KR102003241B1 - 안료 분산액, 안료 분산액의 제조 방법, 착색 조성물, 경화막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 조성물 - Google Patents

안료 분산액, 안료 분산액의 제조 방법, 착색 조성물, 경화막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 조성물 Download PDF

Info

Publication number: KR102003241B1
Authority: KR; South Korea
Prior art keywords: group; pigment; dye; compound; dispersant
Prior art date: 2014-08-29

Application number

KR1020167034834A

Other languages

English (en)

Korean (ko)

Other versions

KR20170008785A (ko

Inventor

히로아키 이데이

카즈야 오오타

스구루 사메지마

Original Assignee

후지필름 가부시키가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2014-08-29

Filing date

2015-07-23

Publication date

2019-07-24

2015-07-23 Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤

2017-01-24 Publication of KR20170008785A publication Critical patent/KR20170008785A/ko

2019-07-24 Application granted granted Critical

2019-07-24 Publication of KR102003241B1 publication Critical patent/KR102003241B1/ko

Links

239000000049 pigment Substances 0.000 title claims abstract description 283
239000000203 mixture Substances 0.000 title claims abstract description 186
239000006185 dispersion Substances 0.000 title claims abstract description 91
238000000034 method Methods 0.000 title claims description 87
230000008569 process Effects 0.000 title claims description 25
239000007787 solid Substances 0.000 title description 26
238000003384 imaging method Methods 0.000 title description 16
239000002270 dispersing agent Substances 0.000 claims abstract description 135
239000002904 solvent Substances 0.000 claims abstract description 59
238000010521 absorption reaction Methods 0.000 claims abstract description 53
238000004519 manufacturing process Methods 0.000 claims abstract description 39
238000002835 absorbance Methods 0.000 claims abstract description 37
LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 claims abstract description 26
ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 claims abstract description 15
229940075420 xanthine Drugs 0.000 claims abstract description 13
-1 sulfonic acid anion Chemical class 0.000 claims description 251
150000001875 compounds Chemical class 0.000 claims description 173
239000000975 dye Substances 0.000 claims description 139
239000002253 acid Substances 0.000 claims description 63
150000001450 anions Chemical class 0.000 claims description 47
239000003999 initiator Substances 0.000 claims description 37
239000000126 substance Substances 0.000 claims description 34
239000001003 triarylmethane dye Substances 0.000 claims description 30
239000007788 liquid Substances 0.000 claims description 23
229910018286 SbF 6 Inorganic materials 0.000 claims description 6
238000002156 mixing Methods 0.000 claims description 5
238000004040 coloring Methods 0.000 abstract description 136
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238000003786 synthesis reaction Methods 0.000 description 59
239000010408 film Substances 0.000 description 56
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238000011161 development Methods 0.000 description 27
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125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 27
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125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 23
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239000011248 coating agent Substances 0.000 description 19
XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 19
125000001153 fluoro group Chemical group F* 0.000 description 19
125000000623 heterocyclic group Chemical group 0.000 description 19
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239000010703 silicon Substances 0.000 description 18
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 16
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YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 15
150000001732 carboxylic acid derivatives Chemical class 0.000 description 15
239000011737 fluorine Substances 0.000 description 15
125000005843 halogen group Chemical group 0.000 description 15
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HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 14
229910052799 carbon Inorganic materials 0.000 description 14
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238000011156 evaluation Methods 0.000 description 14
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230000003287 optical effect Effects 0.000 description 13
FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 12
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YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 12
238000010438 heat treatment Methods 0.000 description 12
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PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 11
239000007877 V-601 Substances 0.000 description 11
125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 11
125000001931 aliphatic group Chemical group 0.000 description 11
125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
239000003431 cross linking reagent Substances 0.000 description 11
MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 11
125000000524 functional group Chemical group 0.000 description 11
239000003112 inhibitor Substances 0.000 description 11
125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 11
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 11
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238000002834 transmittance Methods 0.000 description 10
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ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
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FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 9
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150000001244 carboxylic acid anhydrides Chemical class 0.000 description 9
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150000002148 esters Chemical class 0.000 description 9
QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 9
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150000003254 radicals Chemical class 0.000 description 9
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MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 8
125000003545 alkoxy group Chemical group 0.000 description 8
239000012046 mixed solvent Substances 0.000 description 8
238000010526 radical polymerization reaction Methods 0.000 description 8
239000001052 yellow pigment Substances 0.000 description 8
TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 7
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IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 6
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238000007639 printing Methods 0.000 description 1
KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
KGOFMNHNVFEEHB-UHFFFAOYSA-N prop-2-enoyloxymethoxymethyl prop-2-enoate Chemical compound C=CC(=O)OCOCOC(=O)C=C KGOFMNHNVFEEHB-UHFFFAOYSA-N 0.000 description 1
HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
FKRCODPIKNYEAC-UHFFFAOYSA-N propionic acid ethyl ester Natural products CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 1
ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical group O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
125000005495 pyridazyl group Chemical group 0.000 description 1
UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
125000004076 pyridyl group Chemical group 0.000 description 1
125000000714 pyrimidinyl group Chemical group 0.000 description 1
229940079877 pyrogallol Drugs 0.000 description 1
229940030966 pyrrole Drugs 0.000 description 1
HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
GZTPJDLYPMPRDF-UHFFFAOYSA-N pyrrolo[3,2-c]pyrazole Chemical compound N1=NC2=CC=NC2=C1 GZTPJDLYPMPRDF-UHFFFAOYSA-N 0.000 description 1
239000010453 quartz Substances 0.000 description 1
125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
239000002964 rayon Substances 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
230000009257 reactivity Effects 0.000 description 1
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238000001226 reprecipitation Methods 0.000 description 1
238000011160 research Methods 0.000 description 1
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238000009738 saturating Methods 0.000 description 1
238000007650 screen-printing Methods 0.000 description 1
125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
239000013049 sediment Substances 0.000 description 1
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HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
XTWQOSYEUVHDIT-CQRHUGCQSA-M sodium 3alpha,7alpha-dihydroxy-5beta-cholane-24-sulfonate Chemical compound [Na+].C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCCS([O-])(=O)=O)C)[C@@]2(C)CC1 XTWQOSYEUVHDIT-CQRHUGCQSA-M 0.000 description 1
125000006850 spacer group Chemical group 0.000 description 1
230000003595 spectral effect Effects 0.000 description 1
238000004611 spectroscopical analysis Methods 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
125000003003 spiro group Chemical group 0.000 description 1
238000001694 spray drying Methods 0.000 description 1
238000010186 staining Methods 0.000 description 1
125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
125000000547 substituted alkyl group Chemical group 0.000 description 1
229940014800 succinic anhydride Drugs 0.000 description 1
HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
125000005463 sulfonylimide group Chemical group 0.000 description 1
150000003464 sulfur compounds Chemical class 0.000 description 1
QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
230000001629 suppression Effects 0.000 description 1
ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
229920001187 thermosetting polymer Polymers 0.000 description 1
125000002769 thiazolinyl group Chemical group 0.000 description 1
125000000101 thioether group Chemical group 0.000 description 1
150000003568 thioethers Chemical class 0.000 description 1
OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 1
ZMANZCXQSJIPKH-UHFFFAOYSA-O triethylammonium ion Chemical compound CC[NH+](CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-O 0.000 description 1
125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
239000013638 trimer Substances 0.000 description 1
125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
238000000870 ultraviolet spectroscopy Methods 0.000 description 1
238000001392 ultraviolet--visible--near infrared spectroscopy Methods 0.000 description 1
XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
150000003673 urethanes Chemical class 0.000 description 1
229920001285 xanthan gum Polymers 0.000 description 1
239000001018 xanthene dye Substances 0.000 description 1
239000008096 xylene Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1
239000011592 zinc chloride Substances 0.000 description 1
235000005074 zinc chloride Nutrition 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

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Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
General Physics & Mathematics (AREA)
Power Engineering (AREA)
Materials Engineering (AREA)
Wood Science & Technology (AREA)
Life Sciences & Earth Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Health & Medical Sciences (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Electromagnetism (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Optics & Photonics (AREA)
Materials For Photolithography (AREA)
Optical Filters (AREA)
Pigments, Carbon Blacks, Or Wood Stains (AREA)
Paints Or Removers (AREA)

KR1020167034834A 2014-08-29 2015-07-23 안료 분산액, 안료 분산액의 제조 방법, 착색 조성물, 경화막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 조성물 KR102003241B1 (ko)

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JP2014176037		2014-08-29
JPJP-P-2014-176037		2014-08-29
PCT/JP2015/070898 WO2016031444A1 (ja)	2014-08-29	2015-07-23	顔料分散液、顔料分散液の製造方法、着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置および組成物

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TWI756347B (zh) *	2017-01-30	2022-03-01	日商富士軟片股份有限公司	組成物、膜、紅外線透過濾波器、固體攝像元件、圖像顯示裝置及紅外線感測器
WO2018163668A1 (ja)	2017-03-07	2018-09-13	富士フイルム株式会社	組成物、膜、光センサおよび分散剤
CN109467955A (zh) *	2018-10-19	2019-03-15	深圳市华星光电技术有限公司	染料化合物及滤光片结构
JP7143804B2 (ja) *	2019-04-02	2022-09-29	東洋インキＳｃホールディングス株式会社	カラーフィルタ用着色組成物及びカラーフィルタ
JP7354496B2 (ja) *	2019-08-30	2023-10-03	サカタインクス株式会社	ブラックマトリックス用顔料分散組成物、及び、それを含有するブラックマトリックス用顔料分散レジスト組成物
JP7295259B2 (ja) *	2019-09-26	2023-06-20	富士フイルム株式会社	光配向性重合体、光配向膜および光学積層体
WO2022044650A1 (ja) *	2020-08-31	2022-03-03	富士フイルム株式会社	着色組成物、光学フィルタの製造方法および固体撮像素子の製造方法
WO2022091711A1 (ja) *	2020-10-27	2022-05-05	株式会社Ｄｎｐファインケミカル	感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置

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- 2015-07-23 JP JP2016545057A patent/JP6307164B2/ja active Active
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JP6307164B2 (ja)	2018-04-04
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Publication	Publication Date	Title
KR101844803B1 (ko)	2018-04-03	착색 조성물, 경화막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치, 유기 일렉트로 루미네선스 소자, 색소 및 색소의 제조 방법
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KR101733965B1 (ko)	2017-05-10	착색 감방사선성 조성물, 착색 경화막, 컬러 필터, 착색 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 액정 표시 장치
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