KR20010047275A - Apparatus for Low-Temperature Plasma Treatment oftextile fiber - Google Patents

Apparatus for Low-Temperature Plasma Treatment oftextile fiber Download PDF

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Publication number
KR20010047275A
KR20010047275A KR1019990051414A KR19990051414A KR20010047275A KR 20010047275 A KR20010047275 A KR 20010047275A KR 1019990051414 A KR1019990051414 A KR 1019990051414A KR 19990051414 A KR19990051414 A KR 19990051414A KR 20010047275 A KR20010047275 A KR 20010047275A
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South Korea
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fiber
plasma
temperature plasma
low temperature
processing apparatus
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KR1019990051414A
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Korean (ko)
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석창길
권대혁
전춘배
최진광
강창훈
김준태
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석창길
권대혁
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Priority to KR1019990051414A priority Critical patent/KR20010047275A/en
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    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • D—TEXTILES; PAPER
    • D10—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
    • D10B—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
    • D10B2401/00—Physical properties
    • D10B2401/20—Physical properties optical

Abstract

PURPOSE: A low temperature plasma treating apparatus of a fiber product in which a cooling apparatus is installed at a position to form plasma in a vacuum chamber to cool and condensate moisture of fibers itself is provided, which reduces the treating time of fibers and maximizes the stability and efficiency of a vacuum system. CONSTITUTION: The apparatus is characterized in that a cooling apparatus(3) is installed at a position to form plasma in a vacuum chamber(1) such that the pressure in a plasma process can be effectively dropped by condensing moisture of fibers itself. And the apparatus can effectively control fiber treatment processes as compared to wet treatment methods.

Description

저온 플라즈마 섬유 처리 장치{Apparatus for Low-Temperature Plasma Treatment oftextile fiber}Apparatus for Low-Temperature Plasma Treatment of textile fiber

본 발명은 저온 플라즈마 섬유 처리 장치에 관한 것이다. 본 발명에서는 진공 챔브 내에서 플라즈마가 형성될 부분에 냉각 장치를 부착함으로써, 섬유의 자체 수분을 냉각하여 응축시킴으로써, 효율적으로 플라즈마 처리 부분의 압력을 빠른 시간에 떨어뜨림으로써, 플라즈마 처리에 필요한 공정 압력 도달시간을 효과적으로 단축함으로써 , 플라즈마 섬유처리의 시간 단축을 목적으로 한다. 또한 수증기의 배기를 최소화 함으로써 진공 시스템의 안정성 및 효율을 최대화함을 목적으로 한다.The present invention relates to a low temperature plasma fiber processing apparatus. In the present invention, by attaching a cooling device to the portion where the plasma is to be formed in the vacuum chamber, by cooling and condensing its own moisture of the fiber, by effectively dropping the pressure of the plasma treatment portion in a short time, the process pressure required for the plasma treatment It is aimed at shortening the time of plasma fiber treatment by effectively shortening the arrival time. It also aims to maximize the stability and efficiency of the vacuum system by minimizing the evacuation of water vapor.

종래의 섬유 표면 처리는 산, 알칼리 수용액등에 섬유를 함침하는 습식 처리로 수행되었다. 습식처리는 산, 알칼리 등과 같은 유해한 화학용액이 다량으로 소모되기 때문에 인체 유해도가 높은 공정으로 인식되고 있다. 또한 공정상의 복잡성과 그에 따른 공정 제어가 어려운 단점이 있다.Conventional fiber surface treatment has been carried out by a wet treatment in which fibers are impregnated with an acid, an aqueous alkali solution or the like. Wet treatment is recognized as a process with high human hazards because it consumes a large amount of harmful chemical solutions such as acids and alkalis. In addition, there is a disadvantage in the complexity of the process and the process control accordingly.

본 발명은 상기한 바와 같은 종래기술의 문제점을 해소하기 위하여, 저온 플라즈마를 이용한 섬유 표면 장치를 고안하였다. 섬유는 대기중에 방치하거나 습식세척 등의 전처리 공정에 의하여 5∼20%의 수분을 함유하고 있기 때문에, 저온 플라즈마 표면처리시 챔버내를 플라즈마 공정 압력으로 낮추는데 많은 시간이 소요된다. 상기와 같은 단점을 해결하기 위하여 본 발명에서는 진공 챔브 내에서 플라즈마가 형성될 부분에 냉각 장치를 부착함으로써, 섬유의 자체 수분을 냉각하여 응축시킴으로써, 효율적으로 플라즈마 처리 부분의 압력을 빠른 시간에 떨어뜨림으로써, 플라즈마 처리에 필요한 공정 압력 도달시간을 효과적으로 단축시킬 수 있는 저온 플라즈마 섬유 처리 장치를 고안하였다.The present invention has devised a fiber surface device using a low temperature plasma in order to solve the problems of the prior art as described above. Since the fiber contains 5 to 20% of moisture by pretreatment such as being left in the air or by wet washing, it takes a long time to lower the inside of the chamber to the plasma process pressure during the low temperature plasma surface treatment. In order to solve the above disadvantages, in the present invention, by attaching a cooling device to the portion where the plasma is to be formed in the vacuum chamber, by cooling and condensing its own moisture of the fiber, the pressure of the plasma treatment portion is effectively reduced in a short time. As a result, a low-temperature plasma fiber processing apparatus has been devised that can effectively shorten the process pressure attainment time required for plasma processing.

도1. 저온 플라즈마 섬유 처리 장치의 구성도Figure 1. Configuration diagram of low temperature plasma fiber processing device

(1) 진공 챔버 (2) 냉동 장치가 장착된 슬립관(1) vacuum chamber (2) slip tube with refrigeration unit

(3) 냉동 장치 (4) 가동 롤러(3) refrigeration unit (4) movable roller

(5) 시작 롤러 (6) 최종 롤러(5) starting roller (6) final roller

(7) 전극 (8) 플라즈마 형성 가스(7) electrode (8) plasma forming gas

(9) 진공 펌프 (10) 섬유 인입(출)구 (11) 섬유(9) Vacuum pump (10) Fiber inlet / outlet (11) Fiber

저온 플라즈마를 이용한 섬유 처리 장치의 구성도를 도 1 에 나타내었다. 본 장치의 구성 및 작동은 다음과 같다.The structure of the fiber processing apparatus using a low temperature plasma is shown in FIG. The configuration and operation of the device is as follows.

먼저 진공 챔버(1) 내의 시작 롤러(5)와 최종롤러(6)에 섬유(11)를 삽입한다. 진공 펌프(9)로 진공 챔버내의 대기를 배기하면서 냉동 장치(3)를 가동 시켜 냉동장치가 장착된 슬립관(2)의 온도를 0 □ 이하로 낮춘다. 가동 롤러(4)를 가동시켜 섬유를 인입구(10)를 통해 슬립관 내부로 이동시킨다. 이때 섬유의 자체 수분은 섬유로부터 이탈하여 냉각기에 응축된다. 그 결과 슬립관 내의 압력은 급격히 낮아지게 된다. 여기서 챔버 내의 압력을 진공 펌프를 이용하여 전체적으로 낮추는것이 아니고 냉각 장치를 이용하여 슬립관 내의 압력을 급격히 낮춤으로써 슬립관 외부의 압력과 차별화하여 효율적이고 빠른 시간에 공정을 진행 시킬수 있다First, the fibers 11 are inserted into the starting roller 5 and the final roller 6 in the vacuum chamber 1. The refrigeration apparatus 3 is operated while evacuating the atmosphere in the vacuum chamber by the vacuum pump 9 to lower the temperature of the slip tube 2 equipped with the refrigeration apparatus to 0 □ or less. The movable roller 4 is operated to move the fiber through the inlet 10 into the slip tube. At this time, the fiber's own moisture leaves the fiber and condenses in the cooler. As a result, the pressure in the slip tube is drastically lowered. Here, instead of lowering the pressure in the chamber as a whole by using a vacuum pump, the pressure in the slip tube is drastically lowered by using a cooling device to differentiate the pressure from the outside of the slip tube so that the process can be performed efficiently and quickly.

이상 기체의 기체 방적식에 의하면, 동일한 체적(V)에서 온도(T)가 낮아지면 압력(P)이 낮아진다.According to the gas spinning equation of the ideal gas, when the temperature T is lowered at the same volume V, the pressure P is lowered.

pv = nkT (p: 압력 v: 체적 T: 온도(K))pv = nkT (p: pressure v: volume T: temperature (K))

이 원리를 이용하여 원하는 압력을 형성시킨 후 플라즈마 형성 가스(8)를 주입시켜, 압력이 안정되었을 때 전극(7)에 고주파 전압을 인가하여 저온 플라즈마를 형성시킨다. 본 발명의 저온 플라즈마를 이용한 섬유 표면 처리의 활용예는 두 가지이다. 첫째는 플라즈마 형성 가스로 아르곤과 같은 불활성 가스를 주입하여 섬유 표면을 식각하거나 활성화 함으로써 섬유 표면의 조면화를 향상시켜 폴리에스터 섬유의 심색성를 개선하는 활용예와 , 둘째는 고분자 형성 가스를 주입하여 플라즈마 개시중합에 의한 불소 화합물을 섬유표면에 코팅할 수 있는 활용예이다. 그다음으로 최종 롤러를 가동시켜 계속적으로 섬유를 이동시켜 일괄 공정으로 저온 플라즈마 처리를 할 수 있다. 섬유가 시작 롤러에서 최종 롤러로 모든 이동되면 전계를 인가하는 스위치를 닫고, 가스 주입을 멈춘다음 질소를 주입시켜 챔버내를 세척한 다음 로타리 펌프를 멈추고 챔버 내를 상압으로 맞춘다음 표면 개질된 섬유를 밖으로 인출한다.By using this principle, a desired pressure is formed and then a plasma forming gas 8 is injected, and a low temperature plasma is formed by applying a high frequency voltage to the electrode 7 when the pressure is stabilized. There are two examples of application of the fiber surface treatment using the low temperature plasma of the present invention. First, an inert gas such as argon is injected into the plasma forming gas to etch or activate the surface of the fiber, thereby improving the roughening of the surface of the fiber and improving the color depth of the polyester fiber. It is an application example which can coat the surface of a fluorine compound by initiation polymerization. The final rollers can then be operated to continuously move the fibers to be subjected to low temperature plasma treatment in a batch process. When the fiber has moved all the way from the starting roller to the final roller, close the switch that applies the electric field, stop the gas injection, flush the chamber with nitrogen, stop the rotary pump, set the chamber to atmospheric pressure, and remove the surface-modified fiber. Withdraw out.

상기의 작동에 의하면 ,섬유 표면을 플라즈마를 이용한 건식 처리 방법을 이용함에 있어서, 섬유 자체의 수분을 냉각 장치를 이용하여 냉각 시켜 응축함으로써, 특정 부분의 압력을 빠른 시간에 원하는 수준으로 낮추기가 쉬운 장점이 있다.According to the above operation, in the dry treatment method using the plasma surface, by using the cooling device to condense the moisture of the fiber itself by using a cooling device, it is easy to lower the pressure of a specific portion to a desired level quickly There is this.

본 발명은 섬유 표면을 저온 플라즈마를 이용한 건식 처리 방법을 이용하여 화학용액을 이용한 처리 방법 보다 깨끗하고 제어가 쉬우며 위험성을 배제하였다. 그리고 챔버 내에 실제로 섬유 표면을 개질하는 플라즈마가 형성될 부분에 냉각 장치를 장착하여 그 부분에만 특정 압력으로 빠른 시간에 떨어뜨려 공정을 진행 함으로써 효율성을 높였다.The present invention uses a dry treatment method using a low temperature plasma to clean the fiber surface than chemical treatment method, easier to control and less risk. In addition, a cooling device is mounted on a portion where a plasma that actually modifies the fiber surface is formed in the chamber, and the efficiency is improved by dropping it at a specific time and rapidly dropping in the portion only.

Claims (4)

섬유 표면을 처리하는 방법 및 장치에 있어서, 산, 알카리 수용액에 의한 습식 세척시의 유해한 화학용액의 소모를 억제하고, 저온 플라즈마를 이용한 건식처리 방법을 사용함으로써 습식처리에 비해 섬유 처리 공정의 제어를 효율적으로 할 수 있는, 저온 플라즈마 섬유 처리 장치In the method and apparatus for treating the surface of the fiber, it is possible to reduce the consumption of harmful chemical solution during the wet washing by acid and alkaline aqueous solution, and to control the fiber treatment process compared to the wet treatment by using the dry treatment method using low temperature plasma. Low temperature plasma fiber processing apparatus which can do it efficiently 제 1 항에 있어서, 섬유 자체의 수분을 냉각하여 응축 시킴으로써 효율적으로 플라즈마 공정 압력으로 떨어뜨리는 것을 특징으로 하는 저온 플라즈마 섬유 처리 장치The low temperature plasma fiber processing apparatus according to claim 1, wherein the water of the fiber itself is cooled and condensed to effectively drop the plasma pressure. 제 2 항에 있어서, 진공 챔브 내의 플라즈마가 형성될 부분에 냉각장치를 장착하여 효율적으로 플라즈마 공정 부분의 압력을 떨어뜨리는 것을 특징으로 한 저온 플라즈마 섬유 처리 장치The low temperature plasma fiber processing apparatus according to claim 2, wherein a cooling device is attached to a portion in which the plasma in the vacuum chamber is to be formed to effectively reduce the pressure of the plasma processing portion. 제 1 항에 있어서, 섬유 표면의 식각 및 플라즈마 개시 중합 등의 섬유 표면 개질의 활용예를 가지는 저온 플라즈마 섬유처리 장치The low temperature plasma fiber processing apparatus according to claim 1, wherein the low temperature plasma fiber processing apparatus has an application example of fiber surface modification such as etching of the fiber surface and plasma initiated polymerization.
KR1019990051414A 1999-11-13 1999-11-13 Apparatus for Low-Temperature Plasma Treatment oftextile fiber KR20010047275A (en)

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KR100414130B1 (en) * 2001-08-31 2004-01-07 주식회사제4기한국 Fiber surface modificating apparatus and thereof method by using plasma in low temperature and pressure
KR100763018B1 (en) * 2006-10-17 2007-10-04 주식회사 다원시스 Apparatus and method for providing conductive film
WO2013101308A3 (en) * 2011-09-06 2014-05-01 Honeywell International Inc. Low bfs composite and process for making the same
US9023452B2 (en) 2011-09-06 2015-05-05 Honeywell International Inc. Rigid structural and low back face signature ballistic UD/articles and method of making
US9023451B2 (en) 2011-09-06 2015-05-05 Honeywell International Inc. Rigid structure UHMWPE UD and composite and the process of making
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US9163335B2 (en) 2011-09-06 2015-10-20 Honeywell International Inc. High performance ballistic composites and method of making
US9168719B2 (en) 2011-09-06 2015-10-27 Honeywell International Inc. Surface treated yarn and fabric with enhanced physical and adhesion properties and the process of making
KR20220153451A (en) * 2021-05-11 2022-11-18 박영희 Electrode structure of low-temperature vacuum plasma device for fabric surface modification

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JPH0578974A (en) * 1991-09-18 1993-03-30 Unitika Ltd Method for pretreating cotton fiber fabric

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100414130B1 (en) * 2001-08-31 2004-01-07 주식회사제4기한국 Fiber surface modificating apparatus and thereof method by using plasma in low temperature and pressure
KR100763018B1 (en) * 2006-10-17 2007-10-04 주식회사 다원시스 Apparatus and method for providing conductive film
WO2013101308A3 (en) * 2011-09-06 2014-05-01 Honeywell International Inc. Low bfs composite and process for making the same
KR20140072082A (en) * 2011-09-06 2014-06-12 허니웰 인터내셔널 인코포레이티드 Low bfs composite and process for making the same
CN103906870A (en) * 2011-09-06 2014-07-02 霍尼韦尔国际公司 Low BFS composite and process for making the same
US9023452B2 (en) 2011-09-06 2015-05-05 Honeywell International Inc. Rigid structural and low back face signature ballistic UD/articles and method of making
US9023451B2 (en) 2011-09-06 2015-05-05 Honeywell International Inc. Rigid structure UHMWPE UD and composite and the process of making
US9023450B2 (en) 2011-09-06 2015-05-05 Honeywell International Inc. High lap shear strength, low back face signature UD composite and the process of making
US9163335B2 (en) 2011-09-06 2015-10-20 Honeywell International Inc. High performance ballistic composites and method of making
US9168719B2 (en) 2011-09-06 2015-10-27 Honeywell International Inc. Surface treated yarn and fabric with enhanced physical and adhesion properties and the process of making
US9718237B2 (en) 2011-09-06 2017-08-01 Honeywell International Inc. Rigid structure UHMWPE UD and composite and the process of making
RU2630769C2 (en) * 2011-09-06 2017-09-12 Ханивелл Интернешнл Инк. Composite with low value of cup depth and method of its manufacture
US9821515B2 (en) 2011-09-06 2017-11-21 Honeywell International Inc. High lap shear strength, low back face signature UD composite and the process of making
US9880080B2 (en) 2011-09-06 2018-01-30 Honeywell International Inc. Rigid structural and low back face signature ballistic UD/articles and method of making
US10562238B2 (en) 2011-09-06 2020-02-18 Honeywell International Inc. High lap shear strength, low back face signature UD composite and the process of making
US11027501B2 (en) 2011-09-06 2021-06-08 Honeywell International Inc. High lap shear strength, low back face signature UD composite and the process of making
KR20220153451A (en) * 2021-05-11 2022-11-18 박영희 Electrode structure of low-temperature vacuum plasma device for fabric surface modification

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