KR101593963B1 - UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same - Google Patents

UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same Download PDF

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Publication number
KR101593963B1
KR101593963B1 KR1020150107835A KR20150107835A KR101593963B1 KR 101593963 B1 KR101593963 B1 KR 101593963B1 KR 1020150107835 A KR1020150107835 A KR 1020150107835A KR 20150107835 A KR20150107835 A KR 20150107835A KR 101593963 B1 KR101593963 B1 KR 101593963B1
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KR
South Korea
Prior art keywords
light source
light
exposure
unit
ultraviolet light
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KR1020150107835A
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Korean (ko)
Inventor
조남직
인치억
박종원
송우리
정해일
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조남직
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Priority to KR1020150107835A priority Critical patent/KR101593963B1/en
Priority to TW104135369A priority patent/TWI579658B/en
Priority to CN201510726723.4A priority patent/CN106406033B/en
Priority to CN201520858315.XU priority patent/CN205103540U/en
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Publication of KR101593963B1 publication Critical patent/KR101593963B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

Disclosed is a light source module unit for light exposure. The light source module unit for light exposure comprises: a light source panel where multiple units of ultraviolet light emitting elements mounted on a circuit board in a matrix type array structure are mounted on a supportive panel; and an optical panel arranged in a matrix type array structure in an eccentric state towards a random standard central axis which passes the middle of the ultraviolet light emitting array on the light source panel against the main axis at which multiple element light collecting lenses correspond to the light emitting elements on a lens panel arranged on the side where light is emitted on the light emitting element to face the light source panel. Due to the composition, the present invention can practically and economically replace light sources of the existing light exposure device while secure the light exposure performance to greatly improve the miniature and resolution of the light exposure patterns by maximizing the amount of light of low power since diffused light emitted by ultraviolet light emitting elements in each element is validly collected in a light receiving area which is set by aperture state of the optical system while realizing high efficiency, high-output mono wavelength and short-wavelength ultraviolet rays.

Description

[0001] The present invention relates to an exposure light source module unit and an exposure apparatus including the light source module unit,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure light source used in a photolithography process for forming a microcircuit pattern on a semiconductor wafer or a display panel, and more particularly, to a light source for exposure using a plurality of ultraviolet LED array modules A light source module unit for exposure which is capable of effectively improving exposure performance and efficiency by a combination of condenser lens array modules and capable of easily and economically replacing a light source of an existing exposure apparatus, ≪ / RTI >

For example, an image such as a semiconductor element, a circuit board (PCB) and a liquid crystal display (LCD), an organic light emitting diode (OLED), and a plasma display panel (PDP) The display panel is manufactured such that a microcircuit pattern is formed by an optical micromachining technique called photolithography in an exposure process in its manufacturing process.

Generally, an ultra-high-pressure mercury lamp or a halogen lamp is mainly used as an exposure light source used in a conventional exposure process. However, the conventional exposure light source has a low lifetime and a high power consumption, But also environmental problems.

Particularly, there is a demand for ultra-high resolution realization using the technique of miniaturization of exposure pattern in manufacture of TFT (Thin Film Transistor) or CF (Color Filter) in display fields such as liquid crystal display devices (LCD) and organic light emitting diodes It is a reality that it is impossible to realize the miniaturization of the exposure pattern and realization of the ultrahigh resolution which is the core technology of the display industry due to the technical limitations of the process of finishing the exposure pattern using the existing exposure light source (Hg Lamp).

In recent years, there has been a demand for miniaturization and high-definition of exposure patterns due to miniaturization, large capacity, high integration, and high density of semiconductor devices, and therefore the existing exposure light source has a limitation .

Recently, development of new exposure techniques such as liquid immersion exposure and extreme ultraviolet exposure has been actively carried out. For example, ultraviolet light emitting devices (UV LEDs) can be used with low power consumption, long life, selective use of single wavelength and short wavelength And as an environmentally friendly light source for exposure, it is becoming popular as a substitute for existing light sources for exposure.

However, in the case of an exposure apparatus using an ultraviolet light emitting element (UV LED) as a light source, the structure of the optical path that can reduce the optical loss, the improvement of the light intensity distribution and the power of the optical output and the miniaturization of the exposure pattern, Demand for the development of optical components, modules, and units is in a critical stage, along with the development of high efficiency new light sources (UV LEDs) for large capacity and high density.

SUMMARY OF THE INVENTION The present invention has been made in view of the technical background as described above, and it is an object of the present invention to solve the problems of the background art described above, which has been acquired by the applicant for deriving the present invention, It can not be said to be publicly known to the general public prior to the filing of the invention.

Korean Patent Registration No. 10-1440874 Korean Patent Publication No. 10-1401238 Korean Patent Publication No. 10-2012-0095520 Korean Patent Publication No. 10-2015-0049563

SUMMARY OF THE INVENTION It is an object of the present invention to provide an ultraviolet light emitting device having a plurality of ultraviolet light emitting devices and a condensing lens array module, And to provide a low power consumption type light source module unit for exposure capable of maximizing the light collection efficiency by the optimum combination.

Another object of the present invention is to provide a low power consumption type light source module unit capable of effectively and dramatically improving exposure performance and exposure efficiency so that the exposure pattern can be miniaturized and high resolution can be realized, and an exposure apparatus having the unit as a light source .

Still another object of the present invention is to provide an economical and practical low power consumption type light source module unit for exposure and an exposure apparatus having the unit as a light source by being improved into an alternative compatible modular unit which can be easily replaced with a light source of existing exposure apparatus .

According to an aspect of the present invention, there is provided a light source module unit for exposure according to the present invention, comprising: a light source panel having a plurality of unit ultraviolet light emitting devices mounted on a support panel in a matrix array structure on a circuit board; A plurality of unit condensing lenses arranged on the light output side of the light emitting device so as to face the light source panel are disposed at the centers of the ultraviolet light emitting element arrays on the light source panel with respect to the main light axis, And an optical panel provided in an array structure of a matrix type in a state of being eccentric to an arbitrary reference center axis line side passing through the optical axis.

In order to achieve the above-mentioned objects, an exposure apparatus according to the present invention includes an exposure table for supporting an exposure substrate coated with a photosensitizer, driving means for driving the exposure table in a movable state on the XY plane, A light source module unit for exposure provided for emitting illumination light for exposure to the substrate; an optical system provided between the substrate and the light source module unit for exposure; and control means for controlling driving of the driving means and the exposure light source unit In the exposure apparatus, the light source module unit for exposure includes a light source panel in which a plurality of unit ultraviolet light emitting elements are mounted on a support panel by being mounted on a circuit board in a matrix-like array structure; A plurality of unit condensing lenses arranged on the light output side of the light emitting device so as to face the light source panel are disposed at the centers of the ultraviolet light emitting element arrays on the light source panel with respect to the main light axis, And an optical panel provided in an array structure of a matrix type in a state of being eccentric to an arbitrary reference center axis line side passing through the optical axis.

According to the present invention, the unit condenser lens is gradually spaced from an arbitrary reference center axis side passing through the center of the ultraviolet light emitting element array on the light source panel, and is closer to the edge, And the diffused light emitted from each of the unit ultraviolet light emitting elements is condensed in the light receiving region set in the optical system of the exposure apparatus.

According to an aspect of the present invention, the ultraviolet light emitting device may be mounted on a unit circuit board as a packaged LED light source. Accordingly, the support panel constituting the light source panel may have a configuration in which a plurality of LED light sources in a package form are mounted on a plurality of unit circuit boards.

According to another aspect of the present invention, the ultraviolet light emitting element may be mounted as a packaged LED light source on a single circuit board.

According to another aspect of the present invention, the ultraviolet light emitting device may be mounted as an LED light source on a single or multiple circuit boards in the form of a single chip or a plurality of chips.

In the present invention, the unit condensing lens on the optical panel may be a double-sided convex lens, and a double-sided convex lens having a curvature surface of a different optical structure may be disposed according to the array position.

According to the present invention, there is provided an ultraviolet light-emitting element which is spaced apart from the reference center axis side passing through the center of the ultraviolet light-emitting element array on the light source panel, with respect to the optical distance "a" set in the optical system from the ultraviolet light- X "between the center axis of each of the ultraviolet light emitting elements and the center axis of the condensing lens, and the distance" c "between the center of the condensing lens and the distance" b "between the ultraviolet light emitting element and the condensing lens, ) Is set such that the reference of the eccentric distance "x" of the condensing lens satisfies "x = b * c / a", and the range of "x" / 2ab < x < bc (2b + t) / 2ab "

Also, it is preferable that the distance c between the surface of the ultraviolet light-emitting device and the condenser lens and the diameter d of the condenser lens satisfy the condition of 1.0c <d <2.5c.

The light source panel and the optical panel are preferably supported by the housing and configured to be detachable from the exposure apparatus.

Further, it is preferable that the light source panel and the optical panel are further provided with a radiation means.

According to the light source module unit for exposure according to the present invention, an optical panel, which is a condenser lens array module capable of maximizing the condensing efficiency with respect to the light source panel which is a plurality of ultraviolet light emitting (UV) LED array modules, As high power and high efficiency can be realized with a single wavelength and a short wavelength, it is possible to miniaturize the exposure pattern and achieve a remarkable high resolution by effectively improving the exposure performance and the exposure efficiency.

In addition, according to the light source module unit for exposure according to the present invention, it is possible to provide an alternative and compatible module unit that can be easily replaced with a light source of a conventional exposure apparatus, thereby providing a practical and economical exposure apparatus.

Further, since the light source module unit for exposure according to the present invention is used, it is possible to expect a remarkable reduction in maintenance cost by using low power consumption, reducing the cost of replacing the light source, improving the operation time of the exposure equipment, and solving environmental problems .

In addition, since the light source module unit for exposure according to the present invention can selectively use ultraviolet light having a single wavelength and a short wavelength with high efficiency and high output, it is possible to realize high resolution by pattern refinement which is a core technology for realizing high quality exposure performance It is.

1 is a schematic exploded perspective view showing a light source module unit for exposure according to the present invention.
2 is a schematic perspective view schematically illustrating a unit light source and a condenser lens array structure of an exposure light source module unit according to the present invention.
FIG. 3 is a schematic plan view schematically showing an array structure of an ultraviolet light-emitting device composed of a unit light source of an exposure light source module unit according to the present invention. FIG.
4 and 5 are schematic diagrams for explaining an eccentric array structure of a unit light source and a condenser lens of an exposure light source module unit according to the present invention, respectively.
6 is a graph showing the measurement result of the light collection amount according to the light collecting structure of the light source module unit for exposure according to the present invention.
7 is a photograph showing the light irradiation state of the light source module unit for exposure according to the present invention.
8 and 9 are external perspective views schematically showing a state in which the light source module units for exposure according to the present invention are unitized into different housings.
10 and 11 are a schematic perspective view and a plan view, respectively, showing a light source and a condenser lens array structure of a light source module unit for exposure according to another embodiment of the present invention.
12 is a view showing the results of measurement of the CD value according to the mask line width by photographing the main part of the circuit pattern formed on the wafer by the light source module unit for exposure according to the present invention and the mercury lamp (Hg Lamp) View drawings.
13 is a graph showing the results of measurement of CD values according to a mask line width of a circuit pattern formed on a wafer by a light source module unit for exposure according to the present invention and a mercury lamp Hg Lamp, which is a conventional light source for exposure.
FIG. 14 is a schematic view schematically showing an essential part of an exposure apparatus to which an exposure light source module unit according to the present invention is applied. FIG.

Hereinafter, a light source module unit for exposure according to the present invention will be described in detail with reference to the accompanying drawings. The following description and the accompanying drawings are merely illustrative of the preferred embodiments of the present invention and are not intended to limit the light source module unit for exposure according to the present invention.

1 and 2, a plurality of unit ultraviolet light emitting devices (UV LEDs) 111 are mounted on a circuit board 112 in an array structure in a matrix form, And a lens panel 122 disposed on the light output side of the ultraviolet light emitting device 111 so as to face the light source panel 110. The plurality of unit condenser lenses 121 Of the array of ultraviolet light emitting devices 111 on the light source panel 110 with respect to the main optical axis at a position of the interval p corresponding to the interval p of the array of the ultraviolet light emitting devices 111 (E1, e2) eccentric to an arbitrary reference center axis side passing through the optical axis (see FIG. 2) (see FIG. 2).

According to an aspect of the present invention, the ultraviolet light emitting device 111 may be formed by stacking a plurality of ultraviolet light beams having a wavelength range of 100 nm to 410 nm in a row on a unit circuit board 112, Or an LED light source in the form of a combination of a chip and a package.

Accordingly, the light source panel 110 includes a plurality of strip-shaped unit circuit boards 112 mounted on the support panel 113 in a side-by-side manner, and each of the unit circuit boards 112 includes a plurality of ultraviolet light- (111) form an array in the form of a matrix on the xy coordinates.

On the other hand, the ultraviolet light emitting device 111 may be a chip, a package or a chip that emits ultraviolet light ranging from a 100 nm wavelength band to a 410 nm wavelength band so as to form an array structure in a matrix on a single circuit substrate 112 having a larger area Package type LED light source.

3 is a schematic plan view schematically showing an array structure of an ultraviolet light emitting device 111 provided as a unit light source of the light source module unit for exposure 100 according to the present invention.

3, the light source module unit 100 for exposure according to the present invention includes a plurality of ultraviolet light emitting devices 111 on an xy rectangular coordinate system having the center O of the array of ultraviolet light emitting devices 111 on the light source panel 110 as origin. And the ultraviolet light emitting elements 111 are configured to form an array structure of a matrix type with spaced apart intervals p.

Although the support panel 113 is illustrated as a rectangular panel, the shape of the support panel 113 is shown as an embodiment. The limitation of the light source module unit 100 for exposure according to the present invention no.

Therefore, the light source module unit 100 for exposure according to the present invention can be applied to various embodiments, for example, a disk-shaped panel or the like.

That is, the shape of the support panel 113 on which the ultraviolet light-emitting elements 111 are arrayed depends on the specifications and the configuration of the exposure apparatus to which the light source module unit 100 for exposure according to the present invention is mounted as a light source, It can be modified into various forms so as to be adopted in an optimal state.

3, the ultraviolet light emitting devices 111 are arranged on the support panel 113 in an odd number (9) of rows and columns, the light source panel 110, The unit ultraviolet light emitting device 111 may be disposed at the center O of the ultraviolet light emitting device array.

On the other hand, in the structure in which the ultraviolet light emitting elements 111 are arrayed on the support panel 113 in an even number of rows and columns, the unit ultraviolet light emitting elements 111 are arranged at the center O of the ultraviolet light emitting element array of the light source panel 110 And has an array structure in which the arrangement of the elements 111 is excluded.

In other words, the center O of the ultraviolet light-emitting element array on the light source panel 110 is a light-receiving area in which the diffused light emitted from each unit ultraviolet light-emitting element is condensed by the condenser lens 121 (Refer to FIG. 2 and FIG. 4, e1, e2, and en) of each unit condensing lens 121. The eccentricity of each unit condensing lens 121 is determined by the following equation.

The light receiving area (see the reference numeral "A" in Figs. 4 and 5) is an aperture for forming a condensing target through which the condensed light passes through a reflector provided in an optical system of an unillustrated exposure apparatus. .

Therefore, in the light source module unit 100 for exposure according to the present invention, the diffused light emitted from each unit ultraviolet light emitting device 111 is converged by the condenser lens 121 and is formed as a condensing target of the light receiving area And is condensed to pass through an aperture.

That is, in the light source module unit 100 for exposure according to the present invention, the center O of the array of the ultraviolet light emitting devices 111 on the light source panel 110 and the center of the lens panel 212 are coaxial, The converging lens 121, which is gradually spaced from an arbitrary reference center axis side passing through the center O and is disposed close to the edge, has an eccentricity with respect to the main optical axis of the ultraviolet light emitting element 111, Is gradually increased.

In other words, the light source module unit 100 for exposure according to the present invention performs the role and function of a strabismus lens in that the condenser lens 121 is disposed eccentrically with respect to the main optical axis of the ultraviolet light emitting device 111 Thereby maximizing the light collection efficiency of the diffused light emitted from each of the unit ultraviolet light emitting elements 111. [

In order to maximize the efficiency of condensing the diffused light emitted from the ultraviolet light emitting device 111, the light source module unit 100 for exposure according to the present invention having the above-described structure is configured so that the condenser lens 121 is a double- And it is preferable that a biconvex lens having a curvature surface of a different optical structure is provided according to the array position.

4 and 5 are schematic diagrams for explaining an array structure in which the condenser lens 121 of the light source module unit for exposure 100 according to the present invention is eccentric to the main optical axis of the ultraviolet light emitting device 111. FIG.

4 and 5, "a" represents an optical distance from the ultraviolet light emitting element 111 to an aperture set as a light-receiving region A, which is a light-collecting target.

"B" represents the separation distance of the ultraviolet light emitting device 111 disposed so as to be spaced apart from the reference center axis side passing through the center O of the ultraviolet light emitting device array of the light source panel 110.

"X" represents an eccentric distance between the center axis of the ultraviolet light emitting device 111 and the center axis of the condenser lens 121, "c" represents a distance between the face of the ultraviolet light emitting device 111 and the condenser lens 121, , And "t" represents the diameter of the light receiving region (A).

4 and 5, the light source module unit 100 for exposure according to the present invention includes an ultraviolet light emitting device 111, a light source unit 111, It is preferable that the relationship between "b" and "c", "x", and "t" is defined by the following equation with respect to the distance "a"

That is, the reference of the eccentric distance "x" of the condenser lens 121 is set to satisfy "x = b * c / a", and the range of "x" bc (2b + t) / 2ab ".

6 is a graph showing measurement results of the light collection amount according to the light condensing structure of the light source module unit 100 for exposure according to the present invention. D denotes the distance between the condenser lens 121 and the condenser lens 121, and "c" denotes the distance between the condenser lens 121 and the condenser lens 121, Lt; / RTI &gt;

6, the light source module unit 100 for exposure according to the present invention has a structure in which the diameter "d" of the condenser lens 121 with respect to the face-to-face spacing "c" between the ultraviolet light emitting device 111 and the condenser lens 121 When the ratio value (d / c) is 1 or more, it increases sharply. On the other hand, when the value of d / c is 2 or more, a certain amount of light is maintained.

Therefore, in the light source module unit 100 for exposure according to the present invention, the distance c between the facing surface of the ultraviolet light emitting device 111 and the condenser lens 121 and the diameter d of the condenser lens satisfy 1.0c <d <2.5c Is satisfied.

7 (a) is a diagram showing the light irradiation state of the light source panel 110 in a state in which the optical panel 120 is excluded, and FIG. 7 FIG. 7 (b) is a photograph of the light irradiation state through the optical panel 120. FIG.

Referring to FIG. 7, it can be seen that the brightness of the light irradiation state through the optical panel 120 appears brighter than the light irradiation state in which the optical panel 120 is excluded.

8 and 9, the light source module unit 100 for exposure according to the present invention is configured such that the light source panel 110 and the optical panel 120 are supported by the housings 130 and 140, respectively, And may have a unitized configuration. Since the light source module unit 100 for exposure, which is unitized to be mounted on the housings 130 and 140, can be detachably used as a light source of an exposure apparatus (not shown), it is possible to use a conventional exposure apparatus such as a mercury lamp or a halogen lamp The light source can be replaced very economically and easily.

The light source module unit 100 for exposure according to the present invention is supported by a structure such as a bracket or a flange provided in the exposure apparatus in a state where the light source panel 110 and the optical panel 120 are coupled together, As shown in FIG.

The light source module unit 100 for exposure according to the present invention may further include a heat dissipating unit provided in the housings 130 and 140 so as to be provided around the light source panel 110 and the optical panel 120 desirable.

The heat dissipating means may include a heat sink built in the housings 130 and 140 so that the light source panel 110 and the optical panel 120 may be mounted thereon and a fan or a blower Cooling type heat dissipating means may be provided or a water cooling type heat dissipating means may be provided which is connected to a chiller such that the cooling water circulates through the cooling water inlet 141 and the outlet 142 as illustrated in FIG. The air-cooling type and the water-cooling type heat radiation means can be installed in a combined state.

According to another aspect of the present invention, there is provided a light source module unit for exposure according to the present invention, wherein the ultraviolet light emitting device 111 and the condenser lens 121 are circularly arrayed as shown in FIGS. 10 and 11, As shown in Fig. In the case of such a circular array structure, there is an advantage that the light loss generated from the ultraviolet light emitting device 111 arranged at the corner portion farthest from the center O in the square array structure can be excluded.

Meanwhile, FIG. 12 is a photograph showing photographic results of a comparison between the exposure light source module unit according to the present invention and the conventional exposure light source Hg Lamp.

The test results shown in Fig. 12 were obtained by applying a 1.5-m thick photoresist (PR name: DTFR-JC800) to a 3.5-inch wafer and setting mask line widths in the range of 1.0 to 3.5 um at intervals of 0.2 And developed with 2.38 wt% of tetramethylammonium hydroxide (TMAH) developer to develop a critical dimension (CD) of a microcircuit pattern formed through photolithography used in a conventional LCD manufacturing process, Was measured by photographing.

12, the limit of the critical dimension (CD) of a microcircuit pattern that can be implemented using a mercury lamp, which is a conventional exposure light source, is about 2.0 μm. On the other hand, the light source module unit for exposure according to the present invention It can be seen that the critical dimension (CD) of the microcircuit patterns that can be implemented is possible up to about 1.4 μm.

FIG. 13 is a graph showing the critical dimension line dimension (CD) measured by photographing in FIG. 12 and the ideal critical dimension line dimension (CD).

13, the critical dimension line dimension (CD) of a microcircuit pattern that can be implemented using the light source module unit for exposure according to the present invention is a critical dimension of a microcircuit pattern that can be realized using a conventional mercury lamp It can be seen that it is formed in a pattern closer to the ideal critical dimension fine dimension (CD) as compared with the line width fine dimension (CD).

Therefore, the line width of the fine circuit pattern formed using the light source module unit for exposure according to the present invention can be formed finer and more precisely than the line width of the circuit pattern formed using the mercury lamp (Hg Lamp) can confirm. Accordingly, the light source module unit for exposure according to the present invention can realize a remarkable high resolution in the exposure process.

FIG. 14 is a schematic configuration diagram schematically showing an essential part of an exposure apparatus to which an exposure light source module unit according to the present invention is applied. Here, the same reference numerals as those in the preceding drawings denote the same components.

14, an exposure apparatus 200 according to the present invention includes an exposure table 250 for supporting an exposure glass substrate 10 coated with a photosensitizer, an exposure table 250 for moving the exposure table 250 on XY plane coordinates (Not shown) for driving the glass substrate 10 in a possible state, an exposure light source module unit 100 provided for emitting illumination light for exposure to the glass substrate 10, Optical units 210 to 230 provided between the unit 100 and control means (not shown) for controlling the drive means and the light source unit 100 for exposure in conjunction with each other. Reference numeral 240 denotes an exposure mask on which an exposure pattern is formed.

The glass substrate 10 is coated with a photosensitizer on a surface to which illumination light from the light source module unit for exposure 100 is incident and a mask 240 having the same pattern as the photosensitive pattern formed on the light- And is supported by the exposure table 250. The illumination light emitted from the light source module unit for exposure 100 is condensed through the optical systems 210 to 230 and passes through the mask 240 to be irradiated on the photosensitive surface of the glass substrate 10, The exposure process in which the exposure pattern is transferred onto the photosensitive surface of the glass substrate 3 is performed.

The exposure table 250 is moved in the XY plane coordinates by the driving means according to the relative sizes of the glass substrate 10 and the mask 240 while the positions of the glass substrate 10 and the mask 240 are aligned Thereby performing an exposure process.

In the meantime, in the exposure apparatus 200 according to the present invention, the glass substrate 10 and the mask 240 are provided to be spaced apart from each other, but such a structure does not limit the present invention.

On the other hand, the mask 240 may be provided closely to the photosensitive surface of the glass substrate 10. In the case of this configuration, the photosensitive surface of the glass substrate 10 is closely exposed, and the pattern of the mask 240 is transferred to the photosensitive surface.

A pattern formed on the mask 240 is formed by a configuration in which a gap between the glass substrate 10 and the mask 240 is widened and a reduction projection lens is interposed between the glass substrate 10 and the mask 240 It is possible to perform reduction projection exposure on the photosensitive surface of the glass substrate 10. [

The optical systems 210 to 230 are provided to efficiently collect the illumination light on the mask 240. The optical systems 210 to 230 are arranged in a manner such that the illumination light emitted from the light source module unit for exposure 100 is an aperture, And a reflector 230 for refracting the illumination light passing through the aperture A to the mask 240. The reflector 230 reflects the illumination light passing through the aperture A to the mask 240, And includes a fly eye lens 221, a condenser lens 222 and a plate lens 223 and 224. The configuration of the optical systems 210 to 230 does not limit the exposure apparatus 200 according to the present invention, and various modified configurations may be applied depending on the exposure subject and the mask specification.

The light source module unit for exposure 100 is a component that characterizes the exposure apparatus 200 according to the present invention. A plurality of unit ultraviolet light emitting elements (UV LEDs) 111 are arranged on a circuit board 112, And a plurality of lens panels 122 disposed on the light output side of the ultraviolet light emitting device 111 so as to face the support panel 113. The light source panel 110 is mounted on the supporting panel 113, The unit condenser lenses 121 of the ultraviolet light emitting devices 111 are arranged on the light source panel 110 with respect to the main optical axis at a position of the interval p corresponding to the interval p of the array of the ultraviolet light emitting devices 111 And an optical panel 120 provided in an array structure of a matrix type e1 and e2 eccentric to an arbitrary reference center axis side passing through the center O of the array (see Fig. 2).

According to the exposure apparatus 200 according to the present invention, the ultraviolet light emitting devices 111 are formed in a strip-shaped unit circuit substrate 112 as shown in FIG. 1, Package or an LED light source in the form of a mixture of chip and package.

The light source module unit 100 for exposure as described above is a combination of an optical panel which is a condenser lens array module capable of maximizing a light condensing efficiency with respect to a light source panel which is a plurality of ultraviolet light emitting (UV) LED array modules. And is described in detail with reference to FIG. 12 and has the configuration as described in claims 1 to 10 of the claims, and a detailed description thereof will be omitted.

In other words, the exposure apparatus 200 according to the present invention has a configuration in which the above-described exposure light source module unit 100 is replaced with an existing conventional exposure apparatus, so that the use of low power consumption, It is possible to expect a remarkable reduction in maintenance cost by improving the operation time of the apparatus and solving environmental problems. In addition, since it is possible to realize high output and high efficiency with a single wavelength and short wavelength of ultraviolet rays, It is possible to miniaturize the exposure pattern and realize a breakthrough high resolution.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It is to be understood that various modifications may be made, and such modifications are intended to fall within the scope of the appended claims.

100: Light source module unit for exposure
110: Light source panel
111: ultraviolet light emitting element
112: circuit board
113: Support panel
120: Optical panel
121: condenser lens
122: lens panel
200: Exposure device
210: reflector
240: mask
A: light receiving area / aperture

Claims (13)

A light source panel in which a plurality of unit ultraviolet light emitting elements are mounted on a support panel by being mounted on a circuit board in an array structure in a matrix form;
A plurality of unit condensing lenses arranged on the light output side of the light emitting device so as to face the light source panel are disposed at the centers of the ultraviolet light emitting element arrays on the light source panel with respect to the main light axis, And an optical panel provided in an array structure of a matrix type in a state of being eccentric to an arbitrary reference center axis line side passing through the optical axis,
A distance between the ultraviolet light-emitting device and the light-receiving area (A) from the ultraviolet light-emitting device to the light-receiving area (A) x "between the center axis of each of the ultraviolet light emitting elements and the center axis of the condensing lens, and the distance" c "between the center of the light collecting lens and the center axis of the condensing lens, The relationship of the diameter "t" is set such that the reference of the eccentric distance "x" of the condensing lens satisfies "x = b * c / a"<x<bc (2b + t) / 2ab ". The method according to claim 1,
Wherein the unit condenser lens is disposed in a matrix form in which the amount of eccentricity with respect to the main optical axis of the corresponding unit ultraviolet light emitting device is increased as the unit condenser lens is disposed closer to an edge of the arbitrary reference central axis side passing through the center of the ultraviolet light emitting device array on the light source panel And the diffused light emitted from each of the unit ultraviolet light emitting elements is condensed in the light receiving region set in the optical system of the exposure apparatus. The method according to claim 1,
Wherein the ultraviolet light-emitting device is mounted on the unit circuit board in the form of an LED light source in the form of a chip or a package or a mixture of both. The method according to claim 1,
Wherein the ultraviolet light emitting device is mounted on a single circuit board by a LED light source in the form of any one selected from a chip or a package or a mixture of both. 5. The method according to any one of claims 1 to 4,
Wherein the unit condenser lens is a double-sided convex lens. 5. The method according to any one of claims 1 to 4,
Wherein the unit condensing lens is formed of a biconvex lens having a curvature surface of a different optical structure according to an arrangement position of the unit condensing lens. delete 5. The method according to any one of claims 1 to 4,
Wherein a distance c between a unit surface of the unit ultraviolet light emitting device and the unit ultraviolet light emitting device and a diameter d of the light converging lens satisfy a condition of 1.0c <d <2.5c. 5. The method according to any one of claims 1 to 4,
Wherein the light source panel and the optical panel are supported so as to be unitized in a detachable state in an exposure apparatus. 5. The method according to any one of claims 1 to 4,
Wherein the light source panel and the optical panel are further provided with a heat dissipating means around the light source panel and the optical panel. A driving means for driving the exposure table so as to be movable on the XY plane coordinates; and a controller for controlling the driving means to emit illumination light to the mask for forming the exposure pattern of the substrate A light source module unit for exposure, an optical system provided between the substrate and the light source module unit for exposure, and control means for controlling the driving means and the light source unit for exposure in conjunction with each other,
The light source module unit for exposure,
A light source panel in which a plurality of unit ultraviolet light emitting elements are mounted on a support panel by being mounted on a circuit board in an array structure in a matrix form;
A plurality of unit condensing lenses arranged on the light output side of the light emitting device so as to face the light source panel are disposed at the centers of the ultraviolet light emitting element arrays on the light source panel with respect to the main light axis, And an optical panel provided in an array structure of a matrix type in a state of being eccentric to an arbitrary reference center axis line side passing through the optical axis,
A distance between the ultraviolet light-emitting device and the light-receiving area (A) from the ultraviolet light-emitting device to the light-receiving area (A) x "between the center axis of each of the ultraviolet light emitting elements and the center axis of the condensing lens, and the distance" c "between the center of the light collecting lens and the center axis of the condensing lens, The relationship of the diameter "t" is set such that the reference of the eccentric distance "x" of the condensing lens satisfies "x = b * c / a"<x<bc (2b + t) / 2ab "is satisfied. 12. The method of claim 11,
Wherein the unit condenser lens is arranged in a matrix-like array in which an amount of eccentricity with respect to the main optical axis of the corresponding unit ultraviolet light-emitting device is increased as the unit condenser lens is disposed closer to an edge at an arbitrary reference center axis line side passing through the center of the ultraviolet light- And condenses the diffused light emitted from each of the unit ultraviolet light emitting elements into a light receiving area set in the optical system of the exposure apparatus. delete
KR1020150107835A 2015-07-30 2015-07-30 UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same KR101593963B1 (en)

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KR1020150107835A KR101593963B1 (en) 2015-07-30 2015-07-30 UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same
TW104135369A TWI579658B (en) 2015-07-30 2015-10-28 Uv led light source module unit for exposure photolithography process and exposure photolithography apparatus used the same
CN201510726723.4A CN106406033B (en) 2015-07-30 2015-10-30 For the light source module unit of exposure and the exposure device including the light source module unit
CN201520858315.XU CN205103540U (en) 2015-07-30 2015-10-30 A exposure device for making public light source module unit and including this light source module unit

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CN106406033B (en) 2019-05-03

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