100 and becomes a droplet state.

In this way, the cleaning liquid, which has collided with the inner wall of the main body 100 to be in a droplet state, again absorbs and removes contaminants in the gas while contacting the gas, and after being sprayed from the second injection nozzle 400, The cleaning liquid in the state of droplet striking the inner wall of the chamber 100 forms a vortex and absorbs contaminants in the gas again.

Thus, the gas, which is out of the vortex formed by the cleaning liquid in the droplet state generated while being discharged from the second injection nozzle 400, moves upward and collides with the second obstruction plate 500, The contaminants of the gas and the droplets of the cleaning liquid on the surface of the substrate 500 are granulated and then dropped into the cleaning liquid in the lower body 100 to be removed.

Thereafter, the contaminants in the gas and the cleaning liquid in a droplet state that have not been removed by the second obstruction plate 500 are finally removed by the demister 600, and then, through the gas exhaust hole 120 And the discharged gas is discharged in a purified gas state.

The contaminants that have flowed into the cleaning liquid in the main body 100 and settled on the bottom of the main body 100 are discharged to the outside of the main body 100 through the drain nozzle 130. Since the cleaning liquid in the main body 100 is not higher than the predetermined level by the level controller 700, the upper portion of the cleaning liquid in the main body 100 is always cleaned by the clean cleaning liquid continuously flowing from the outside. State can be maintained.

As described above, in the wet scrubbing and dust collecting apparatus of the embodiment, when the gas containing contaminants through the first spray nozzle 200 is sprayed into the cleaning liquid in the main body 100, The contaminants are removed by the vortex movement of the main body 100 and the contaminants due to the collision with the cleaning liquid are removed first after the contaminants are removed and the gas is again introduced into the main body 100 through the second injection nozzle 200 The cleaning liquid and the gas are mixed with each other in a droplet state while spraying and discharging into the cleaning liquid, and the contaminants in the gas are removed again. Accordingly, the pollutant removal efficiency with respect to the gas containing the pollutant is increased.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

100: Body 110: Gas inflow hole
120: gas discharge hole 130: drain nozzle
140: Guide wall 200: First injection nozzle
300: first obstruction plate 400: second injection nozzle
500: second disturbance plate 600: demister
700:

Claims (8)

A main body having a tubular shape in which a cleaning liquid is stored, a gas inlet hole through which a gas containing contaminants flows from the outside, and a gas discharge hole through which the gas cleaned by the cleaning liquid is discharged to the outside;
A first injection nozzle connected to the interior of the body so as to have a tubular shape rounded upward so that one end and the other end face the lower portion of the main body, respectively, for spraying and discharging the gas introduced into the gas inflow hole to the surface of the cleaning liquid; and;
A first obstruction plate connected to the inside of the main body and causing the cleaning liquid in a droplet state to be scattered by the gas injected and discharged through the first injection nozzle to collide with the first obstruction plate;
The first and second nozzles being connected to the inside of the main body in a state of having a tubular shape rounded upward so as to face the bottom of the main body respectively, A second injection nozzle for injecting and discharging the fuel;
A second baffle plate connected to the inside of the main body to cause the cleaning liquid in a droplet state to be scattered by the gas injected and discharged through the second injection nozzle to be collided;
And removing the remaining contaminants and the droplet state cleaning liquid from the gas and droplet state cleaning liquid which is installed in the main body and does not collide with the second obstruction plate after being discharged from the second injection nozzle; And
And a water level adjuster connected to one side of the main body to adjust a level of the cleaning liquid in the main body. The method according to claim 1,
The lower end of the body has a venturi shape,
And a drain nozzle for discharging contaminants settled in the cleaning liquid to the outside after being separated from the gas is formed in a lower end portion of the main body. The method according to claim 1,
Wherein the first injection nozzle and the second injection nozzle are coupled to each other so as to be connected to the inside of the body, and the gas introduced from the gas inlet hole is connected to the second injection nozzle, And a guide wall for guiding the droplets to be sequentially moved to the demister from the second injection nozzle after the droplet is moved to the injection nozzle. The method according to claim 1,
One end of the first injection nozzle into which the gas is introduced and one end of the second injection nozzle are connected to the other end of the first injection nozzle through which the gas is discharged and the other end of the second injection nozzle, Device. The method according to claim 1 or 4,
The first injection nozzle is formed so that its diameter decreases from one end toward the other end,
And the second injection nozzle is formed so that its diameter increases from one end toward the other end. The method according to claim 1 or 4,
Wherein one end of the first injection nozzle and one end of the second injection nozzle are disposed so as to be locked to the cleaning liquid in the main body. The method according to claim 1,
The level-
A cylindrical water level adjusting case which is partitioned into a cleaning liquid supply space and a cleaning liquid discharge space by barrier ribs provided inside, and each of the cleaning liquid supply space and the cleaning liquid discharge space communicates with a lower end of the main body;
And a supply control valve for controlling the supply amount of the cleaning liquid is mounted at one end of the cleaning liquid supply space, the supply control valve being connected to the cleaning liquid supply space of the level control case so as to supply the cleaning liquid supplied from the outside to the main body A cleaning liquid supply regulating pipe,
A supply water level adjusting buoy valve connected to the supply control valve and operating the supply control valve while lifting and lowering in accordance with the buoyancy of the cleaning liquid supplied to the cleaning liquid supply space,
And a cleaning liquid discharge control pipe vertically penetrated through the cleaning liquid discharge space of the level control case to discharge the cleaning liquid stored in the cleaning liquid discharge space to the outside of the water level control case. The method of claim 7,
The cleaning liquid discharge control pipe is screwed into the water level control case so as to adjust the vertical position so as to adjust the position of the upper end of the water level control case and to regulate the discharge amount of the cleaning liquid in the cleaning liquid discharge space. Device.

KR1020130017596A 2013-02-19 2013-02-19 Dust collector KR20140103742A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106582157A (en) * 2015-10-16 2017-04-26 安徽华尔泰化工股份有限公司 Device for removing dust after synthesis ammonia raw material gas fine desulfurization
KR101883658B1 (en) * 2018-05-29 2018-08-29 (주)씨앤지테크 High-efficiency microbubble wet type dust collecting apparatus
CN108465299A (en) * 2017-02-23 2018-08-31 西恩基株式会社 Vortex patern cleans dust collect plant
KR20180111152A (en) * 2017-03-31 2018-10-11 (주)씨앤지테크 Vortex type wet scrubber
KR20190044930A (en) * 2017-10-23 2019-05-02 김현순 Wet-type fine dust collector
CN110102152A (en) * 2019-06-20 2019-08-09 傅金凤 Water-soluble organic exhaust gas absorption tower
CN113426192A (en) * 2021-05-10 2021-09-24 唐林 Nano copper powder preparation, filtration and collection device for electronic paste

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106582157A (en) * 2015-10-16 2017-04-26 安徽华尔泰化工股份有限公司 Device for removing dust after synthesis ammonia raw material gas fine desulfurization
CN108465299A (en) * 2017-02-23 2018-08-31 西恩基株式会社 Vortex patern cleans dust collect plant
KR20180111152A (en) * 2017-03-31 2018-10-11 (주)씨앤지테크 Vortex type wet scrubber
KR20190044930A (en) * 2017-10-23 2019-05-02 김현순 Wet-type fine dust collector
KR101883658B1 (en) * 2018-05-29 2018-08-29 (주)씨앤지테크 High-efficiency microbubble wet type dust collecting apparatus
WO2019231010A1 (en) * 2018-05-29 2019-12-05 (주)씨앤지테크 Highly efficient microbubble wet dust collection apparatus
CN110785216A (en) * 2018-05-29 2020-02-11 C&G科技有限公司 High-efficiency micro-bubble wet dust collector
CN110102152A (en) * 2019-06-20 2019-08-09 傅金凤 Water-soluble organic exhaust gas absorption tower
CN110102152B (en) * 2019-06-20 2024-04-26 傅金凤 Water-soluble organic waste gas absorption tower
CN113426192A (en) * 2021-05-10 2021-09-24 唐林 Nano copper powder preparation, filtration and collection device for electronic paste

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