KR20000076704A - A method of manufacturing a surface acoustic wave apparatus - Google Patents
A method of manufacturing a surface acoustic wave apparatus Download PDFInfo
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- KR20000076704A KR20000076704A KR1020000008451A KR20000008451A KR20000076704A KR 20000076704 A KR20000076704 A KR 20000076704A KR 1020000008451 A KR1020000008451 A KR 1020000008451A KR 20000008451 A KR20000008451 A KR 20000008451A KR 20000076704 A KR20000076704 A KR 20000076704A
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- acoustic wave
- surface acoustic
- wave device
- base member
- manufacturing
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- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 88
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 33
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 238000002844 melting Methods 0.000 claims abstract description 20
- 230000008018 melting Effects 0.000 claims abstract description 20
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 12
- 239000000956 alloy Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 229910000679 solder Inorganic materials 0.000 claims description 4
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 229910015363 Au—Sn Inorganic materials 0.000 claims description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims 1
- 238000005304 joining Methods 0.000 abstract description 8
- 238000007789 sealing Methods 0.000 description 6
- 238000003466 welding Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1071—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the SAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02929—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/058—Holders; Supports for surface acoustic wave devices
- H03H9/059—Holders; Supports for surface acoustic wave devices consisting of mounting pads or bumps
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49004—Electrical device making including measuring or testing of device or component part
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49005—Acoustic transducer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49147—Assembling terminal to base
- Y10T29/49149—Assembling terminal to base by metal fusion bonding
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
본 발명의 탄성표면파 장치의 제조방법은 탄성표면파 소자가 베이스 부재의 오목부 저면에 페이스 다운 구조로 고정되도록 융점이 약 450℃ 이상인 금속 범프 51에 의해 탄성표면파 소자와 베이스 부재를 범프 접합하는 공정; 및 베이스 부재와 캡 부재를 왁스 재료와 함께 접합할 때에 왁스 재료의 융점보다도 높은 온도에서 베이스 부재와 캡 부재를 균일하게 가열하여 왁스 재료를 용융시켜서 베이스 부재와 캡 부재를 접합하는 공정을 포함한다.The method for manufacturing a surface acoustic wave device of the present invention includes the steps of: bump-bonding a surface acoustic wave element and a base member by metal bumps 51 having a melting point of about 450 ° C. or more so that the surface acoustic wave element is fixed to the bottom surface of the recess by the face down structure; And a step of joining the base member and the cap member by uniformly heating the base member and the cap member at a temperature higher than the melting point of the wax material when the base member and the cap member are joined together with the wax material to melt the wax material.
Description
본 발명은 탄성표면파 소자를 패키지 내에 기밀 봉지한 탄성표면파 장치의 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a surface acoustic wave device in which a surface acoustic wave element is hermetically sealed in a package.
일반적으로, 탄성표면파 장치는 탄성표면파 소자를 범프 접합하여 베이스 부재에 접속·고정하고, 그런 다음 베이스 부재 위에 캡 부재를 접합하여 형성한 패키지 내에 탄성표면파 소자를 기밀 봉지하여 형성된다. 종래의 이러한 탄성표면파 장치에서는, 심 용접 공법(seam welding method)과 코바르(Kovar) 합금이 베이스 부재와 캡 부재의 기밀 봉지를 위한 접합을 형성하도록 사용되었다.In general, a surface acoustic wave device is formed by bump-bonding a surface acoustic wave element to a base member by connecting and fixing the surface acoustic wave element, and then sealing the surface acoustic wave element in a package formed by bonding a cap member on the base member. In this conventional surface acoustic wave device, a seam welding method and a Kovar alloy have been used to form a joint for hermetic sealing of the base member and the cap member.
또한, 심 용접 공법 이외의 기밀 봉지 방법으로서는, 베이스 부재 또는 캡 부재 중의 어느 한쪽의 접합부에 왁스 재료(wax material)를 도포하고, 그런 다음, 예를 들어 캡 부재에 소형 히터 블록(small heater block)을 직접 접속시키고 이것으로 왁스 재료가 용융되도록 캡 부재를 가열한 후에 냉각하여 베이스 부재와 캡 부재를 접합하는 왁스 봉지 방법(wax sealing method)이 있다.In addition, as a hermetic sealing method other than the seam welding method, a wax material is applied to one of the joints of either the base member or the cap member, and then, for example, a small heater block is applied to the cap member. There is a wax sealing method in which the cap member is directly connected to it and the cap material is heated to be melted therefrom, followed by cooling to join the base member and the cap member.
하지만, 상술한 심 용접 공법을 이용하여 베이스 부재와 캡 부재를 접합한 경우, 심 용접 공정 동안에 캡 부재 또는 베이스 부재의 접합부의 일부만이 부분적으로 고온으로 상승되도록 가열되고, 접속 부분과 다른 부분과의 사이에 상당한 온도차가 발생한 상태에서 베이스 부재와 캡 부재가 접합된다. 그 이후에 탄성표면파 장치의 냉각에 따라서, 베이스 부재와 캡 부재와의 사이에 큰 잔류 응력이 발생하여, 도 3에 도시한 바와 같이 베이스 부재 10과 캡 부재 30을 상당히 변형시키게 된다. 그리고, 이러한 변형에 의해 탄성표면파 소자 20을 베이스 부재 10 위에 접속·고정하는 금속 범프 51에 응력이 집중되고 또한 금속 범프 51과 접합된 전극 12와 25에도 응력이 집중된다. 따라서, 금속 범프 51과 전극 12, 25의 파손 및 벗겨짐 등의 접속 불량 상태와 특성 불량을 유발한다는 문제가 있었다.However, in the case where the base member and the cap member are joined by using the seam welding method described above, only a part of the joint of the cap member or the base member is heated to be partially raised to a high temperature during the seam welding process, and the connection portion and the other portion The base member and the cap member are joined in a state where a significant temperature difference has occurred between them. Subsequently, as the surface acoustic wave device cools, a large residual stress is generated between the base member and the cap member, which significantly deforms the base member 10 and the cap member 30 as shown in FIG. By this deformation, stress is concentrated on the metal bumps 51 connecting and fixing the surface acoustic wave element 20 on the base member 10, and also on the electrodes 12 and 25 joined to the metal bumps 51. Accordingly, there has been a problem that a connection failure state such as breakage and peeling of the metal bumps 51 and the electrodes 12 and 25 and poor property are caused.
또한, 상술한 왁스 봉지 공법을 이용하여 베이스 부재와 캡 부재를 접합한 경우에도, 상술한 동일한 이유로 인하여 접합 처리 이후에 베이스 부재가 변형되는 문제가 발생되고, 심 용접 공법에서 발생한 유사한 문제가 발생된다.In addition, even when the base member and the cap member are joined by using the wax sealing method described above, a problem arises in that the base member is deformed after the joining treatment for the same reason as described above, and a similar problem occurred in the seam welding method. .
통상 탄성표면파 장치에 있어서, 탄성표면파 소자의 표면(탄성표면파 전파면) 상의 전극이 자유 진동할 수 있는 공간이 필요하다. 하지만, 반도체 장치 등의 형성에 이용되는 수지를 탄성표면파 소자와 베이스 부재와의 공간에 충전할 수 없기 때문에, 금속 범프 상에 집중된 응력을 경감하거나 완화시킬 수 없고, 결국 접합 강도를 향상할 수 없게 된다. 따라서, 탄성표면파 장치의 신뢰성을 향상시키기 위해서는 금속 범프 상에 가해지는 응력을 저감하는 것이 매우 중요하다.Usually, in a surface acoustic wave device, a space for freely vibrating an electrode on the surface (elastic surface wave propagation surface) of the surface acoustic wave element is required. However, since the resin used to form the semiconductor device or the like cannot be filled in the space between the surface acoustic wave element and the base member, the stress concentrated on the metal bumps cannot be reduced or alleviated, and thus the bonding strength cannot be improved. do. Therefore, in order to improve the reliability of the surface acoustic wave device, it is very important to reduce the stress applied to the metal bumps.
상술한 문제를 극복하기 위하여, 본 발명의 특정 구현예에서는 베이스 부재와 캡 부재를 접합 공정 동안에 금속 범프 상에 미치는 응력을 최소화여, 금속 범프 접합부에서 발생하는 문제를 방지하고, 이것에 의해 신뢰성에서 우수한 탄성표면파 장치의 제조방법을 제공한다.In order to overcome the above-mentioned problems, certain embodiments of the present invention minimize the stress on the metal bumps during the joining process between the base member and the cap member, thereby avoiding problems occurring at the metal bump joints, thereby reducing reliability. Provided is an excellent method for producing a surface acoustic wave device.
도 1은 본 발명의 특정 구현예에 따라 제조된 탄성표면파 장치의 단면도이다.1 is a cross-sectional view of a surface acoustic wave device manufactured according to a particular embodiment of the present invention.
도 2는 본 발명의 특정 구현예에 따라 제조된 탄성표면파 소자의 평면도이다.2 is a plan view of a surface acoustic wave device fabricated in accordance with certain embodiments of the present invention.
도 3은 종래의 탄성표면파 장치를 형성하기 위하여 베이스 부재와 캡 부재가 함께 접합되는 공정 동안에 발생되는 변형을 설명하기 위한 개략적인 단면도이다.FIG. 3 is a schematic cross-sectional view for explaining the deformation generated during the process of joining the base member and the cap member together to form a conventional surface acoustic wave device.
〈도면의 주요 부분에 대한 부호의 설명〉<Explanation of symbols for main parts of drawing>
10 ... 베이스 부재10 ... base member
12 ... 전극 선로12 ... electrode line
20 ... 탄성표면파 소자20 ... surface acoustic wave elements
25 ... 전극 패턴25 ... electrode pattern
30 ... 캡 부재30 ... cap member
51 ... 금속 범프51 ... metal bump
52 ... 땜납 재료52 ... solder material
본 발명에 따른 특정 구현예의 탄성표면파 장치의 제조방법은, 탄성표면파 소자가 베이스 부재의 오목부 저면에 페이스 다운 구조로 고정되도록 융점이 약 450℃ 이상인 금속 범프에 의해 탄성표면파 소자와 베이스 부재를 범프 접합하는 공정; 및 상기 베이스 부재와 캡 부재를 왁스 재료(wax material)와 함께 접합할 때에 왁스 재료의 융점보다도 높은 온도에서 베이스 부재와 캡 부재를 균일하게 가열하여 왁스 재료를 용융시켜서 베이스 부재와 캡 부재를 접합하는 공정을 포함한다.In the method for manufacturing a surface acoustic wave device according to a specific embodiment of the present invention, the surface acoustic wave device and the base member are bumped by a metal bump having a melting point of about 450 ° C. or more so that the surface acoustic wave element is fixed to the bottom of the recess of the base member in a face-down structure. Bonding step; And when the base member and the cap member are joined together with a wax material, the base member and the cap member are uniformly heated at a temperature higher than the melting point of the wax material to melt the wax material to join the base member and the cap member. Process.
상술한 제조방법의 용도에 의하면, 베이스 부재와 캡 부재와의 접합공정 동안에 상술한 상이한 부재들 사이에서 온도차가 발생하지 않기 때문에, 냉각 후에 탄성표면파 장치에 작용하는 잔류 응력이 최소화되고, 이와 같이 금속 범프 접합부상의 응력을 대폭 저감시킬 수 있다. 이러한 이유로, 금속 범프의 파손과 범프 접합부에 접속된 전극의 파손을 매우 확실하게 감소시키고, 금속 범프 또는 범프 접속부의 벗겨짐 등의 접속 문제를 크게 감소시킬 수 있다. 한편, 탄성표면파 소자는 베이스 부재에 강하게 지지 고정되면서 전기적으로 접속되기 위하여 미리 융점 450℃ 이상의 금속 범프에 의해 범프 접합되거나 결합될 수 있다.According to the use of the above-described manufacturing method, since the temperature difference does not occur between the above-described different members during the joining process of the base member and the cap member, the residual stress acting on the surface acoustic wave device after cooling is minimized, and thus the metal The stress on the bump junction can be greatly reduced. For this reason, breakage of the metal bumps and breakage of the electrodes connected to the bump junctions can be reduced with great certainty, and connection problems such as peeling of the metal bumps or bump connecting portions can be greatly reduced. Meanwhile, the surface acoustic wave device may be bump-bonded or coupled by metal bumps having a melting point of 450 ° C. or more in advance in order to be electrically supported and fixedly connected to the base member.
왁스 재료로서는 땜납(solder), Au-Sn합금, 또는 약 450℃ 이하의 연화점을 가진 저융점 유리가 이용될 수 있다.As the wax material, solder, Au—Sn alloy, or low melting glass having a softening point of about 450 ° C. or less may be used.
상술한 바와 같이, 본 발명의 특정 구현예에 따른 탄성표면파 소자는, 약 450℃ 이상의 융점을 가진 금속 범프를 통해 베이스 부재 위에 강하게 접속되고 고정되며, 베이스 부재와 캡 부재가 접합되도록 탄성표면파 장치 전체가 균일하게 가열된다. 이것에 의해서, 금속 범프 접합부상에 미치는 응력을 상당히 감소시킬 수 있다. 따라서, 금속 범프와 범프 접합부에 발생하던 접속 문제를 방지할 수 있고 이것에 의해서 높은 신뢰성의 탄성표면파 장치를 얻을 수 있다.As described above, the surface acoustic wave device according to the specific embodiment of the present invention is strongly connected and fixed on the base member through a metal bump having a melting point of about 450 ° C. or more, and the surface acoustic wave device is formed so that the base member and the cap member are joined. Is heated uniformly. This can significantly reduce the stress on the metal bump junction. Therefore, the connection problem which occurred in the metal bump and bump junction part can be prevented, and the surface acoustic wave device of high reliability can be obtained by this.
본 발명을 명백하게 나타내기 위하여 도면들을 첨부하여 나타내었지만, 본 발명은 도시된 특정 장치와 수단으로 한정되지는 않는다.BRIEF DESCRIPTION OF THE DRAWINGS Although the drawings are shown in order to make the invention clear, the invention is not limited to the specific apparatus and means shown.
이하, 본 발명의 특정 구현예를 도면을 참조하여 상세하게 설명한다.Hereinafter, specific embodiments of the present invention will be described in detail with reference to the drawings.
도 1은 본 발명의 특정 구현예에 따라 제조된 탄성표면파 장치를 도시한 단면도이고, 도 2는 도 1에 도시된 탄성표면파 소자를 도시한 평면도이다.1 is a cross-sectional view showing a surface acoustic wave device manufactured according to a specific embodiment of the present invention, Figure 2 is a plan view showing the surface acoustic wave device shown in FIG.
본 구현예의 탄성표면파 장치에서, 탄성표면파 소자 20의 복수개의 전극 패드(pads) 25와 베이스 부재 10의 오목부 내의 상면에 형성된 복수개의 전극 랜드(lands) 12는 페이스 다운 구조(face-down configuration)로 금속 범프 51을 통해 범프 접합된다. 탄성표면파 소자 20은 베이스 부재 10 위에 지지 고정되고 동시에 전기적으로 접속된다. 또한, 탄성표면파 소자 20을 덮도록 캡 부재 30이 고융점 왁스를 포함한 왁스 재료 52를 통해 베이스 부재 10에 접합된다. 이와 같이, 탄성표면파 소자 20은 베이스 부재 10와 캡 부재 30으로 형성된 패키지 내(공간 내)에 기밀 봉지된다. 이러한 탄성표면파 장치에 있어서, 탄성표면파 소자 20의 탄성표면파 전파면과 베이스 부재 10과의 사이에는 도 1에 도시된 바와 같이 탄성표면파를 더욱 효율 좋게 전파하기 위한 갭(gap; 공간)이 제공된다.In the surface acoustic wave device of the present embodiment, the plurality of electrode pads 25 of the surface acoustic wave element 20 and the plurality of electrode lands 12 formed on the upper surface in the recess of the base member 10 are face-down configuration. Bump joints through the metal bump 51 as. The surface acoustic wave element 20 is supported and fixed on the base member 10 and is electrically connected at the same time. In addition, the cap member 30 is bonded to the base member 10 through the wax material 52 including the high melting point wax so as to cover the surface acoustic wave element 20. Thus, the surface acoustic wave element 20 is hermetically sealed in a package (in the space) formed of the base member 10 and the cap member 30. In this surface acoustic wave device, a gap is provided between the surface acoustic wave propagation surface of the surface acoustic wave element 20 and the base member 10 to more efficiently propagate the surface acoustic wave as shown in FIG.
상술한 탄성표면파 소자 20은 도 2에 도시한 바와 같이, 압전기판 21을 포함한다. 압전기판 21의 상면에는 IDT(interdigital transducer) 전극 22, 반사기 전극 23, 각 IDT 전극 22로부터 인출된 인출 전극 24, 및 각 인출 전극 24에 접속된 전극 패드 25를 포함하는 전극 패턴이 형성된다. 이 전극 패턴은 Al 또는 Al을 함유한 합금으로 이루어지고 주지의 박막 형성법에 의해 적절하게 형성된다. 압전 기판 21로서는, 티탄산리튬(lithium tantalate), 니오브산리튬(lithium niobate) 등의 적절한 압전성 재료가 사용될 수 있다.The surface acoustic wave element 20 described above includes a piezoelectric plate 21, as shown in FIG. An electrode pattern including an interdigital transducer electrode 22, a reflector electrode 23, an extraction electrode 24 drawn out from each IDT electrode 22, and an electrode pad 25 connected to each extraction electrode 24 is formed on the upper surface of the piezoelectric substrate 21. This electrode pattern consists of Al or the alloy containing Al, and is formed suitably by the well-known thin film formation method. As the piezoelectric substrate 21, a suitable piezoelectric material such as lithium titanate, lithium niobate or the like can be used.
베이스 부재 10은, 오목 구조이고 복수개의 세라믹 층을 적층하여 적절하게 형성되며, 그의 하면, 즉 오목부의 내면 및 내부에 인출된 복수개의 전극 랜드 12를 포함한 입출력 전극 패턴과 접지 전극 패턴을 포함한다. 도면에 도시되어 있지는 않지만, 베이스 부재 10의 하면에는 입력 및 출력 단자 전극이 제공된다. 이 탄성표면파 장치는 베이스 부재 10의 하면을 실장면으로서 이용하여 실장 기판(회로 기판) 상에 실장될 수 있다.The base member 10 has a concave structure and is appropriately formed by stacking a plurality of ceramic layers, and includes an input / output electrode pattern and a ground electrode pattern including a lower surface thereof, that is, a plurality of electrode lands 12 drawn out inside and in the recess. Although not shown in the figure, the bottom surface of the base member 10 is provided with input and output terminal electrodes. This surface acoustic wave device can be mounted on a mounting substrate (circuit board) using the lower surface of the base member 10 as a mounting surface.
캡 부재 30은 Fe-Ni합금, 또는 Fe이나 다른 적당한 재료를 함유한 합금으로 구성된 금속판이며, 필요에 따라 도금 처리될 수 있다.The cap member 30 is a metal plate composed of an Fe—Ni alloy or an alloy containing Fe or other suitable material, and may be plated as necessary.
이 탄성표면파 장치는 다음의 방법으로 제조되는 것이 바람직하다. 먼저, 탄성표면파 소자 20의 각 전극 패드 25위에 Au 또는 Au를 주성분으로 함유한 재료로 제조된 각 금속 범프 51을 볼 본딩법(ball-bonding method)에 의해 형성한다. 그런 다음, 탄성표면파 소자 20을 페이스 다운(face down) 방식, 즉 IDT 와 다른 전극을 포함하는 탄성표면파 전파면이 베이스 부재 10에 대향하도록 배치시키고, 초음파와 열을 동시에 인가한다. 이러한 방법에서, 각 전극 패드 25와 그것에 대응하는 베이스 부재 10의 각 전극 랜드 12는 금속 범프 51을 통하여 함께 접합되고, 이것에 의하여 탄성표면파 소자 20을 베이스 부재 10에 접속·고정한다.This surface acoustic wave device is preferably manufactured by the following method. First, each metal bump 51 made of a material containing Au or Au as a main component is formed on each electrode pad 25 of the surface acoustic wave element 20 by a ball-bonding method. Then, the surface acoustic wave element 20 is disposed face down, that is, the surface acoustic wave propagation surface including the IDT and the other electrode is opposed to the base member 10, and ultrasonic waves and heat are simultaneously applied. In this method, each of the electrode pads 25 and the electrode lands 12 of the base member 10 corresponding thereto are joined together through the metal bumps 51, thereby connecting and fixing the surface acoustic wave element 20 to the base member 10.
상술한 각 금속 범프 51의 재료는 Au로 한정되지 않으며, 베이스 부재 10과 캡 부재 30을 함께 접합하기 위한 후공정 동안에 금속 재료가 쉽게 용융 또는 연화되지 않고 융점이 약 450℃ 이상인 재료가 적절하게 이용될 수 있다.The material of each of the metal bumps 51 described above is not limited to Au, and during the post-process for joining the base member 10 and the cap member 30 together, a material having a melting point of about 450 ° C. or higher without appropriate melting or softening of the metal material is appropriately used. Can be.
상술한 범프 접합에서는 초음파와 열을 동시에 인가한 공법으로 설명하였지만, 초음파만 또는 열만을 인가하여 범프 접합을 실시하는 공법도 이용할 수 있다. 또한, 금속 범프 형성 방법은 볼 본딩 공법으로 한정되지 않는다. 예를 들면, 도금 처리를 포함한 범프 형성법 등의 다른 금속 범프 형성법을 이용할 수도 있다.In the above-described bump bonding, a method in which ultrasonic waves and heat are applied at the same time has been described, but a method in which bump bonding is performed by applying only ultrasonic waves or only heat can also be used. In addition, the metal bump formation method is not limited to the ball bonding method. For example, another metal bump forming method such as a bump forming method including plating treatment may be used.
다음으로, 미리 왁스 재료 52로 형성된 고융점 왁스를 압착한 캡 부재 30을 베이스 부재 10 위에 놓는다. 그런 다음, 캡 부재 30과 베이스 부재 10을 리플로우 로(reflow furnace)에 투입하여, 도 1에 화살표로 나타낸 바와 같이 베이스 부재 10, 탄성표면파 소자 20 및 캡 부재 30 전체를 왁스 재료 52의 융점보다도 높은 온도로 균일하게 가열하고, 이것에 의하여 왁스 재료 52를 용융하고 베이스 부재 10과 캡 부재 30이 서로 접합되도록 한다. 이때, 가열 온도는 범프가 용융되지 않는 약 450℃ 이하가 바람직하다.Next, the cap member 30 which previously crimped the high melting point wax formed of the wax material 52 is placed on the base member 10. Then, the cap member 30 and the base member 10 are put into a reflow furnace, and the base member 10, the surface acoustic wave element 20, and the cap member 30 as a whole as indicated by the arrows in Fig. 1 are lower than the melting point of the wax material 52. Heated uniformly to a high temperature, thereby melting the wax material 52 and allowing the base member 10 and the cap member 30 to bond to each other. At this time, the heating temperature is preferably about 450 ° C. or less at which bumps do not melt.
이와 같이, 본 특정 구현예에 따른 탄성표면파 장치의 제조방법에 의하면, 탄성표면파 장치 전체를 균일하게 가열하여 베이스 부재와 캡 부재를 접합하기 때문에, 접합시에 상이한 부재 사이에서 온도차가 방생하지 않는다. 따라서, 냉각 후에 탄성표면파 장치에 작용하는 잔류 응력은 매우 작아져 최소화 되며, 이것으로 금속 범프 접합부에 가해지는 응력은 대폭 저감된다. 이러한 이유로, 금속 범프의 파손과 범프 접합부에 접속된 전극의 파손을 크게 감소시키고, 이들 부재의 벗겨짐 등의 접속 문제를 대폭 저감할 수 있으며, 이것에 의하여 수율을 향상시키고 고장율을 감소시키며 신뢰성을 크게 향상시킬 수 있다.As described above, according to the manufacturing method of the surface acoustic wave device according to the present specific embodiment, since the entire surface acoustic wave device is uniformly heated to bond the base member and the cap member, a temperature difference does not occur between the different members at the time of joining. Therefore, the residual stress acting on the surface acoustic wave device after cooling is very small and minimized, thereby greatly reducing the stress applied to the metal bump junction portion. For this reason, breakage of metal bumps and breakage of electrodes connected to bump joints can be greatly reduced, and connection problems such as peeling of these members can be greatly reduced, thereby improving yield, reducing failure rate, and greatly increasing reliability. Can be improved.
왁스 재료로서는, 상술한 땜납 이외에, Au-Su합금 또는 저융점 유리를 이용할 수도 있다. 또한, 상술한 구현예에서는 캡 부재에 왁스 재료를 압착한 경우에 대하여 설명하였지만, 베이스 부재에 왁스 재료를 미리 형성하도록 할 수도 있고, 다른 한편으로 인쇄에 의해 형성하도록 할 수도 있다.As the wax material, in addition to the solder described above, Au-Su alloy or low melting point glass may be used. In addition, in the above-described embodiment, the case where the wax material is pressed onto the cap member has been described, but the wax material may be formed on the base member in advance, or on the other hand, it may be formed by printing.
또한, 상술한 구현예에서는, 베이스 부재와 캡 부재와의 접합에 리플로우 로를 이용한 경우에 대하여 설명하였지만, 본 발명은 이것으로 한정되지는 않는다. 탄성표면파 장치 전체를 균일하게 가열할 수 있는 가열로 또는 오븐(oven)을 사용할 수도 있다.Moreover, in the above-mentioned embodiment, although the case where the reflow furnace was used for joining of a base member and a cap member was demonstrated, this invention is not limited to this. A heating furnace or oven capable of uniformly heating the whole surface acoustic wave device may be used.
또한, 캡 부재의 재료는 Fe-Ni합금 또는 Fe를 함유한 합금으로 한정되지 않고, 왁스 재료와의 사이에서 우수한 기밀성(airtight sealing property)을 얻을 수 있는 재료이면 사용가능하다. 또, 캡 부재를 형성하기 위한 재료는 금속으로 한정되지 않고, 캡 부재를 형성하기 위하여 세라믹을 이용할 수 있으며, 이런 경우에, 왁스 재료로서는 저융점 유리를 이용할 수도 있다. 또한, 금속으로 형성된 베이스 부재를 이용할 수도 있다.The material of the cap member is not limited to the Fe-Ni alloy or the alloy containing Fe, and can be used as long as the material can obtain excellent airtight sealing property with the wax material. The material for forming the cap member is not limited to metal, and ceramics may be used to form the cap member. In this case, low melting glass may be used as the wax material. It is also possible to use a base member made of metal.
또한, 베이스 부재 및 캡 부재의 형상은 상술한 구현예에 도시된 것으로 한정되지 않고, 예를 들어, 평판 형상의 베이스 부재와 오목 형상의 캡 부재로 패키지를 형성할 수도 있다. 또, 탄성표면파 소자의 전극 패턴도 상술한 구현예에 도시된 것으로 한정되지는 않는다.In addition, the shape of the base member and the cap member is not limited to that shown in the above-described embodiment, for example, a package may be formed from a flat base member and a concave cap member. In addition, the electrode pattern of the surface acoustic wave element is not limited to that shown in the above-described embodiment.
상술한 바와 같이, 본 발명에 의하면, 탄성표면파 소자는 융점이 450℃ 이상의 금속 패턴에 의해 베이스 부재에 강하게 접속·고정하고, 또한 탄성표면파 장치 전체를 균일하게 가열하고 베이스 부재와 캡 부재와의 접합을 실시하여, 금속 범프 접합부에 가해지는 응력을 대폭 저감하고 있지 때문에, 금속 범프와 범프 접합부에서의 접합 불량 상태의 발생을 대폭 저감할 수 있고, 신뢰성이 높은 탄성표면파 장치를 얻을 수 있다.As described above, according to the present invention, the surface acoustic wave element is strongly connected to and fixed to the base member by a metal pattern having a melting point of 450 ° C. or higher, and the entire surface acoustic wave device is uniformly heated to join the base member and the cap member. Since the stress exerted on the metal bump junction portion is greatly reduced, the occurrence of a poor bonding state between the metal bump and the bump junction portion can be greatly reduced, and a highly reliable surface acoustic wave device can be obtained.
본 발명을 구현예를 개시하였지만, 여기에 개시된 기술적 사상을 이용한 다양한 변형이 본원의 특허청구범위 내에서 가능하다. 따라서, 본 발명의 범위는 본원 특허청구범위로 한정된다.Although the embodiments of the present invention have been disclosed, various modifications using the technical spirit disclosed herein are possible within the scope of the claims herein. Accordingly, the scope of the invention is defined by the claims.
Claims (20)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05419299A JP3339450B2 (en) | 1999-03-02 | 1999-03-02 | Method for manufacturing surface acoustic wave device |
| JP11-54192 | 1999-03-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20000076704A true KR20000076704A (en) | 2000-12-26 |
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ID=12963692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020000008451A KR20000076704A (en) | 1999-03-02 | 2000-02-22 | A method of manufacturing a surface acoustic wave apparatus |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6543109B1 (en) |
| EP (1) | EP1033810B1 (en) |
| JP (1) | JP3339450B2 (en) |
| KR (1) | KR20000076704A (en) |
| CN (1) | CN1130822C (en) |
| DE (1) | DE60034836T2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100608448B1 (en) * | 2003-04-23 | 2006-08-03 | 가부시키가이샤 무라타 세이사쿠쇼 | Package of surface-mountable electronic component |
| WO2007061216A1 (en) * | 2005-11-24 | 2007-05-31 | Korea Advanced Institute Of Science And Technology | Method for bonding between electrical devices using ultrasonic vibration |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3702961B2 (en) * | 2002-10-04 | 2005-10-05 | 東洋通信機株式会社 | Manufacturing method of surface mount type SAW device |
| JP3689414B2 (en) * | 2003-06-03 | 2005-08-31 | 東洋通信機株式会社 | Manufacturing method of surface acoustic wave device |
| JP5556893B2 (en) | 2010-08-24 | 2014-07-23 | 株式会社村田製作所 | Ultrasonic generator |
| WO2012127979A1 (en) * | 2011-03-22 | 2012-09-27 | 株式会社村田製作所 | Manufacturing method for electronic component module and electronic component module |
| JP2013046167A (en) * | 2011-08-23 | 2013-03-04 | Seiko Epson Corp | Vibration device and manufacturing method of vibration device |
| JP5742954B2 (en) * | 2011-10-03 | 2015-07-01 | 株式会社村田製作所 | Ultrasonic generator |
| JP5565544B2 (en) * | 2012-08-01 | 2014-08-06 | 株式会社村田製作所 | Electronic components and electronic component modules |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5992552A (en) * | 1982-11-19 | 1984-05-28 | Hitachi Ltd | Semiconductor device |
| JPS62181517A (en) * | 1986-02-05 | 1987-08-08 | Murata Mfg Co Ltd | Surface wave device |
| US5058800A (en) * | 1988-05-30 | 1991-10-22 | Canon Kabushiki Kaisha | Method of making electric circuit device |
| JPH04196324A (en) * | 1990-11-28 | 1992-07-16 | Hitachi Ltd | Method and device for forming bump, and electronic device applying same |
| JPH06350376A (en) * | 1993-01-25 | 1994-12-22 | Matsushita Electric Ind Co Ltd | Piezoelectric device air-tightly sealed and air-tight sealing package |
| US5459368A (en) * | 1993-08-06 | 1995-10-17 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device mounted module |
| JPH07154185A (en) | 1993-10-04 | 1995-06-16 | Nec Corp | Surface acoustic wave device and its manufacture |
| FR2714200B1 (en) * | 1993-11-25 | 1996-12-27 | Fujitsu Ltd | Surface acoustic wave device and its manufacturing process. |
| US5939817A (en) * | 1994-09-22 | 1999-08-17 | Nippon Electric Co | Surface acoustic wave device |
| JP3171043B2 (en) * | 1995-01-11 | 2001-05-28 | 株式会社村田製作所 | Surface acoustic wave device |
| JP3301262B2 (en) * | 1995-03-28 | 2002-07-15 | 松下電器産業株式会社 | Surface acoustic wave device |
| JP3328102B2 (en) * | 1995-05-08 | 2002-09-24 | 松下電器産業株式会社 | Surface acoustic wave device and method of manufacturing the same |
| JPH09232899A (en) | 1996-02-23 | 1997-09-05 | Rohm Co Ltd | Package mount method for electronic element |
| JPH1032460A (en) | 1996-07-18 | 1998-02-03 | Murata Mfg Co Ltd | Surface acoustic wave device |
| JPH1098352A (en) | 1996-09-24 | 1998-04-14 | Toyo Commun Equip Co Ltd | Surface acoustic wave device |
| JPH10256409A (en) | 1997-03-10 | 1998-09-25 | Toyo Commun Equip Co Ltd | Fabrication of packages for piezoelectric device |
| JPH10256415A (en) | 1997-03-10 | 1998-09-25 | Toyo Commun Equip Co Ltd | Structure of package of piezoelectric device |
| JPH10313227A (en) | 1997-05-13 | 1998-11-24 | Murata Mfg Co Ltd | Surface acoustic wave device |
| JPH11204681A (en) * | 1998-01-12 | 1999-07-30 | Sumitomo Metal Smi Electron Devices Inc | Manufacture of ceramic package |
| US6321444B1 (en) * | 2000-04-11 | 2001-11-27 | Japan Radio Co., Ltd. | Method of making surface acoustic wave device |
| EP0961404B1 (en) | 1998-05-29 | 2008-07-02 | Fujitsu Limited | Surface-acoustic-wave filter having an improved suppression outside a pass-band |
| US6329739B1 (en) * | 1998-06-16 | 2001-12-11 | Oki Electric Industry Co., Ltd. | Surface-acoustic-wave device package and method for fabricating the same |
| JP2000286526A (en) * | 1999-03-30 | 2000-10-13 | Murata Mfg Co Ltd | Surface mounting structure and surface-mounted electronic component used in the same |
| JP3351402B2 (en) * | 1999-04-28 | 2002-11-25 | 株式会社村田製作所 | Electronic element, surface acoustic wave element, mounting method thereof, electronic component or surface acoustic wave device manufacturing method, and surface acoustic wave device |
-
1999
- 1999-03-02 JP JP05419299A patent/JP3339450B2/en not_active Expired - Lifetime
-
2000
- 2000-02-17 US US09/506,459 patent/US6543109B1/en not_active Expired - Lifetime
- 2000-02-22 KR KR1020000008451A patent/KR20000076704A/en active Search and Examination
- 2000-03-02 CN CN00103835A patent/CN1130822C/en not_active Expired - Lifetime
- 2000-03-02 DE DE60034836T patent/DE60034836T2/en not_active Expired - Lifetime
- 2000-03-02 EP EP00400562A patent/EP1033810B1/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100608448B1 (en) * | 2003-04-23 | 2006-08-03 | 가부시키가이샤 무라타 세이사쿠쇼 | Package of surface-mountable electronic component |
| WO2007061216A1 (en) * | 2005-11-24 | 2007-05-31 | Korea Advanced Institute Of Science And Technology | Method for bonding between electrical devices using ultrasonic vibration |
Also Published As
| Publication number | Publication date |
|---|---|
| US6543109B1 (en) | 2003-04-08 |
| JP3339450B2 (en) | 2002-10-28 |
| CN1130822C (en) | 2003-12-10 |
| CN1265538A (en) | 2000-09-06 |
| DE60034836T2 (en) | 2007-11-29 |
| JP2000252778A (en) | 2000-09-14 |
| DE60034836D1 (en) | 2007-06-28 |
| EP1033810A2 (en) | 2000-09-06 |
| EP1033810B1 (en) | 2007-05-16 |
| EP1033810A3 (en) | 2000-09-20 |
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