KR20010009054A - A case for containing reticle - Google Patents

A case for containing reticle Download PDF

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Publication number
KR20010009054A
KR20010009054A KR1019990027206A KR19990027206A KR20010009054A KR 20010009054 A KR20010009054 A KR 20010009054A KR 1019990027206 A KR1019990027206 A KR 1019990027206A KR 19990027206 A KR19990027206 A KR 19990027206A KR 20010009054 A KR20010009054 A KR 20010009054A
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KR
South Korea
Prior art keywords
reticle
cover
top cover
plate
case
Prior art date
Application number
KR1019990027206A
Other languages
Korean (ko)
Inventor
조승열
Original Assignee
조승열
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 조승열 filed Critical 조승열
Priority to KR1019990027206A priority Critical patent/KR20010009054A/en
Publication of KR20010009054A publication Critical patent/KR20010009054A/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741Handling masks outside exposure position, e.g. reticle libraries
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67359Closed carriers specially adapted for containing masks, reticles or pellicles

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: A case for keeping a reticle is provided, in which the reticle is supported safely because an upside cover is always maintained a closed state by being closed and fixed automatically the upside cover. CONSTITUTION: The case contains i) an upside cover that have an upside transparency plate that can confirm the kept reticle; ii) a lower plate that is formed at the opposite side of the upside cover; iii) a backside plate that is formed with the backside plate in a body and is connected the upside cover by a hinge; iv) a front side cover that is formed at the opposite side of the backside plate and is connected the lower side by the hinge; v) a left cover that is wriggled according to opening and shutting of the front side cover; vi) a light plate that is formed at the opposite side of the left side cover; vii) a lock means that is locked and fixed automatically when the upside cover is covered, and have the elastic projection that is installed at the inside of the upside cover and the projection housing unit that is installed at the lower side plate to house the elastic projection.

Description

레티클 보관케이스 {A case for containing reticle}Reticle Storage Case {A case for containing reticle}

본 발명은 반도체 소자를 생산하기 위한 노광공정에 사용되는 레티클(Reticle)을 담아 보관하는 레티클 케이스로써, 더욱 상세히는 레티클 케이스의 상면 덮개를 덮으면 상면덮개가 자동적으로 잠금 고정되도록 하여 레티클을 안정적으로 담아 보관하기 적합한 레티클 보관케이스이다.The present invention is a reticle case containing a reticle (reticle) used in the exposure process for producing a semiconductor device, more specifically, when the top cover of the reticle case to cover the top cover is automatically locked and securely containing the reticle Reticle storage case suitable for storage.

일반적으로 반도체 칩을 제조하기 위해 미세화된 회로를 웨이퍼 상에 적층식으로 형성하게 되는데, 각각의 적층하는 단계를 레이어(layer)라 하며, 레이어에는 필요한 패턴들을 각각 형성시켜야 된다.In general, in order to manufacture a semiconductor chip, a micronized circuit is formed on a wafer in a stacked manner. Each lamination step is called a layer, and each of the necessary patterns must be formed in the layer.

이때 레티클을 사용하여 레티클 상에 형성된 패턴을 일정한 비율로 축소하여 웨이퍼 상에 형성시키게 된다.At this time, the pattern formed on the reticle is reduced to a predetermined ratio by using the reticle to be formed on the wafer.

이 레티클의 패턴은 반도체 칩의 회로가 복잡해짐에 따라 더욱더 미세해지고 고 정밀성과 고 밀집성이 요구된다. 따라서 패턴이 형성된 레티클의 표면에 스크래치(scratch)가 발생되거나 파티클(particle)이 부착되면 미세한 패턴 형성에 절대적인 악영향을 미치게 되기 때문에 보관 및 운반 취급에 매우 주의를 요한다.The pattern of the reticle becomes finer as the circuit of the semiconductor chip becomes more complicated, and high precision and high density are required. Therefore, if scratches are generated on the surface of the patterned reticle or particles are attached, it has a great negative effect on the formation of fine patterns.

이러한 보관 및 운반, 취급에 주의를 요하는 레티클을 보관하기 위해 본 발명의 출원인은 실용신안등록 출원 제 98-12686 호에서 "레티클 보관케이스" 에 대한 기술을 출원하였다.In order to store a reticle that requires attention to such storage, transportation, and handling, the applicant of the present invention has applied for a technology for a "reticle storage case" in Utility Model Registration Application No. 98-12686.

실용신안 출원 제 98-12686 호에 기재된 '레티클 보관케이스"는 반도체 제조 장치에서 레티클의 보관과 이동을 위하여 사용하는 육면체로 된 레티클 케이스에 관한 것으로써, 레티클의 전면을 지지 고정하는 전면 고정부와 이물질의 유입을 방지하는 밀폐부를 포함하고 레티클의 전면을 확인 할 수 있는 상면 투명판을 구비한 상면 덮개와, 상면 덮개의 맞대응 면에 형성되어 레티클의 후면을 확인하는 저면 투명판과 레티클의 후면을 지지 고정하는 후면 고정부를 구비한 저면판과, 저면판과 일체형으로 형성되고 상면 덮개가 힌지에 의하여 결합된 후면판과, 후면판의 맞대응 면에 형성되어 힌지에 의해 저면판에 연결되고 상부에 슬라이드핀을 구비한 전면 덮개와, 전면 덮개의 슬라이드핀과 상호 작동되는 슬라이드판을 구비하여 전면 덮개의 개폐에 연동되는 좌면 덮개와, 좌면 덮개의 맞대응 면에 형성되어 반도체 제조장비에 의하여 일정한 거리만큼 이동되며 감광원판의 측면을 지지하는 제 1 아암과 제 2 아암이 설치되고 일정 부위가 절개된 우면판을 포함하여 이루어져 있습니다.The reticle storage case described in Utility Model Application No. 98-12686 relates to a hexahedral reticle case used for storage and movement of a reticle in a semiconductor manufacturing apparatus, and includes a front fixing part for supporting and fixing the front surface of the reticle. The top cover includes a seal to prevent the inflow of foreign substances and has a top transparent plate for checking the front side of the reticle, and a bottom transparent plate and a rear surface of the bottom reticle formed on the opposite side of the top cover to check the back of the reticle. A bottom plate having a rear fixing portion for supporting and fixing the back plate, which is formed integrally with the bottom plate, and the top cover is joined by a hinge, and is formed on an opposing surface of the back plate and connected to the bottom plate by a hinge, Front cover with slide pin, and slide plate which interacts with slide pin of front cover to open and close the front cover It includes a left side cover and a right side plate formed on an opposing surface of the left side cover and moved by a predetermined distance by semiconductor manufacturing equipment, and having a first arm and a second arm supporting the side of the photosensitive disc, and having a predetermined portion cut away. It consists of

이런 구성으로 이루어진 실용 제 98-12686 호의 "레티클 보관 케이스"는 레티클이 저면판의 후면 고정부에 의해 후면이 지지되고, 제 1 및 제 2 아암에 의해 레티클의 측면이 지지된 상태에서 상면 덮개를 덮고 다수개의 조임 볼트를 조여 상면 덮개를 잠금 고정시키게 된다.Practical No. 98-12686 "Reticle Storage Case" having such a configuration is provided with the top cover with the reticle supported by the rear fixing part of the bottom plate and the side of the reticle supported by the first and second arms. Cover and tighten the plurality of fastening bolts to lock the top cover.

그러나, 실용 제 98-12686 호의 "레티클 보관케이스"는 상면 덮개를 다수개의 조임 나사를 조여 잠금 고정시키게 되는데, 사용자가 상면 덮개를 조임 볼트로 고정시키지 않은 상태에서 레티클을 운반 및 보관하게 되면 외부에서 가해지는 힘에 의해 상면 덮개가 열리게 된다.However, "Reticle storage case" of Practical No. 98-12686 is to lock the top cover by tightening a plurality of fastening screws, if the user transports and stores the reticle without fixing the top cover with a fastening bolt from the outside The top cover is opened by the applied force.

따라서, 레티클 보관케이스의 내부에 보관된 레티클이 움직이게 되어 후면 고정부 및 제 1 및 제 2 아암에 긁혀 손상되거나 레티클이 떨어져 깨지는 문제점이 있다.Therefore, the reticle stored inside the reticle storage case is moved, and there is a problem that the back fixing portion and the first and second arms are scratched and damaged or the reticle is broken and broken.

이에 본 발명은 종래 기술의 문제점을 해결하기 위해 안출된 것으로써, 상면덮개를 덮으면 자동적으로 상면덮개가 잠금고정되도록 하는 레티클 보관케이스를 제공하는데 그 목적이 있다.Accordingly, the present invention has been made to solve the problems of the prior art, it is an object of the present invention to provide a reticle storage case to automatically lock the top cover when the top cover.

따라서, 본 발명은 상기 목적을 달성하고자, 보관된 레티클을 시각적으로 확인할 수 있는 상면 투명판을 구비한 상면 덮개와, 상면 덮개의 맞대응 면에 형성된 저면판과, 저면판과 일체형으로 형성되고 상면 덮개가 힌지에 의하여 결합된 후면판과, 후면판의 맞대응 면에 형성되어 힌지에 의해 저면판에 연결된 전면 덮개와, 전면 덮개의 개폐에 연동되는 좌면 덮개와, 좌면 덮개의 맞대응 면에 형성된 우면판을 포함하여 이루어지는 레티클 케이스에 있어서, 상면덮개가 덮어지면 상면덮개를 자동적으로 잠금고정시키는 잠금수단을 더 구비한다.Therefore, the present invention, in order to achieve the above object, the top cover having a top transparent plate that can visually check the stored reticle, the bottom plate formed on the mating surface of the top cover, and formed integrally with the bottom plate and the top cover Is formed in the rear plate joined by the hinge, the front cover formed on the butt face of the back plate and connected to the bottom plate by the hinge, the seat cover which is linked to the opening and closing of the front cover, and the right face plate formed on the butt face of the seat cover. In the reticle case comprising a, further comprising a locking means for automatically locking the top cover when the top cover is covered.

여기서, 잠금수단은 상면덮개의 내측면에 설치된 탄성돌기와, 탄성돌기가 수용되도록 탄성돌기에 상호 대향되는 위치의 저면판에 설치된 돌기 수용편으로 한다.Here, the locking means is an elastic projection provided on the inner surface of the top cover, and a projection receiving piece provided on the bottom plate of the position opposite to each other so that the elastic projection is accommodated.

제 1 도는 본 발명인 레티클 보관케이스에서 상면 덮개가 개방된 상태의 분해 사시도.Figure 1 is an exploded perspective view of the top cover is open in the reticle storage case of the present invention.

제 2 도는 본 발명인 레티클 케이스에서 전면 덮개가 개방된 상태에서 상면 덮개와 후면판이 생략된 평면도.2 is a plan view in which the top cover and the back plate are omitted in the state that the front cover is open in the reticle case of the present invention.

도 3은 본 발명의 레티클 케이스에서 레티클 지지단에 대한 사시도.Figure 3 is a perspective view of the reticle support end in the reticle case of the present invention.

■ 도면의 주요부분에 대한 간략한 부호설명 ■■ Brief description of the main parts of the drawing ■

10 : 저면판 11 : 상면덮개10: bottom plate 11: top cover

12 : 전면덮개 13 : 좌면덮개12: front cover 13: seat cover

14 : 후면판 15 : 우면판14: rear panel 15: right side plate

16 : 레티클 지지단 17 : 상면 투명판16: Reticle support end 17: upper transparent plate

18 : 코일 스프링 19 : 가이드 포스트18: coil spring 19: guide post

20 : 잠금 볼트 21 : 잠금 너트20: lock bolt 21: lock nut

22 : 슬라이드 판 23 : 슬라이드 핀22: slide plate 23: slide pin

24,25 : 아암(arm) 26 : 실리콘 돌편24,25: arm 26: silicon stone pieces

27 : 이물 방지턱 28 : 탄성 잠금 돌기27: foreign material prevention jaw 28: elastic locking projection

29 : 돌기 수용편29: projection accommodation

이하, 첨부된 도면을 참조하여 본 발명인 레티클 케이스에 대한 상세한 일 실시예를 설명하면 다음과 같다.Hereinafter, with reference to the accompanying drawings will be described a detailed embodiment of the present invention reticle case as follows.

제 1 도 내지 제 3 도를 참조하여 본 발명의 레티클 케이스를 설명하면 다음과 같다.The reticle case of the present invention will be described with reference to FIGS. 1 to 3 as follows.

본 발명의 레티클 케이스는 육면체로 이루어지는데, 내면으로 레티클(미도시)의 전면을 탄성적으로 지지고정하는 다수개의 실리콘 돌편(26)이 형성되며, 절개된 부분을 통해 외부의 이물질이 유입되는 것을 방지하기 위한 이물방지턱(27)이 형성된 상면덮개(11)가 있다.The reticle case of the present invention is made of a hexahedron, the inner surface is formed with a plurality of silicon protrusions 26 to elastically support the front of the reticle (not shown), and prevents foreign substances from flowing through the cut portion. There is a top cover 11 is formed with a foreign material prevention jaw (27).

또한, 상면덮개(11)에는 레티클의 유무를 확인할 수 있도록 상면 덮개의 중단부에 상면 투명판(17)이 형성되며, 상면덮개의 고정을 위해 상면덮개의 외부에서 내부로 관통되게 설치된 다수개의 조임볼트(20)가 있다.In addition, the top cover 11 has a top transparent plate 17 is formed in the middle portion of the top cover to check the presence of the reticle, a plurality of fastenings installed to penetrate through the inside of the top cover for fixing the top cover There is a bolt 20.

이러한 상면덮개(11)의 맞대응 면에는 레티클의 후면을 지지 고정하는 레티클 지지단(16)이 형성되며, 상면덮개의 조임볼트(20)와 상호 결합되는 다수개의 조임너트(21)이 형성된 저면판(10)이 있다.On the counter-facing surface of the top cover 11, a reticle support end 16 for supporting and fixing the rear surface of the reticle is formed, and a bottom plate having a plurality of tightening nuts 21 coupled to the tightening bolts 20 of the top cover. There is 10.

여기서, 레티클 지지단(16)은 제 3 도에 도시된 바와 같이, 저면판(10)에서 수직하게 돌출된 두 개의 기둥 사이에 힌지에 의해 연결되며 대략적인 형태는 "??" 자 형태를 가지고 있으며, 레티클 후면과의 접촉부위를 미소돌부(16a,16b)를 갖도록 하여 레티클과의 접촉면적을 최소화하도록 한다.Here, the reticle support end 16 is connected by a hinge between two pillars projecting vertically from the bottom plate 10, as shown in FIG. It has a ruler shape, and the contact area with the reticle rear surface has minute protrusions 16a and 16b to minimize the contact area with the reticle.

그리고, 저면판(10)에 수직하게 형성되고, 상면덮개(11)가 힌지에 의하여 결합된 후면판(14)이 있다.Then, there is a back plate 14 formed perpendicular to the bottom plate 10, the top cover 11 is coupled by a hinge.

이 후면판(14)의 맞대응 면에는 힌지에 의해 저면판(10)에 연결되어 개폐 가능하며, 제 2 도에 도시된 바와 같이 상부에 슬라이드핀(23)을 구비한 전면 덮개(12)가 있다.Abutment surface of the rear plate 14 is connected to the bottom plate 10 by a hinge to open and close, and there is a front cover 12 having a slide pin 23 on the top as shown in FIG. .

그리고, 전면 덮개의 슬라이드핀(23)이 연접되는 슬라이드판을(22) 구비하여 전면 덮개(12)가 개폐됨에 따라 슬라이드핀이 슬라이드판을 밀어 전면덮개의 개폐에 연동되어 개폐되는 좌면 덮개(13)가 있다.In addition, the front cover 12 is provided with a slide plate 22 to which the slide pin 23 is connected, and the front cover 12 is opened and closed as the slide pin pushes the slide plate to open and close in conjunction with the opening and closing of the front cover 13 There is).

이 좌면 덮개(13)의 맞대응 면에는 코일 스프링(18a,18b)을 갖는 가이드 포스트(19a,19b)에 설치되어 미도시된 반도체 제조장비에 의하여 일정한 거리만큼 하방향으로 이동하면서 레티클의 측면을 지지하는 제 1 아암(23), 제 2 아암(24)이 설치되고, 일정 부위가 절개된 우면판(15)이 있다.The mating surface of the seat cover 13 is installed on the guide posts 19a and 19b having the coil springs 18a and 18b, and moves downward by a predetermined distance by the semiconductor manufacturing equipment not shown to support the side of the reticle. The first arm 23 and the second arm 24 are provided, and there is a right surface plate 15 in which a predetermined portion is cut.

여기서, 제 2 아암(24)은 상부면이 레티클 지지단(16)의 하부면과 서로 접촉되어 있다.Here, the upper surface of the second arm 24 is in contact with the lower surface of the reticle support end 16.

그리고, 이러한 육면체로 이루어진 본 발명인 레티클 케이스에는 상면덮개(11)를 잠금고정시키는 잠금 볼트(20) 및 잠금 너트(21) 뿐만 아니라, 상면덮개(11)가 덮어지면 자동적으로 상면덮개를 잠글 수 있도록 덮개 잠금수단을 구비하고 있다.And, in the reticle case of the present invention made of such a hexahedron, as well as the locking bolt 20 and the lock nut 21 to lock the top cover 11, so that the top cover 11 is covered to automatically lock the top cover. A cover locking means is provided.

이 덮개 잠금수단은 상면 덮개(11)의 내측면에 탄성 잠금 돌기(28)를 형성하고, 저면판(10)에 잠금돌기(28)와 상호 대응되는 위치에 상면덮개가 덮혀지면 잠금돌기가 삽입 수용되는 돌기 수용편(29)으로 한다.The cover locking means forms an elastic locking protrusion 28 on the inner side of the top cover 11, and the locking protrusion is inserted when the top cover is covered at a position corresponding to the locking protrusion 28 on the bottom plate 10. It is set as the protrusion accommodating piece 29 accommodated.

이와 같이 구성되는 본 발명인 레티클 케이스에서 레티클의 보관 및 인출시 상면덮개의 잠금고정은 다음과 같다.Locking of the top cover during storage and withdrawal of the reticle in the reticle case of the present invention configured as described above is as follows.

먼저 레티클을 레티클 케이스 내에 위치시키기 위해 상면 덮개(20)의 잠금볼트(20)을 회전시켜 잠금너트(21)와의 체결을 해제하여 상판 덮개(20)를 개방하고 레티클의 하단부 측면을 제 1 아암(23) 위에 안착시키면, 레티클의 후면은 레티클 지지단(16)에 의해 지지된다.First, in order to position the reticle in the reticle case, the locking bolt 20 of the top cover 20 is rotated to release the lock nut 21 and the top plate 20 is opened, and the lower side of the reticle has the first arm ( 23) Once seated above, the back of the reticle is supported by the reticle support end 16.

그리고, 상면덮개(11)를 덮으면 상면 덮개의 다수 실리콘 돌편(26)이 레티클의 전면과 접촉되어 레티클의 전면을 적어도 네 부분에서 고정하게 된다.When the top cover 11 is covered, the plurality of silicon protrusions 26 of the top cover contact the front surface of the reticle to fix the front surface of the reticle in at least four parts.

이때, 상면덮개(11)는 탄성잠금 돌기(28)가 돌기 수용편(29)에 삽입되어 자동적으로 잠금 고정된다. 그리고, 상면덮개(11)를 완전히 잠금 고정시키기 위해서는 잠금 볼트(20) 및 잠금 너트(21)를 상호 결합시키면 되는데, 잠금 볼트 및 잠금너트를 상호 결합시키지 않더라도 외부에서 일정한 힘(즉, 탄성잠금 돌기 및 돌기 수용편이 상호 결합된 결합력)이상의 외력이 작용하지 않는 경우 상면 덮개(11)는 항상 닫혀진 상태를 유지하게 된다.At this time, the top cover 11 is the elastic locking projection 28 is inserted into the projection receiving piece 29 is automatically locked fixed. In order to completely lock the top cover 11, the locking bolt 20 and the lock nut 21 may be coupled to each other, even if the locking bolt and the lock nut are not coupled to each other. And when the external force is greater than the coupling force of the protrusion receiving piece mutually coupled) the top cover 11 is always kept in a closed state.

이와같이 보관된 레티클을 반도체 제조장치인 X-Y 테이블 또는 노광장비 등에서 레티클 케이스내에서 외부로 인출은 레티클 케이스가 기계 장치의 소정의 위치로 이동되어 고정되면 먼저 제 1 아암(23)에 의해 레티클의 하단부 측면이 지지된 레티클은 제 1 아암이 반도체 제조장비(미도시)에 의해 하방향으로 일정거리 이동되면 레티클은 레티클 지지단(16)에 접촉되어 레티클 지지단에 의해 상면 덮개(11)쪽으로 밀리는 힘을 받게 되어 상면 덮개쪽으로 기울어지거나 수직 상태를 유지한다.The reticle thus stored out of the reticle case from the XY table or the exposure equipment, which is a semiconductor manufacturing apparatus, is moved to a predetermined position of the mechanical device and fixed to the lower side of the reticle by the first arm 23. The supported reticle has a force that is pushed toward the top cover 11 by the reticle support by contacting the reticle support 16 when the first arm is moved downwardly by the semiconductor manufacturing equipment (not shown). Be inclined or held vertically towards the top cover.

이때 전면 덮개(12)를 밀어서 좌면 덮개(13)가 연동되게 하여 전면과 좌면(레티클 케이스가 세로 방향으로 서 있기 때문에 실제로는 상면)이 개방되면, 장치의 레티클 진공척(미도시 됨)이 레티클 케이스내로 이송되어 레티클 후면을 진공흡착 한다.At this time, the front cover 12 is pushed so that the seat cover 13 is interlocked so that the front and the seat (actually the top surface because the reticle case is standing in the vertical direction) are opened, the reticle vacuum chuck (not shown) of the device is It is transported into the case and vacuum sucks the back of the reticle.

레티클 진공척에 의해 레티클이 진공 흡착되면, 제 2 아암(24)을 반도체 제조장비(미도시)의 작동장치가 당겨서 하방향으로 일정거리 이동되어 하고, 제 2 아암(24)과 연계된 레티클 지지단(16)을 뒤로 일정거리 젖혀지게 한 다음 레티클 진공척에 의해 진공흡착된 레티클이 이송되어 소정의 공정 영역으로 이동된다. 이 때 레티클 지지단(16)이 후 하방으로 이동되어 있으므로 레티클과 접촉이 발생되지 않는다.When the reticle is vacuum-adsorbed by the reticle vacuum chuck, the second arm 24 is pulled by the actuator of the semiconductor manufacturing equipment (not shown) to be moved a predetermined distance downward, and the reticle support associated with the second arm 24 is supported. The stage 16 is leaned back a certain distance, and then the vacuumed reticle is transferred by the reticle vacuum chuck to be moved to a predetermined process area. At this time, since the reticle support end 16 is moved downward, no contact with the reticle occurs.

이러한 인출 과정에서도 상면덮개(11)가 잠금 볼트(20) 및 잠금너트(21)에 의해 완전히 잠금 고정되지 않더라도 탄성 잠금 돌기(28) 및 돌기 수용편(29)이 상호 결합되어 있기 때문에 외부에서 외력이 작용하지 않으면 상면덮개(11)는 항상 닫혀진 상태를 유지하게 된다.Even when the top cover 11 is not completely locked by the lock bolt 20 and the lock nut 21 even in the drawing process, since the elastic locking protrusion 28 and the protrusion receiving piece 29 are coupled to each other, If this does not work, the top cover 11 is always kept in a closed state.

상기에서 상술한 바와 같이, 본 발명인 레티클 케이스는 레티클을 내부에 위치시키고 상면덮개를 덮으면 탄성 잠금 돌기가 돌기 수용편에 삽입되어 자동적으로 상면덮개를 잠금 고정시키게 된다.As described above, the reticle case of the present invention is to place the reticle inside and cover the top cover, the elastic locking projection is inserted into the projection receiving piece to automatically lock the top cover.

따라서, 상면덮개를 잠금 볼트 및 잠금 너트로 잠금 고정시키지 않더라도 상면덮개는 항상 닫혀진 상태를 유지하게 되어 내부에 보관된 레티클을 안정적으로 지지하므로써 레티클이 손상되는 문제점이 해결된다.Therefore, even if the top cover is not locked with the lock bolt and the lock nut, the top cover is always kept closed, thereby stably supporting the reticle stored therein, thereby solving the problem of damage to the reticle.

Claims (1)

보관된 레티클을 시각적으로 확인할 수 있는 상면 투명판을 구비한 상면 덮개와; 상기 상면 덮개의 맞대응 면에 형성된 저면판과; 상기 저면판과 일체형으로 형성되고 상기 상면 덮개가 힌지에 의하여 결합된 후면판과; 상기 후면판의 맞대응 면에 형성되어 힌지에 의해 저면판에 연결된 전면 덮개와; 상기 전면 덮개의 개폐에 연동되는 좌면 덮개와; 상기 좌면 덮개의 맞대응 면에 형성된 우면판을 포함하여 이루어지는 레티클 케이스에 있어서,A top cover having a top transparent plate for visually confirming the stored reticle; A bottom plate formed on the mating surface of the top cover; A back plate formed integrally with the bottom plate and having the top cover coupled by a hinge; A front cover formed on a mating surface of the back plate and connected to the bottom plate by a hinge; A seat cover coupled to opening and closing of the front cover; In the reticle case comprising a right side plate formed on the mating surface of the seat cover, 상기 상면덮개가 덮어지면 상기 상면덮개를 자동적으로 잠금고정시키는 잠금수단을 더 구비하되,When the top cover is covered with a locking means for automatically locking and fixing the top cover, 상기 잠금수단은 상기 상면덮개의 내측면에 설치된 탄성돌기와;The locking means includes an elastic protrusion installed on the inner surface of the top cover; 상기 탄성돌기가 수용되도록 상기 탄성돌기에 상호 대향되는 위치의 상기 저면판에 설치된 돌기 수용편으로 이루어진 것이 특징인 레티클 케이스.Reticle case, characterized in that consisting of the projection receiving piece provided on the bottom plate of the position opposite to each other to the elastic projection so that the elastic projection.
KR1019990027206A 1999-07-07 1999-07-07 A case for containing reticle KR20010009054A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI737411B (en) * 2019-08-16 2021-08-21 家登精密工業股份有限公司 Sealed reticle storage device with soft contact

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI737411B (en) * 2019-08-16 2021-08-21 家登精密工業股份有限公司 Sealed reticle storage device with soft contact

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