KR20080063942A - Reticle transfer apparatus - Google Patents

Reticle transfer apparatus Download PDF

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Publication number
KR20080063942A
KR20080063942A KR1020070000574A KR20070000574A KR20080063942A KR 20080063942 A KR20080063942 A KR 20080063942A KR 1020070000574 A KR1020070000574 A KR 1020070000574A KR 20070000574 A KR20070000574 A KR 20070000574A KR 20080063942 A KR20080063942 A KR 20080063942A
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KR
South Korea
Prior art keywords
reticle
air
unit
loader arm
grip
Prior art date
Application number
KR1020070000574A
Other languages
Korean (ko)
Inventor
우정오
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR1020070000574A priority Critical patent/KR20080063942A/en
Publication of KR20080063942A publication Critical patent/KR20080063942A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A reticle transfer apparatus is provided to stably absorb a reticle by supplying vacuum absorption force to a loader arm with pre-set power. A grip unit moves to a predetermined position to grip a reticle. A cleaning unit is formed on the grip unit. The cleaning unit supplies air slantly to an external surface of the reticle. The air is slantly supplied along a movement direction of the grip unit. The cleaning unit has a first air spraying unit and a second air spraying unit. The first air spraying unit is formed on the grip unit to spray air toward an upper surface of the reticle. The second air spraying unit is formed on the grip unit to spray air toward a lower surface of the reticle. The grip unit includes a loader arm(100), where a lower surface of the reticle is received, and a robot arm(200), which is extended from the loader arm. The first air spraying unit has a first guidance hole(310), which is formed on the loader arm and guides air to the lower surface of the reticle. The second air spraying unit has a second guidance hole(320), which is formed on the robot arm and guides air to an upper surface of the reticle.

Description

Reticle Transporter {RETICLE TRANSFER APPARATUS}

1 is a perspective view showing a reticle transfer device according to an embodiment of the present invention.

2 is a cross-sectional view taken along the line A-A 'shown in FIG.

3 is a cross-sectional view taken along the line BB ′ shown in FIG. 1.

Figure 4 is a perspective view showing a reticle transfer device according to another embodiment of the present invention.

FIG. 5 is a cross-sectional view taken along the line C-C 'shown in FIG. 4.

** Description of symbols for the main parts of the drawing **

100, 150: loader arm

151: first loader arm

152: second loader arm

200: robot arm

310: first guide hall

312: tube

320: second guide hall

330: first guide hole

340: second guide hole

410: first air injector

420: second air injector

430: control unit

The present invention relates to a reticle transfer apparatus, and more particularly, to a reticle transfer apparatus capable of stably transferring a reticle by removing particles present in a reticle to be transferred.

In general, a semiconductor device is manufactured by repeatedly or selectively performing unit processes such as a diffusion process, a deposition process, a photolithography process, an etching process, an ion implantation process, and a cleaning process.

Among the above processes, the photolithography process is a process of forming a plurality of predetermined circuit patterns on the upper surface of the wafer. Such a circuit pattern formation technology is a very important technology and serves as a driving force for ultra-high integration of semiconductor devices.

The photolithography process includes coating a photoresist (PR), which is a chemical substance largely exposed to light, on a top surface of a wafer, and an exposure process of projecting a predetermined circuit pattern through light onto the coated PR. And the developing process of developing the exposed circuit pattern using a developing solution.

In the above process, a stepper or a scanner is generally used in the exposure process. Referring to the configuration of the exposure apparatus as described above, the exposure apparatus includes a light source, a reticle stage disposed under the light source, and having a predetermined circuit pattern formed thereon, and having a reticle seated thereon, and a circuit pattern positioned below the reticle stage. And a wafer stage on which the wafer to be formed is seated, and a reduction projection optical system positioned between the reticle stage and the wafer stage to guide the light passing through the reticle to be projected on the upper surface of the wafer.

Here, the reticle is stored in a reticle carriage. The reticle stored in the reticle carriage is carried in or out of the reticle stage by a transfer device. The transfer device is composed of a robot arm which is operated along a predetermined operation path by receiving power from the outside, and a loader arm installed on the robot arm to pick up the reticle.

Here, the loader arm supports the bottom of the reticle and picks up the reticle using a vacuum suction force provided from the outside. Here, the vacuum suction force is provided through a plurality of vacuum holes formed in the loader arm. Accordingly, the reticle is vacuum-adsorbed to the loader arm by a vacuum suction force provided through the vacuum hole, and the reticle is carried in or out of the reticle carriage or the reticle stage in such a state.

However, if particles of a predetermined size are present on the bottom surface of the reticle, in particular, the portion which is in contact with the loader arm and is sucked in vacuum, the particles may be introduced into the vacuum hole provided with the vacuum suction force. In this case, the particles may not be discharged to the outside through the inside of the vacuum hole, but may be caught by the inside of the vacuum hole. In this case, the vacuum suction force provided through the vacuum hole is formed in the normal range or less.

Therefore, in the related art, when the reticle is not normally sucked by the loader arm, and the reticle is transported in this state, the reticle may be shifted from the loader arm, and thus the reticle is shifted from the reticle stage. There is a problem that is settled. Furthermore, there is a problem that the reticle is broken away from the loader arm.

In addition, in the related art, when the exposure process is performed after the seating position is settled on the reticle stage as described above, the circuit pattern substantially formed on the wafer is not normally aligned, which causes product defects.

Of course, in the related art, particles are generated in the reticle as described above, and when the particles are introduced into the vacuum hole, a vacuum error is generated to stop the process and remove the particles. However, in the related art, since the process is stopped and the cleaning process is performed every time the particles are generated as described above, the process time is increased, the product production rate is decreased, and the cost of the equipment is increased.

Accordingly, the present invention has been made to solve the above problems, it is an object of the present invention to provide a reticle transfer device that can remove the particles generated in the reticle.

Another object of the present invention is to provide a reticle conveying apparatus for allowing the vacuum adsorption force of the loader arm for vacuum adsorption of the reticle to be made with a predetermined force.

Still another object of the present invention is to provide a reticle conveying apparatus capable of normally seating the reticle on the reticle stage by preventing the mounting position of the reticle gripped on the loader arm from shifting.

Still another object of the present invention is to provide a reticle transfer device which can prevent the reticle from being separated from the loader arm during reticle transfer.

In order to achieve the above object, the present invention provides a reticle transfer device.

The reticle conveying apparatus of the present invention includes a grip part for moving to a predetermined position to pick up a reticle and a cleaning part for supplying air to an outer surface of the reticle so as to be inclined with respect to the moving direction of the reticle.

Here, the air is preferably provided to be inclined along the moving direction of the reticle.

The cleaning unit includes a first air spray unit provided in the grip unit and spraying air toward the upper surface of the reticle, and a second air spray unit provided in the grip unit and spraying air toward the lower surface of the reticle. Preferably, the air spraying direction of the first air spraying unit and the second air spraying unit is inclined along the moving direction.

In addition, the grip unit includes a loader arm on which the bottom of the reticle is seated, and a robot arm extending from the loader arm, wherein the first air spray unit is formed on the loader arm to guide air to the bottom of the reticle. And a second guide hole provided in the robot arm to guide air to the upper surface of the reticle, wherein the first guide hole and the second guide hole are provided in the robot arm. It is preferably formed along a direction inclined along the moving direction.

Meanwhile, the air may be provided reciprocally between a first reference direction along the moving direction and a second reference direction along the opposite direction to the moving direction.

Here, the cleaning unit is provided in the grip portion and the first 'air injection unit for injecting air toward the upper surface of the reticle, the second' air injection unit provided in the grip portion for injecting air toward the lower surface of the reticle, and It is provided with a grip unit having a rotary unit for reciprocating the first 'air spray unit and the second' air spray unit within a reference range,

The reference range may be a reciprocating range between the first reference direction and the second reference direction.

In addition, the grip part includes a first loader arm on which the bottom of the reticle is seated, a second loader arm extending from the first loader arm to cover an upper portion of the reticle, the first loader arm and the second loader. And a robot arm extending from the arm, wherein the first 'air spraying unit has a first air sprayer positioned in the first guide hole provided in the first loader arm and rotated in the reference range, and the second 'The air spray unit may be provided with a second air sprayer which is located inside the second guide hole provided in the second loader arm and rotates in the reference range.

Here, the first air injector and the second air injector may be swing-operated within the reference range.

In addition, each of the first air injector and the second air injector is driven in connection with a motor, the motor is connected to a control unit for receiving a signal for driving, and the control unit may be preset with the reference range. .

Hereinafter, with reference to the accompanying drawings, it will be described a reticle transfer device according to an embodiment of the present invention.

First, to describe the reticle transfer apparatus according to an embodiment of the present invention.

1 is a perspective view showing a reticle transfer device according to an embodiment of the present invention. 2 is a cross-sectional view taken along the line A-A 'shown in FIG. 3 is a cross-sectional view taken along the line BB ′ shown in FIG. 1.

Referring to FIG. 1, the reticle conveying apparatus provides air to an outer surface of the reticle 50 so as to be inclined based on a direction in which the grip part moves to a predetermined position to pick up the reticle 50. The cleaning part is provided.

The grip part includes a loader arm 100 that supports the bottom of the reticle 50, one end of which extends in a vertical direction from one end of the loader arm 100 in a vertical direction, and the other end of the loader arm 100. It is provided with a robot arm 200 extending a predetermined length to the other side. The robot arm 200 is connected to a driving device not shown. The driving device may serve to move the robot arm 200 along the movement direction X1, to rotate the robot arm 200 to change the movement direction, or to elevate the robot arm 200.

The loader arm 100 has a plurality of vacuum suction holes 110. The vacuum suction holes 110 are exposed to the outside through the upper surface of the loader arm 100. The vacuum suction holes 110 are connected to a vacuum suction force providing unit (not shown) to receive a vacuum suction force from the vacuum suction force providing unit.

In addition, the loader arm 100 and the robot arm 200 include a cleaning part.

2 and 3, the loader arm 100 has a first air spray unit for injecting air to be inclined to the bottom of the reticle 50, the robot arm 200 is the reticle 50 It has a second air spray unit for injecting air to be inclined to the upper surface of the. The first and second air spray units include an air providing unit (not shown) and a tube 312 connected to the air providing unit.

Here, the first air spraying unit has a first guide hole 310 formed in the end of the loader arm (100). The second air spray unit has a second guide hole 320 formed in the robot arm 200.

Referring to FIG. 2, the first guide hole 310 is a hole formed to be inclined at a predetermined angle θ1 along the moving direction X1 of the loader arm 100, and the first air spray unit The air supplied by the air is injected through the first guide hole 310.

The first guide hole 310 is connected to the tube 312, it is fixed by a fixing member 311. The fixing member 311 is fastened so as to be screwed into the bottom of the loader arm 100 at the periphery of the first guide hole 310. In addition, one end of the tube 312 is fastened to the fixing member 311.

Referring to FIG. 3, the second guide hole 320 is inclined at a predetermined angle θ2 along the moving direction X1 of the loader arm 100 to inject air to the upper surface of the reticle 50. It is a hall for. In addition, the second guide hole 320 may be a hole gradually expanding in the direction in which the air is injected. The second guide hole 320 is connected to the tube 312 at the rear of the robot arm 200. The method of fastening with the tube 312 of the second guide hole 320 is fastened in the same manner as the fixing member 311 as shown in FIG.

Next, to explain the operation and effect of the reticle transfer device according to an embodiment of the present invention configured as described above.

1 to 3, the robot arm 200 is moved to a position where the reticle 50 is loaded by a driving device (not shown). The loader arm 100 installed at the end of the robot arm 200 is moved to support the bottom surface of the reticle 50. In this case, the air providing unit provides air having a predetermined injection pressure to each of the first guide hole 310 and the second guide hole 320 through the tube 312. Of course, the air provided above is used to push and clean the particles present on the outer surface of the reticle 50 to a predetermined or more injection pressure. However, the above-mentioned air mentioned in the present invention may use another gas for cleaning the outer surface of the reticle 50, that is, a cleaning gas such as nitrogen.

Therefore, the air provided from the air provider is injected through the first guide hole 310 and the second guide hole 320. The air injected through the first guide hole 310 is injected toward the bottom surface of the reticle 50 to be inclined along the moving direction X1 of the loader arm 100. Therefore, the air injected through the first guide hole 310 may be cleaned by blowing particles existing on the bottom surface of the reticle 50 to the outside.

Meanwhile, the air injected through the second guide hole 320 is injected to be inclined toward the upper surface of the reticle 50 along the moving direction X1 of the loader arm 100. Therefore, air injected through the second guide hole 320 may be cleaned by blowing particles existing on the upper surface of the reticle 50 to the outside.

That is, the reticle 50 is cleaned by air injected from the first and second guide holes 310 and 320 before and after the upper surface and the bottom surface of the reticle 50 is seated on the loader arm 100. It is mounted on the), and is fixed by the suction through the vacuum suction hole 110 formed in the loader arm (100). Therefore, it is possible to prevent the occurrence of a vacuum error due to the particles that are present on the top and bottom of the reticle 50 flows into the vacuum suction hole (110).

Next, to describe the reticle transfer apparatus according to another embodiment of the present invention.

Figure 4 is a perspective view showing a reticle transfer device according to another embodiment of the present invention. FIG. 5 is a cross-sectional view taken along the line C-C 'shown in FIG. 4.

4 and 5, a reticle conveying apparatus according to another embodiment of the present invention is installed in the grip portion and the grip portion to inject air so as to be inclined toward the upper and lower surfaces of the reticle 50, but the reference range ( and a cleaning unit for spraying in δ) to clean the reticle 50.

The grip part includes a loader arm 150 on which the reticle 50 is seated, and a robot arm 160 connected to a predetermined length from an end of the loader arm 150.

The loader arm 150 extends from one end of the first loader arm 151 and the first loader arm 151 on which the bottom surface of the reticle 50 comes into close contact with the first loader arm 151. The second loader arm 152 is extended to cover a predetermined distance from the upper surface of the. A first guide hole 340 is formed in the first loader arm 152, and a second guide hole 330 is formed in the second loader arm 152.

The reference range δ is between a first reference direction ① along the direction X1 in which the reticle 50 moves and a second reference direction ② along the opposite direction to the moving direction x1. It may be a round trip range of.

The cleaning unit is installed on the first loader arm 151 located below the reticle 50, the first 'air injection unit for injecting air in the reference range (δ) to the bottom surface of the reticle 50, A second 'air spray unit installed on the second loader arm 152 to inject air into the upper surface of the reticle 50 within a reference range δ, and the first', 2 'air spray unit The control unit 430 for spraying the upper and lower surfaces of the reticle 50 in the reference range (δ) through.

Here, referring to FIG. 5, the first 'air injection unit is positioned inside the first guide hole 330 provided at the end of the first loader arm 151 and rotates in the reference range δ. A first air injector 410 is provided, the first air injector 410 is rotatably supported by a first rotation shaft 411 provided in the first guide hole 330, and the first rotation shaft 411 is The first motor 412 is connected, and the first motor 412 is electrically connected to the controller 430 to receive a driving signal.

The second 'air spray unit is provided with a second air sprayer 420 located inside the second guide hole 340 provided in the second loader arm 152 and rotated in the reference range δ. The second air injector 420 is rotatably supported by a second rotation shaft 421 provided in the second guide hole 340, and the second rotation shaft 421 is connected to the second motor 422. The second motor 422 is electrically connected to the controller 430 to receive a driving signal.

The control unit 430 may be a preset rotation angle range (herein, the reference range δ) of the first and second air injectors 410 and 420. Accordingly, the control unit 430 transmits an electrical signal to the first and second motors 412 and 422 to rotate the first and second rotation shafts 411 and 421 within the rotation angle range so as to rotate the first and second air injectors 410 and 420. Can be rotated.

Next, to explain the operation and effect of the reticle transfer apparatus according to another embodiment of the present invention having the configuration as described above.

4 and 5, the grip part is moved toward the reticle 50 to pick up the reticle 50 by receiving power from the outside. The reticle 50 may be positioned on the loader arm 150 of the grip part.

At this time, the upper and lower surfaces of the reticle 50 entering the loader arm 150 may be cleaned by the first and second air spray units.

That is, the controller 430 drives the first and second motors 412 and 422 to rotate the first and second air injectors 410 and 420 in the preset rotation angle range. By driving the first and second motors 412 and 422, the first and second air injectors 410 and 420 are rotated in the reference range δ which is a range between the first reference direction ① and the second reference direction ②. That is, the swing operation can be performed. At the same time, air is injected from the first and second air injectors 410 and 420 at a constant injection pressure.

Accordingly, the upper and lower surfaces of the reticle 50 entering the loader arm 150 are cleaned.

More specifically, the first air injector 410 swings in the reference range δ and injects air having a constant injection pressure to be inclined to the bottom of the reticle 50. Therefore, when following the first reference direction ①, air is provided on the bottom surface of the reticle 50 along the moving direction X1 of the loader arm 150, and when following the second reference direction ②, the air is reticle. It is provided on the bottom surface of the reticle 50 along the entry direction (-X1) (the direction opposite to the movement direction X1 of the loader arm) of 150. Therefore, the entire surface of the bottom surface of the reticle 50 may be evenly cleaned. In addition, the action of the second air injector 420 is also the same as the action of the first air injector. However, the second air injector 420 cleans the upper surface of the reticle 50.

Accordingly, more than half of the reticle 50 enters the loader arm 150, and if there is a particle that has not been cleaned before, it can be easily removed.

Therefore, the reticle 50 is cleaned by air injected while the upper and lower surfaces thereof swing within the reference range δ before being seated on the loader arm 150, and then the loader arm 150 It is seated in the suction is fixed through the vacuum suction hole 110 formed in the first loader arm 151. Therefore, it is possible to prevent the occurrence of a vacuum error due to the particles that are present on the top and bottom of the reticle 50 flows into the vacuum suction hole (110).

As described above, the present invention has the effect of removing the particles present on the top and bottom of the reticle.

In addition, the present invention has the effect that the vacuum adsorption force supplied to the loader arm to be supplied with a predetermined force in order to suck the reticle in a vacuum to stably adsorb the reticle.

In addition, the present invention also has the effect that the reticle can be normally seated on the reticle stage by transferring so that the seating position of the reticle gripped on the loader arm is not misaligned.

In addition, the present invention has an effect that can prevent the product loss due to breakage of the reticle by preventing the reticle from being separated from the loader arm during reticle transfer.

Claims (9)

A grip part moving to a predetermined position to pick up the reticle; And And a cleaning part provided on the grip part and supplying air to be inclined to the outer surface of the reticle. The method of claim 1, And the air is supplied to be inclined along a moving direction of the grip part. The method of claim 2, The cleaning unit includes a first air spray unit provided in the grip unit and spraying air toward the upper surface of the reticle, and a second air spray unit provided in the grip unit and spraying air toward the lower surface of the reticle, Reticle conveying apparatus, characterized in that the air spraying direction of the first air spraying unit and the second air spraying unit is inclined along the moving direction. The method of claim 3, wherein The grip part includes a loader arm on which the bottom surface of the reticle is seated, and a robot arm extending from the loader arm, The first air spray unit has a first guide hole formed in the loader arm to guide air to the bottom of the reticle, The second air spray unit has a second guide hole provided in the robot arm to guide air to the upper surface of the reticle, And the first guide hole and the second guide hole are formed along a direction inclined along the moving direction. The method of claim 1, And the air is reciprocally supplied between a first reference direction along a moving direction of the grip part and a second reference direction along a direction opposite to the moving direction. The method of claim 5, The cleaning unit includes a first 'air spray unit provided in the grip unit to inject air toward the upper surface of the reticle, a second' air spray unit provided in the grip unit to inject air toward the lower surface of the reticle, and the grip unit It is provided with a rotary unit for reciprocating the first 'air injection unit and the second' air injection unit within a reference range, And the reference range is a reciprocating range between the first reference direction and the second reference direction. The method of claim 6, The grip part includes a first loader arm on which a bottom surface of the reticle is seated, a second loader arm extending from the first loader arm to cover an upper portion of the reticle, and extending from the first loader arm and the second loader arm. Equipped with a robot arm, The first 'air spray unit is provided with a first air sprayer located inside the first guide hole provided in the first loader arm and rotated in the reference range. The second 'air spray unit is a reticle conveying device, characterized in that it comprises a second air sprayer which is located in the second guide hole provided in the second loader arm rotates in the reference range. The method of claim 7, wherein And the first air injector and the second air injector are swing-operated within the reference range. The method of claim 8, Each of the first air injector and the second air injector is driven in connection with a motor, and the motor is connected to a control unit for receiving a signal for driving. The control unit is a reticle transfer apparatus, characterized in that the reference range is preset.
KR1020070000574A 2007-01-03 2007-01-03 Reticle transfer apparatus KR20080063942A (en)

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KR1020070000574A KR20080063942A (en) 2007-01-03 2007-01-03 Reticle transfer apparatus

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KR1020070000574A KR20080063942A (en) 2007-01-03 2007-01-03 Reticle transfer apparatus

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111324017A (en) * 2018-12-17 2020-06-23 夏泰鑫半导体(青岛)有限公司 Mask robot and mask transfer method
CN112925174A (en) * 2021-01-28 2021-06-08 长鑫存储技术有限公司 Semiconductor lithographic apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111324017A (en) * 2018-12-17 2020-06-23 夏泰鑫半导体(青岛)有限公司 Mask robot and mask transfer method
CN112925174A (en) * 2021-01-28 2021-06-08 长鑫存储技术有限公司 Semiconductor lithographic apparatus

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