KR102577158B1 - Etching composition and etching method using the same - Google Patents
Etching composition and etching method using the same Download PDFInfo
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- KR102577158B1 KR102577158B1 KR1020200028013A KR20200028013A KR102577158B1 KR 102577158 B1 KR102577158 B1 KR 102577158B1 KR 1020200028013 A KR1020200028013 A KR 1020200028013A KR 20200028013 A KR20200028013 A KR 20200028013A KR 102577158 B1 KR102577158 B1 KR 102577158B1
- Authority
- KR
- South Korea
- Prior art keywords
- etching
- acid
- weight
- film
- metal film
- Prior art date
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- 238000005530 etching Methods 0.000 title claims abstract description 210
- 239000000203 mixture Substances 0.000 title claims abstract description 116
- 238000000034 method Methods 0.000 title claims abstract description 45
- 229910052751 metal Inorganic materials 0.000 claims abstract description 84
- 239000002184 metal Substances 0.000 claims abstract description 84
- 230000008569 process Effects 0.000 claims abstract description 26
- 239000004065 semiconductor Substances 0.000 claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 239000010949 copper Substances 0.000 claims description 51
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 46
- -1 amine compounds Chemical class 0.000 claims description 46
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 45
- 239000003112 inhibitor Substances 0.000 claims description 45
- 229910052802 copper Inorganic materials 0.000 claims description 43
- 150000007524 organic acids Chemical class 0.000 claims description 37
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 36
- 229910052750 molybdenum Inorganic materials 0.000 claims description 30
- 239000011733 molybdenum Substances 0.000 claims description 30
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- 239000003002 pH adjusting agent Substances 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 18
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 18
- 229910001182 Mo alloy Inorganic materials 0.000 claims description 17
- 150000002222 fluorine compounds Chemical class 0.000 claims description 15
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000002738 chelating agent Substances 0.000 claims description 13
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 claims description 12
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 8
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 8
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 229930024421 Adenine Natural products 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 229960000643 adenine Drugs 0.000 claims description 7
- GFFGJBXGBJISGV-UHFFFAOYSA-N adenyl group Chemical group N1=CN=C2N=CNC2=C1N GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 claims description 7
- 235000005985 organic acids Nutrition 0.000 claims description 7
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 6
- 239000001530 fumaric acid Substances 0.000 claims description 6
- 235000011087 fumaric acid Nutrition 0.000 claims description 6
- 239000001630 malic acid Substances 0.000 claims description 6
- 235000011090 malic acid Nutrition 0.000 claims description 6
- 235000006408 oxalic acid Nutrition 0.000 claims description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 6
- 150000002391 heterocyclic compounds Chemical group 0.000 claims description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 4
- 229910017855 NH 4 F Inorganic materials 0.000 claims description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001361 adipic acid Substances 0.000 claims description 4
- 235000011037 adipic acid Nutrition 0.000 claims description 4
- 239000000908 ammonium hydroxide Substances 0.000 claims description 4
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 4
- 235000015165 citric acid Nutrition 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 4
- 239000011975 tartaric acid Substances 0.000 claims description 4
- 235000002906 tartaric acid Nutrition 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 239000011135 tin Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 claims description 3
- 229910016569 AlF 3 Inorganic materials 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 150000003973 alkyl amines Chemical class 0.000 claims description 3
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 229910052757 nitrogen Chemical group 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Chemical group 0.000 claims description 3
- 239000010408 film Substances 0.000 description 133
- 230000000052 comparative effect Effects 0.000 description 19
- 229910052723 transition metal Inorganic materials 0.000 description 13
- 150000003624 transition metals Chemical class 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- YYRMJZQKEFZXMX-UHFFFAOYSA-N calcium;phosphoric acid Chemical compound [Ca+2].OP(O)(O)=O.OP(O)(O)=O YYRMJZQKEFZXMX-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 238000000354 decomposition reaction Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 229910021645 metal ion Inorganic materials 0.000 description 7
- 239000002426 superphosphate Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 6
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 5
- 150000007522 mineralic acids Chemical class 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 4
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- ULRPISSMEBPJLN-UHFFFAOYSA-N 2h-tetrazol-5-amine Chemical compound NC1=NN=NN1 ULRPISSMEBPJLN-UHFFFAOYSA-N 0.000 description 3
- XZGLNCKSNVGDNX-UHFFFAOYSA-N 5-methyl-2h-tetrazole Chemical compound CC=1N=NNN=1 XZGLNCKSNVGDNX-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004254 Ammonium phosphate Substances 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 3
- 235000019289 ammonium phosphates Nutrition 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 3
- 235000019797 dipotassium phosphate Nutrition 0.000 description 3
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 3
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 3
- 229910000397 disodium phosphate Inorganic materials 0.000 description 3
- 235000019800 disodium phosphate Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 229910000160 potassium phosphate Inorganic materials 0.000 description 3
- 235000011009 potassium phosphates Nutrition 0.000 description 3
- 238000004886 process control Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 235000011152 sodium sulphate Nutrition 0.000 description 3
- PQHYOGIRXOKOEJ-UHFFFAOYSA-N 2-(1,2-dicarboxyethylamino)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)NC(C(O)=O)CC(O)=O PQHYOGIRXOKOEJ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
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- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
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- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- BIGPRXCJEDHCLP-UHFFFAOYSA-N ammonium bisulfate Chemical compound [NH4+].OS([O-])(=O)=O BIGPRXCJEDHCLP-UHFFFAOYSA-N 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical group N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- JZLMRQMUNCKZTP-UHFFFAOYSA-N molybdenum tantalum Chemical compound [Mo].[Ta] JZLMRQMUNCKZTP-UHFFFAOYSA-N 0.000 description 2
- ZPZCREMGFMRIRR-UHFFFAOYSA-N molybdenum titanium Chemical compound [Ti].[Mo] ZPZCREMGFMRIRR-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 2
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- 229920006395 saturated elastomer Polymers 0.000 description 2
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- 150000003536 tetrazoles Chemical class 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 125000006732 (C1-C15) alkyl group Chemical group 0.000 description 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- PVOAHINGSUIXLS-UHFFFAOYSA-N 1-Methylpiperazine Chemical compound CN1CCNCC1 PVOAHINGSUIXLS-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
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- 125000003469 3-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
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- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
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- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
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- 229910052742 iron Inorganic materials 0.000 description 1
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- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- XMYQHJDBLRZMLW-UHFFFAOYSA-N methanolamine Chemical compound NCO XMYQHJDBLRZMLW-UHFFFAOYSA-N 0.000 description 1
- 229940087646 methanolamine Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
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- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 1
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- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 150000002825 nitriles Chemical class 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
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- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
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- 125000001997 phenyl group Chemical class [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
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- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
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- 239000010937 tungsten Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/16—Sulfur-containing compounds
- C23F11/165—Heterocyclic compounds containing sulfur as hetero atom
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Abstract
본 발명은 식각 조성물 및 이를 이용하는 금속막의 식각방법에 관한 것으로, 상세하게는 단일금속막 또는 다중금속막의 식각 특성을 향상시키는 식각 조성물, 이를 이용하는 금속막의 식각방법 및 본 발명의 식각 조성물을 이용하여 수행되는 공정을 포함하는 반도체 소자의 제조방법을 제공한다.The present invention relates to an etching composition and a method of etching a metal film using the same. Specifically, an etching composition that improves the etching characteristics of a single metal film or a multi-metal film, a method of etching a metal film using the same, and an etching composition performed using the etching composition of the present invention. Provides a method for manufacturing a semiconductor device including a process.
Description
본 발명은 식각 조성물 및 이를 이용하는 식각방법에 관한 것으로, 보다 상세하게는 식각 조성물, 이를 이용하는 금속막의 식각방법 및 본 발명의 식각 조성물을 이용하여 수행되는 공정을 포함하는 반도체 소자의 제조방법에 관한 것이다.The present invention relates to an etching composition and an etching method using the same, and more specifically, to an etching composition, a method of etching a metal film using the same, and a method of manufacturing a semiconductor device including a process performed using the etching composition of the present invention. .
반도체 장치 및 TFT-LCD 등의 미세 회로는 기판상에 형성된 알루미늄, 알루미늄 합금, 구리 및 구리 합금 등의 도전성 금속막 또는 실리콘 산화막, 실리콘 질화막 등의 절연막에 포토레지스트를 균일하게 도포한 다음, 패턴이 새겨진 마스크를 통하여 빛을 조사한 후 현상을 통하여 원하는 패턴의 포토레지스트를 형성시키고 건식 또는 습식 식각으로 포토레지스트 하부에 있는 금속막 또는 절연막에 패턴을 전사한 후, 필요없는 포토레지스트를 박리 공정에 의해 제거하는 일련의 리소그래피 공정을 거쳐 완성된다. Microcircuits such as semiconductor devices and TFT-LCDs are made by uniformly applying photoresist to a conductive metal film such as aluminum, aluminum alloy, copper and copper alloy, or an insulating film such as silicon oxide or silicon nitride film formed on a substrate, and then forming a pattern. After irradiating light through an engraved mask and developing it to form a photoresist of the desired pattern, the pattern is transferred to the metal film or insulating film below the photoresist by dry or wet etching, and then unnecessary photoresist is removed through a peeling process. It is completed through a series of lithography processes.
반도체 장치 및 TFT-LCD의 기판을 제조하기 위해 TFT의 게이트와 데이터 라인 전극용 배선 재료로 알루미늄, 알루미늄 합금층 및 크롬이 흔히 사용되었으나, 대형 디스플레이 구현을 위해서는 전극용 배선의 저항 감소가 필수적이며, 이를 위하여 저항이 낮은 금속인 구리를 배선 형성에 사용하고자 하는 시도가 진행되고 있다. To manufacture semiconductor devices and TFT-LCD substrates, aluminum, aluminum alloy layers, and chrome have been commonly used as wiring materials for TFT gate and data line electrodes. However, in order to implement large displays, it is essential to reduce the resistance of electrode wiring. To this end, attempts are being made to use copper, a metal with low resistance, to form wiring.
그러나, 구리는 유리 기판 및 실리콘 절연막과 접착력이 낮고 실리콘 막으로 확산되는 문제점이 있어 티타늄, 몰리브덴 등을 구리막의 하부 배리어 금속으로 사용하고 있다.However, copper has low adhesion to the glass substrate and silicon insulating film and has a problem of diffusing into the silicon film, so titanium, molybdenum, etc. are used as the lower barrier metal of the copper film.
이에 따라 하부 배리어 금속막과 구리막의 식각에 사용되는 식각 조성물에 대한 연구도 활발하게 진행되고 있다.Accordingly, research on etching compositions used for etching the lower barrier metal film and copper film is also being actively conducted.
배리어 금속이 티타늄, 몰리브덴 합금인 경우의 식각 공정은 티타늄의 화학적 성질로 인해 특정 이온 또는 특정 조건으로만 식각해야되는 단점을 가지고 있으며, 배리어 금속이 몰리브덴인 경우의 식각 공정은 구리막과 몰리브덴 막과의 접착력이 떨어지는 단점을 가지고 있다. 특히 구리 막과 몰리브덴 막의 접착력이 떨어지는 부분에 식각 조성물의 침투에 의한 과식각 현상이 심화된다. 그러나 과식각 현상을 해결하기 위해 몰리브덴 합금의 식각 속도를 감소 시키면 몰리브덴 합금의 잔사를 유발하게 된다.The etching process when the barrier metal is titanium or molybdenum alloy has the disadvantage of having to be etched only under specific ions or under specific conditions due to the chemical properties of titanium, and when the barrier metal is molybdenum, the etching process involves combining the copper film and molybdenum film. It has the disadvantage of poor adhesion. In particular, overetching occurs due to penetration of the etching composition into areas where the adhesion between the copper film and the molybdenum film is poor. However, reducing the etching rate of molybdenum alloy to solve the overetching phenomenon causes residues of molybdenum alloy.
특히 대형 디스플레이 구현을 위해서 전극용 배선에 구리를 사용할 경우 테이퍼 앵글(Taper angle)이 형성하는 각도에 따라 후속 공정에서 불량이 발생하게 된다.In particular, when copper is used for electrode wiring to implement a large display, defects may occur in subsequent processes depending on the angle formed by the taper angle.
따라서 테이퍼 앵글이 적정한 각도를 형성하며, 잔사가 발생하지 않는 우수한 식각 조성물에 대한 연구가 필요하다.Therefore, research is needed on an excellent etching composition that forms an appropriate taper angle and does not generate residue.
본 발명은 식각 조성물, 특히 구리 등의 금속 단일막 또는 구리 등의 금속을 포함하는 다중금속막을 효과적으로 식각하여 식각 특성을 획기적으로 향상시킬 수 있는 식각 조성물 및 이를 이용하는 식각방법을 제공한다.The present invention provides an etching composition, particularly an etching composition that can dramatically improve etching properties by effectively etching a single metal film such as copper or a multi-metal film containing a metal such as copper, and an etching method using the same.
또한 본 발명은 본 발명의 식각 조성물을 이용하여 수행되는 공정을 포함하는 반도체 소자의 제조방법을 제공한다.Additionally, the present invention provides a method for manufacturing a semiconductor device including a process performed using the etching composition of the present invention.
본 발명은 놀랍도록 식각성능이 향상된 식각 조성물을 제공하는 것으로, 본 발명의 식각 조성물은 과산화수소; 두개 이상의 카르복실산기를 가지는 유기산; 식각억제제; 불소 화합물; 아데닌, 구아닌 또는 이들의 혼합물인 언더컷 억제제; 아민 화합물; pH 조절제; 및 잔량의 물을 포함한다.The present invention provides an etching composition with surprisingly improved etching performance. The etching composition of the present invention includes hydrogen peroxide; Organic acids having two or more carboxylic acid groups; Etch inhibitor; fluorine compounds; an undercut inhibitor that is adenine, guanine, or mixtures thereof; amine compounds; pH adjuster; and a residual amount of water.
바람직하게 본 발명의 일 실시예에 따른 유기산은 2 내지 7개의 탄소수를 가지는 유기산일 수 있으며, 구체적으로 말론산, 푸마르산, 말릭산, 시트르산, 옥살산, 타르타르산, 숙신산, 글루타르산, 아디프산 및 피멜산에서 선택되는 하나 또는 둘 이상일 수 있다.Preferably, the organic acid according to an embodiment of the present invention may be an organic acid having 2 to 7 carbon atoms, specifically malonic acid, fumaric acid, malic acid, citric acid, oxalic acid, tartaric acid, succinic acid, glutaric acid, adipic acid and It may be one or more than two selected from pimelic acid.
본 발명의 일 실시예에 따른 pH 조절제는 수산화나트륨, 수산화칼륨, 탄산나트륨 및 수산화암모늄에서 선택되는 하나 또는 둘 이상일 수 있다.The pH adjuster according to an embodiment of the present invention may be one or two or more selected from sodium hydroxide, potassium hydroxide, sodium carbonate, and ammonium hydroxide.
바람직하게 본 발명의 일 실시예에 따른 유기산 및 pH 조절제는 중량비가 1 내지 5 : 1 일 수 있다.Preferably, the organic acid and the pH adjuster according to an embodiment of the present invention may have a weight ratio of 1 to 5:1.
본 발명의 일 실시예에 따른 아민 화합물은 C4 내지 C10의 알킬아민, C3 내지 C10의 시클로알킬아민 또는 이들의 혼합물일 수 있다.The amine compound according to an embodiment of the present invention may be a C4 to C10 alkylamine, a C3 to C10 cycloalkylamine, or a mixture thereof.
본 발명의 일 실시예에 따른 식각억제제는 분자내 산소, 황 및 질소에서 선택되는 하나 또는 둘 이상의 헤테로 원자를 포함하는 헤테로고리 화합물일 수 있다.The etching inhibitor according to an embodiment of the present invention may be a heterocyclic compound containing one or two or more heteroatoms selected from oxygen, sulfur, and nitrogen in the molecule.
바람직하게 본 발명의 일 실시예에 따른 아민 화합물과 식각억제제는 중량비가 5 내지 10 : 1 일수 있다Preferably, the weight ratio of the amine compound and the etch inhibitor according to an embodiment of the present invention may be 5 to 10:1.
본 발명의 일 실시예에 따른 식각 조성물은 조성물 총 중량에 대해 과산화수소 10 내지 30중량%, 유기산 0. 1 내지 10중량%, 식각억제제 0.01 내지 5중량%, 불소 화합물 0.01 내지 1중량%, 언더컷 억제제 0.01 내지 2중량%, 아민 화합물 0.1 내지 5중량%, pH 조절제 0. 1 내지 5중량% 및 잔량의 물을 포함할 수 있다.The etching composition according to an embodiment of the present invention contains 10 to 30% by weight of hydrogen peroxide, 0.1 to 10% by weight of an organic acid, 0.01 to 5% by weight of an etch inhibitor, 0.01 to 1% by weight of a fluorine compound, and an undercut inhibitor, based on the total weight of the composition. It may include 0.01 to 2% by weight, 0.1 to 5% by weight of an amine compound, 0.1 to 5% by weight of a pH adjuster, and the remaining amount of water.
본 발명의 일 실시예에 따른 불소 화합물은 HF, NaF, KF, AlF3, HBF4, NH4F, NH4HF2, NaHF2, KHF2 및 NH4BF4에서 선택되는 어느 하나 또는 둘 이상일 수 있다.The fluorine compound according to an embodiment of the present invention is any one or two or more selected from HF, NaF, KF, AlF 3 , HBF 4 , NH 4 F, NH 4 HF 2 , NaHF 2 , KHF 2 and NH 4 BF 4 You can.
본 발명의 일 실시예에 따른 식각 조성물은 킬레이트제를 더 포함할 수 있으며, 본 발명의 일 실시예에 따른 킬레이트제는 분자내 아미노기와 카르복실산기 또는 포스폰산기를 포함하는 화합물일 수 있다.The etching composition according to an embodiment of the present invention may further include a chelating agent, and the chelating agent according to an embodiment of the present invention may be a compound containing an amino group, a carboxylic acid group, or a phosphonic acid group within the molecule.
또한 본 발명은 본 발명의 식각 조성물을 금속막에 접촉시켜 금속막을 식각하는 단계를 포함하는 금속막의 식각방법을 제공한다.Additionally, the present invention provides a method of etching a metal film including the step of etching the metal film by contacting the metal film with the etching composition of the present invention.
본 발명의 일 실시예에 따른 금속막은 구리, 몰리브덴, 티타늄, 인듐, 아연, 주석 및 나이오븀에서 선택되는 하나 또는 둘 이상이 포함된 것일 수 있으며, 구리를 포함하는 단일 금속막; 구리 합금막을 포함하는 구리합금막; 및 구리를 포함하는 상부막과 몰리브데늄막 또는 몰리브데늄 합금막을 포함하는 다중막에서 선택되는 것일 수 있다.The metal film according to an embodiment of the present invention may contain one or two or more selected from copper, molybdenum, titanium, indium, zinc, tin, and niobium, and may include a single metal film containing copper; A copper alloy film including a copper alloy film; and a multilayer film including an upper film containing copper and a molybdenum film or a molybdenum alloy film.
또한 본 발명은 본 발명의 식각 조성물을 이용하여 수행되는 공정을 포함하는 반도체 소자의 제조방법을 제공한다.Additionally, the present invention provides a method for manufacturing a semiconductor device including a process performed using the etching composition of the present invention.
본 발명의 식각 조성물은 안정성이 매우 우수하여 처리매수 및 처리시간이 증가하여도 식각 속도와 식각 균일성이 유지되며, 잔막 및 언더컷이 발생되지 않는 등의 식각 특성에 변화가 없어 매우 우수한 식각 성능을 가진다. The etching composition of the present invention has excellent stability, so that the etching speed and etching uniformity are maintained even as the number of sheets and processing time increases, and there is no change in etching characteristics such as no residual film or undercut, providing excellent etching performance. have
또한 본 발명의 식각 조성물은 식각속도가 매우 우수할 뿐만 아니라 하부막의 금속 등의 잔사가 남지 않으며, 언더컷이 발생되지 않으며, 현저하게 낮은 테이퍼 앵글을 가지는 등의 현저하게 향상된 식각 특성을 가진다.In addition, the etching composition of the present invention not only has an excellent etching speed, but also has significantly improved etching properties, such as leaving no metal residue on the lower film, not generating undercuts, and having a significantly low taper angle.
따라서 본 발명의 식각 조성물을 이용하는 금속막의 식각방법은 금속 단일막 또는 금속 등을 포함하는 이중 또는 다중금속막을 우수한 식각 속도와 식각 균일성으로 효과적인 식각을 할 수 있다.Therefore, the method of etching a metal film using the etching composition of the present invention can effectively etch a single metal film or a double or multi-metal film containing metal with excellent etching speed and etching uniformity.
또한 본 발명의 식각 조성물을 이용하여 수행되는 공정을 포함하는 반도체 소자의 제조방법은 본 발명의 식각 조성물을 이용함으로써 향상된 성능을 가지는 반도체 소자의 제조가 가능하다. In addition, the method of manufacturing a semiconductor device including a process performed using the etching composition of the present invention can produce a semiconductor device with improved performance by using the etching composition of the present invention.
본 발명의 명세서에 기재된 "알킬"은 오직 탄소 및 수소 원자로만 이루어지고, 1 내지 20개의 탄소 원자 (C1-C20 알킬), 1 내지 15개의 탄소원자 (C1-C15 알킬), 4 내지 10개의 탄소 원자 (C4-C10 알킬), 바람직하게는 4 내지 8개의 탄소원자(C4-C8 알킬)를 가지며, 단일 결합에 의해 분자의 나머지 부분에 부착되는 포화 직쇄형 또는 분지형 탄화수소쇄 라디칼을 지칭한다. 구체적인 일례로의 알킬기는 메틸, 에틸, n-프로필, 1-메틸에틸 (이소-프로필), n-부틸, n-펜틸, 1,1-디메틸에틸 (t-부틸), 3-메틸헥실, 2-메틸헥실 등을 포함한다.“Alkyl” as used in the specification of the present invention consists only of carbon and hydrogen atoms, 1 to 20 carbon atoms (C1-C20 alkyl), 1 to 15 carbon atoms (C1-C15 alkyl), 4 to 10 carbon atoms. refers to a saturated straight or branched hydrocarbon chain radical having atoms (C4-C10 alkyl), preferably 4 to 8 carbon atoms (C4-C8 alkyl), which are attached to the remainder of the molecule by single bonds. Specific examples of alkyl groups include methyl, ethyl, n-propyl, 1-methylethyl (iso-propyl), n-butyl, n-pentyl, 1,1-dimethylethyl (t-butyl), 3-methylhexyl, 2 -Includes methylhexyl, etc.
본 명세서에 기재된 "시클로알킬"은 오직 탄소 및 수소 원자로만 이루어지고, 3 내지 15개의 탄소 원자, 바람직하게는 3 내지 10개의 탄소 원자, 3 내지 9개의 탄소 원자, 3 내지 8개의 탄소 원자, 3 내지 7개의 탄소 원자, 3 내지 6개의 탄소원자, 3 내지 5개의 탄소 원자를 갖는 융합된 또는 가교된 고리계, 4개의 탄소 원자를 갖는 고리, 또는 3개의탄소 원자를 갖는 고리를 포함할 수 있는 안정한 비-방향족 모노시클릭 또는 폴리시클릭 탄화수소 라디칼을 지칭한다. 시클로알킬 고리는 포화 또는 불포화일 수 있고, 단일 결합에 의해 분자의 나머지 부분에 부착될 수 있다. 모노시클릭 라디칼은 예를 들어 시클로프로필, 시클로부틸, 시클로펜틸, 시클로헥실, 시클로헵틸, 및 시클로옥틸을 포함한다. 폴리시클릭 라디칼은 예를 들어 아다만틸, 노르보르닐, 데칼리닐, 7,7-디메틸-비시클로[2.2.1]헵타닐 등을 포함한다.As used herein, “cycloalkyl” consists only of carbon and hydrogen atoms, preferably 3 to 15 carbon atoms, preferably 3 to 10 carbon atoms, 3 to 9 carbon atoms, 3 to 8 carbon atoms, 3 may include a fused or bridged ring system having from 3 to 7 carbon atoms, 3 to 6 carbon atoms, 3 to 5 carbon atoms, a ring having 4 carbon atoms, or a ring having 3 carbon atoms. Refers to a stable non-aromatic monocyclic or polycyclic hydrocarbon radical. Cycloalkyl rings can be saturated or unsaturated and can be attached to the rest of the molecule by single bonds. Monocyclic radicals include, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. Polycyclic radicals include, for example, adamantyl, norbornyl, decalinyl, 7,7-dimethyl-bicyclo[2.2.1]heptanyl, and the like.
본 명세서에 기재된 "카르복실산기"는 -CO2H 치환기를 지칭한다.As used herein, “carboxylic acid group” refers to the -CO 2 H substituent.
본 발명은 식각 조성물을 제공하는 것으로, 특히 구리 등을 포함하는 이중 또는 다중금속막의 식각 특성을 획기적으로 향상시키는 식각 조성물을 제공한다.The present invention provides an etching composition, and in particular, an etching composition that dramatically improves the etching properties of dual or multi-metal films containing copper, etc.
본 발명의 식각 조성물은 과산화수소; 두개 이상의 카르복실산기를 가지는 유기산; 식각억제제; 불소 화합물; 아데닌, 구아닌 또는 이들의 혼합물인 언더컷 억제제; 아민 화합물; pH 조절제; 및 잔량의 물을 포함한다.The etching composition of the present invention includes hydrogen peroxide; Organic acids having two or more carboxylic acid groups; Etch inhibitor; fluorine compounds; an undercut inhibitor that is adenine, guanine, or mixtures thereof; amine compounds; pH adjuster; and a residual amount of water.
본 발명의 식각 조성물은 상기와 같은 조성의 조합으로 향상된 식각 특성 구체적으로, 식각 조성물의 안정성이 매우 우수하여 식각되는 다중금속막의 계면을 보호함으로써 식각특성을 놀랍도록 향상시킨다.The etching composition of the present invention has improved etching properties by combining the above compositions. Specifically, the etching composition has excellent stability and surprisingly improves etching properties by protecting the interface of the multi-metal film being etched.
바람직하게 본 발명은 식각 조성물은 식각첨가제로 특정한 작용기를, 특정 갯수 이상을 가지는 유기산 즉, 두개 이상의 카르복실산기를 가지는 유기산을 식각 조성물의 조합으로 사용하여 우수한 식각특성을 가진다.Preferably, the etching composition of the present invention has excellent etching properties by using a combination of an organic acid having a specific number of functional groups, that is, an organic acid having two or more carboxylic acid groups, as an etching additive.
바람직하게 본 발명의 일 실시예에 따른 두개 이상의 카르복실산기를 가지는 유기산은 2 내지 7개의 탄소수를 가지는 화합물일 수 있으며, 구체적으로 말론산, 푸마르산, 말릭산, 시트르산, 옥살산, 타르타르산, 숙신산, 글루타르산, 아디프산 및 피멜산에 선택되는 하나 또는 둘 이상일 수 있다.Preferably, the organic acid having two or more carboxylic acid groups according to an embodiment of the present invention may be a compound having 2 to 7 carbon atoms, specifically malonic acid, fumaric acid, malic acid, citric acid, oxalic acid, tartaric acid, succinic acid, and glucolic acid. It may be one or two or more selected from taric acid, adipic acid and pimelic acid.
바람직하게 본 발명의 식각 조성물은 과산화수소, 두개 이상의 카르복실산기를 가지는 유기산, 식각억제제, 불소 화합물, 특정한 언더컷 억제제, 아민 화합물의 조합에 반드시 pH 조절제를 포함함으로써 더욱 향상된 식각 특성을 가지며, pH 조절제는 구체적으로 한정이 되는 것은 아니나, 수산화나트륨, 수산화칼륨, 탄산나트륨 및 수산화암모늄에서 선택되는 하나 또는 둘 이상일 수 있다.Preferably, the etching composition of the present invention has further improved etching properties by always including a pH regulator in a combination of hydrogen peroxide, an organic acid having two or more carboxylic acid groups, an etching inhibitor, a fluorine compound, a specific undercut inhibitor, and an amine compound, and the pH regulator is Although not specifically limited, it may be one or two or more selected from sodium hydroxide, potassium hydroxide, sodium carbonate, and ammonium hydroxide.
바람직하게 본 발명의 일 실시예에 따른 유기산 및 pH 조절제는 향상된 식각특성 특히, 페이퍼 앵글 및 식각 속도 향상을 하기 위한 측면에서 유기산 : pH 조절제의 중량비가 1 내지 5 : 1 일 수 있으며, 좋기로는 2 내지 3 : 1일 수 있다.Preferably, the organic acid and pH adjuster according to an embodiment of the present invention may have a weight ratio of organic acid:pH adjuster of 1 to 5:1 in terms of improving etching characteristics, especially paper angle and etching speed, preferably 1 to 5:1. It may be 2 to 3:1.
바람직하게 본 발명의 일 실시예에 따른 아민 화합물 및 식각억제제은 식각특성 특히, 하부막 잔사 및 언더컷이 발생하지 않도록 하기 위한 측면에서 아민 화합물 : 식각억제제 중량비가 5 내지 10 : 1 일 수 있으며, 바람직하게 6 내지 7 : 1일 수 있다.Preferably, the amine compound and the etch inhibitor according to an embodiment of the present invention may have an amine compound:etch inhibitor weight ratio of 5 to 10:1 in terms of etching characteristics, especially to prevent lower film residues and undercuts from occurring. It may be 6 to 7:1.
바람직하게 본 발명의 일 실시예에 따른 식각 조성물은 유기산 : pH 조절제의 중량비가 1 내지 5 : 1 이며, 아민 화합물 : 식각억제제의 중량비가 5 내지 10의 조합일 수 있으며, 좋기로는 유기산 : pH 조절제의 중량비가 2 내지 3 : 1 이며, 아민 화합물 : 식각억제제의 중량비가 5 내지 7의 조합일 수 있다.Preferably, the etching composition according to an embodiment of the present invention may have a weight ratio of organic acid:pH adjuster of 1 to 5:1, and an amine compound:etch inhibitor weight ratio may be a combination of 5 to 10, preferably organic acid:pH. The weight ratio of the regulator may be 2 to 3:1, and the weight ratio of the amine compound:etch inhibitor may be a combination of 5 to 7.
이하에서는 본 발명의 일 실시예에 따른 식각 조성물의 각 구성성분들에 대해 보다 상세히 설명한다.Hereinafter, each component of the etching composition according to an embodiment of the present invention will be described in more detail.
a) 과산화수소a) hydrogen peroxide
본 발명의 식각 조성물에서 과산화수소는 금속 또는 금속막의 전이금속 또는 금속의 주 산화제로 작용한다.In the etching composition of the present invention, hydrogen peroxide acts as a main oxidizing agent for metals or transition metals of metal films.
본 발명의 일 실시예에 식각 조성물은 5 내지 33%의 과산화수소수를 이용하여 식각 조성물 내에서 일정한 중량의 과산화수소를 포함하도록 제조될 수 있으나, 이에 한정이 있는 것은 아니다.In one embodiment of the present invention, the etching composition may be prepared by using 5 to 33% hydrogen peroxide solution to contain a certain weight of hydrogen peroxide, but the etching composition is not limited thereto.
본 발명의 일 실시예에 따른 과산화수소는 식각 조성물 총 중량에 대하여 10 내지 30중량%로 포함될 수 있다. 과산화수소가 10중량% 미만으로 포함될 경우 전이금속의 산화력이 충분하지 않아 식각이 이루어지지 않을 수 있으며,30중량% 초과하여 포함되는 경우 식각 속도가 너무 빨라 공정 제어가 어려워지는 문제가 있다. 바람직한 식각속도를 구현할 수 있어 식각 잔사 및 식각 불량을 방지할 수 있으며, 시디로스(CD loss)가 감소하고 공정 조절이 용이하다는 측면에서 바람직하게 15 내지 25중량%로 포함될 수 있다.Hydrogen peroxide according to an embodiment of the present invention may be included in an amount of 10 to 30% by weight based on the total weight of the etching composition. If hydrogen peroxide is included in less than 10% by weight, etching may not occur due to insufficient oxidizing power of the transition metal, and if it is included in more than 30% by weight, the etching rate is too fast, making process control difficult. A desirable etching speed can be achieved to prevent etching residues and etching defects, and in terms of reducing CD loss and easy process control, it can preferably be included at 15 to 25% by weight.
b) 유기산b) organic acids
본 발명의 식각첨가제는 전이금속 또는 금속에 대한 보조 산화제의 역할을 하며, 테이퍼 프로파일을 개선시키는 것으로 본 발명의 식각첨가제는 특정한 유기산이 사용된다.The etching additive of the present invention acts as an auxiliary oxidizing agent for transition metals or metals, and a specific organic acid is used to improve the taper profile.
본 발명의 유기산은 두개 이상의 카르복실산기를 가지는 유기산으로, 바람직하게는 2 내지 7개의 탄소수를 가지는 유기산일 수 있으며, 보다 바람직하게는 2 내지 5개의 탄소수를 가지는 유기산일 수 있다.The organic acid of the present invention is an organic acid having two or more carboxylic acid groups, preferably an organic acid having 2 to 7 carbon atoms, more preferably an organic acid having 2 to 5 carbon atoms.
구체적으로 두개 이상의 카르복실산기를 가지는 유기산은 말론산, 푸마르산, 말릭산, 시트르산, 옥살산, 타르타르산, 숙신산, 글루타르산, 아디프산 및 피멜산에서 선택되는 하나 또는 둘 이상일 수 있으며, 바람직하게는 말론산, 옥살산, 푸마르산 및 말릭산에서 선택되는 하나 또는 둘 이상일 수 있다.Specifically, the organic acid having two or more carboxylic acid groups may be one or two or more selected from malonic acid, fumaric acid, malic acid, citric acid, oxalic acid, tartaric acid, succinic acid, glutaric acid, adipic acid and pimelic acid, preferably It may be one or two or more selected from malonic acid, oxalic acid, fumaric acid, and malic acid.
본 발명의 두개 이상의 카르복실산기를 가지는 유기산은 식각 조성물 총중량에 대하여 0. 1 내지 10중량%,식각첨가제 사용에 따른 테이퍼 프로파일 개선 효과 및 식각 특성의 저하를 억제하기 위한 측면에서 바람직하게는 1 내지 5중량%로 포함될 수 있다.The organic acid having two or more carboxylic acid groups of the present invention is preferably 0.1 to 10% by weight based on the total weight of the etching composition, and is preferably 1 to 10% by weight in terms of improving the taper profile and suppressing deterioration of etching properties due to the use of etching additives. It may be included at 5% by weight.
C) 식각억제제C) Etch inhibitor
본 발명의 일 실시예에 따른 식각 조성물은 식각억제제를 필수구성으로 포함하며, 식각억제제는 전이금속의 식각 속도를 조절하여 패턴의 시디로스(CD loss)를 줄여주고,공정마진을 높이며,적절한 테이퍼앵글을 갖는 식각 프로파일이 되도록 하는 것으로, 분자내 산소,황 및 질소 중에서 선택되는 하나 또는 둘 이상의 헤테로 원자를 포함하는 헤테로고리 화합물일 수 있으며, 본 발명의 헤테로고리 화합물은 단환식의 헤테로고리 화합물 및 단환식의 헤테로고리와 벤젠고리의 축합구조를 갖는 다환식 헤테로고리 화합물도 포함한다.The etching composition according to an embodiment of the present invention includes an etch inhibitor as an essential component, and the etch inhibitor controls the etching rate of the transition metal to reduce the CD loss of the pattern, increase the process margin, and provide an appropriate taper. To create an etch profile with an angle, it may be a heterocyclic compound containing one or two or more heteroatoms selected from oxygen, sulfur, and nitrogen in the molecule, and the heterocyclic compound of the present invention is a monocyclic heterocyclic compound and It also includes polycyclic heterocyclic compounds having a condensed structure of a monocyclic heterocycle and a benzene ring.
본 발명의 일 실시예에 따른 헤테로고리 화합물은 구체적인 예로는 옥사졸(oxazole),이미다졸(imidazole), 피라졸(pyrazole), 트리아졸(triazole), 테트라졸(tetrazole), 5-아미노테트라졸(5-aminotetrazole), 메틸테트라졸(methyltetrazole), 피페라진(piperazine), 메틸피페라진(methylpiperazine), 히드록실에틸피페라진 (hydroxyethylpiperazine), 벤즈이미다졸(benzimidazole), 벤즈피 라졸(benzpyrazole), 톨루트리아졸(tolutriazole), 히드로톨루트리아졸(hydrotolutriazole) 또는 히드록시톨루트리아졸(hydroxytolutriazole)일 수 있으며, 바람직하게는 테트라졸, 5-아미노테트라졸 및 메틸테트라졸에서 선택되는 하나 또는 둘 이상일 수 있다. Specific examples of heterocyclic compounds according to an embodiment of the present invention include oxazole, imidazole, pyrazole, triazole, tetrazole , and 5-aminotetrazole. (5-aminotetrazole), methyltetrazole , piperazine, methylpiperazine, hydroxyethylpiperazine, benzimidazole, benzpyrazole , tol It may be tolutriazole, hydrotolutriazole, or hydroxytolutriazole, and is preferably one or two selected from tetrazole, 5-aminotetrazole, and methyltetrazole. It could be more than that.
본 발명의 식각억제제는 식각 조성물 총 중량에 대하여 0.01 내지 5중량%, 바람직하게는 0.05 내지 2중량%로 포함될 수 있다. 식각억제제가 0.01 중량% 미만으로 포함될 경우 식각 속도 조절이 어렵고,테이퍼 앵글을 조절할 수 있는 능력이 저하되며, 또 공정 마진이 적어 양산성이 저하되는 문제가 있고,5중량% 초과하여 포함되는 경우 식각 속도가 감소하여 비효율적인 문제가 있다.The etch inhibitor of the present invention may be included in an amount of 0.01 to 5% by weight, preferably 0.05 to 2% by weight, based on the total weight of the etching composition. If the etch inhibitor is included in less than 0.01% by weight, it is difficult to control the etch speed, the ability to control the taper angle is reduced, and the process margin is small, which reduces mass productivity. If it is included in more than 5% by weight, the etching inhibitor is difficult to control. There is a problem of inefficiency due to reduced speed.
d) 불소화합물d) Fluorine compounds
본 발명의 식각 조성물에 포함되는 불소화합물은 이중금속막 일례로 구리/몰리브덴 막을 동시에 식각할 때 몰리브덴 막의 식각 속도를 향상시켜 테일랭스를 감소시켜 주고,식각시 필연적으로 발생하게 되는 몰리브덴의 잔사를 제거하는 작용을 한다. 몰리브덴의 테일 증가는 휘도를 감소시킬 수 있으며, 잔사가 기판 및 하부막에 남게 되면 전기적인 쇼트,배선 불량 및 휘도를 감소시키므로 반드시 제거해야 한다.The fluorine compound contained in the etching composition of the present invention improves the etching speed of the molybdenum film when simultaneously etching a dual metal film, for example, a copper/molybdenum film, reduces the tail length, and removes molybdenum residue that is inevitably generated during etching. It works. An increase in the tail of molybdenum can reduce brightness, and if residues remain on the substrate and lower film, they must be removed because they cause electrical shorts, poor wiring, and reduced brightness.
본 발명의 일 실시예에 따른 불소화합물은 해리되어 F- 또는 HF2 -를 발생시킬 수 있는 화합물이면 모두 가능하나, 구체적인 예로는 HF,NaF, KF, A lF3, HBF4, NH4F, NH4HF2, NaHF2, KHF2 및 NH4BF4에서 선택되는 하나 또는 둘 이상일 수 있으며, 바람직하게 HF, A1F3, HBF4, NH4F, 및 NH4HF2에서 선택되는 하나 또는 둘 이상일 수 있다. 불소화합물은 식각 조성물 총 중량에 대하여 0.01 내지 1중량%,금속 잔사 일례로 구리/몰리브덴 막에서 몰리브덴의 잔사를 효과적인 제거 및 유리기판 등의 하부막의 식각을 억제하기위한 측면에서 바람직하게는 0.05 내지 0.5중량%로 포함될 수 있다. The fluorine compound according to an embodiment of the present invention can be any compound that can dissociate to generate F - or HF 2 - , but specific examples include HF, NaF, KF, AlF 3 , HBF 4 , NH 4 F, It may be one or two or more selected from NH 4 HF 2 , NaHF 2 , KHF 2 and NH 4 BF 4 , preferably one or two selected from HF, A1F 3 , HBF 4 , NH 4 F, and NH 4 HF 2 It could be more than that. The fluorine compound is contained in an amount of 0.01 to 1% by weight based on the total weight of the etching composition, preferably 0.05 to 0.5% by weight in order to effectively remove metal residues, such as molybdenum residues from copper/molybdenum films, and to suppress etching of lower films such as glass substrates. It may be included in weight percent.
e) 언더컷 억제제e) Undercut inhibitor
본 발명의 일 실시예에 따른 식각 조성물에 포함되는 언더컷 억제제는 특정한 화합물인 아데닌(adenine),구아닌(guanine) 또는 이들의 혼합물을 사용하며, 본 발명의 두개 이상의 카르복실산기를 가지는 유기산 및 pH 조절제와의 가장 바람직한 조합으로 의도적으로 채택된 화합물이다.The undercut inhibitor included in the etching composition according to an embodiment of the present invention uses a specific compound, adenine, guanine, or a mixture thereof, and an organic acid and a pH adjuster having two or more carboxylic acid groups of the present invention. This is a compound intentionally selected as the most desirable combination with.
본 발명의 이러한 조합에 의해 본 발명의 식각 조성물은 식각속도가 저하되지 않으며, 금속의 잔사가 발생되지 않아 식각 특성을 놀랍도록 향상시킨다. By this combination of the present invention, the etching speed of the etching composition of the present invention is not reduced and no metal residue is generated, thereby surprisingly improving the etching properties.
특히 금속이중막을 동시에 식각할 시 일례로 구리/몰리브덴 막의 동시 식각시 식각속도를 저하시키지 않으면서도 몰리브덴 막의 몰리브덴의 잔사를 방지하고 언더컷 발생을 억제할 수 있다.In particular, when simultaneously etching a metal double film, for example, when simultaneously etching a copper/molybdenum film, molybdenum residue in the molybdenum film can be prevented and the occurrence of undercuts can be suppressed without reducing the etching rate.
본 발명의 언더컷 억제제의 함량은 몰리브덴의 잔사가 발생할 우려, 구리의 식각속도 감소 및 언더컷 억제 등을 고려하여 좋기로는 조성물 총 중량에 대하여 0.01 내지 2중량% 바람직하게 0.05 내지 1중량%로 포함될 수 있다.The content of the undercut inhibitor of the present invention may be preferably 0.01 to 2% by weight, preferably 0.05 to 1% by weight, based on the total weight of the composition, considering the risk of molybdenum residues, reduction of copper etching rate, and undercut suppression. there is.
f) 아민 화합물f) Amine compounds
본 발명의 식각 조성물에 포함되는 아민 화합물은 식각 공정 시 식각 조성물 내에 금속이온 농도가 증가하게 되며 이러한 금속 이온은 산화제인 과산화수소를 분해시키는 촉매역할을 하게 됨으로써 식각공정 전체의 경시변화를 초래하게 되나, 아민 화합물을 함유시킴으로써 이러한 과산화수소의 분해를 억제해 전체적인 식각 공정의 경시변화를 억제하여 식각특성을 향상시킨다.The amine compound included in the etching composition of the present invention increases the concentration of metal ions in the etching composition during the etching process, and these metal ions serve as a catalyst to decompose hydrogen peroxide, an oxidizing agent, resulting in changes over time in the entire etching process. By containing an amine compound, the decomposition of hydrogen peroxide is suppressed and changes in the overall etching process over time are suppressed, thereby improving etching characteristics.
바람직하게 본 발명의 아민 화합물은 C4 내지 C10의 알킬아민, C3 내지 C10의 시클로알킬아민 또는 이들의 혼합물일 수 있으나, 바람직하게 직쇄 또는 분지쇄의 6개의 탄소수를 가지는 헥실 아민일 수 있으며, 헥실 아민은 하기 화합물에서 선택되나, 이에 한정이 있는 것은 아니다.Preferably, the amine compound of the present invention may be a C4 to C10 alkylamine, a C3 to C10 cycloalkylamine, or a mixture thereof, but is preferably a linear or branched hexyl amine having 6 carbon atoms, and hexyl amine. is selected from the following compounds, but is not limited thereto.
본 발명의 일 실시예에 따른 아민 화합물은 우수한 효과를 가지기위한 측면에서 바람직하게 n-헥실아민, i-헥실아민 및 neo-헥실아민에서 선택되는 하나 또는 둘 이상일 수 있다.The amine compound according to an embodiment of the present invention may preferably be one or two or more selected from n-hexylamine, i-hexylamine, and neo-hexylamine in order to have excellent effects.
본 발명의 일 실시예에 따른 아민 화합물은 0.1 내지 5중량%, 바람직하게 0.1 내지 2중량%일 수 있다. The amine compound according to an embodiment of the present invention may be 0.1 to 5% by weight, preferably 0.1 to 2% by weight.
바람직하게 본 발명의 식각 조성물은 아민 화합물 및 식각억제제의 중량비를 제어함으로써 금속막의 식각특성을 놀랍도록 향상시킬 수 있으며, 이러한 측면에서 바람직하게 아민 화합물과 식각억제제의 중량비는 5 내지 10 : 1 일 수 있다. 아민 화합물의 식각억제제의 중량비가 5 : 1 보다 낮은 4 : 1 이하인 경우, 과산화 수소 분해 억제 감소와 식각억제 감소되어 처리 매수 증가 시 언더컷 발생을 일으킬 수 있다. 아민 화합물과 식각억제제의 중량비가 10 : 1 보다 높은 11 : 1 이상인 경우 몰리브데늄 식각을 제어하여 잔막 발생을 일으킬 수 있다. Preferably, the etching composition of the present invention can surprisingly improve the etching characteristics of a metal film by controlling the weight ratio of the amine compound and the etching inhibitor. In this respect, the weight ratio of the amine compound and the etching inhibitor is preferably 5 to 10:1. there is. If the weight ratio of the etch inhibitor to the amine compound is less than 5:1 and is less than 4:1, hydrogen peroxide decomposition inhibition and etching inhibition are reduced, which may cause undercuts to occur when the number of treated pieces increases. If the weight ratio of the amine compound and the etch inhibitor is 11:1 or higher, which is higher than 10:1, molybdenum etching can be controlled and residual film may be generated.
f) pH 조절제f) pH regulator
본 발명의 일 실시예에 따른 pH 조절제는 수산화나트륨, 수산화칼륨, 탄산나트륨 및 수산화암모늄에서 선택되는 하나 또는 둘 이상일 수 있으며, 바람직하게는 수산화나트륨일 수 있다.The pH adjuster according to an embodiment of the present invention may be one or two or more selected from sodium hydroxide, potassium hydroxide, sodium carbonate, and ammonium hydroxide, and may preferably be sodium hydroxide.
본 발명의 식각액 조성물은 pH 조절제를 포함함으로써 pH를 조절할 수 있으며, 본 발명의 식각액 조성물의 pH는 금속막의 식각율을 높이기 위한 측면에서 pH 2 내지 pH 5 일 수 있다.The etchant composition of the present invention can control pH by including a pH adjuster, and the pH of the etchant composition of the present invention may be pH 2 to pH 5 in order to increase the etching rate of the metal film.
본 발명의 일 실시예에 따른pH 조절제는 중량이 0. 1 중량% 내지 5중량%, 바람직하게 0.5 내지 3중량%일 수 있다.The pH adjuster according to an embodiment of the present invention may have a weight of 0.1% by weight to 5% by weight, preferably 0.5% by weight to 3% by weight.
바람직하게 본 발명의 식각 조성물은 두 개 이상의 카르복실산기를 가지는 유기산 및 pH 조절제의 중량비를 제어함으로써 금속막의 식각특성을 놀랍도록 향상시킬 수 있으며, 이러한 측면에서 바람직하게 두 개 이상의 카르복실산기를 가지는 유기산과 pH 조절제의 중량비는 1 내지 5 : 1 일 수 있으며, 바람직하게 2 내지 3 : 1일 수 있다.Preferably, the etching composition of the present invention can surprisingly improve the etching characteristics of a metal film by controlling the weight ratio of the organic acid having two or more carboxylic acid groups and the pH adjuster. In this respect, the etching composition preferably has two or more carboxylic acid groups. The weight ratio of the organic acid and the pH adjuster may be 1 to 5:1, preferably 2 to 3:1.
중량비가 1 : 1 보다 낮은 1 : 2인 경우 식각 속도가 현저히 감소하며 처리매수 증가 시 언더컷을 발생 시킬 수 있다. 중량비가 5 : 1 보다 큰 경우 식각 속도가 너무 빨라 공정 제어가 어려워지며 빠른 식각 속도로 인해 테이퍼 앵글이 70° 이상으로 증가하게 된다. If the weight ratio is 1:2, which is lower than 1:1, the etching speed is significantly reduced and undercut may occur when the number of sheets to be processed increases. If the weight ratio is greater than 5:1, the etch rate is too fast, making process control difficult, and the taper angle increases to more than 70° due to the fast etch rate.
본 발명의 일 실시예에 따른 식각 조성물은 총 중량에 대해 과산화수소 10 내지 30중량%, 유기산 0. 1 내지 10중량%, 식각억제제 0.01 내지 5중량%, 불소 화합물 0.01 내지 1중량%, 언더컷 억제제 0.01 내지 2중량%, 아민 화합물 0.1 내지 5중량%, pH 조절제 0. 1 내지 5중량% 및 잔량의 물의 조합으로 식각 특성을 향상시킬 수 있으며, 보다 향상된 식각특성을 가기지위한 측면에서 바람직하게는 총 중량에 대해 과산화수소 15 내지 25중량%, 말론산, 옥살산, 푸마르산 및 말릭산에서 선택되는 하나 또는 둘 이상의 유기산 1 내지 5중량%, 식각억제제 0.05 내지 2중량%, 불소 화합물 0.05 내지 0.5 중량%, 아데닌, 구아닌 또는 이들의 혼합물인 언더컷 억제제0.05 내지 1중량%, 헥실아민 0.1 내지 1중량%, 수산화나트륨 0. 5 내지 1중량% 및 잔량의 물을 포함할 수 있다.The etching composition according to an embodiment of the present invention contains 10 to 30% by weight of hydrogen peroxide, 0.1 to 10% by weight of organic acid, 0.01 to 5% by weight of etch inhibitor, 0.01 to 1% by weight of fluorine compound, and 0.01% by weight of undercut inhibitor, based on the total weight. Etching properties can be improved by a combination of 0.1 to 2% by weight, 0.1 to 5% by weight of amine compound, 0.1 to 5% by weight of pH adjuster, and the remaining amount of water. In order to achieve more improved etching properties, the total amount is preferably 15 to 25% by weight of hydrogen peroxide, 1 to 5% by weight of one or more organic acids selected from malonic acid, oxalic acid, fumaric acid and malic acid, 0.05 to 2% by weight of an etch inhibitor, 0.05 to 0.5% by weight of a fluorine compound, and adenine. , 0.05 to 1% by weight of an undercut inhibitor that is guanine or a mixture thereof, 0.1 to 1% by weight of hexylamine, 0.5 to 1% by weight of sodium hydroxide, and the remaining amount of water.
g) 킬레이트제g) Chelating agent
본 발명의 일 실시예에 따른 식각 조성물은 킬레이트제를 더 포함할 수 있으며, 킬레이트제는 식각이 진행되는 동안 발생하는 금속 이온들과 킬레이트를 형성하여 비활성화시킴으로써 이들 금속 이온에 의한 부반응 발생을 방지하고,그 결과 반복되는 식각 공정에도 식각 특성을 유지할 수 있도록 한다. 특히 구리층의 경우 식각 조성물중에 구리 이온이 다량으로 잔존할 경우 패시베이션막을 형성하여 산화되어, 식각이 되지않는 문제점이 있으나, 킬레이트제의 투입시 구리 이온의 패시베이션막 형성을 방지할 수 있다. 또,킬레이트제는 과산화수소 자체의 분해반응을 방지하여 식각 조성물의 안정성을 증가시킬 수 있다. 따라서, 만약 식각 조성물 중에 킬레이트제가 첨가되지 않을 경우 식각이 진행되는 동안 산화된 금속 이온이 활성화되어 식각 조성물의 식각 특성이 변화되기 쉽고, 또 과산화수소의 분해 반응이 촉진되어 발열 및 폭발이 발생할 수 있다.The etching composition according to an embodiment of the present invention may further include a chelating agent, and the chelating agent forms a chelate with metal ions generated during etching to deactivate them, thereby preventing side reactions from occurring due to these metal ions. ,As a result, the etching properties can be maintained even through repeated etching processes. In particular, in the case of the copper layer, if a large amount of copper ions remain in the etching composition, it forms a passivation film and is oxidized, preventing etching. However, when a chelating agent is added, the formation of a passivation film of copper ions can be prevented. Additionally, the chelating agent can increase the stability of the etching composition by preventing the decomposition reaction of hydrogen peroxide itself. Therefore, if a chelating agent is not added to the etching composition, oxidized metal ions are activated during etching, which may easily change the etching properties of the etching composition, and the decomposition reaction of hydrogen peroxide may be promoted, resulting in heat generation and explosion.
즉, 본 발명의 실시예에 따른 킬레이트제는 식각공정 시 발생되는 금속이온들과 킬레이션하여 과산화수소의 분해를 억제하며, 식각 조성물의 보관시에도 안정성을 높이는 역할하는 것으로, 특별히 한정이 있는 것은 아니나, 분자내 아미노기와 카르복실산기 또는 포스폰산기를 포함하는 것일 수 있으며, 구체적으로 이미노디석신산, 이미노디아세트산(iminodiacetic acid), 니트릴로트리 아세트산(nitri lotriacetic acid), 에틸렌디 아민테트라아세트산(ethylenediaminetetraacetic acid), 디에틸렌트리 니트릴펜타아세트산(diethylenetrinitri1 acetic acid), 아미노트리스(메 틸렌포스폰산)(aminotris(methylenephosphonic acid)), (1-히드록시에탄-1,1-디일) 비스 (포스폰산)((1-hydroxyethane-l, 1-diyl)bis(phosphonic acid)), 에틸렌디아민 테트라(메틸렌포스폰산) (ethylenediamine tetra(methylene phosphonic acid)), 디에틸렌트리아민 펜타(메틸렌포스폰산) (Diethylenetri amine penta(methylenephosphonic acid), 알라닌(alanine), 글루탐산(glutamic acid), 아미노부티르산(aminobutyric acid) 및 글리신(glycin)에서 선택되는 하나 또는 둘 이상일 수 있으며, 바람직하게는 이미노디석신산, 이미노디아세트산, 니트릴로트리 아세트산, 에틸렌디아민테트라아세트산 및 디에틸렌트리니트릴펜타아세트산 에서 선택되는 하나 또는 둘 이상일 수 있다.In other words, the chelating agent according to an embodiment of the present invention suppresses the decomposition of hydrogen peroxide by chelating with metal ions generated during the etching process and serves to increase the stability of the etching composition even when stored, and is not particularly limited. , may contain an amino group, a carboxylic acid group, or a phosphonic acid group within the molecule, specifically iminodisuccinic acid, iminodiacetic acid, nitrilotriacetic acid, and ethylenediaminetetraacetic acid. acid), diethylenetrinitri1 acetic acid, aminotris(methylenephosphonic acid), (1-hydroxyethane-1,1-diyl) bis(phosphonic acid)( (1-hydroxyethane-l, 1-diyl)bis(phosphonic acid)), ethylenediamine tetra(methylene phosphonic acid), Diethylenetri amine penta It may be one or two or more selected from (methylenephosphonic acid), alanine, glutamic acid, aminobutyric acid, and glycin, preferably iminodisuccinic acid, iminodiacetic acid, and nitrile. It may be one or two or more selected from rotriacetic acid, ethylenediaminetetraacetic acid, and diethylenetrinitrile pentaacetic acid.
본 발명의 일 실시예에 따른 킬레이트제는 식각 조성물 총중량에 대하여 0.1 내지 5중량%,바람직하게는 0.1 내지 3중량%로 포함될 수 있다. 킬레이트제가 0.1 중량% 미만으로 포함될 경우 비활성화시킬 수 있는 금속 이온량이 너무 작아서 과산화수소 분해반응을 제어하는 능력이 떨어지고,5중량% 초과하여 포함되는 경우 추가적인 킬레이트 형성으로 금속을 비활성화 시키는 작용을 기대할 수 없어 비효율적인 문제가 될 수 있다.The chelating agent according to an embodiment of the present invention may be included in an amount of 0.1 to 5% by weight, preferably 0.1 to 3% by weight, based on the total weight of the etching composition. If the chelating agent is included in less than 0.1% by weight, the amount of metal ions that can be deactivated is too small, so the ability to control the decomposition reaction of hydrogen peroxide is reduced, and if it is included in more than 5% by weight, the action of deactivating the metal through additional chelate formation cannot be expected, making it inefficient. can be a problem.
h) 물h) water
본 발명의 일 실시예에 따른 식각 조성물에서 물은 특별히 한정되는 것은 아니나,탈이온수가 바람직할 수 있으며,물 속에 이온이 제거된 정도인 비저항값이 18MQ/cm이상인 탈이온수가 보다 바람직할 수 있다.In the etching composition according to an embodiment of the present invention, water is not particularly limited, but deionized water may be preferable, and deionized water having a resistivity value of 18 MQ/cm or more, which is the degree to which ions are removed from the water, may be more preferable. .
상기 물은 식각 조성물 총 중량이 100 중량%가 되도록 하는 양으로 포함될The water will be included in an amount such that the total weight of the etching composition is 100% by weight.
수 있다.You can.
i) 기타 첨가제i) Other additives
본 발명의 금속막의 식각 조성물은 식각 성능을 향상 시키기위해 통상 식각 조성물에 사용되는 임의의 첨가제를 더 포함할 수 있다. 상기 첨가제로는 추가의 식각안정제,글라스 식각억제제, 무기산, 무기산염 등을 들 수 있다. 이들 중 1종 단독으로 또는 2종 이상이 혼합되어 사용될 수 있다.The etching composition for a metal film of the present invention may further include any additives commonly used in etching compositions to improve etching performance. The additives include additional etch stabilizers, glass etch inhibitors, inorganic acids, inorganic acid salts, etc. One of these may be used alone or two or more may be used in combination.
본 발명의 일 실시예에 따른 식각안정제는 알코올기와 아민기를 동시에 갖는 화합물일 수 있다. 구체적인 일 예로, 메탄올아민, 에탄올아민, 프로판올아민, 부탄올아민, 디에탄올아민, 트리에탄올아민, 디메틸에탄올아민 및 N-메틸에탄올아민에서 선택되는 어느 하나 또는 둘 이상의 혼합물일 수 있으며, 이에 제한되지 않는다.The etch stabilizer according to an embodiment of the present invention may be a compound having both an alcohol group and an amine group. As a specific example, it may be any one or a mixture of two or more selected from methanolamine, ethanolamine, propanolamine, butanolamine, diethanolamine, triethanolamine, dimethylethanolamine, and N-methylethanolamine, but is not limited thereto.
상기 식각안정제는 식각 조성물 총량을 기준으로, 0.01 내지 10 중량%, 보다 좋게는 0.05 내지 7 중량%, 더욱 좋게는 0.1 내지 5 중량%로 첨가되는 것이 바람직할 수 있다. 상기의 범위 내에서 식각안정제는 금속 잔사의 발생을 효과적으로 억제할 수 있다.The etch stabilizer may be preferably added in an amount of 0.01 to 10% by weight, more preferably 0.05 to 7% by weight, and even more preferably 0.1 to 5% by weight, based on the total amount of the etching composition. Within the above range, the etch stabilizer can effectively suppress the generation of metal residues.
본 발명의 일 실시예에 따른 글라스 식각 억제제는 붕불산 또는 붕불산염에서 선택되는 어느 하나 이상의 혼합물일 수 있다. 구체적인 일 예로, HBF4, NaBF4, KBF4 및 NH4BF4 등에서 선택되는 어느 하나 또는 둘 이상의 혼합물일 수 있으나, 이에 제한되지 않는다.The glass etch inhibitor according to an embodiment of the present invention may be a mixture of one or more borofluoric acids or borofluoric acid salts. As a specific example, it may be any one or a mixture of two or more selected from HBF 4 , NaBF 4 , KBF 4 and NH 4 BF 4 , but is not limited thereto.
상기 글라스 식각 억제제의 함량은 식각 조성물 총량을 기준으로, 0.01내지 10 중량%, 보다 좋게는 0.05 내지 7 중량%, 더욱 좋게는 0.1 내지 5 중량%로 첨가되는 것이 바람직할 수 있다. 상기의 범위 내에서 글라스 식각 억제 효과가 우수하고, 식각 속도가 감소하지 않아 바람직할 수 있다.The content of the glass etching inhibitor may be preferably 0.01 to 10% by weight, more preferably 0.05 to 7% by weight, and even more preferably 0.1 to 5% by weight, based on the total amount of the etching composition. Within the above range, the effect of suppressing glass etching is excellent and the etching rate is not reduced, which may be preferable.
본 발명의 일 실시예에 따른 식각 조성물은 글리콜계 고분자는 더 포함할 수 있으며, 구체적인 일례로 플리에틸렌글리콜(polyethlene glycol) 등을 포함할 수 있으나, 이에 제한되지 않는다. 본 발명의 일 실시예에 따른 글리콜계 고분자는 식각 조성물 총량을 기준으로, 0.1 내지 30 중량%로 첨가될 수 있으며, 보다 좋게는 1 내지 20 중량%, 더욱 좋게는 5 내지 15 중량%로 첨가되는 것이 바람직할 수 있다. 상기의 범위 내에서 글리콜계 고분자는 과산화수소 분해 반응에 대한 제어 효과가 우수하고, 식각능을 저하시키지 않아 바람직할 수 있다.The etching composition according to an embodiment of the present invention may further include a glycol-based polymer, and may include polyethylene glycol as a specific example, but is not limited thereto. The glycol-based polymer according to an embodiment of the present invention may be added in an amount of 0.1 to 30% by weight, more preferably 1 to 20% by weight, and even more preferably 5 to 15% by weight, based on the total amount of the etching composition. This may be desirable. Within the above range, glycol-based polymers may be preferred because they have an excellent control effect on the hydrogen peroxide decomposition reaction and do not reduce etching ability.
본 발명의 무기산 또는 무기산염은 한정이 있는 것은 아니나, 무기산은 인산, 질산, 황산, 및 이들의 염에서 선택되는 하나 또는 둘 이상일 수 있으며, 일례로 황산염은 황산암모늄, 과황산암모늄, 황산나트륨, 과황산나트륨, 황산칼륨 또는 과황산칼륨일 수 있으며, 인산염은 인산수소칼륨, 인산수소나트륨, 인산수소암모늄, 황산수소암모늄 인산나트륨, 과인산나트륨, 인산칼륨, 과인산칼륨, 인산암모늄 또는 과인산암모늄 이에 한정되지 않는다.There is no limitation to the inorganic acid or inorganic acid salt of the present invention, but the inorganic acid may be one or two or more selected from phosphoric acid, nitric acid, sulfuric acid, and salts thereof. For example, the sulfate is ammonium sulfate, ammonium persulfate, sodium sulfate, and It may be sodium sulfate, potassium sulfate, or potassium persulfate, and the phosphate is not limited to potassium hydrogen phosphate, sodium hydrogen phosphate, ammonium hydrogen phosphate, sodium ammonium hydrogen sulfate, sodium superphosphate, potassium phosphate, potassium superphosphate, ammonium phosphate, or ammonium superphosphate. .
바람직하게 본 발명의 일 실시예에 따른 무기산 또는 무기산염은 인산, 인산염, 황산 및 황산염에서 선택되는 하나 또는 둘 이상일 수 있으며, 구체적으로 인산, 황산, 인산수소칼륨, 인산수소나트륨, 인산수소암모늄, 황산수소암모늄 인산나트륨, 과인산나트륨, 인산칼륨, 과인산칼륨, 인산암모늄, 과인산암모늄, 황산암모늄, 과황산암모늄, 황산나트륨, 과황산나트륨, 황산칼륨 및 과황산칼륨에서 선택되는 하나 또는 둘 이상일 수 있다. 바람직하게는 본 발명의 일 실시예에 따른 무기산 또는 무기산염은 황산 및 인산염의 조합일 수 있으며, 인산염은 인산수소칼륨(potassium hydrogen phosphate), 인산수소나트륨(sodkun hydrogen phosphate), 인산수소암모늄(ammonhim hydrogen phosphate), 황산수소암모늄 인산나트륨(sodhim phosphate), 과인산나트륨(sodium perphosphate), 인산칼륨(potasshim phosphate), 과인산칼륨(potasshim perphosphate), 인산암모늄(ammonium phosphate) 또는 과인산암모늄 (ammonium perphosphate) 등 일 수 있다.Preferably, the inorganic acid or inorganic acid salt according to an embodiment of the present invention may be one or two or more selected from phosphoric acid, phosphate, sulfuric acid, and sulfate, and specifically, phosphoric acid, sulfuric acid, potassium hydrogen phosphate, sodium hydrogen phosphate, ammonium hydrogen phosphate, Ammonium bisulfate may be one or more selected from sodium phosphate, sodium superphosphate, potassium phosphate, potassium superphosphate, ammonium phosphate, ammonium superphosphate, ammonium sulfate, ammonium persulfate, sodium sulfate, sodium persulfate, potassium sulfate and potassium persulfate. Preferably, the inorganic acid or inorganic salt according to an embodiment of the present invention may be a combination of sulfuric acid and phosphate, and the phosphate may be potassium hydrogen phosphate, sodium hydrogen phosphate, or ammonium hydrogen phosphate. hydrogen phosphate, ammonium bisulfate, sodium phosphate, sodium perphosphate, potassium phosphate, potassium superphosphate, ammonium phosphate, or ammonium perphosphate, etc. You can.
본 발명의 일 실시예에 따른 금속막 식각 조성물은 테이퍼 앵글이 30°에서 70° 범위 내 식각 특성을 가지고 있어 후속 공정 불량율 감소시키며, 식각이 반복 수행되더라도 상기 범위 내 테이퍼 앵클을 유지할 수 있다. The metal film etching composition according to an embodiment of the present invention has an etching characteristic with a taper angle within the range of 30° to 70°, thereby reducing the subsequent process defect rate and maintaining the taper angle within the above range even if etching is repeatedly performed.
테이퍼 앵글이 70°이상일 경우에는 후속 공정에서 절연막 크랙(crack) 또는 드라이 에치(Dry etch) 공정에서 반도체막 언에치(unetch)를 발생 시킬 수 있다. 또한 테이퍼 앵글이 30° 이하일 경우에는 후속 공정에서 빛 산란을 일으킬 수 있다. 보다 바람직하게는 40°에서 60° 범위의 테이퍼 앵글을 형성한다. If the taper angle is more than 70°, the insulating film may crack in the subsequent process or the semiconductor film may be unetched in the dry etch process. Additionally, if the taper angle is less than 30°, light scattering may occur in the subsequent process. More preferably, a tapered angle in the range of 40° to 60° is formed.
본 발명의 일 실시예에 따른 식각 조성물은 금속 또는 금속막의 식각시, 식각 속도조절이 용이하며, 또한 식각 프로파일(etch profile)이 우수하고, 배선의 직진성이 우수하다. 또한 잔사의 완전제거가 가능하여 TFT-LCD 게이트 및 소스/드레인 전극용으로 사용하는 전이금속막, 특히 구리를 포함하는 막의 식각 조성물로 매우 유용하게 사용될 수 있다.The etching composition according to an embodiment of the present invention facilitates control of the etching speed when etching a metal or metal film, has an excellent etch profile, and has excellent straightness of wires. In addition, since residues can be completely removed, it can be very useful as an etching composition for transition metal films used for TFT-LCD gate and source/drain electrodes, especially films containing copper.
또한 본 발명의 일 실시예에 따른 식각 조성물은 이중금속막, 특히 구리/몰리브덴막 또는 구리/티타늄막의 식각공정에 이용되어 앞서 언급된 장점과 더불어 금속막의 계면을 보호하여 계면 과식각을 억제하고 안정성이 우수하여 테이퍼 앵글, 시디 로스 및 식각 직진성 등의 식각 특성을 개선시킬 수 있다.In addition, the etching composition according to an embodiment of the present invention is used in the etching process of a double metal film, especially a copper/molybdenum film or a copper/titanium film, and in addition to the above-mentioned advantages, it protects the interface of the metal film, suppresses interfacial overetching, and provides stability. This is excellent and can improve etching characteristics such as taper angle, CD loss, and etch straightness.
이에 따라 본 발명의 일 실시예에 따른 식각 조성물은 액정표시장치의 TFT(Thin Film Transistor)를 구성하는 게이트,소오스 또는 드레인 전극용 금속배선 재료로서 이중금속막 또는 다중금속막 특히 구리/몰리브덴 막을 사용하는 경우 금속배선 패턴을 형성하기 위한 식각 조성물로서 유용하게 사용될 수 있다.Accordingly, the etching composition according to an embodiment of the present invention uses a double metal film or a multi-metal film, especially a copper/molybdenum film, as a metal wiring material for the gate, source, or drain electrodes constituting the TFT (Thin Film Transistor) of the liquid crystal display device. In this case, it can be usefully used as an etching composition for forming a metal wiring pattern.
본 발명의 일 실시예에 따른 식각 조성물은 금속막의 식각에 사용될 수 있는 조성물로 본 발명에 기재된 금속막은 금속, 비금속 또는 전이금속을 모두 포함하는 것을 의미하며, 바람직하게 전이금속일 수 있으며, 금속 또는 전이금속이 단독으로 포함될 수 있으며, 또는 금속 또는 전이금속들의 혼합금속일 수 있다.The etching composition according to an embodiment of the present invention is a composition that can be used for etching a metal film. The metal film described in the present invention means containing all metals, non-metals, or transition metals, and may preferably be a transition metal, and may be a metal or a transition metal. The transition metal may be included alone, or may be a metal or a mixed metal of transition metals.
구체적으로, 금속단독막, 금속합금막 또는 금속산화막일 수 있으며, 금속산화막의 일례로, ITO, IZO, IGZO 등을 들 수 있다.Specifically, it may be a single metal film, a metal alloy film, or a metal oxide film, and examples of the metal oxide film include ITO, IZO, IGZO, etc.
본 발명의 일 실시예에 따른 식각 조성물이 적용될 수 있는 전이금속 또는 금속막은 구리, 몰리브덴, 티타늄, 인듐, 아연, 주석, 텅스텐, 은, 금, 크롬, 망간, 철, 코발트, 니켈 및 나이오븀에서 선택되는 하나 또는 둘 이상의 금속 또는 전이금속이 포함된 막일 수 있으며, 구체적인 일례로 구리막, 구리/몰리브덴막, 구리/티타늄막, 구리/몰리브덴합금막, 구리/인듐합금막일 수 있으며, 바람직하게 구리/몰리브덴합금막일 수 있다.Transition metals or metal films to which the etching composition according to an embodiment of the present invention can be applied include copper, molybdenum, titanium, indium, zinc, tin, tungsten, silver, gold, chromium, manganese, iron, cobalt, nickel, and niobium. It may be a film containing one or two or more selected metals or transition metals, and specific examples include a copper film, a copper/molybdenum film, a copper/titanium film, a copper/molybdenum alloy film, and a copper/indium alloy film, preferably copper. /It may be a molybdenum alloy film.
본 발명의 일 실시예에 따른 구리/몰리브덴막 또는 구리/몰리브덴합금막은 하나이상의 구리(Cu)막과 1이상의 몰리브덴(Mo)막 및/또는 몰리브덴합금막(Mo-alloy)이 상호 적층된 다중막일 수 있으며, 상기 다중막은 Cu/Mo(Mo-alloy)이중막, Cu/Mo(Mo-alloy)/Cu 또는 Mo(Mo-alloy)/Cu/Mo(alloy)의 삼중막을 포함할 수 있다. 상기 막의 순서는 기판의 물질, 접합성에 따라 적절히 조절할 수 있다.The copper/molybdenum film or copper/molybdenum alloy film according to an embodiment of the present invention is a multi-film in which one or more copper (Cu) films and one or more molybdenum (Mo) films and/or molybdenum alloy films (Mo-alloy) are laminated on each other. The multilayer may include a Cu/Mo(Mo-alloy) double layer, Cu/Mo(Mo-alloy)/Cu, or Mo(Mo-alloy)/Cu/Mo(alloy) triple layer. The order of the films can be appropriately adjusted depending on the material and adhesion of the substrate.
본 발명의 일 실시에 따른 몰리브데늄합금막은 몰리브데늄-텡스텐(Mo-W), 몰리브데늄-티타늄(Mo-Ti), 몰리브데늄-니오비늄(Mo-Nb), 몰리브데늄-크롬(Mo-Cr) 또는 몰리브데늄-탄탈륨(Mo-Ta)으로 구성될 수 있으며, 상기 몰리브데늄막 또는 몰리브데늄합금막은 잔사없이 효율적인 식각을 하기 위한 측면에서 100 ~ 500Å, 상기 구리막은 1000 ~ 10,000Å의 두께를 갖도록 증착할 수 있다.The molybdenum alloy film according to an embodiment of the present invention is molybdenum-tungsten (Mo-W), molybdenum-titanium (Mo-Ti), molybdenum-niobiumium (Mo-Nb), molybdenum It may be composed of denium-chromium (Mo-Cr) or molybdenum-tantalum (Mo-Ta), and the molybdenum film or molybdenum alloy film is 100 to 500 Å in terms of efficient etching without residue. The copper film can be deposited to have a thickness of 1000 to 10,000 Å.
또한 본 발명은 본 발명의 식각 조성물을 금속막에 접촉시켜 금속막을 식각하는 단계를 포함하는 금속막의 식각방법을 제공한다.Additionally, the present invention provides a method of etching a metal film including the step of etching the metal film by contacting the metal film with the etching composition of the present invention.
본 발명의 식각 조성물을 이용한 금속막의 식각방법은 본 발명의 식각 조성물을 이용하는 것을 제외하고는 당업자가 인식할 수 있는 통상의 방법에 따라 실시될 수 있다.The method of etching a metal film using the etching composition of the present invention may be carried out according to a conventional method recognized by a person skilled in the art, except that the etching composition of the present invention is used.
구체적으로는 기판 상에 금속막을 증착하는 단계; 상기 금속막 상에 포토레지스트 막을 형성한 후 패턴화하는 단계; 및 본 발명의 식각 조성물을 사용하여 상기 패턴화된 포토레지스트막이 형성된 금속막을 식각하는 단계를 포함하여 금속막을 식각할 수 있으며, 이때,상기 기판 위에 형성되는 금속막은 단일막, 이중금속막 또는 다중금속막(다층금속막)일 수 있으며, 이중금속막 또는 다중금속막일 경우 그 적층 순서가 특별히 한정되지 않는다.Specifically, depositing a metal film on a substrate; Forming a photoresist film on the metal film and patterning it; And the metal film can be etched, including the step of etching the metal film on which the patterned photoresist film is formed using the etching composition of the present invention, wherein the metal film formed on the substrate is a single film, a double metal film, or a multi-metal film. It may be a film (multilayer metal film), and in the case of a double metal film or multi-metal film, the stacking order is not particularly limited.
또한 상기 식각방법은 기판과 전이금속막 사이 즉 ,기판과 전이금속막 사이 일례로 구리/몰리브덴 막일 경우 기판과 구리막 사이 또는 기판과 몰리브덴 막 사이에 반도체 구조물을 형성하는 단계를 포함할 수 있다.Additionally, the etching method may include forming a semiconductor structure between the substrate and the transition metal film, for example, in the case of a copper/molybdenum film, between the substrate and the copper film, or between the substrate and the molybdenum film.
본 발명의 일 실시예에 따른 금속막의 식각방법의 금속막은 구리, 몰리브덴, 티타늄, 인듐, 아연, 주석 및 나이오븀에서 선택되는 하나 또는 둘 이상을 포함하는 것일 수 있으며, 앞서 기재된 바와 같이 금속막은 구리를 포함하는 단일 금속막; 구리 합금막을 포함하는 구리합금막; 및 구리를 포함하는 상부막과 몰리브데늄막 또는 몰리브데늄 합금막을 포함하는 다중막에서 선택되는 것일 수 있으며, 바람직하게는 구리를 포함하는 상부막과 몰리브데늄막 또는 몰리브데늄 합금막을 포함하는 다중막일 수 있다.The metal film of the metal film etching method according to an embodiment of the present invention may include one or two or more selected from copper, molybdenum, titanium, indium, zinc, tin, and niobium. As described above, the metal film is copper. A single metal film comprising; A copper alloy film including a copper alloy film; and a multilayer film comprising an upper film containing copper and a molybdenum film or a molybdenum alloy film, preferably comprising an upper film containing copper and a molybdenum film or a molybdenum alloy film. It can be a multi-act.
또한 본 발명은 본 발명의 식각 조성물을 이용하여 수행되는 식각 공정을 포함하는 반도체 소자의 제조방법을 제공한다. Additionally, the present invention provides a method for manufacturing a semiconductor device including an etching process performed using the etching composition of the present invention.
본 발명의 일 실시예에 따른 반도체 소자는 액정표시장치,플라즈마 디스플레이 패널 등 표시장치용 반도체 구조물일 수 있다. 구체적으로는 상기 반도체 구조물은 유전체막, 도전막,및 비정질 또는 다결정 등의 실리콘막 중에서 선택되는 막을 1층 이상 포함하는 것일 수 있으며, 이들 반도체 구조물은 통상의 방법에 따라 제조될 수 있다.The semiconductor device according to an embodiment of the present invention may be a semiconductor structure for a display device, such as a liquid crystal display device or a plasma display panel. Specifically, the semiconductor structure may include one or more layers of a dielectric film, a conductive film, and an amorphous or polycrystalline silicon film, and these semiconductor structures can be manufactured according to conventional methods.
이하 본 발명을 실시예에 의해 상세하게 설명한다. 그러나 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 내용이 하기 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail by examples. However, the following examples are merely illustrative of the present invention and the content of the present invention is not limited to the following examples.
[실시예 1][Example 1]
과산화수소 20중량%, 이미노디아세트산(Iminodiacetic acid, IDA) 3중량%, 아데닌 0.1중량%, 불화암모늄(Ammonium fluoride, AF) 0.1중량%, 이외 하기 표 1에 기재된 성분 및 잔량의 물을 혼합하여 식각 조성물을 제조하였다.Etch by mixing 20% by weight of hydrogen peroxide, 3% by weight of iminodiacetic acid (IDA), 0.1% by weight of adenine, 0.1% by weight of ammonium fluoride (AF), the ingredients listed in Table 1 below, and the remaining amount of water. A composition was prepared.
[실시예 2 내지 7][Examples 2 to 7]
실시예 1에서 하기 표 1에 기재된 성분 및 함량을 달리한 것을 제외하고는 실시예 1과 동일하게 실시하여 식각 조성물을 제조하였다.An etching composition was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 below were different.
[비교예 1 내지 2][Comparative Examples 1 to 2]
실시예 1에서 하기 표1에 기재된 성분 및 함량을 달리한 것을 제외하고는 실시예 1과 동일하게 실시하여 식각 조성물을 제조하였다.An etching composition was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 below were different.
[비교예 3][Comparative Example 3]
실시예 1에서 하기 표 1에 기재된 성분 및 함량을 달리한 것과 식각억제제를 포함하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 식각 조성물을 제조하였다.An etching composition was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 below were different and the etching inhibitor was not included.
[비교예 4][Comparative Example 4]
실시예 1에서 하기 표 1에 기재된 성분 및 함량을 달리한 것과 유기산을 포함하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 식각 조성물을 제조하였다.An etching composition was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 below were different and organic acids were not included.
[비교예 5][Comparative Example 5]
실시예 1에서 하기 표 1에 기재된 성분 및 함량을 달리한 것과 NaOH를 포함하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 식각 조성물을 제조하였다.An etching composition was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 below were different and NaOH was not included.
[비교예 6][Comparative Example 6]
실시예 1에서 하기 표 1에 기재된 성분 및 함량을 달리한 것과 아민화합물을 포함하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 식각 조성물을 제조하였다.An etching composition was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 below were different and the amine compound was not included.
(wt%)ingredient
(wt%)
MTZ:메틸테트라졸MTZ: methyltetrazole
MA: 말론산(malonic acid)MA: malonic acid
HA: n-헥실아민HA: n-hexylamine
[실험예 1] 식각 특성 평가[Experimental Example 1] Etching characteristics evaluation
유리기판 상에 두께 4500Å의 구리 막 및 몰리브덴 막을 각각 순차적으로 증착하여 시편을 제작하였다. 상기 시편에 대해 포토리소그래피 공정을 진행하여 패터닝한 레지스트막을 형성하고, 상기 실시예 1 내지 7 및 비교예 1 내지 5의 식각 조성물을 각각 이용하여 구리 및 몰리브덴 막에 대한 식각을 실시하였다. 이때, 상기 식각 공정은 스프레이가 가능한 장비(Mini-etcher ME-001)를 이용하여 32℃에서 측정된 EPD(end point detection)에 50%의 오버에치를 더하여 식각을 진행하였다. EPD측정은 식각 진행시 시편의 색변화를 육안 관찰하여 측정하였으며, 테이퍼 앵글, 몰리브덴 잔사 및 처리매수에 따른 언더컷 발생유무는 주사전자 현미경(Hitachi사, S-4800)을 이용하여 관찰하였다. A specimen was manufactured by sequentially depositing a copper film and a molybdenum film with a thickness of 4500 Å on a glass substrate. A photolithography process was performed on the specimen to form a patterned resist film, and the copper and molybdenum films were etched using the etching compositions of Examples 1 to 7 and Comparative Examples 1 to 5, respectively. At this time, the etching process was performed by adding 50% overetch to the EPD (end point detection) measured at 32°C using spray-capable equipment (Mini-etcher ME-001). EPD was measured by visually observing the color change of the specimen during etching, and the occurrence of undercut according to the taper angle, molybdenum residue, and number of treated sheets was observed using a scanning electron microscope (Hitachi, S-4800).
그 결과를 하기 표 2에 기재하였다.The results are shown in Table 2 below.
(/sec)Cu etch rate
( /sec)
(°)Taper angle
(°)
표 2에서 보이는 바와 같이 본 발명의 실시예 1 내지 7의 식각 조성물은 비교예 1 내지 2의 식각 조성물과 대비하여 식각속도가 80 /sec 내지 100 /sec 으로 매우 우수하며, 테이퍼 앵글도 40 내지 60°로 매우 우수하다. As shown in Table 2, the etching compositions of Examples 1 to 7 of the present invention have an etching rate of 80% compared to the etching compositions of Comparative Examples 1 to 2. /sec to 100 /sec is very excellent, and the taper angle is also excellent at 40 to 60°.
또한 처리매수가 증가하여도 언더컷이 발생하지 않으며, 몰리브덴 잔사물도 남아 있지 않아 식각 특성이 놀랍도록 향상되었다.In addition, even when the number of treated sheets increases, no undercut occurs and no molybdenum residue remains, so the etching characteristics are surprisingly improved.
이는 본 발명의 식각 조성물이 과산화수소; 두개 이상의 카르복실산기를 가지는 유기산; 식각억제제; 불소 화합물; 아데닌, 구아닌 또는 이들의 혼합물인 언더컷 억제제; 아민 화합물; pH 조절제; 및 잔량의 물의 조합에서 나타나는 식각특성으로 판단된다.This means that the etching composition of the present invention contains hydrogen peroxide; Organic acids having two or more carboxylic acid groups; Etch inhibitor; fluorine compounds; an undercut inhibitor that is adenine, guanine, or mixtures thereof; amine compounds; pH adjuster; It is judged to be an etching characteristic that appears in combination with the remaining amount of water.
즉, 두개 이상의 카르복실산기를 가지는 유기산, 식각억제제, 아민 화합물 및 pH 조절제의 조합이 식각특성을 효과적으로 유지함을 알 수 있으며, 특히 실시예 1 내지 7에서 보이는 바와 같이 두개 이상의 카르복실산기를 가지는 유기산과 pH 조절제 중량비의 비율에 따라서 보다 향상된 식각 특성을 가짐을 알 수 있다. That is, it can be seen that the combination of an organic acid having two or more carboxylic acid groups, an etching inhibitor, an amine compound, and a pH adjuster effectively maintains the etching characteristics. In particular, as shown in Examples 1 to 7, the organic acid having two or more carboxylic acid groups It can be seen that the etching properties are improved depending on the weight ratio of the pH regulator.
또한, 실시예 1 내지 7에서 보이는 바와 같이 아민 화합물과 식각억제제 중량비의 비율에 따라서 보다 향상된 식각 특성을 가짐을 알 수 있다.In addition, as shown in Examples 1 to 7, it can be seen that the etching properties are improved depending on the weight ratio of the amine compound and the etching inhibitor.
Claims (14)
상기 조성물은 조성물 총 중량에 대해 과산화수소 10 내지 30중량%, 유기산 0.1 내지 10중량%, 식각억제제 0.01 내지 5중량%, 불소 화합물 0.01 내지 1중량%, 언더컷 억제제 0.01 내지 2중량%, 아민 화합물 0.1 내지 5중량%, pH 조절제 0. 1 내지 5중량% 및 킬레이트제 0.1 내지 5중량% 포함하고,
상기 pH 조절제는 수산화나트륨, 수산화칼륨, 탄산나트륨 및 수산화암모늄에서 선택되는 하나 또는 둘 이상으로서, 상기 유기산과 pH 조절제는 중량비가 1 내지 5 : 1 인, 식각 조성물. hydrogen peroxide; Organic acids having two or more carboxylic acid groups; Etch inhibitor; fluorine compounds; an undercut inhibitor that is adenine, guanine, or mixtures thereof; amine compounds; pH adjuster; An etching composition comprising a chelating agent and a residual amount of water,
The composition contains 10 to 30% by weight of hydrogen peroxide, 0.1 to 10% by weight of organic acid, 0.01 to 5% by weight of etch inhibitor, 0.01 to 1% by weight of fluorine compound, 0.01 to 2% by weight of undercut inhibitor, and 0.1 to 1% by weight of amine compound based on the total weight of the composition. 5% by weight, 0.1 to 5% by weight of pH adjuster, and 0.1 to 5% by weight of chelating agent,
The pH adjuster is one or more selected from sodium hydroxide, potassium hydroxide, sodium carbonate, and ammonium hydroxide, and the organic acid and the pH adjuster have a weight ratio of 1 to 5:1.
상기 유기산은 2 내지 7개의 탄소수를 가지는 식각 조성물.According to clause 1,
The organic acid is an etching composition having 2 to 7 carbon atoms.
상기 유기산은 말론산, 푸마르산, 말릭산, 시트르산, 옥살산, 타르타르산, 숙신산, 글루타르산, 아디프산 및 피멜산에 선택되는 하나 또는 둘 이상인 식각 조성물.According to clause 2,
The organic acid is one or more selected from malonic acid, fumaric acid, malic acid, citric acid, oxalic acid, tartaric acid, succinic acid, glutaric acid, adipic acid and pimelic acid.
상기 아민 화합물은 C4 내지 C10의 알킬아민, C3 내지 C10의 시클로알킬아민 또는 이들의 혼합물인 식각 조성물.According to clause 1,
The amine compound is a C4 to C10 alkylamine, a C3 to C10 cycloalkylamine, or a mixture thereof.
상기 식각억제제는 분자내 산소, 황 및 질소에서 선택되는 하나 또는 둘 이상의 헤테로 원자를 포함하는 헤테로고리 화합물인 식각 조성물.According to clause 1,
The etching inhibitor is an etching composition that is a heterocyclic compound containing one or two or more heteroatoms selected from oxygen, sulfur, and nitrogen in the molecule.
상기 아민 화합물과 식각억제제는 중량비가 5 내지 10 : 1인 식각 조성물.According to clause 1,
An etching composition wherein the amine compound and the etching inhibitor have a weight ratio of 5 to 10:1.
상기 불소 화합물은 HF, NaF, KF, AlF3, HBF4, NH4F, NH4HF2, NaHF2, KHF2 및 NH4BF4에서 선택되는 어느 하나 또는 둘 이상인 식각 조성물.According to clause 1,
The fluorine compound is any one or two or more selected from HF, NaF, KF, AlF 3 , HBF 4 , NH 4 F, NH 4 HF 2 , NaHF 2 , KHF 2, and NH 4 BF 4 .
상기 금속막은 구리, 몰리브덴, 티타늄, 인듐, 아연, 주석 및 나이오븀에서 선택되는 하나 또는 둘 이상이 포함하는 것인 금속막의 식각방법.According to clause 11,
A method of etching a metal film, wherein the metal film includes one or two or more selected from copper, molybdenum, titanium, indium, zinc, tin, and niobium.
상기 금속막은 구리를 포함하는 단일 금속막; 구리 합금막을 포함하는 구리합금막; 및 구리를 포함하는 상부막과 몰리브데늄막 또는 몰리브데늄 합금막을 포함하는 다중막에서 선택되는 것인 금속막의 식각방법.According to clause 11,
The metal film may be a single metal film containing copper; A copper alloy film including a copper alloy film; and a method of etching a metal film selected from a multilayer comprising an upper film containing copper and a molybdenum film or a molybdenum alloy film.
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