KR20130107460A - Conductive film, touch pannel and display device including the same - Google Patents

Conductive film, touch pannel and display device including the same Download PDF

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Publication number
KR20130107460A
KR20130107460A KR1020120029269A KR20120029269A KR20130107460A KR 20130107460 A KR20130107460 A KR 20130107460A KR 1020120029269 A KR1020120029269 A KR 1020120029269A KR 20120029269 A KR20120029269 A KR 20120029269A KR 20130107460 A KR20130107460 A KR 20130107460A
Authority
KR
South Korea
Prior art keywords
thin film
metal thin
dielectric layer
film layer
metal
Prior art date
Application number
KR1020120029269A
Other languages
Korean (ko)
Inventor
임정구
백성호
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020120029269A priority Critical patent/KR20130107460A/en
Publication of KR20130107460A publication Critical patent/KR20130107460A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/05—Interconnection of layers the layers not being connected over the whole surface, e.g. discontinuous connection or patterned connection
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208—Touch screens
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Abstract

The present invention relates to a conductive laminated film that can be usefully used for electrodes of a touch panel and a liquid crystal display device having a touch panel including the same.
The conductive laminated film according to the present invention includes a substrate, a first metal thin film layer formed on the substrate, a first dielectric layer formed on the first metal thin film layer, a second metal thin film layer formed on the first dielectric layer, and the second metal thin film layer. In the conductive laminated film comprising a second dielectric layer formed on the, the first dielectric layer is characterized in that the metal oxide film of the surface obtained by heat treatment of the first metal thin film layer.

Description

Conductive laminated film, touch panel and display device including the same {CONDUCTIVE FILM, TOUCH PANNEL AND DISPLAY DEVICE INCLUDING THE SAME}

The present invention relates to a conductive laminated film, a touch panel and a display device including the same.

The present invention relates to a conductive laminated film, a touch panel and a display device including the same.

Accordingly, an object of the present invention is to solve the above-mentioned conventional problems, and to provide a conductive laminated film capable of controlling thickness as well as improving adhesion between the metal thin film layer and the dielectric layer.

Another object of the present invention is to provide a touch panel including the conductive laminated film.

Another object of the present invention is to provide a display device including the touch panel.

In order to achieve the above object, the present invention provides a substrate, a first metal thin film layer formed on the substrate, a first dielectric layer formed on the first metal thin film layer, a second metal thin film layer formed on the first dielectric layer, and the second Comprising a second dielectric layer formed on the metal thin film layer, the first dielectric layer provides a conductive laminated film, characterized in that the oxide film of the first metal obtained by heat-treating the surface of the first metal thin film layer.

The first metal may be chromium or aluminum.

The thickness of the first dielectric layer may be a ratio of 1: 9 to 2: 8 with respect to the thickness of the first metal thin film layer.

The first metal thin film layer preferably has a thickness of 2 μm or less. In particular, the first metal thin film layer preferably has a thickness of 0.01 ㎛ to 0.5 ㎛.

In another aspect, the present invention provides a touch panel comprising the conductive laminated film.

In another aspect, the present invention provides a display device characterized in that the touch panel is provided.

The conductive laminated film according to the present invention can increase the bonding strength between the first dielectric layer and the first metal thin film layer by making the first metal oxide layer on the surface obtained by heat-treating the first metal thin film layer as the first dielectric layer. When the dielectric layer is formed, the thickness of the film can be adjusted according to the change of the heat treatment condition, and thus there is an advantage that it is easy to manage the optical transmission power and the electrical conductivity.

The conductive laminated film may be usefully used as an electrode for a touch panel, and the touch panel may be usefully used in various display devices.

1 is a view schematically showing a conductive laminated film according to an embodiment of the present invention.

Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings, which are presented to aid the understanding of the present invention, but the present invention is not limited thereto.

1 is a view schematically showing a conductive laminated film according to an embodiment of the present invention.

As shown in FIG. 1, the conductive laminated film according to the present invention is formed on the substrate 10, the first metal thin film layer 20 formed on the substrate 10, and the first metal thin film layer 20. The first dielectric layer 30 made of an oxide film of the first metal obtained by heat-treating the surface of the first metal thin film layer 20, the second metal thin film layer 40 formed on the first dielectric layer 30, and the second metal thin film layer ( And a second dielectric layer 50 formed on the substrate 40.

The substrate 10 may be used without limitation as long as it is generally used in the field for forming a conductive electrode, particularly in the field for manufacturing a conductive laminated film in a touch panel. For example, the substrate 10 includes a glass plate, a silicon wafer, and polypropylene (PP), polystylene (PS), polymethylmethacrylate (PMMA), polyimide (PI), poly ether sulfone (PES), polyethylene terephthalate (PET), and LCP (LCP). Liquid-crystal polymers), PC (Polycarbonate) may be selected from the group consisting of.

The first metal thin film layer 20 is formed on the substrate 10. The first metal is preferably formed of a metal having conductivity and easily oxidized by heat treatment. For example, the first metal may be aluminum or chromium.

The first metal thin film layer 20 can be easily formed by applying a method generally known in the art. For example, the first metal thin film layer 20 may be formed using a known method such as sputtering, chemical vapor deposition (CVD), ion plating, and the like, and the sputtering method is preferable. Can be used.

The first metal thin film layer 20 preferably has a thickness of 2 μm or less, preferably 1 μm or less, and more preferably 0.01 μm to 0.5 μm. When the thickness of the first metal thin film layer 20 is greater than 2 μm, optical transparency, that is, the transmittance is poor, and when the thickness of the first metal thin film layer 20 is less than 0.01 μm, electrical conductivity is inferior.

According to the present invention, a first dielectric layer 30 is formed on the first gold thin film layer 20.

According to the present invention, the first dielectric layer 30 is formed of an oxide film of the first metal on the surface obtained by heat treatment of the first metal thin film layer 20.

That is, when the surface of the first metal thin film layer 20 is heat treated, oxidation of the first metal occurs on the surface of the first metal thin film layer 20, thereby forming an oxide film of the first metal. In the present invention, the oxide film of the first metal thus formed is used as the first dielectric layer 30.

The surface heat treatment of the first metal thin film layer 20 may be a heat treatment method generally known in the art, it is also possible to heat treatment while supplying oxygen in the heat treatment process for easy oxide film formation, the present invention is limited thereto It is not.

As such, when the first dielectric layer 30 is an oxide film of the first metal obtained by heat-treating the first metal thin film layer 20, the bonding force between the first dielectric layer 30 and the first metal thin film layer 20 is enhanced. That is, since the first dielectric layer 20 is formed of an oxide film obtained by heat-treating the surface of the first metal thin film layer 20, the bonding strength is remarkably higher than that of conventionally formed by depositing dissimilar metal on the first metal thin film layer 20. Will rise. In addition, when adjusting the heat treatment time, it is possible to adjust the thickness of the oxide film of the first metal, that is, the first dielectric layer 30. Therefore, not only the overall thickness of the conductive laminated film can be controlled, but also the electrical conductivity and the transmission power can be easily managed through the thickness control.

In this case, the thickness of the first dielectric layer 30 is preferably formed by heat treatment of the first metal thin film layer 20 so that the ratio of the thickness of the first metal thin film layer 20 is 1: 9 to 2: 8. If the thickness of the first dielectric layer 30 is less than 1: 9 with respect to the thickness of the 1 metal thin film layer 20, it may not serve as a sufficient electrical non-conductor, and the protection function of the first metal thin film layer 20 may be inferior. When the thickness of the first dielectric layer 30 is greater than 2: 8 with respect to the thickness of the 1 metal thin film layer 20, there is a problem that it is difficult to manage electrical conductivity and transmittance of the conductive laminated film.

The second metal thin film layer 40 is formed on the first dielectric layer 30.

The second metal thin film layer 40 may be applied without limitation to those used in the general touch panel field.

For example, the second metal thin film layer 40 may be formed of indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO), and antimony tin oxide. (antimony tin oxide, ATO), Ag nano-wire, Al-doped ZnO, AZO, carbon nanotube, poly (3,4-ethylenedioxythiophene) (PEDOT) It may be formed of one or more selected from the group consisting of conductive polymers such as.

Preferably, the second metal thin film layer 40 is preferably formed of an oxide of a metal in consideration of the bonding force with the first dielectric layer 30, and particularly preferably formed of indium tin oxide. That is, as the first dielectric layer 20 is formed of an oxide of the first metal, the bonding force can be enhanced more than when the second metal thin film layer 40 is formed of a metal oxide.

The second metal thin film layer 40 can be easily formed by applying a method generally known in the art. For example, the second metal thin film layer 40 may be formed using a known method such as sputtering, chemical vapor deposition (CVD), ion plating, and the like, and the sputtering method is preferable. Can be used.

The second metal thin film layer 40 preferably has a thickness of 2 μm or less, preferably 1 μm or less, more preferably 0.01 μm to 0.5 μm in consideration of electrical conductivity and optical transparency.

The second dielectric layer 50 is formed on the second metal thin film layer 40.

The second dielectric layer 50 may be applied to those commonly used in the art. Preferably, the second dielectric layer 50 may be formed of an oxide of a metal. For example, the second dielectric layer 50 may be manufactured using SnO 2 .

The second dielectric layer 50 can be easily formed by applying a known method. For example, the second dielectric layer 50 may use any known method such as sputtering, chemical vapor deposition (CVD), ion plating, or the like, and a sputtering method is preferable.

In addition, the thickness of the second dielectric layer 50 may be formed within a range of thickness generally formed in the art. For example, the thickness of the second dielectric layer 50 may be 2 μm or less, preferably 1 μm or less, and more preferably 0.01 μm to 0.5 μm in consideration of transmission and electrical conductivity.

The conductive laminated film according to the present invention formed as described above may be used in a device requiring conductivity, and may be used, for example, for electrodes of various devices.

Preferably, the conductive laminate film may be used as an electrode of various display devices, and in particular, may be used for various touch panel touch panels. For example, the touch panel may be applied to a conventional capacitive touch panel.

In this case, the conductive laminated film may have a predetermined pattern, and the shape of the pattern is not particularly limited since it may be patterned and used in a predetermined shape according to the operating principle of the touch panel to which the conductive layer film is applied.

The display device of the present invention includes a touch panel including a conductive laminated film. The display device may be any one selected from a liquid crystal display, a plasma display, an organic electroluminescent display, an electrophoretic display, and an equivalent display. However, the type of the display device is not limited in the present invention.

In the above, the present invention has been described through one embodiment of the accompanying drawings, which are presented to aid the understanding of the present invention, and those of ordinary skill in the art without departing from the spirit of the present invention. It will be understood that various modifications and variations are possible within the scope.

10: substrate
20: first metal thin film layer
30: first dielectric layer
40: second metal thin film layer
50: second dielectric layer

Claims (6)

A substrate;
A first metal thin film layer formed on the substrate,
A first dielectric layer formed on the first metal thin film layer,
A second metal thin film layer formed on the first dielectric layer;
It comprises a second dielectric layer formed on the second metal thin film layer,
The first dielectric layer is a conductive laminated film, characterized in that the oxide film of the first metal obtained by heat-treating the surface of the first metal thin film layer.
The method according to claim 1,
The first metal is chromium or aluminum, characterized in that the conductive laminated film.
The method according to claim 1,
The thickness of the first dielectric layer has a ratio of 1: 9 to 2: 8 relative to the thickness of the first metal thin film layer.
The method according to claim 1,
The first metal thin film layer has a thickness of 2 ㎛ or less conductive conductive film.
A touch panel comprising the conductive laminated film of any one of claims 1 to 4.
A display device comprising a touch panel comprising the conductive laminated film of any one of claims 1 to 4.
KR1020120029269A 2012-03-22 2012-03-22 Conductive film, touch pannel and display device including the same KR20130107460A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020120029269A KR20130107460A (en) 2012-03-22 2012-03-22 Conductive film, touch pannel and display device including the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120029269A KR20130107460A (en) 2012-03-22 2012-03-22 Conductive film, touch pannel and display device including the same

Publications (1)

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KR20130107460A true KR20130107460A (en) 2013-10-02

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9544999B2 (en) 2014-12-24 2017-01-10 Samsung Electronics Co., Ltd. Transparent electrodes and electronic devices including the same
US9892815B2 (en) 2015-09-25 2018-02-13 Samsung Electronics Co., Ltd. Electrical conductors, electrically conductive structures, and electronic devices including the same
US10438715B2 (en) 2014-11-12 2019-10-08 Samsung Electronics Co., Ltd. Nanostructure, method of preparing the same, and panel units comprising the nanostructure
US10575370B2 (en) 2015-09-25 2020-02-25 Samsung Electronics Co., Ltd. Electrical conductors, electrically conductive structures, and electronic devices including the same
US11422658B2 (en) 2014-07-18 2022-08-23 Samsung Electronics Co., Ltd. Electrode structure and touch detecting sensor using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11422658B2 (en) 2014-07-18 2022-08-23 Samsung Electronics Co., Ltd. Electrode structure and touch detecting sensor using the same
US10438715B2 (en) 2014-11-12 2019-10-08 Samsung Electronics Co., Ltd. Nanostructure, method of preparing the same, and panel units comprising the nanostructure
US9544999B2 (en) 2014-12-24 2017-01-10 Samsung Electronics Co., Ltd. Transparent electrodes and electronic devices including the same
US9892815B2 (en) 2015-09-25 2018-02-13 Samsung Electronics Co., Ltd. Electrical conductors, electrically conductive structures, and electronic devices including the same
US10575370B2 (en) 2015-09-25 2020-02-25 Samsung Electronics Co., Ltd. Electrical conductors, electrically conductive structures, and electronic devices including the same

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