KR101943239B1 - Gantry device and control method - Google Patents
Gantry device and control method Download PDFInfo
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- KR101943239B1 KR101943239B1 KR1020177010971A KR20177010971A KR101943239B1 KR 101943239 B1 KR101943239 B1 KR 101943239B1 KR 1020177010971 A KR1020177010971 A KR 1020177010971A KR 20177010971 A KR20177010971 A KR 20177010971A KR 101943239 B1 KR101943239 B1 KR 101943239B1
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- sensing element
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- scanning galvanometer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Laser Beam Processing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Measurement Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Abstract
A gantry apparatus and a control method are disclosed. The gantry device comprises: a support device; A gantry body (8) arranged on said support device via a gantry coupling mechanism; Sensing elements 2 and 50 and a scanning galvanometer 4 all disposed on the gantry body 8 and a sensing element 3 arranged on the supporting device 4 and a scanning galvanometer 4 and a gantry body 8 And a vertical agitator 6 configured to support the vertical movement of the scanning galvanometer 4. The combination of the gantry body 8 and the gantry coupling mechanism allows the gantry body to move horizontally and vertically The predetermined vertical value of the sensing element 5 for measuring the height of the scanning galvanometer 4 is determined based on the measurement results of the sensing elements 2, 3 and 5, and the scanning galvanometer 4 Is moved, and the optical focus of the scanning galvanometer 4 is adjusted to the target point.
Description
BACKGROUND OF THE
With the development of flat panel display technology, increasingly larger substrates in lithographic equipment and measuring equipment for flat panel displays are placed on wafer stages, increasing the difficulty of vertical or horizontal movement of wafer stages and increasing the length of travel paths To be limited by substrate sizes. When compared to wafer stages, gantries have the advantage of a simple structure and a longer travel path. For this reason, the advantages of replacing wafer stages with gantries are becoming more and more pronounced.
Existing gantries are all horizontally controlled, and up to now there are no vertically controlled gantries. Typically, the vertical control for the lithography tool is achieved by moving the area measured through the closed-loop control made possible by the focusing and leveling sensors to an optimum focal plane. The control is performed in such a manner that the servo operation is performed until the preset height and tilt values of the focusing and leveling sensors are provided and the height and tilt values measured by the focusing and leveling sensors match the predefined values To position the region to be measured at the optimal focal plane. Figure 1 shows a vertical control mechanism according to the prior art, with the substrate being positioned on the wafer stage, the controller transmits a control command to the wafer stage actuator (motor), which, in response to the command, The focusing and leveling sensors measure the current position of the top surface of the substrate and negatively feed the current position to the controller to form a control loop. The controller then transmits an additional control command to the motor based on the feedback. This step is repeated until the substrate on the wafer stage is located in the optimal focus plane, i.e., the target plane.
This vertical control, however, made possible by a closed-loop control mechanism that requires the involvement of focusing and leveling sensors as well as feedback mechanisms, is time-consuming and the closed-loop control mechanism based on focusing and leveling sensors is relatively complex.
It is an object of the present invention to provide a gantry apparatus and control methods. The gantry device includes a gantry and a gantry guide rail, and is movable both horizontally and vertically. This allows the substrate to be adjusted to the optimal focus plane by closed-loop control without including focusing and leveling sensors, thereby reducing control difficulties and saving production costs.
The above object can be achieved by a gantry apparatus according to the present invention.
In the gantry device,
A support device for carrying a substrate;
A gantry body and a gantry coupling mechanism, the gantry body being arranged on the support device through the gantry coupling mechanism;
A vertical actuator disposed on the gantry body and movable in a vertical direction with respect to the gantry body;
A scanning galvanometer disposed on the vertical actuator;
A first sensing element disposed on the support device, the first sensing element detecting an optimum focal plane for the scanning galvanometer system by using a reference surface of the first sensing element detect;
A second sensing element disposed on the gantry body, the second sensing element configured to measure a first distance from a surface of the substrate to the reference surface of the first sensing element; And
A third sensing element disposed on the vertical actuator; and the third sensing element receives the first sensing element from the scanning galvanometer system on the reference surface of the first sensing element for detecting the best focus plane for the scanning galvanometer system, A second distance to the reference surface of the element;
Lt; / RTI >
Wherein the vertical actuator is configured such that the vertical distance between the scanning galvanometer and the surface of the substrate is equal to the sum of the first distance and the second distance, As shown in FIG.
In addition, the gantry coupling mechanism may include a gantry guide rail.
The gantry body may further include a first horizontal crossbeam and a second horizontal crossbeam, wherein the first horizontal crossbeam and the second horizontal crossbeam cross each other at right angles in a horizontal plane, And transports the scanning galvanometer system horizontally along the gantry guide rails.
Also, the third sensing element may be a profilometer.
The first sensing element may be an aberration sensor, a displacement sensor, or a leveling sensor.
Also, the second sensing element may be a grating scale, a linear variable differential transformer (LVDT), or an interferometer.
The support device may further comprise a wafer stage, a marble, a damper, and a ground base, wherein the substrate is disposed on the wafer stage, the wafer stage is disposed on the marble, Base.
The gantry device is also used for laser sealing of a glass substrate, wherein the substrate comprises an upper glass substrate and a lower glass substrate, wherein the surface of the substrate is a lower surface of the upper glass substrate to be.
Further, the gantry apparatus is used in an exposure apparatus, and the surface of the substrate is the top surface of the substrate.
The above object can be achieved by a gantry apparatus control method for using the above-mentioned gantry apparatus.
The method comprises:
1) moving the second sensing element over the first sensing element and measuring a first distance (Z_BF) from the second sensing element to the reference surface of the first sensing element by the second sensing element step;
2) moving the scanning galvanometer system over the first sensing element and causing the vertical actuator to move the vertical of the scanning galvanometer system until the reference surface of the first sensing element detects the optimal focal plane of the scanning galvanometer system. Detecting a second distance (Z_galBFref) from the zero plane of the third sensing element to the reference surface of the first sensing element by the third sensing element;
3) moving the second sensing element over the substrate and detecting a third distance (Z_mess) from the second sensing element to the surface of the substrate by the second sensing element;
4) calculating a fourth distance (Z_s) from the zero plane of the third sensing element to the surface of the substrate when the best focus plane of the scanning galvanometer system is adjusted to the surface of the substrate; The relationship between the fourth distance and the first distance, the second distance and the third distance is
Same as; And5) moving the best focus plane for the scanning galvanometer system to the surface of the substrate based on the fourth distance;
.
Also, in step 5), until the vertical distance from the zero plane of the third sensing element to the surface of the substrate is equal to the fourth distance (Z_s), the third sensing element (servo closed-loop control), and the vertical actuator drives the third sensing element and the scanning galvanometer to move vertically in synchronization with each other.
This object can be achieved by another gantry device control method for using the aforementioned gantry device.
The method comprises:
1) move the second sensing element directly above the first sensing element and measure a first distance (Z_BF) from the second sensing element to the reference surface of the first sensing element by the second sensing element ;
2) moving the scanning galvanometer system just above the first sensing element, until the reference surface of the first sensing element detects the optimal focal plane of the scanning galvanometer system, Adjusting a vertical position and detecting a second distance (Z_galBFref) from the zero plane of the third sensing element to the reference plane of the first sensing element by the third sensing element;
3) onto the substrate and to move said second sensing element, wherein the distance to a plurality of leveling points by the second sensing element on said surface of said substrate from the second sensing element (z 1, z 2, ..., z n );
4) on the basis of (the horizontal position of z 1, z 2, ..., z n) and the plurality of leveling points ((x1, y1), the distances, (x2, y2), ( x3, y3)), Calculating an average distance pz and slope coefficients pwx, pwy from the second sensing element to the surface of the substrate, wherein the calculation is: n is an integer, pwx and pwy are slope coefficients;
5) Based on the average distance pz from the second sensing element to the surface of the substrate, the slope coefficients pwx, pwy and the preset horizontal position (x_aim, y_aim) of the target point, Calculating a height z_aim of the target point;
6) calculating a fourth distance (Z_s) from the zero plane of the third sensing element to the surface of the substrate when the best focus plane of the scanning galvanometer system is adjusted to the surface of the substrate; A fourth distance, and a distance between the first distance, the second distance and the third distance as follows:
And
7) moving the scanning galvanometer system just above the target point and moving the optimal focus plane for the scanning galvanometer system to a plane in which the target point is located along the fourth distance;
.
The third sensing element also performs servo closed-loop control until the vertical distance from the zero plane of the third sensing element to the surface of the substrate is equal to the fourth distance in step 7) The vertical actuator drives the third sensing element and the scanning galvanometer to move vertically to a synchronized state.
In addition, the number of the plurality of leveling points may be three.
Compared with the prior art, the present invention has the following advantages.
The present invention uses a gantry body and a gantry coupling mechanism as well as a wafer stage and the gantry body is coupled to the gantry coupling mechanism to move horizontally and vertically And enables a variety of additional options and applications; Further, by moving the scanning galvanometer system to closed loop control based on a predetermined vertical value of the sensing element, the optical focus of the scanning galvanometer system can be adjusted to the target point, and the first sensing element, the second sensing element, The height of the scanning galvanometer can be measured based on the measurement results of the third sensing element, thereby reducing the control difficulty and saving the production cost.
Figure 1 shows a vertical control mechanism according to the prior art.
2 is a schematic structural view of a vertical control apparatus for a gantry apparatus according to a first embodiment of the present invention.
3 is a schematic structural view of a system for laser sealing a glass package according to the first embodiment of the present invention.
4 shows a vertical control mechanism according to the first embodiment of the present invention.
5 is a view schematically showing a height adjustment for a scanning galvanometer according to the first embodiment of the present invention.
6A to 6C schematically illustrate a process for vertical control of a gantry device according to the present invention.
7 is a view schematically showing a height adjustment for a scanning galvanometer according to a second embodiment of the present invention.
In the drawings,
Specific embodiments of the present invention are described in detail below with reference to the accompanying drawings. The features and advantages of the present invention become more apparent from the following detailed description and claims. It should be noted that the attached drawings are not necessarily to scale and are provided in a very simple form, and that the drawings are used for the purpose of illustrating the embodiments clearly and conveniently.
Example 1
2 is a schematic view of a structure of a vertical control device for a gantry device according to a first embodiment of the present invention. As shown in the drawings, the gantry apparatus includes the following.
A glass substrate or a support device for transporting a substrate which is a sapphire substrate, in this embodiment a
The
The
The
The
The
A second sensing element (5), a second sensing element (5) are arranged on the gantry body (8) and are configured to measure the height of the scanning galvanometer (4); And
The vertical actuator 6 and the vertical actuator 6 are disposed between the
The gantry coupling mechanism comprises a
The gantry device can be used to laser-seal the
Additionally, the gantry device may also be used in an exposure device with handles, typically a single substrate. In this case, the height of the surface of the substrate measured by the
4 schematically shows a vertical control mechanism according to the first embodiment of the present invention, in which the controller performs a control command, and the vertical control actuator 6 (motor) controls the position of the
5 is a view schematically showing the height adjustment of the scanning galvanometer according to the first embodiment of the present invention. The optical focus of the
1. As shown in FIG. 6A, the
6b, the
3. The
4. When the optical focal point of the
(One)
Equation (1) represents the first mathematical model described above.
5. As shown in FIG. 6C, the
Example 2
Structural schematics of the vertical control device and the vertical control mechanism for the gantry device according to the second embodiment are shown in FIGS. 2 and 4, respectively. The gantry apparatus of FIG. 2 and the vertical control mechanism of FIG. 4 are the same as those described in the first embodiment, and therefore the description thereof is omitted here.
7 schematically shows the height adjustment of the scanning galvanometer according to the second embodiment of the present invention. During use of the glass substrate, there is generally a tilt in the bottom surface of the upper glass substrate. Unlike the first embodiment in which the tilt is not taken into consideration, in this embodiment, the influence of the bottom surface inclination of the upper glass substrate on the predetermined height is evaluated. The optical focal point of the
1. As shown in FIG. 6A, the
6b, the
3. The
4. The overall height and slope of the upper glass substrate is calculated based on the heights of the three leveling points. The calculation of height and slope requires setting of three unknowns defined herein as pz, pwx and pwy. The
(2)
The positions of the
(3)
The unknowns pz, pwz and pwy can be obtained from equation (3).
5. The height of the
(4)
z_aim can be obtained from equation (4).
6. When the optical focus of the
(5)
7, the
In summary, the control apparatus and methods for the gantry apparatus according to the above-described embodiments of the present invention use the
The foregoing description merely sets forth some preferred embodiments of the invention and does not in any way limit its scope. All equivalents and modifications by those skilled in the art to the subject matter disclosed and the details disclosed herein without departing from the scope of the present invention are within the scope of the present invention and are still within the scope of the present invention.
Claims (14)
A support device for transporting the substrate;
A gantry body and a gantry coupling mechanism, the gantry body being arranged on the support device through the gantry coupling mechanism;
A vertical actuator disposed on the gantry body and movable in a vertical direction with respect to the gantry body;
A scanning galvanometer disposed on the vertical actuator;
A first sensing element disposed on the support device, the first sensing element configured to detect an optimal focus plane for the scanning galvanometer system by using a reference surface of the first sensing element;
A second sensing element disposed on the gantry body, the second sensing element configured to measure a first distance from a surface of the substrate to a reference surface of the first sensing element; And
A third sensing element disposed on the vertical actuator; and the third sensing element receives the first sensing element from the scanning galvanometer system on the reference surface of the first sensing element for detecting the best focus plane for the scanning galvanometer system, A second distance to the surface of the element;
Lt; / RTI >
Wherein the vertical actuator is configured to detect a vertical position of the scanning galvanometer based on the first distance and the second distance such that a vertical distance between the scanning galvanometer and the surface of the substrate is equal to a sum of the first distance and the second distance, Of the gantry device.
Wherein the gantry coupling mechanism comprises a gantry guide rail.
Wherein the gantry body includes a first horizontal cross beam and a second horizontal cross beam,
Wherein the first horizontal crossbeam and the second horizontal crossbeam intersect at right angles in a horizontal plane and carry the scanning galvanometer system horizontally along the gantry guide rails.
Wherein the first sensing element is a rough surface.
Wherein the second sensing element is an aberration sensor, a displacement sensor or a focusing and leveling sensor.
Wherein the third sensing element is a lattice scale, a linear variable displacement transducer or an interferometer.
Wherein the support device comprises a wafer stage, a marble, a damper and a ground base,
Wherein the substrate is disposed on the wafer stage,
Wherein the wafer stage is disposed on the marble,
And the marbles are connected to the ground base through the damper.
The gantry device is used for laser sealing of a glass substrate,
Wherein the substrate comprises an upper glass substrate and a lower glass substrate,
Wherein the surface of the substrate is a lower surface of the upper glass substrate.
The gantry apparatus is used in an exposure apparatus,
Wherein the surface of the substrate is the top surface of the substrate.
1) moving the second sensing element over the first sensing element and measuring a first distance (Z_BF) from the second sensing element to the reference surface of the first sensing element by the second sensing element step;
2) moving the scanning galvanometer system over the first sensing element and causing the vertical actuator to move the vertical of the scanning galvanometer system until the reference surface of the first sensing element detects the optimal focal plane of the scanning galvanometer system. Detecting a second distance (Z_galBFref) from the zero plane of the third sensing element to the reference surface of the first sensing element by the third sensing element;
3) moving the second sensing element over the substrate and detecting a third distance (Z_mes) from the second sensing element to the surface of the substrate by the second sensing element
4) calculating a fourth distance (Z_s) from the zero plane of the third sensing element to the surface of the substrate when the best focus plane of the scanning galvanometer system is adjusted to the surface of the substrate; The relationship between the fourth distance and the first distance, the second distance and the third distance is Same as; And
5) moving the best focus plane for the scanning galvanometer system to the surface of the substrate based on the fourth distance;
And the gantry device control method.
In step 5), until the vertical distance from the zero plane of the third sensing element to the surface of the substrate is equal to the fourth distance Z_s,
Wherein the third sensing element performs servo closed loop control such that the vertical actuator drives the third sensing element and the scanning galvanometer to move vertically in a synchronized state.
1) move the second sensing element directly above the first sensing element and measure a first distance (Z_BF) from the second sensing element to the reference surface of the first sensing element by the second sensing element ;
2) moving the scanning galvanometer system just above the first sensing element, until the reference surface of the first sensing element detects the optimal focal plane of the scanning galvanometer system, Adjusting a vertical position and detecting a second distance (Z_galBFref) from the zero plane of the third sensing element to the reference surface of the first sensing element by the third sensing element;
3) onto the substrate and to move said second sensing element, wherein the distance to a plurality of leveling points by the second sensing element on said surface of said substrate from the second sensing element (z 1, z 2, ..., z n );
4) on the basis of (the horizontal position of z 1, z 2, ..., z n) and the plurality of leveling points ((x1, y1), the distances, (x2, y2), ( x3, y3)), Calculating an average distance pz and slope coefficients pwx, pwy from the second sensing element to the surface of the substrate, wherein the calculation is: n is an integer, pwx and pwy are slope coefficients;
5) Based on the average distance pz from the second sensing element to the surface of the substrate, the slope coefficients pwx, pwy and the preset horizontal position (x_aim, y_aim) of the target point, Calculating a height (z_aim) of the point, the calculation is as follows;
6) calculating a fourth distance (Z_s) from the zero plane of the third sensing element to the surface of the substrate when the best focus plane of the scanning galvanometer system is adjusted to the surface of the substrate; A fourth distance, and a distance between the first distance, the second distance and the third distance as follows:
And
7) moving the scanning galvanometer system just above the target point and moving the optimal focus plane for the scanning galvanometer system to a plane in which the target point is located along the fourth distance;
And the gantry device control method.
In step 7), until the vertical distance from the zero plane of the third sensing element to the surface of the substrate is equal to the fourth distance Z_s,
Wherein the third sensing element performs servo closed loop control such that the vertical actuator drives the third sensing element and the scanning galvanometer to move vertically in a synchronized state.
Wherein the number of the plurality of leveling points is three.
Applications Claiming Priority (3)
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CN201410510061.2A CN105527796B (en) | 2014-09-28 | 2014-09-28 | Planer-type equipment and control method |
CN201410510061.2 | 2014-09-28 | ||
PCT/CN2015/086912 WO2016045461A1 (en) | 2014-09-28 | 2015-08-14 | Gantry device and control method |
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CN110727177B (en) * | 2019-09-23 | 2022-04-01 | 钧迪智能装备科技(苏州)有限公司 | Exposure device and exposure method for special-shaped workpiece |
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JP2017530559A (en) | 2017-10-12 |
CN105527796A (en) | 2016-04-27 |
JP6242542B2 (en) | 2017-12-06 |
KR20170091584A (en) | 2017-08-09 |
SG11201702491SA (en) | 2017-04-27 |
TWI581006B (en) | 2017-05-01 |
CN105527796B (en) | 2018-03-13 |
WO2016045461A1 (en) | 2016-03-31 |
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