KR20130073529A - Transparent conductive film and touch panel having the same - Google Patents

Transparent conductive film and touch panel having the same Download PDF

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Publication number
KR20130073529A
KR20130073529A KR1020110141423A KR20110141423A KR20130073529A KR 20130073529 A KR20130073529 A KR 20130073529A KR 1020110141423 A KR1020110141423 A KR 1020110141423A KR 20110141423 A KR20110141423 A KR 20110141423A KR 20130073529 A KR20130073529 A KR 20130073529A
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KR
South Korea
Prior art keywords
transparent conductive
conductive film
conductive layer
transparent
present
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Application number
KR1020110141423A
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Korean (ko)
Inventor
임정구
백성호
Original Assignee
동우 화인켐 주식회사
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Priority to KR1020110141423A priority Critical patent/KR20130073529A/en
Publication of KR20130073529A publication Critical patent/KR20130073529A/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0003—Apparatus or processes specially adapted for manufacturing conductors or cables for feeding conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Abstract

The present invention relates to a transparent conductive film and a touch panel having the same, and more particularly to a transparent substrate; And a patterned transparent conductive layer laminated on the transparent substrate and having a refractive index of 1.0 to 1.8 and a thickness of 100 nm to 300 nm, thereby providing a transparent conductive film having excellent appearance visibility and low reflectance. It relates to a touch panel.

Description

Transparent conductive film and touch panel having the same

The present invention relates to a transparent conductive film having a low reflectance and a touch panel having the same.

Currently, a transparent conductive member widely used in a touch panel is a member having a transparent conductive thin film such as ITO on one surface of a glass substrate or a plastic film and having transparency in the visible region.

Usually, the so-called conductive glass plate, in which a cerium oxide or indium oxide thin film is formed on glass as a transparent conductive member, is well known. However, the conductive glass plate is inferior in flexibility and processability due to the characteristics of the glass used as the substrate and is preferable depending on the application. You may not do it. Therefore, in recent years, transparent conductive films based on various polymer films, such as polyethylene terephthalate films, which have flexibility and processability, are excellent in impact resistance and light in weight, have been used.

One of the main functions of this transparent conductive film used in the touch panel is to detect the input position. For this purpose, a transparent conductive film having a transparent conductive layer having a predetermined pattern shape on its surface is known.

However, when the transparent conductive layer is patterned, the pattern portion and the non-pattern portion (pattern opening portion) can be visually distinguished, and as the difference in reflectance between the pattern portion and the non-pattern portion becomes larger, the difference becomes clearer. There is a problem. In particular, in the capacitive touch panel, since the patterned transparent conductive layer is formed on the entire surface of the display display portion, even when the transparent conductive layer is patterned, a good appearance is required as the display element.

In order to improve such a problem, for example, JP-A-2008-98169 of Patent Document 1 discloses a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer. Is proposed. As an example, a silicon tin oxide layer (thickness of 10 nm or more) having a refractive index of 1.7 as a high refractive index layer on a transparent substrate, a silicon oxide layer having a refractive index of 1.43 as a low refractive index layer (thickness of 30 nm), and an ITO film having a refractive index of 1.95 as a transparent conductive layer The transparent conductive film which formed (thickness 15nm) in this order is described.

However, in the transparent conductive film described in Patent Document 1, there is a problem that the difference between the pattern portion and the pattern opening is clearly revealed, which is still insufficient to improve the appearance.

In addition, since ITO, which is widely used as a conductive layer of a transparent conductive film, has a high reflectance itself, there is a problem in that the overall reflectance is maintained when the reflectance of the non-pattern portion is maintained similar to that of ITO.

1. Japanese Unexamined Patent Publication No. 2008-98169

It is an object of the present invention to provide a transparent conductive film having a small difference in reflectance between a pattern portion and a non-pattern portion, and having excellent appearance visibility, and a touch panel having the same.

In addition, an object of the present invention is to provide a transparent conductive film having a low reflectance and a touch panel having the same.

1. transparent substrate; And

A patterned transparent conductive layer laminated on the transparent substrate and having a refractive index of 1.0 to 1.8 and a thickness of 100 nm to 300 nm;

Transparent conductive film provided with.

2. The transparent conductive film of claim 1, wherein the transparent conductive layer has a refractive index of 1.4 to 1.8.

3. The transparent conductive film of claim 1, wherein the transparent conductive layer has a thickness of 160 to 240 nm.

4. The transparent conductive film of claim 1, wherein the transparent conductive layer has an extinction coefficient of 0.01 to 0.1.

5. The transparent conductive film of claim 1, wherein the transparent conductive layer has an extinction coefficient of 0.01 to 0.05.

6. The transparent conductive film of claim 1, wherein the transparent conductive layer has a sheet resistance of 50 kW / sq to 150 kW / sq.

7. The transparent conductive film of claim 1, wherein the transparent conductive layer contains silver (Ag).

8. The transparent conductive film of claim 1, wherein the transparent substrate has a thickness of 2 μm to 200 μm.

9. The transparent conductive film according to claim 1, wherein the reflectivity of light with a wavelength of 598 nm irradiated at an incidence angle of 10 ° in the atmosphere on the transparent conductive layer is 5% to 10%.

10. The manufacturing method of the transparent conductive film of Claim 1 which includes printing the patterned transparent conductive layer on a transparent base material.

11. The method according to claim 10, wherein the transparent conductive layer is formed by printing a metal powder or a metal paste in a predetermined pattern.

12. The method of claim 11, wherein the metal is silver (Ag).

13. Touch panel provided with the transparent conductive film in any one of Claims 1-9.

The transparent conductive film of the present invention is excellent in appearance visibility because the reflectance of the pattern portion and the non-pattern portion of the patterned transparent conductive layer is similar and the recognition rate of the pattern is lowered.

Since the transparent conductive film of the present invention implements a transparent conductive layer having a low refractive index and overall reflectance is low, the glare of the user is significantly less.

Since the transparent conductive film of the present invention has a low sheet resistance when silver (Ag) is used as a material for the transparent conductive layer, the transparent conductive film has better electrical characteristics based on the same optical transmittance as compared to conventional ITO.

Since the transparent conductive film of the present invention does not have a separate transparent dielectric layer, the manufacturing process is simple.

Since the method for manufacturing a transparent conductive film of the present invention uses a printing method when forming a transparent conductive layer, the conventional ITO conductive layer can form a transparent conductive layer in a very simple process as compared with the need for an etching process. In order to prevent the formation of a separate layer having acid resistance, it is possible to thin the transparent conductive film.

1 is a schematic cross-sectional view of a transparent conductive film according to the present invention.
2 is a schematic cross-sectional view of a conventional transparent conductive film.
3 is a schematic cross-sectional view of a touch panel to which the transparent conductive film of the present invention is applied.

The present invention is a transparent substrate; And a patterned transparent conductive layer laminated on the transparent substrate and having a refractive index of 1.0 to 1.8 and a thickness of 100 nm to 300 nm; a transparent conductive film having excellent appearance visibility and low reflectance and a touch having the same It is about the panel.

Hereinafter, the present invention will be described in detail with reference to the drawings.

1 schematically shows an embodiment of a transparent conductive film 100 according to the present invention. However, the configuration shown in the drawings described herein below are not merely representative of the technical spirit of the present invention as the only preferred embodiment of the present invention, there may be equivalents and modifications of the embodiments described below.

The transparent conductive film 100 of the present invention is formed by laminating a transparent conductive layer 10 on a transparent substrate 30, and the transparent conductive layer 10 is patterned and has a refractive index of 1.0 to 1.8 and a thickness of 100. It is characterized in that the nm to 300 nm.

The conventional conductive film provided a transparent dielectric layer on a transparent base material and a transparent conductive layer. 2 is a cross-sectional view of a schematic structure of a conventional conductive film 100 ′.

Referring to FIG. 2, in the conventional conductive film 100 ′, the first transparent dielectric layer 22 is present on the transparent substrate 30, and the transparent conductive layer 10 ′ is formed of a metal oxide such as ITO. Since it was formed by a method such as sputtering using, it was inevitable to undergo a step of etching with an acid solution or the like for the patterning. Therefore, in order to protect the first transparent dielectric layer 22 from the etching solution, it was necessary to have a second transparent dielectric layer 21 formed of SiO 2 or the like having acid resistance between the transparent dielectric layer and the transparent conductive layer.

However, the transparent conductive film 100 of the present invention does not include the transparent dielectric layer provided with the conventional transparent conductive film. Therefore, the thin film of the transparent conductive film 100 is possible.

In the transparent conductive film 100 of the present invention, the refractive index of the transparent conductive layer 10 is 1.0 to 1.8, preferably 1.4 to 1.8, and the refractive index of the transparent conductive layer formed of a metal oxide such as conventional ITO is about 2.0. It has a low refractive index compared to that. If the refractive index is less than 1.0 or greater than 1.8, the difference between the refractive index of the transparent substrate 30 is increased, so that the reflectance is increased and the transmittance is lowered. That is, the transparent conductive layer 10 is placed on the side where the light is incident, if the transparent conductive layer 10 has a low refractive index of the above range as in the present invention, the refractive index like the conventional transparent conductive layer 10 ' Snell's law gives a lower reflectance than this, which can improve glare.

In the transparent conductive film 100 of the present invention, the transparent conductive layer 10 is 100 to 300 nm, preferably 160 to 240 nm in order to eliminate the difference in reflectance between the pattern portion of the transparent conductive layer 10 and the reflectance of the non-pattern portion. Has a thickness of. If the transparent conductive layer 10 has a thickness of less than the above range, the optical transmittance is high but the electrical conductivity is low. If the transparent conductive layer 10 has a thickness exceeding the above range, the electrical conductivity is high but the optical transmittance is low. There is a problem that the reflectance is increased. In this aspect, when the transmittance is 90% or more, the transparent conductive layer 10 according to the present invention may have a sheet resistance of 50 kW / sq to 100 kW / sq.

Since the transparent substrate 30 has a very low reflectance, the reflectivity of the transparent conductive layer 10 should also be lowered by the reflectance of the transparent substrate 30 so that there is no difference in reflectance between the transparent substrate 30 and the transparent conductive layer 10. . In this case, the shape recognition rate of the pattern caused by the change in the intensity of the reflected light of the portion where the pattern is formed and the portion that is not formed is reduced, and thereby the appearance visibility is excellent. According to the present invention, when the transparent conductive layer 10 has a specific refractive index and a range of thickness as described above, the synergistic effect can be exerted, thereby improving the appearance visibility and remarkably lowering the reflectance to improve the glare phenomenon. If the transparent conductive layer 10 has a thickness exceeding the above range, there is a problem in that electrical conductivity is increased but optical transmittance is low.

Optionally, the transparent conductive film 100 of the present invention preferably has a low extinction coefficient of the transparent conductive layer 10. For example, it may have a value of 0.01 to 0.1, preferably 0.01 to 0.05. The extinction coefficient value of the transparent conductive layer 10 of the present invention is a value which is remarkably small compared to the extinction coefficient of the transparent conductive layer formed of a metal oxide such as ITO. When the transparent conductive layer 10 has the above-mentioned extinction coefficient range according to the present invention, it is possible to maintain an excellent electrical conductivity and reduce the degree of reflection according to the Beer-Lambert law, thereby improving the glare phenomenon.

The material for forming the transparent conductive layer 10 is a material having the above-described refractive index and thickness, and preferably has a low extinction coefficient, and may be used without limitation as long as the material can be patterned by a printing (printing) process as described below. . For example, a conductive metal may be used, and silver (Ag) is preferably used, and silver (Ag) has an extinction coefficient of about 0.02 when included in a conductive layer thinned to 300 nm or less, and thus 7 Very low reflectance of less than or equal to%.

In the transparent conductive film 100 of this invention, it is preferable that the transparent base material 30 is 2-200 micrometers in thickness, and it is more preferable that it is 2-150 micrometers. While ensuring the mechanical strength in the above range can be made thin film easily.

As the transparent substrate 30, various polymer films having transparency commonly used in the art may be used without particular limitation. For example, polyester resin, acetate resin, polyether sulfone resin, polycarbonate resin, polyamide resin, polyimide resin, polyolefin resin, (meth) acrylic resin, polyvinyl chloride resin, Polyvinylidene chloride resin, polystyrene resin, polyvinyl alcohol resin, polyarylate resin, polyphenylene sulfide resin and the like. Among these, especially preferable are polyester resin, polycarbonate resin, and polyolefin resin.

Transparent conductive film 100 of the present invention including the configuration as described above is excellent in visibility and low reflectance. For example, when irradiating light with a wavelength of 598 nm on the plane on which the transparent conductive layer is formed in the air at an incidence angle of 10 °, the reflectance may be 5% to 10%.

Hereinafter, an embodiment of a method of manufacturing the transparent conductive film 100 of the present invention will be described. However, since the manufacturing method described below does not represent all of the technical spirit of the present invention as the only preferred embodiment of the present invention, there may be equivalents and modifications of the embodiments described below.

The transparent conductive film 10 may be manufactured by a simple process of forming the transparent conductive layer 10 on one side of the transparent substrate 30.

Before laminating the transparent conductive layer 10 to the transparent base material 30, the surface of the base material 30 is etched and coated with the surface of the base material 30 in advance, such as sputtering, corona discharge, flame, ultraviolet irradiation, electron beam irradiation, chemical conversion, and oxidation. ), The adhesion to the transparent base material 30 of the transparent conductive layer 10 formed thereon can be improved. Moreover, it is preferable to clean the surface of the base material 30 by solvent cleaning, ultrasonic cleaning, etc. as needed.

In the manufacturing method of the present invention, the transparent conductive layer 10 may be formed by a simple printing process such as screen printing, gravure printing, offset printing, or the like. The printing method is a method of printing (printing) the conductive paste on the transparent dielectric layer 20 in a predetermined pattern.

Conventionally, in the formation of the transparent conductive layer 10, a vapor deposition method or a sputtering method was used as in the dielectric layer. However, when the conductive layer is formed by vapor deposition or sputtering, an etching process is required separately for patterning. However, the present invention can produce the transparent conductive layer 10 without an etching process by using a printing method.

The conductive paste according to the present invention includes a conductive material, a binder, and the like, and various conductive metal powders can be used as the conductive material, and preferably silver (Ag) can be used. Silver (Ag) may be included in the paste in the form of silver powder, silver nanowires or mixtures thereof, and preferably silver nanowires may be used.

In addition, after the transparent conductive layer 10 is patterned, the patterned transparent conductive layer 10 may be further subjected to a heat treatment process as necessary. This is because the constituent components of the transparent conductive layer 10 are crystallized, so that the transparency and the conductive layer can be improved. The heating temperature at this time is 100 degreeC-180 degreeC, for example, and processing time can be 15 minutes-180 minutes, for example.

The pattern shape of the transparent conductive layer 10 may be applied without particular limitation to the pattern used in the art, and may form various patterns such as a stripe shape and a lattice shape according to the use to which the transparent conductive film 100 is applied. have.

The transparent conductive film prepared according to the present invention can be usefully used for the touch panel. 3 is a schematic cross-sectional view of a capacitive touch panel to which the transparent conductive film of the present invention is applied as an embodiment.

As shown in FIG. 3, the touch panel 200 is formed at regular intervals on the circumferential edge of the transparent conductive film 100 of the present invention and the transparent conductive layer 10 of the transparent conductive film 100 described above. The electrode terminal 40 and the transparent protective layer 50 formed above the transparent conductive layer 10 and inside the electrode terminal 40 may be provided. The electrode terminal 40 and the transparent protective layer 50 are formed of a method and a material commonly used in the art. For example, the transparent protective layer 50 can use the same material as the transparent base material 30 mentioned above.

In the touch panel 200, the transparent conductive layer 10 and an external touch position detecting circuit (not shown) are connected through the electrode terminal 40. As a result, when a finger is touched (touched) at an arbitrary point (coordinate) of the transparent protective layer 50 on the transparent conductive layer 10, the capacitance of the human body is measured at the point where the transparent conductive layer 10 is touched. Through the ground, the resistance value between each electrode terminal 40 and the ground line is changed. This change is detected by the touch position detecting circuit, thereby inputting coordinates on a display screen, not shown.

The above-described touch panel relates to a capacitive type, and the touch panel according to the present invention can be applied without being limited to the capacitive type, if the transparent conductive film of the present invention can be applied. It may be possible.

Hereinafter, the present invention will be described in detail with reference to Examples. However, the embodiments according to the present invention can be modified into various other forms, and the scope of the present invention should not be construed as being limited to the embodiments described below. The embodiments of the present invention are provided to enable those skilled in the art to more fully understand the present invention.

Example  And Comparative example

The silver (Ag) nanowires (50-100 nm in diameter and 20 μm or less in length) were used as the conductive material of the transparent conductive layer (Example) and ITO (Comparative Example), respectively. A transparent conductive film was prepared.

division Example Comparative example material Refractive index Extinction coefficient thickness material Refractive index Extinction coefficient thickness Transparent conductive layer Ag 1.6 0.02 200 nm ITO 2.0 0.3 22 nm Second transparent dielectric layer - - - - SiO 2 1.45 0 37 nm First transparent dielectric layer - - - - InSnOx 2.2 0 6 nm Transparent film
materials PET 1.66 0 125 μm PET 1.66 0 125 μm

In Table 1, in the case of the comparative example, the formation of the second transparent dielectric layer was essential using ITO in the transparent conductive layer, and a separate etching process was performed for patterning.

The reflectance was measured by irradiating light with a wavelength of 598 nm at an incidence angle of 10 ° on the surface on which the transparent conductive layers of the transparent conductive films prepared in Examples and Comparative Examples, respectively, were prepared in the air. Example was 13.2%. Comparing the absolute value of the reflectance, it can be seen that the embodiment is about half lower than the comparative example, and the glare phenomenon is remarkably improved. In addition, in the case of the example, the recognition rate of the pattern was lower than that of the comparative example, and the appearance visibility was excellent.

10, 10 ': transparent conductive layer 21, 22: transparent dielectric layer
30: transparent base material
100, 100 ': transparent conductive film
40: electrode terminal 50: transparent protective layer
200: touch panel

Claims (13)

Transparent substrate; And
A patterned transparent conductive layer laminated on the transparent substrate and having a refractive index of 1.0 to 1.8 and a thickness of 100 nm to 300 nm;
Transparent conductive film provided with.
The transparent conductive film of claim 1, wherein the transparent conductive layer has a refractive index of 1.4 to 1.8.
The transparent conductive film of claim 1, wherein the transparent conductive layer has a thickness of 160 to 240 nm.
The transparent conductive film of claim 1, wherein the transparent conductive layer has an extinction coefficient of 0.01 to 0.1.
The transparent conductive film of claim 1, wherein the transparent conductive layer has an extinction coefficient of 0.01 to 0.05.
The transparent conductive film of claim 1, wherein the transparent conductive layer has a sheet resistance of 50 kV / sq to 150 kV / sq.
The transparent conductive film of claim 1, wherein the transparent conductive layer contains silver (Ag).
The transparent conductive film of claim 1, wherein the transparent substrate has a thickness of 2 μm to 200 μm.
The transparent conductive film of claim 1, wherein a reflectance of light of 598 nm wavelength irradiated at an angle of incidence of 10 ° in the atmosphere on the transparent conductive layer is 5% to 10%.
The manufacturing method of the transparent conductive film of Claim 1 containing printing the patterned transparent conductive layer on a transparent base material.
The method of claim 10, wherein the transparent conductive layer is formed by printing a metal powder or a metal paste in a predetermined pattern.
The method of claim 11, wherein the metal is silver (Ag).
The touch panel provided with the transparent conductive film in any one of Claims 1-9.
KR1020110141423A 2011-12-23 2011-12-23 Transparent conductive film and touch panel having the same KR20130073529A (en)

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