KR20130064945A - Retro-reflection structure for improving retro-reflection and weatherproof and process method - Google Patents

Retro-reflection structure for improving retro-reflection and weatherproof and process method Download PDF

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Publication number
KR20130064945A
KR20130064945A KR1020110131580A KR20110131580A KR20130064945A KR 20130064945 A KR20130064945 A KR 20130064945A KR 1020110131580 A KR1020110131580 A KR 1020110131580A KR 20110131580 A KR20110131580 A KR 20110131580A KR 20130064945 A KR20130064945 A KR 20130064945A
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KR
South Korea
Prior art keywords
base film
retroreflective
pattern
forming
retro
Prior art date
Application number
KR1020110131580A
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Korean (ko)
Inventor
최혜민
문병율
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엘지이노텍 주식회사
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Priority to KR1020110131580A priority Critical patent/KR20130064945A/en
Publication of KR20130064945A publication Critical patent/KR20130064945A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G02B5/045—Prism arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
    • G02B5/124—Reflex reflectors cube corner, trihedral or triple reflector type plural reflecting elements forming part of a unitary plate or sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/416—Reflective

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)

Abstract

PURPOSE: A retro-reflection structure is provided to simplify manufacturing method to guarantee weather resistance and to lower luminance reduction by removing support unit between a retro-reflection pattern and a base film. CONSTITUTION: A retro-reflection structure includes the first base film(100), the second base film(200), a retro-reflection pattern(300) and a reflection adhesion layer(500). The first base film and the second base film are arranged to face each other. The retro-reflection pattern is located in between the first base film and the second base film. The retro-reflection pattern is formed with a sufficiently transparent filler to minimize degradation of retro-reflection efficiency and propagate optical ray. The reflection adhesive layer clings to the surface of the first base film and the second base film. The adhesive layer is configured with a structure in which a metallic reflective material is mixed with the adhesive material.

Description

RETRO-REFLECTION STRUCTURE FOR IMPROVING RETRO-REFLECTION AND WEATHERPROOF AND PROCESS METHOD}

The present invention relates to a method for forming a retroreflective structure having high brightness and strong weather resistance to the external environment.

Currently used high-bright retroreflective film has a prism structure, and uses the total reflection principle caused by the difference in refractive index between the polymer material and the air forming the prism.

1 is a view showing a retroreflective film structure according to the prior art.

As shown in FIG. 1, the retroreflective body 300 is formed on the first base film 100, and the support (junction) part 400 is placed in several places, thereby maintaining a constant distance from the second base film 200. Keeps and bonds. In this structure, a support portion 400 serving as a support is required between the retroreflective body 300, the first base film 100, and the second base film 200.

However, the support portion 400 does not appear in the retroreflective light when it hits the cause of reducing the brightness. In addition, the prism pattern is broken with time, and weather resistance is not guaranteed. To solve this problem, a structure in which a reflective material is coated on a prism pattern and filled with another polymer is used, which is expensive to manufacture.

Therefore, there is a need for a structure in which the manufacturing process is simple and weather resistance is ensured and the luminance decrease can be reduced.

One embodiment of the present invention by removing the support portion between the retroreflective pattern and the base film, the manufacturing process is simple and weather resistance is ensured, retroreflective structure and formation method for retroreflective and weather resistance improvement that can reduce the brightness reduction To provide.

A retroreflective structure according to an embodiment of the present invention is a first base film and a second base film disposed to face each other, a retroreflective pattern formed between the first base film and the second base film, and the retroreflective An end of the pattern includes a reflective adhesive layer that adheres to the surface of the first base film or the second base film.

The retroreflective pattern may have a structure coated on an inner surface of the first base film or the second base film.

The retroreflective pattern may be a protruding pattern formed on an inner surface of the first base film or the second base film.

The retroreflective pattern may have a semicircular, polygonal, or lenticular shape in cross section.

The retroreflective pattern may be a prism pattern.

The retroreflective pattern may have a structure in which an uneven pattern is implemented at the end of the retroreflective pattern.

The first base film or the base film may be formed of any one of PET, PC, PES, PI, and PMMA.

The retroreflective pattern may be formed of a material selected from the group consisting of polyacrylates, urethanes, polynitriles, polycarbonates, polyesters, and polyolefins.

The reflective adhesive layer may be a structure in which a metal reflective material is mixed in the adhesive material layer or a structure in which a metal reflective material layer is coated on the surface of the adhesive material layer.

The reflective material may be any one or two or more materials selected from aluminum, copper, silver, gold, TiO 2, CaCO 3, BaSO 4, Al 2 O 3, Silicon, and PS.

The reflective adhesive layer may have a refractive index of 1.0 to 1.4.

The retroreflective structure forming method according to the present invention comprises the steps of placing the first base film and the second base film facing each other, forming a retroreflective pattern between the first base film and the second base film, and the And bonding an end of the retroreflective pattern to the surface of the first base film or the second base film.

According to one embodiment of the invention, by removing the support portion between the prism body and the base film, it is possible to eliminate the decrease in the brightness of the support portion.

According to one embodiment of the present invention, the process of forming the support pattern can be reduced, thereby simplifying the manufacturing process.

According to one embodiment of the present invention, each of the prism body is made of a structure having a form bonded to the base film, it is resistant to impact.

According to one embodiment of the present invention, even if damage is caused by an impact from the outside, only a localized portion is hit, so the brightness is reduced.

According to one embodiment of the present invention, by coating a reflective material on the reflective adhesive layer, the material cost is lower than that of the method of filling the adhesive resin, it is possible to improve weather resistance.

1 is a view showing a retroreflective film structure according to the prior art.
2 is a diagram illustrating a retroreflective structure according to an embodiment of the present invention.
3 is a diagram illustrating an example of a fine pattern of a region where a retroreflective pattern and a reflective adhesive layer abut according to an embodiment of the present invention.
4 is a flowchart illustrating a procedure of a method of forming a retroreflective structure according to an embodiment of the present invention.

Hereinafter, various embodiments of the present invention will be described in detail with reference to the accompanying drawings and accompanying drawings, but the present invention is not limited to or limited by the embodiments.

2 is a diagram illustrating a retroreflective structure according to an embodiment of the present invention.

Referring to FIG. 2, the retroreflective structure may include a first base film 100, a second base film 200, a retroreflective pattern 300, and a reflective adhesive layer 500.

The first base film 100 and the second base film 200 are disposed to face each other.

In an embodiment, the first base film 100 and the second base film 200 may be any one of polyethylene terephthalate (PET), polycarbonate (PC), polyether sulfone (PES), polyimide (PI), and polymethyacrylate (PMMA). Can be formed.

In another embodiment, the first base film 100 and the second base film 200 may comprise a metal, such as aluminum, silver, nickel, tin, copper or gold, or a combination thereof, or may comprise a plurality of layers. And non-metals such as dielectric stacks. The first base film 100 and the second base film 200 may be subjected to physical or chemical lamination techniques such as vacuum deposition, sputtering, chemical vapor deposition (CVD), plasma assisted CVD, electroless lamination, and the like, depending on the desired film type. Can be applied. The first base film 100 and the second base film 200 may include a plurality of layers, including layers that promote adhesion to a body layer, a barrier layer, and a protective overcoat layer.

The retroreflective pattern 300 is formed between the first base film 100 and the second base film 200. The retroreflective pattern 300 may have a structure coated on an inner surface of the first base film 100 or the second base film 200.

In an embodiment, the retroreflective pattern 300 may be a protruding pattern formed on an inner surface of the first base film 100 or the second base film 200. For example, the retroreflective pattern 300 may have a semicircular shape, a polygonal shape, or a lenticular shape. Alternatively, the retroreflective pattern 300 may be a prism pattern. The retroreflective pattern 300 may have a structure in which an uneven pattern is implemented at the end of the retroreflective pattern 300.

In another embodiment, the retroreflective pattern 300 may be formed of a material selected from the group consisting of polyacrylates, urethanes, polynitriles, polycarbonates, polyesters, and polyolefins.

The retroreflective pattern 300 may be formed of a filler sufficiently transparent to allow light to propagate while minimizing deterioration of retroreflective efficiency. For example, the filler may form a strong bond with the first base film 100 and the second base film 200. Therefore, the filler may form a substantially continuous layer covering all of the retroreflective pattern 300. The filler may be discontinuous and may be directly enclosed by networks of bonds. For example, the filler allows the retroreflective pattern 300 to have a stronger direct bonding with the first base film 100, the second base film 200, and the reflective adhesive layer 500. Embodiments of a continuous filler layer allow the filler to flow from one cube corner cavity to another before the filler solidifies by crosslinking.

Referring to FIG. 1, in the related art, a support portion 400 serving as a support is required between the retroreflective body 300, the first base film 100, and the second base film 200. However, the support portion 400 does not appear in the retroreflective light when it hits the cause of reducing the brightness. In addition, the pattern of the retroreflective body 300 is broken with time, and weather resistance is not guaranteed.

In order to solve this problem, in the present invention, the support portion 400 may be removed to simplify the manufacturing process, and thus, a retroreflective structure having strong weather resistance may be formed. That is, the retroreflective structure forms a retroreflective pattern 300 on the first base film 100, and coats the reflective adhesive layer 500 mixed with the reflective material on the second base film 200, and then the first base film. (100) and the second base film 200 are bonded together.

As in the retroreflective structure, the total reflection may occur due to a difference in refractive index between the retroreflective pattern 300 and the air layer 600. In addition, the retroreflective structure mixes a reflective material with the reflective adhesive layer 500 so that light may be reflected by the reflective material without a trap even when the end portion of the retroreflective pattern 300 contacts the adhesive.

That is, in the present invention, the retroreflective structure includes a reflective adhesive layer 500 which is attached to the ends of the retroreflective pattern 300 to abut the surfaces of the first base film 100 and the second base film 200.

The reflective adhesive layer 500 may be a structure in which a metal reflective material is mixed in the adhesive material layer, or a structure in which a metal reflective material layer is coated on the surface of the adhesive material layer.

For example, the reflective material may be any one or two or more materials selected from aluminum, copper, silver, gold, TiO 2, CaCO 3, BaSO 4, Al 2 O 3, Silicon, and PS.

The reflective adhesive layer 500 may have a refractive index of 1.0 to 1.4.

Since the retroreflective structure is bonded to the first base film 100 and the second base film 200 one by one, the retroreflective pattern 300 is strong in impact, and only a local part is affected even during an external impact, thereby decreasing luminance. little.

In addition, the retroreflective structure is a simple manufacturing process compared to coating the support on a portion. In addition, the retroreflective structure has an advantage that the manufacturing cost is cheaper than the structure filled with a resin and an adhesive of a prism that is used a lot to ensure weather resistance. Here, the prism refers to a retroreflective pattern.

3 is a diagram illustrating an example of a fine pattern of a region where a retroreflective pattern and a reflective adhesive layer abut according to an embodiment of the present invention.

As shown in FIG. 3, the retroreflective pattern 300 may improve the retroreflective performance by giving a fine pattern 700 to a region that meets the reflective adhesive layer 500. The fine pattern 700 may be a protruding pattern, a prism pattern, or an uneven pattern.

4 is a flowchart illustrating a procedure of a method of forming a retroreflective structure according to an embodiment of the present invention.

Referring to FIG. 4, in step S410, the retroreflective structure forming method arranges the first base film and the second base film to face each other. The retroreflective structure forming method may form the first base film or the base film as any one of PET, PC, PES, PI, and PMMA.

In step S420, the retroreflective structure forming method forms a retroreflective pattern between the first base film and the second base film. In the method of forming the retroreflective structure, the retroreflective pattern may be formed on the inner surface of the first base film or the second base film by a protruding pattern, a prism pattern, or an uneven pattern.

In an embodiment, the retroreflective structure forming method may form the retroreflective pattern using a material selected from the group consisting of polyacrylate, urethane, polynitrile, polycarbonate, polyester, and polyolefin.

In step S430, in the method of forming the retroreflective structure, the ends of the retroreflective pattern are bonded to abut the surface of the first base film or the second base film. Here, the method of forming the retroreflective structure is a 'reflective adhesive layer' having a structure in which a metal reflective material is mixed in the adhesive material layer or a metal reflective material layer coated on the surface of the adhesive material layer. The first base film or the second base film may be bonded to the surface.

Methods according to an embodiment of the present invention may be implemented in the form of program instructions that can be executed by various computer means and recorded in a computer readable medium. The computer readable medium may include program instructions, data files, data structures, etc. alone or in combination. The program instructions recorded on the medium may be those specially designed and constructed for the present invention or may be available to those skilled in the art of computer software. Examples of computer-readable recording media include magnetic media such as hard disks, floppy disks, and magnetic tape, optical media such as CD-ROMs, DVDs, and magnetic disks, such as floppy disks. Magneto-optical media, and hardware devices specifically configured to store and execute program instructions, such as ROM, RAM, flash memory, and the like. The medium may be a transmission medium such as an optical or metal line, a wave guide, or the like, including a carrier wave for transmitting a signal designating a program command, a data structure, or the like. Examples of program instructions include not only machine code generated by a compiler, but also high-level language code that can be executed by a computer using an interpreter or the like. The hardware device described above may be configured to operate as one or more software modules to perform the operations of the present invention, and vice versa.

As described above, the present invention has been described by way of limited embodiments and drawings, but the present invention is not limited to the above embodiments, and those skilled in the art to which the present invention pertains various modifications and variations from such descriptions. This is possible.

Therefore, the scope of the present invention should not be limited to the described embodiments, but should be determined by the equivalents of the claims, as well as the claims.

100: first base film
200: second base film
300: retroreflective pattern
500: reflective adhesive layer
600: air layer

Claims (16)

A first base film and a second base film disposed to face each other;
A retroreflective pattern formed between the first base film and the second base film; And
A reflective adhesive layer for bonding the end of the retroreflective pattern to abut the surface of the first base film or the second base film
Retroreflective structure comprising a. The method of claim 1,
The retroreflective pattern,
Retroreflective structure formed of a structure coated on the inner surface of the first base film or the second base film. The method of claim 1,
The retroreflective pattern,
A retroreflective structure, which is a protruding pattern formed on an inner surface of the first base film or the second base film. The method of claim 3,
The retroreflective pattern,
A retroreflective structure whose cross section is semicircular, polygonal, and lenticular. The method of claim 3,
The retroreflective pattern,
A retroreflective structure that is a prism pattern. The method of claim 3,
The retroreflective pattern,
Retroreflective structure formed of a structure in which an uneven pattern is implemented at the end of the retroreflective pattern. The method of claim 1,
The first base film or the base film,
A retroreflective structure formed of any one of polyethylene terephthalate (PET), polycarbonate (PC), polyether sulfone (PES), polyimide (PI), and PolyMethly MethaAcrylate (PMMA). The method of claim 1,
The retroreflective pattern,
A retroreflective structure formed from a material selected from the group consisting of polyacrylates, urethanes, polynitriles, polycarbonates, polyesters, and polyolefins. The method of claim 1,
The reflective adhesive layer,
A retroreflective structure comprising a structure in which a metal reflective material is mixed in an adhesive material layer or a metal reflective material layer coated on an adhesive material layer surface. 10. The method of claim 9,
The reflective material,
A retroreflective structure in which any one or two or more materials selected from aluminum, copper, silver, gold, TiO 2, CaCO 3, BaSO 4, Al 2 O 3, Silicon, and PS are mixed. The method of claim 1,
The reflective adhesive layer,
A retroreflective structure having a refractive index of 1.0 to 1.4. Disposing the first base film and the second base film to face each other;
Forming a retroreflective pattern between the first base film and the second base film; And
Bonding an end of the retroreflective pattern to the surface of the first base film or the second base film
Retroreflective structure forming method comprising a. The method of claim 12,
Forming the retroreflective pattern,
Forming the retroreflective pattern on the inner surface of the first base film or the second base film by a protruding pattern, a prism pattern, or an uneven pattern.
Retroreflective structure forming method comprising a. The method of claim 12,
Positioning the first base film and the second base film opposite to each other,
Forming the first base film or the base film with any one of PET, PC, PES, PI, and PMMA
Retroreflective structure forming method comprising a. The method of claim 12,
Forming the retroreflective pattern,
Forming the retroreflective pattern with a material selected from the group consisting of polyacrylates, urethanes, polynitriles, polycarbonates, polyesters, and polyolefins
Retroreflective structure forming method comprising a. The method of claim 12,
Bonding the ends of the retroreflective pattern to abut the surface of the first base film or the second base film,
The reflective adhesive layer is a structure in which a metal reflective material is mixed in the adhesive material layer or a metal reflective material layer is coated on the surface of the adhesive material layer. Adhering to
Retroreflective structure forming method comprising a.
KR1020110131580A 2011-12-09 2011-12-09 Retro-reflection structure for improving retro-reflection and weatherproof and process method KR20130064945A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160072946A (en) * 2014-12-15 2016-06-24 삼성에스디아이 주식회사 Composite optical film and display apparatus comprising the same
KR20160125546A (en) * 2015-04-21 2016-11-01 미래나노텍(주) Retroreflective sheet
KR20210015712A (en) * 2019-08-02 2021-02-10 (주)리플로맥스 Cube corner type retroreflective sheet and amnufacturing method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160072946A (en) * 2014-12-15 2016-06-24 삼성에스디아이 주식회사 Composite optical film and display apparatus comprising the same
KR20160125546A (en) * 2015-04-21 2016-11-01 미래나노텍(주) Retroreflective sheet
KR20210015712A (en) * 2019-08-02 2021-02-10 (주)리플로맥스 Cube corner type retroreflective sheet and amnufacturing method thereof

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