KR20070099699A - 니오브분말, 그 소결체, 그 화성체 및 그들을 사용한콘덴서 - Google Patents
니오브분말, 그 소결체, 그 화성체 및 그들을 사용한콘덴서 Download PDFInfo
- Publication number
- KR20070099699A KR20070099699A KR1020077020385A KR20077020385A KR20070099699A KR 20070099699 A KR20070099699 A KR 20070099699A KR 1020077020385 A KR1020077020385 A KR 1020077020385A KR 20077020385 A KR20077020385 A KR 20077020385A KR 20070099699 A KR20070099699 A KR 20070099699A
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- South Korea
- Prior art keywords
- niobium
- capacitor
- particles
- mass
- group
- Prior art date
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- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 title claims abstract description 279
- 239000003990 capacitor Substances 0.000 title claims abstract description 102
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 312
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 163
- 239000002245 particle Substances 0.000 claims abstract description 148
- 239000010955 niobium Substances 0.000 claims description 205
- 229910052758 niobium Inorganic materials 0.000 claims description 205
- 238000010438 heat treatment Methods 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 32
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 30
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 29
- 229920001940 conductive polymer Polymers 0.000 claims description 28
- 239000004065 semiconductor Substances 0.000 claims description 26
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 20
- 229910052760 oxygen Inorganic materials 0.000 claims description 18
- 239000001301 oxygen Substances 0.000 claims description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 150000001450 anions Chemical class 0.000 claims description 15
- 239000002019 doping agent Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 229920006395 saturated elastomer Polymers 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 12
- 229910052786 argon Inorganic materials 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 125000004122 cyclic group Chemical group 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 125000004417 unsaturated alkyl group Chemical group 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000008151 electrolyte solution Substances 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 229920000128 polypyrrole Polymers 0.000 claims description 4
- 229920000123 polythiophene Polymers 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 claims description 3
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 3
- 125000005907 alkyl ester group Chemical group 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 230000005496 eutectics Effects 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 3
- 229920000767 polyaniline Polymers 0.000 claims description 3
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 claims description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Chemical group 0.000 claims description 3
- 125000001302 tertiary amino group Chemical group 0.000 claims description 3
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 239000002861 polymer material Substances 0.000 claims description 2
- 239000003989 dielectric material Substances 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000011163 secondary particle Substances 0.000 description 65
- 230000000052 comparative effect Effects 0.000 description 38
- 239000011164 primary particle Substances 0.000 description 23
- 150000001875 compounds Chemical class 0.000 description 21
- -1 CF 3 groups Chemical group 0.000 description 19
- 239000000243 solution Substances 0.000 description 19
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 16
- 230000006698 induction Effects 0.000 description 15
- 239000007800 oxidant agent Substances 0.000 description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 12
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 11
- 241000220259 Raphanus Species 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 229940071125 manganese acetate Drugs 0.000 description 6
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000005469 granulation Methods 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- 238000010298 pulverizing process Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 4
- 235000006140 Raphanus sativus var sativus Nutrition 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- PYLYNBWPKVWXJC-UHFFFAOYSA-N [Nb].[Pb] Chemical compound [Nb].[Pb] PYLYNBWPKVWXJC-UHFFFAOYSA-N 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229920000137 polyphosphoric acid Polymers 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- ROSDCCJGGBNDNL-UHFFFAOYSA-N [Ta].[Pb] Chemical compound [Ta].[Pb] ROSDCCJGGBNDNL-UHFFFAOYSA-N 0.000 description 2
- AFPRJLBZLPBTPZ-UHFFFAOYSA-N acenaphthoquinone Chemical compound C1=CC(C(C2=O)=O)=C3C2=CC=CC3=C1 AFPRJLBZLPBTPZ-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000007773 negative electrode material Substances 0.000 description 2
- 230000001546 nitrifying effect Effects 0.000 description 2
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 2
- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 2
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 2
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical compound C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 1
- 229940105324 1,2-naphthoquinone Drugs 0.000 description 1
- 229940005561 1,4-benzoquinone Drugs 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical compound CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 description 1
- YMUICPQENGUHJM-UHFFFAOYSA-N 2-methylpropyl(tripropyl)azanium Chemical compound CCC[N+](CCC)(CCC)CC(C)C YMUICPQENGUHJM-UHFFFAOYSA-N 0.000 description 1
- TVEXGJYMHHTVKP-UHFFFAOYSA-N 6-oxabicyclo[3.2.1]oct-3-en-7-one Chemical compound C1C2C(=O)OC1C=CC2 TVEXGJYMHHTVKP-UHFFFAOYSA-N 0.000 description 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 1
- 229940076442 9,10-anthraquinone Drugs 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- 229910016467 AlCl 4 Inorganic materials 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 241000283690 Bos taurus Species 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 241000723346 Cinnamomum camphora Species 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 1
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- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
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- 239000010405 anode material Substances 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- RGHILYZRVFRRNK-UHFFFAOYSA-N anthracene-1,2-dione Chemical compound C1=CC=C2C=C(C(C(=O)C=C3)=O)C3=CC2=C1 RGHILYZRVFRRNK-UHFFFAOYSA-N 0.000 description 1
- LSOTZYUVGZKSHR-UHFFFAOYSA-N anthracene-1,4-dione Chemical compound C1=CC=C2C=C3C(=O)C=CC(=O)C3=CC2=C1 LSOTZYUVGZKSHR-UHFFFAOYSA-N 0.000 description 1
- ILFFFKFZHRGICY-UHFFFAOYSA-N anthracene-1-sulfonic acid Chemical compound C1=CC=C2C=C3C(S(=O)(=O)O)=CC=CC3=CC2=C1 ILFFFKFZHRGICY-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229930006711 bornane-2,3-dione Natural products 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229930008380 camphor Natural products 0.000 description 1
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- 150000001768 cations Chemical class 0.000 description 1
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- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
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- 230000007423 decrease Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
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- 238000005755 formation reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
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- 238000007429 general method Methods 0.000 description 1
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- 150000004820 halides Chemical class 0.000 description 1
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- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
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- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- SLBHRPOLVUEFSG-UHFFFAOYSA-N naphthalene-2,6-dione Chemical compound O=C1C=CC2=CC(=O)C=CC2=C1 SLBHRPOLVUEFSG-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- 150000002822 niobium compounds Chemical class 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 229920000867 polyelectrolyte Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000414 polyfuran Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- RLCOXABDZNIZRQ-UHFFFAOYSA-N pyrene-2,7-dione Chemical compound C1=CC2=CC(=O)C=C(C=C3)C2=C2C3=CC(=O)C=C21 RLCOXABDZNIZRQ-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 125000004151 quinonyl group Chemical group 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- HIEHAIZHJZLEPQ-UHFFFAOYSA-M sodium;naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 HIEHAIZHJZLEPQ-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/145—Chemical treatment, e.g. passivation or decarburisation
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
실시예 및 비교예 | 1차 입자의 평균 입자지름 | 니오브 분말의 처리(온도, 시간) | 평균 질소농도 (질량%) | 누설전류 (㎂) | |||
질소 1atm하 | 아르곤 1atm하 | 진공하 | 표면~50nm | 깊이 50~200nm | |||
실시예 1 | 1 | 400℃ 1시간 | 800℃ 2시간 | 무 | 0.3 | 0.3 | 2.0 |
비교예 1 | 1 | 무 | 무 | 무 | 0.0 | 0.0 | 62.3 |
비교예 2 | 1 | 400℃ 1시간 | 무 | 무 | 0.7 | 0.2 | 43.4 |
실시예 2 | 1 | 400℃ 1시간 | 800℃ 2시간 | 800℃ 10분 | 0.1 | 0.3 | 9.2 |
실시예 3 | 1 | 500℃ 1시간 | 무 | 무 | 1.7 | 0.9 | 10.5 |
실시예 4 | 1 | 500℃ 1시간 | 800℃ 2시간 | 무 | 0.9 | 0.9 | 5.8 |
실시예 5 | 1 | 500℃ 1시간 | 800℃ 2시간 | 800℃ 10분 | 0.2 | 0.9 | 3.5 |
실시예 6 | 1 | 600℃ 1시간 | 무 | 무 | 5.3 | 3.2 | 10.9 |
실시예 7 | 1 | 600℃ 1시간 | 800℃ 2시간 | 무 | 3.4 | 3.4 | 8.8 |
실시예 8 | 1 | 600℃ 1시간 | 800℃ 2시간 | 800℃ 10분 | 0.5 | 3.4 | 2.1 |
비교예 4 | 1 | 700℃ 1시간 | 800℃ 2시간 | 무 | 5.3 | 5.3 | 84.6 |
비교예 5 | 1 | 700℃ 1시간 | 800℃ 2시간 | 800℃ 10분 | 0.5 | 5.2 | 23.6 |
실시예 9 | 2 | 400℃ 1시간 | 무 | 무 | 0.7 | 0.3 | 1.1 |
실시예 10 | 0.5 | 400℃ 1시간 | 무 | 무 | 0.7 | 0.3 | 5.9 |
Claims (20)
- 질소를 함유하는 콘덴서용 니오브 분말에 있어서,니오브 입자 표면에서의 깊이 50~200nm까지의 범위의 평균질소농도가, 0.29~4질량%이고,니오브 입자 표면에서 깊이 50nm까지의 범위의 평균질소농도가, 깊이 50~200nm까지의 범위의 평균질소농도 보다 작거나 같고, 또한 0.1질량% 이상인 것을 특징으로 하는 니오브 분말.
- 질소를 함유하는 콘덴서용 니오브 분말에 있어서,니오브 입자 표면에서의 깊이 50~200nm까지의 범위의 평균질소농도가 0.29~4질량%이고,니오브 입자 표면에서 깊이 50nm까지의 범위의 평균질소농도가 0.19~1질량%인 것을 특징으로 하는 니오브 분말.
- 제1항 또는 제2항에 있어서, 니오브 분말 입자가 0.1∼1000㎛의 입자지름을 갖는 것을 특징으로 하는 니오브 분말.
- 제1항 또는 제2항에 있어서, 니오브 분말 입자가 0.5∼40㎡/g의 비표면적을 갖는 것을 특징으로 하는 니오브 분말.
- 제1항 또는 제2항에 기재된 니오브 분말을 소결해서 얻어지는 것을 특징으로 하는 소결체.
- 양극 산화에 의해, 제5항에 기재된 소결체 표면상에 산화 니오브를 주체로 하는 유전체를 형성한 것을 특징으로 하는 소결체.
- 제5항에 기재된 소결체를 한쪽의 전극으로 하고, 그 소결체 표면상에 형성된 산화 니오브를 주체로 하는 유전체와, 상기 유전체 상에 형성된 상대전극으로 구성된 것을 특징으로 하는 콘덴서.
- 제7항에 있어서, 상대전극이 전해액, 유기반도체 및 무기반도체로 이루어지는 군에서 선택되는 1종 이상인 것을 특징으로 하는 콘덴서.
- 제8항에 있어서, 상대전극이 유기반도체이고, 그 유기반도체가 벤조피롤린 4량체와 클로라닐로 이루어지는 유기반도체, 테트라티오테트라센을 주성분으로 하는 유기반도체, 테트라시아노퀴노디메탄을 주성분으로 하는 유기반도체 및 도전성 고분자로 이루어지는 군에서 선택되는 1종 이상의 재료인 것을 특징으로 하는 콘덴서.
- 제9항에 있어서, 도전성 고분자가 폴리피롤, 폴리티오펜, 폴리아닐린 및 이들의 치환 유도체로부터 선택되는 1종 이상인 것을 특징으로 하는 콘덴서.
- 제9항에 있어서, 도전성 고분자가, 하기 일반식(1) 또는 일반식(2)(식 중, R1∼R4는 각각 독립하여 수소원자, 탄소수 1∼10의 직쇄상 혹은 분기상의 포화 혹은 불포화의 알킬기, 알콕시기 혹은 알킬에스테르기, 또는 할로겐원자, 니트로기, 시아노기, 1급, 2급 혹은 3급 아미노기, CF3기, 페닐기 및 치환페닐기로 이루어지는 군으로부터 선택되는 1가기를 나타낸다. R1과 R2 및 R3과 R4의 탄화수소쇄는 서로 임의의 위치에서 결합하고, 이러한 기에 의해 치환을 받고 있는 탄소원자와 함께 하나 이상의 3∼7원환의 포화 또는 불포화 탄화수소의 환상구조를 형성하는 2가쇄를 형성해도 좋다. 상기 환상 결합쇄에는, 카르보닐, 에테르, 에스테르, 아미드, 술피드, 술피닐, 술포닐, 이미노의 결합을 임의의 위치에 함유하여도 좋다. X는 산소, 유황 또는 질소원자를 나타내고, R5는 X가 질소원자일 때만 존 재하고, 독립해서 수소 또는 탄소수 1∼10의 직쇄상 혹은 분기상의 포화 혹은 불포화의 알킬기를 나타낸다.)로 표시되는 반복단위를 포함하는 중합체에, 도펀트를 도핑한 도전성 고분자인 것을 특징으로 하는 콘덴서.
- 제12항에 있어서, 도전성 고분자가 폴리(3,4-에틸렌디옥시티오펜)에 도펀트를 도핑한 도전성 고분자인 것을 특징으로 하는 콘덴서.
- 제7항에 있어서, 상대전극이 층상구조를 적어도 일부에 갖는 도전성 고분자재료로 이루어지는 것을 특징으로 하는 콘덴서.
- 제7항에 있어서, 상대전극이 유기술폰산 음이온을 도펀트로서 함유하는 재료로 이루어지는 것을 특징으로 하는 콘덴서.
- 제5항의 니오브 소결체를 한쪽의 전극으로 하고, 그 소결체 표면상에 형성된 산화 니오브를 주체로 하는 유전체막과, 상기 유전체 상에 형성된 상대전극으로 구성된 콘덴서에 있어서, 한쪽의 전극인 니오브 소결체의 평균 질소농도가 0.3∼4질량%인 것을 특징으로 하는 콘덴서.
- 제16항에 있어서, 산화 니오브를 주체로 하는 유전체의 평균 질소농도가 0.2∼1질량%인 것을 특징으로 하는 콘덴서.
- 제1항 또는 제2항에 기재된 질소를 함유하는 콘덴서용 니오브 분말의 제조방법에 있어서, 질소를 함유하는 니오브 분말을 불활성 가스 분위기 중에서 가열하는 공정을 포함하는 것을 특징으로 하는 니오브 분말의 제조방법.
- 제18항에 있어서, 질소를 함유하는 니오브 분말을 진공 중에서 가열하는 공 정을 포함하는 것을 특징으로 하는 니오브 분말의 제조방법.
- 제18항에 있어서, 불활성 가스가 아르곤인 것을 특징으로 하는 니오브 분말의 제조방법.
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KR10-2003-7009261A KR20040030487A (ko) | 2001-10-02 | 2002-10-01 | 니오브분말, 그 소결체, 그 화성체 및 그들을 사용한 콘덴서 |
KR1020057024274A KR20060006105A (ko) | 2001-10-02 | 2002-10-01 | 니오브분말, 그 소결체, 그 화성체 및 그들을 사용한콘덴서 |
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EP (1) | EP1434243B1 (ko) |
JP (3) | JPWO2003032344A1 (ko) |
KR (3) | KR100784335B1 (ko) |
CN (1) | CN100456399C (ko) |
AT (1) | ATE456852T1 (ko) |
BR (1) | BRPI0206094B1 (ko) |
DE (1) | DE60235247D1 (ko) |
WO (1) | WO2003032344A1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2006068302A1 (ja) * | 2004-12-24 | 2006-06-29 | Showa Denko K.K. | 固体電解コンデンサ素子、固体電解コンデンサ及びその製造方法 |
US7423862B2 (en) | 2004-12-24 | 2008-09-09 | Showa Denko K.K. | Solid electrolytic capacitor element, solid electrolytic capacitor and production method thereof |
DE102005043829A1 (de) * | 2005-09-13 | 2007-04-05 | H.C. Starck Gmbh | Verfahren zur Herstellung von Elektrolytkondensatoren mit hoher Nennspannung |
CN100528418C (zh) * | 2008-01-11 | 2009-08-19 | 宁夏东方钽业股份有限公司 | 含氮均匀的阀金属粉末及其制造方法,阀金属坯块和阀金属烧结体以及电解电容器的阳极 |
DE102013206603A1 (de) * | 2013-04-12 | 2014-10-16 | H.C. Starck Gmbh | Verfahren zur Herstellung von sauerstoffarmen Ventilmetallsinterkörpern mit hoher Oberfläche |
CN105612013A (zh) * | 2013-10-08 | 2016-05-25 | 昭和电工株式会社 | 铌造粒粉末的制造方法 |
CN104021940B (zh) * | 2014-05-29 | 2016-09-07 | 中国振华(集团)新云电子元器件有限责任公司 | 一种降低氧化铌电容器等效串联电阻的阴极制备工艺 |
JP2019145696A (ja) * | 2018-02-22 | 2019-08-29 | パナソニックIpマネジメント株式会社 | 電解コンデンサ |
WO2022044932A1 (ja) * | 2020-08-27 | 2022-03-03 | パナソニックIpマネジメント株式会社 | 電解コンデンサ用電極箔、電解コンデンサ、電解コンデンサ用電極箔の製造方法および電解コンデンサの製造方法 |
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KR200142216Y1 (ko) * | 1994-09-29 | 1999-06-01 | 정몽규 | 자동차용 부유 엔진 마운트 |
US6185090B1 (en) * | 1997-01-29 | 2001-02-06 | Vishay Sprague, Inc. | Method for doping sintered tantalum and niobium pellets with nitrogen |
JP3254163B2 (ja) * | 1997-02-28 | 2002-02-04 | 昭和電工株式会社 | コンデンサ |
US6051044A (en) * | 1998-05-04 | 2000-04-18 | Cabot Corporation | Nitrided niobium powders and niobium electrolytic capacitors |
US6515846B1 (en) * | 1999-02-08 | 2003-02-04 | H.C. Starck, Inc. | Capacitor substrates made of refractory metal nitrides |
JP4547730B2 (ja) * | 1999-06-22 | 2010-09-22 | 株式会社村田製作所 | 電解コンデンサ用電極、電解コンデンサ及びこれらの製造法 |
JP4049964B2 (ja) * | 2000-02-08 | 2008-02-20 | キャボットスーパーメタル株式会社 | 窒素含有金属粉末およびその製造方法ならびにそれを用いた多孔質焼結体および固体電解コンデンサー |
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Also Published As
Publication number | Publication date |
---|---|
EP1434243A4 (en) | 2006-07-26 |
KR20060006105A (ko) | 2006-01-18 |
JPWO2003032344A1 (ja) | 2005-01-27 |
BR0206094A (pt) | 2004-01-13 |
JP2009124162A (ja) | 2009-06-04 |
BRPI0206094B1 (pt) | 2016-10-25 |
WO2003032344A1 (en) | 2003-04-17 |
CN1486498A (zh) | 2004-03-31 |
DE60235247D1 (de) | 2010-03-18 |
EP1434243A1 (en) | 2004-06-30 |
KR20040030487A (ko) | 2004-04-09 |
JP5601692B2 (ja) | 2014-10-08 |
KR100784335B1 (ko) | 2007-12-14 |
JP4906130B2 (ja) | 2012-03-28 |
EP1434243B1 (en) | 2010-01-27 |
JP2012069967A (ja) | 2012-04-05 |
CN100456399C (zh) | 2009-01-28 |
ATE456852T1 (de) | 2010-02-15 |
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