KR20070078713A - 유기 화합물의 증착장치 및 증착방법 - Google Patents
유기 화합물의 증착장치 및 증착방법 Download PDFInfo
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- KR20070078713A KR20070078713A KR1020070008127A KR20070008127A KR20070078713A KR 20070078713 A KR20070078713 A KR 20070078713A KR 1020070008127 A KR1020070008127 A KR 1020070008127A KR 20070008127 A KR20070008127 A KR 20070008127A KR 20070078713 A KR20070078713 A KR 20070078713A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
- (A) 복수의 증착원;(B) 피성막 기판을 유지하는 유지부재;(C) 증착원과 피성막 기판 사이에 배치되어, 상기 복수의 증착원에 대응하도록 각각 독립적으로 배치된 개구를 지닌 개구 부재; 및(D) 피성막 기판과, 증착원 및 개구 부재의 적어도 한쪽을 상기 유지된 피성막 기판을 포함하는 면에 평행인 면 내의 1 방향으로 이동시키는 이동수단을 포함하고,상기 복수개의 증착원은 상기 이동방향에 교차하는 방향인 상기 면내 방향을 따라 배치되어 있고,상기 개구의 이동 방향의 중앙에서의 폭이 상기 개구의 단부에서의 폭보다 작은 것을 특징으로 하는 증착장치.
- 제 1항에 있어서, 상기 복수의 증착원 사이에 배치된 칸막이 부재를 추가로 포함하는 것을 특징으로 하는 증착장치.
- 제 2항에 있어서, 상기 칸막이 부재는 상기 증착원과 상기 개구 부재 사이의 공간 및 상기 개구 부재와 상기 피성막 기판 사이의 공간에 모두 배치되어 있는 것을 특징으로 하는 증착장치.
- 제 1항에 있어서, 상기 개구의 상기 1 방향의 폭은 이웃하는 개구에 근접한 일단부 쪽이 타단부 쪽보다 작은 것을 특징으로 하는 증착장치.
- 제 1항에 있어서, 상기 이동수단은 상기 피성막 기판을 이동시키는 수단인 것을 특징으로 하는 증착장치.
- 제 1항에 있어서, 상기 증착원으로부터 증발된 증착 재료의 증발속도분포는 상기 증착원의 중심에 대해서 동심원 형상 또는 동심 타원형상인 것을 특징으로 하는 증착장치.
- (A) 복수의 증착원;(B) 피성막 기판을 유지하는 유지부재;(C) 증착원과 피성막 기판 사이에 배치되어, 상기 복수의 증착원에 대응하도록 각각 독립적으로 배치된 복수의 개구 부재;(D) 피성막 기판과, 증착원 및 개구 부재의 적어도 한쪽을 상기 유지된 피성막 기판을 포함하는 면에 평행인 면 내의 1 방향으로 이동시키는 이동수단; 및(E) 상기 복수의 증착원 사이에 배치된 칸막이 부재를 포함하고,상기 복수개의 증착원은 상기 이동방향에 교차하는 방향인 상기 면내 방향을 따라 배치되어 있고,개구의 이동 방향의 각 개구의 중앙에서의 폭이 상기 각 개구의 단부에서의 폭보다 작은 것을 특징으로 하는 증착장치.
- 유기 화합물의 증착 공정을 포함하는 유기발광소자의 제조방법으로서,상기 유기 화합물의 증착 공정은피성막 기판과, 복수의 증착원 및 개구 부재의 적어도 한쪽을 상기 피성막 기판을 포함하는 면에 평행인 면 내의 1 방향으로 이동시키는 공정;상기 증착원으로부터 유기 화합물을 증발시키는 공정; 및상기 증발된 유기 화합물을 상기 개구부재를 통과시켜 상기 피성막 기판에 막을 형성하는 공정을 포함하고;상기 개구 부재는 복수의 개구를 지니고 있고;상기 각 개구의 1 방향의 각 개구의 중앙에서의 폭이 상기 각 개구의 단부에서의 폭보다 작고;상기 복수의 개구는 각각의 복수의 증착원에 대응하도록 각각 독립적으로 배치되어 있는 것을 특징으로 하는 유기 발광소자의 제조방법.
- 전극을 지닌 기판상에 배열된 복수의 화소에, 상기 배열된 화소에 대응하는 복수의 개구를 지닌 마스크를 통해 유기 화합물층을 형성하기 위한 유기 화합물의 증착방법으로서,증착원을 상기 기판 및 마스크에 대해서 제 1 방향으로 상대적으로 이동시키 면서 상기 증착원으로부터 증발된 유기 화합물을 상기 마스크를 통해서 상기 기판상에 퇴적시키는 증착 공정을 포함하고,상기 마스크의 개구 면적은 상기 증착원 쪽으로부터 상기 기판을 향해서 상기 마스크의 두께 방향으로 감소되는 것을 특징으로 하는 유기 화합물의 증착방법.
- 전극을 지닌 기판상에 배열된 복수의 화소에, 상기 화소 배열에 대응하는 복수의 개구를 지닌 마스크를 통해 유기 화합물층을 형성하기 위한 유기 화합물의 증착방법으로서,증착원을 상기 기판 및 마스크에 대해서 제 1 방향으로 상대적으로 이동시키면서 상기 증착원으로부터 증발된 유기 화합물을 상기 마스크를 통해서 상기 기판상에 퇴적시키는 증착 공정을 포함하고,상기 마스크의 일부에 있어서, 상기 마스크의 개구의 각각의 중심과 상기 화소의 각각의 중심은 상기 제 1 방향과 직교하는 제 2 방향에서 서로 어긋나 있는 것을 특징으로 하는 유기 화합물의 증착방법.
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JP2006018519 | 2006-01-27 | ||
JPJP-P-2006-00018519 | 2006-01-27 | ||
JPJP-P-2007-00001935 | 2007-01-10 | ||
JP2007001935A JP5064810B2 (ja) | 2006-01-27 | 2007-01-10 | 蒸着装置および蒸着方法 |
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KR20070078713A true KR20070078713A (ko) | 2007-08-01 |
KR100837475B1 KR100837475B1 (ko) | 2008-06-12 |
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KR1020070008127A KR100837475B1 (ko) | 2006-01-27 | 2007-01-26 | 증착장치 및 유기발광소자의 제조방법 |
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US (1) | US20070178708A1 (ko) |
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Also Published As
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JP2007227359A (ja) | 2007-09-06 |
KR100837475B1 (ko) | 2008-06-12 |
JP5064810B2 (ja) | 2012-10-31 |
US20070178708A1 (en) | 2007-08-02 |
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