KR101095002B1 - The manufacturing methods of low temperature and low dielectric constant transparent dielectric layer and paste for soda-lime glass substrate in Plasma Display Panel - Google Patents

The manufacturing methods of low temperature and low dielectric constant transparent dielectric layer and paste for soda-lime glass substrate in Plasma Display Panel Download PDF

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KR101095002B1
KR101095002B1 KR1020090079148A KR20090079148A KR101095002B1 KR 101095002 B1 KR101095002 B1 KR 101095002B1 KR 1020090079148 A KR1020090079148 A KR 1020090079148A KR 20090079148 A KR20090079148 A KR 20090079148A KR 101095002 B1 KR101095002 B1 KR 101095002B1
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transparent dielectric
low
composition
display panel
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KR20110021378A (en
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최병현
지미정
안용태
장우석
고영수
김세기
배현
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한국세라믹기술원
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/38—Dielectric or insulating layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/476—Tin oxide or doped tin oxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/944—Layers comprising zinc oxide

Abstract

본 발명은 현재 사용하고 있는 고왜점을 갖으면서 고가인 PDP용 기판을 저가이면서 현재기판보다 60℃ 낮은 전이온도를 갖는 소다라임(Soda lime silicate)유리에 적용이 가능한 무연(non-Pb)이고, 중금속이면서 고유전율을 갖는 Bi계가 아닌 친환경 저융점 투명 유전체조성으로 P2O5 30내지 35몰%, ZnO 10 내지 20몰%, CaO 10내지 20몰%이고 잔부는 SnO2인 조성물에 상기 조성물 대비 Al2O3필러를 5내지 10 중량% 포함하는 것을 특징으로 한다. 환경 유해물질인 납(Pb)이나 비스무스(Bi)를 함유하지 않기 때문에 환경 친화적인 특징을 가지며, 265~321℃의 낮은 전이온도와 높은 가시광선 투과율 및 8~10의 낮은 유전상수를 가짐으로 플라즈마 디스플레이용 패널(PDP) 투명 유전체의 제조에 유용하게 사용 될 수 있다.The present invention is a lead-free (non-Pb) that can be applied to soda lime silicate glass having a high distortion point and expensive PDP substrate at a low temperature and 60 ℃ lower than the current substrate, It is a heavy metal and high dielectric constant, non-bi-friendly, low-energy transparent dielectric composition of P 2 O 5 30 to 35 mol%, ZnO 10 to 20 mol%, CaO 10 to 20 mol% and the balance is SnO 2 composition compared to the composition It characterized in that it comprises 5 to 10% by weight of Al 2 O 3 filler. It does not contain lead (Pb) or bismuth (Bi), which is an environmentally harmful substance.It is environmentally friendly and has a low transition temperature of 265 ~ 321 ℃, high visible light transmittance and low dielectric constant of 8 ~ 10. Display panel (PDP) can be usefully used in the manufacture of a transparent dielectric.

Description

소다라임 유리 기판에 적용이 가능한 플라즈마 디스플레이 패널용 투명유전체 조성물 및 그 제조 방법{The manufacturing methods of low temperature and low dielectric constant transparent dielectric layer and paste for soda-lime glass substrate in Plasma Display Panel}The transparent dielectric composition for a plasma display panel that can be applied to a soda lime glass substrate, and a method for manufacturing the same.

본 발명은 기존에 플라즈마 디스플레이용 패널(PDP)에 사용되어 온 PbO계 투명유전체를 대체하면서 전이온도가 60℃ 낮은 재료의 개발에 관한 것으로, 종래의 투명유전체가 갖는 특성을 유지 또는 향상 시키면서 친환경적이고, 또한 소다라임 기판에 적용키 위해 현재 580℃에서 사용한 투명유전체를 500℃이하에서 저온소성이 가능하게끔 대체 할 수 있는 무연(Pb-free)투명유전체의 개발에 관한 것이다. 이와같이 본 발명은 투명유전체 유리 조성물에 인쇄용 유리페이스트에 사용되는 수지, 용제 및 유기용매를 사용하여 투명유전체용 페이스트를 제조하는 기술분야이다.The present invention relates to the development of a material having a low transition temperature of 60 ° C. while replacing a PbO-based transparent dielectric that has previously been used in a plasma display panel (PDP). In addition, the present invention relates to the development of Pb-free transparent dielectric material that can replace the transparent dielectric currently used at 580 ° C for low temperature baking below 500 ° C for application to soda-lime substrate. As described above, the present invention is a technical field for preparing a transparent dielectric paste using a resin, a solvent, and an organic solvent used for printing glass paste in a transparent dielectric glass composition.

종래의 플라즈마 디스플레이 패널에 사용되는 투명 유전체용 유리 조성물은 전면 유리 기판의 열적 특성에 맞추어서 낮은 소성온도, 기판과 비슷한 열팽창계 수, 적당한 유전상수 특성을 지닌 PbO, B2O3 및 SiO2를 주성분으로 하였다.The glass composition for transparent dielectrics used in the conventional plasma display panel is composed of PbO, B 2 O 3 and SiO 2 having low firing temperature, thermal expansion coefficient similar to that of the substrate, and suitable dielectric constant characteristics in accordance with the thermal characteristics of the front glass substrate. It was made.

현재 PDP의 상용 투명유전체로 쓰이고 있는 조성은 낮은 융점을 갖고, 열처리 전후에 물리적, 화학적으로 고 안정성을 갖는 PbO 조성을 대부분 함유하고 있다. 그러나 PbO 성분은 유리 내에서는 안정하나, 폐기시 산성비등의 산에 용해되어 Pb이온으로 용출되어 토양 및 수질오염을 비롯한 환경공해를 유발시키고 인체에 유해한 영향을 주는 문제점을 가지고 있다. 또한, 납(Pb)을 함유하지 않고 저온소성용 대체 조성으로 사용되고 있는 Bi2O3계 유리 역시 독극물로 분류되면서 고유전율을 갖기 때문에 중금속 성분을 포함한 비친환경적인 물질이어서 적합한 조성이 못된다. Currently, the composition used as a commercial transparent dielectric of PDP has a low melting point and contains most of the PbO composition which is physically and chemically stable before and after heat treatment. However, the PbO component is stable in glass, but when dissolved, it is dissolved in acid such as acid rain, eluted with Pb ions, causing environmental pollution including soil and water pollution, and having a harmful effect on the human body. In addition, Bi 2 O 3 glass, which does not contain lead (Pb) and is used as an alternative composition for low temperature firing, also has a high dielectric constant as it is classified as a poison, so it is not an environmentally friendly material including heavy metal components, and thus is not a suitable composition.

이에, 일본 공개특허 제2001-89187호에서는 ZnO-B2O3-SiO2유리 조성계에 Li2O, Na2O, K2O의 알칼리 산화물, 또는 LiF, NaF, KF의 알칼리 불화물을 첨가하여 무연 유리조성물을 제조하는 것을 제시하고 있다. 그러나, 알칼리 금속이온은 유리 내에서 이동도가 매우 커서, 투명 유전체를 소성할 경우 인접해 있는 Ag전극과 이온교환반응을 일으켜 황변현상을 유발하여 투명유전체의 투과율 및 패널의 휘도를 저하시키는 문제점을 가지고 있어 무연 저융점유리의 목적에 부합되지 않는다는 문제점이 제기되고 있다.In Japanese Patent Laid-Open No. 2001-89187, an alkali oxide of Li 2 O, Na 2 O, K 2 O, or an alkali fluoride of LiF, NaF, KF is added to a ZnO-B 2 O 3 -SiO 2 glass composition system. It is proposed to prepare a lead-free glass composition. However, alkali metal ions have very high mobility in glass, and when firing transparent dielectrics, ion exchange reactions with adjacent Ag electrodes cause yellowing, which reduces the transmittance of the transparent dielectric and the brightness of the panel. The problem has been raised that it does not meet the purpose of lead-free low melting glass.

따라서, 본 발명의 목적은 종래 Pb, Bi를 주성분으로 하거나 B2O3-ZnO(BaO) 조성분에 많은 양의 알카리 또는 불화물을 포함한 알카리계를 포함하는 투명유전체에서 인체에 유해한 중금속인 납(Pb) 또는 (Bi)를 포함하지 않거나 고가인 불화물을 포함하지 않으면서도 열적, 광학적으로 안정하며 저온 소성이 가능한 소다라임기판유리에 적용 가능한 PDP 투명 유전체용 유리조성물을 제공하며, 유리조성물에 적합한 수지, 용제 및 유기용매를 사용하여 페이스트를 제조하는 방법을 제공하는 것이다.Accordingly, an object of the present invention is lead (Pb), which is a heavy metal harmful to the human body in a transparent dielectric including an alkali-based compound containing a large amount of alkali or fluoride in a conventional Pb, Bi or B 2 O 3 -ZnO (BaO) composition It provides a glass composition for PDP transparent dielectric material that can be applied to soda-lime substrate glass that does not contain or (Bi) or does not contain expensive fluoride and can be thermally, optically stable, and can be fired at low temperature. It is to provide a method for producing a paste using a solvent and an organic solvent.

상기와 같은 목적을 달성하기 위한 본 발명에 따른 플라즈마디스플레이패널(PDP)용 소다라임 유리 기판에 적합한 저온, 저유전율 투명유전체 조성 및 페이스트 제조 방법은 30내지 35몰% P2O5, 10내지 20몰% ZnO, 10내지 20몰% CaO이고 잔부는 SnO2인 조성물에 상기 조성물 대비 중량%로 Al2O3를 5내지 10 첨가하여 구성되는 소다라임유리기판용 플라즈마 디스플레이 패널의 상판유전체용 유리 조성물을 갖는 것을 특징으로 한다. Low temperature, low dielectric constant transparent dielectric composition and paste manufacturing method suitable for the soda-lime glass substrate for plasma display panel (PDP) according to the present invention for achieving the above object is 30 to 35 mol% P 2 O 5 , 10 to 20 mol% ZnO, 10 to 20 mole% CaO and a cup portion SnO 2 the composition of the upper dielectric glass composition of the soda-lime glass substrate, a plasma display panel that is configured to 5-10 the addition of Al 2 O 3 as compared to% by weight of the composition Characterized in having a.

이상 설명한 바와 같이 본 발명은 플라즈마 디스플레이 패널용 투명유전체 제조에 관한 것으로서 P2O5 30~35몰%, ZnO 10내지 20몰%, CaO 10내지 20몰%이고 잔부는 SnO2의 조성으로 1100℃에서 자당(sucrose)을 첨가하여 용융 한 후 이 용융물을 분쇄한 후 이 용융물에 필러로 중량%로 Al2O3 5 내지 10 첨가하여 기존의 Pb, Bi를 포함하는 투명유전체의 특성을 유지 혹은 배가 시키면서, 중금속이 포함되지 않아 제품 폐기시 환경오염 및 생태계 파괴의 문제점을 근본적으로 해결할 수 있고 인체에 무해하며, 열적, 광학적 및 전기적으로 안정하고 연화점이 낮고, 또한, 저온 분해가 가능한 니트로셀룰로스 또는 에틸셀룰로스를 사용하여 유기바인더의 분해를 촉진시켜 기포의 발생을 억제할 수 있을 뿐만 아니라, 발생된 기포를 쉽게 이탈시킬 수 있게 된다. 따라서 본 발명에 의한 조성물을 사용하여 유전체를 형성하는 경우, 450-500℃에서의 저온 소성이 가능하며 PDP 투명 유전체의 제조에 유용하게 사용 될 수 있다.As described above, the present invention relates to the manufacture of transparent dielectrics for plasma display panels, wherein 30 to 35 mol% of P 2 O 5 , 10 to 20 mol% of ZnO, and 10 to 20 mol% of CaO are present, and the balance is 1100 ° C. in the composition of SnO 2 . Sucrose is melted by adding and then the melt is pulverized, and the melt is added to Al 2 O 3 5 to 10% by weight with a filler to maintain or double the characteristics of the existing transparent dielectrics containing Pb and Bi. However, it does not contain heavy metals, so it can fundamentally solve the problems of environmental pollution and ecosystem destruction when disposing of the product, is harmless to the human body, is thermally, optically and electrically stable, has a low softening point, and can be decomposed at low temperature. Cellulose can be used to promote the decomposition of the organic binder to suppress the generation of bubbles, as well as to easily escape the generated bubbles. Therefore, when the dielectric is formed using the composition according to the present invention, low-temperature baking at 450-500 ° C. is possible and may be usefully used in the production of PDP transparent dielectric.

본 발명은 플라즈마 디스플레이 패널용으로 P2O5 30~35몰%, ZnO 10~20몰%, CaO 10~20몰%이고 잔부는 SnO2의 조성물에 상기 조성물 대비에 5내지 10중량%의 Al2O3필러로 구성되며 현재기판보다 60℃ 낮은 전이온도를 갖는 소다라임 기판유리에 적용 가능한 투명유전체 조성물에 관한 것으로 500℃이하의 온도에서 저온소성이 가능한 특징이 있다. 상기 조성물의 유전상수는 8~10이며 유리화 전이온도는 265~321℃이다. 또한, 본 발명에서 사용한 인쇄용 유리페이스트에 사용되는 수지 및 용제는 유기용매 a-Terpineol, Butyl Carbitol Aceatate를 1:1 비율로 혼합하여 니트로셀룰로스와 수지를 사용하였다. 본 발명에 의한 조성물에서 사용될 수 있는 유기용제로는 특별한 제한은 없으나 에틸셀룰로스, 니트로셀룰로스 및 아크릴수지로 이루어진 군에서 선택되는 한 종류 이상이나 두 종류이상을 혼합하여 사용하는 것이다. The present invention is a plasma display panel for P 2 O 5 30-35 mol%, ZnO 10-20 mol%, CaO 10-20 mol% and the balance is 5 to 10% by weight of Al in the composition of SnO 2 The present invention relates to a transparent dielectric composition composed of 2 O 3 fillers and applicable to soda-lime substrate glass having a transition temperature of 60 ° C. lower than a current substrate. The dielectric constant of the composition is 8 ~ 10 and the vitrification transition temperature is 265 ~ 321 ℃. In addition, the resin and solvent used in the printing glass paste used in the present invention were mixed with organic solvents a-Terpineol and Butyl Carbitol Aceatate in a 1: 1 ratio to use nitrocellulose and a resin. The organic solvent that can be used in the composition according to the present invention is not particularly limited, but one or more selected from the group consisting of ethyl cellulose, nitrocellulose and acrylic resin is used.

(실시 예 1)(Example 1)

산화주석(SnO2), 오산화인(P2O5), 산화아연(ZnO), 산화칼슘(CaO)을 표1과 같은 몰비로 천칭하여 혼합한 다음. 혼합물을 알루미나 도가니에 넣고 대기분위기에서 환원제로 자당(sucrose)을 일정량 첨가 후 900~1100℃까지 승온 시킨 후 10~30분 유지한 후 도가니 내 용융물을 흘러내려 공기로 급냉하였다. 그리고 이 급냉물을 1차 조분쇄, 2차 미분쇄 과정을 거쳐 3~5㎛의 평균입경을 가지는 투명유전체용 유리분말을 제조하였다. 제조 된 조성물의 유전상수는 impedence analyzer를 이용하여 상온, 1MHz에처 측정을 진행하였다. 이때, 시편의 크기는 1×1×0.3(cm)였고, 전극 면은 Ag전극을 사용하였다. 또한, 전이온도, 연화온도 및 열팽창계수를 측정하기 위해 TMA(Linseis DMA L77)를 사용하여 승온속도 10℃/min으로 측정하였다. 시편의 준비는 5×5×15(mm)의 크기로 제작하여 측정하였다. 제조 된 조성물의 전이점은 265~314℃였으며, 열팽창계수의 경우 91~118×10-7/℃의 값을 나타내었고 유전상수 값은 9.2~9.6을 나타내었다.Tin oxide (SnO 2 ), phosphorus pentoxide (P 2 O 5 ), zinc oxide (ZnO), and calcium oxide (CaO) are mixed in the molar ratios shown in Table 1 and then mixed. The mixture was placed in an alumina crucible, sucrose was added as a reducing agent in an air atmosphere, and then heated to 900 to 1100 ° C., and then maintained for 10 to 30 minutes, followed by quenching the melt in the crucible with air. The quenched product was then subjected to primary coarse grinding and second fine grinding to prepare a glass powder for transparent dielectric material having an average particle diameter of 3 to 5 μm. Dielectric constant of the prepared composition was measured at room temperature, 1MHz using an impedence analyzer. At this time, the size of the specimen was 1 × 1 × 0.3 (cm), the Ag electrode was used as the electrode surface. In addition, in order to measure the transition temperature, the softening temperature and the coefficient of thermal expansion, TMA (Linseis DMA L77) was used to measure the temperature increase rate at 10 ° C / min. Preparation of the specimen was made by measuring the size of 5 × 5 × 15 (mm). The transition point of the prepared composition was 265 ~ 314 ℃, the coefficient of thermal expansion was 91 ~ 118 × 10 -7 / ℃ and the dielectric constant value was 9.2 ~ 9.6.

Figure 112009052295253-pat00001
Figure 112009052295253-pat00001

(실시 예 2)(Example 2)

투명유전체 조성물을 표 1과 같은 몰%비로 천칭하여 혼합한 다음, 혼합물을 알루미나 도가니에 넣고 대기분위기에서 1400℃, 질소분위기에서 1000℃, 환원제로 자당(sucrose)를 일정량 첨가 후 900~1100℃까지 승온 시킨 후 10~30분 유지한 후 도가니내 용융물을 흘러내려 공기로 급냉하였다. 급냉 용융물을 X-선 회절분석기를 사용하여 결정여부를 평가한 결과를 도 1에 나타내었고, 공기분위기에서 1400℃로 용융 시 결정상이 나타났고 N2분위기에서 1000℃에서 용융할 경우와 환원제로 자당(sucrose)을 일정량 첨가하여 900~1100℃에서 용융하였을 때 비정질상을 나타냄을 알 수 있었다.The transparent dielectric composition was mixed by mixing in a molar% ratio as shown in Table 1, and then the mixture was placed in an alumina crucible and then 1400 ° C. in an air atmosphere, 1000 ° C. in a nitrogen atmosphere, and sucrose was added as a reducing agent to 900-1100 ° C. After the temperature was raised and maintained for 10 to 30 minutes, the melt in the crucible was flowed down and quenched with air. The results of evaluating the crystallization of the quenched melt using an X-ray diffractometer are shown in FIG. 1. In the air atmosphere, the crystalline phase appeared when melted at 1400 ° C. and melted at 1000 ° C. in a N 2 atmosphere. A certain amount of (sucrose) was added, and it was found that the amorphous phase appeared when melted at 900 ~ 1100 ℃.

(실시 예 3)(Example 3)

실시예 2에서는 실시예 1에서 나타난 35 몰% SnO2, 35몰% P2O5, 30몰% ZnO의 투명유전체용 유리분말 조성물에 상기 조성물 대비 10㎛인 Al2O3를 중량%로 0, 5, 및 10을 각각 첨가했을 때의 투과율의 변화를 나타내었다. 광투과율의 경우 UV-VIS(Simazu, 2401, Japan)을 이용하여 측정하였다. 소성된 투명유전체 막에 대해서 빛의 300~800nm파장대에서의 투과율 범위에서 기준파장 550nm에서 직진광 투과율로 측정하였다. 또한 실시예 1에서와 같이 유전상수, 열팽창계수, 전이온도, 연화온도등을 측정하였다. [표 2]에 나타낸것 처럼 필러로 Al2O3 첨가량이 증가 할수록 유전상수는 9.3에서 8.9로, 열팽창계수는 92×10-7/℃에서 84×10-7/℃로 감소하였고 투과율은 77%에서 82%로, 전이온도는 310℃에서 321℃로 연화온도는 332℃에서 362℃로 증가함을 알 수 있었다.In Example 2, in the glass powder composition for transparent dielectric material of 35 mol% SnO 2, 35 mol% P 2 O 5, and 30 mol% ZnO shown in Example 1, Al 2 O 3 having a thickness of 10 μm compared to the composition was 0% by weight. The change of the transmittance | permeability when adding, 5, and 10 respectively was shown. Light transmittance was measured using UV-VIS (Simazu, 2401, Japan). The fired transparent dielectric film was measured with a linear light transmittance at a reference wavelength of 550 nm in a transmittance range of 300 to 800 nm wavelength of light. In addition, as in Example 1, the dielectric constant, thermal expansion coefficient, transition temperature, softening temperature, and the like were measured. As shown in Table 2, as the amount of Al 2 O 3 added to the filler increased, the dielectric constant decreased from 9.3 to 8.9, the coefficient of thermal expansion decreased from 92 × 10 -7 / ℃ to 84 × 10 -7 / ℃, and the transmittance was 77 From% to 82%, the transition temperature was increased from 310 ℃ to 321 ℃ softening temperature was found to increase from 332 ℃ to 362 ℃.

Figure 112011037422217-pat00004
Figure 112011037422217-pat00004

(실시 예 4)(Example 4)

상기의 투명유전체용 조성물인 유리분말 70중량%, Al2O3 필러를 10중량%, 바인더가 혼입된 비히클(바인더: 니트로셀룰로스, 유기용제: a-테르피네올/부틸카비톨아세테이트)를 20중량% 넣고 30분 동안 고속혼합기를 이용하여 충분히 교반시켰다. 충분히 교반된 슬러리를 3-roll mill을 사용하여 밀링한 후 진공펌프를 이용하여 탈포하여 페이스트를 제조하였다. 이 투명유전체용 페이스트를 소다라임 기판에 SiO2 또는 Al2O3를 코팅한 후, 그 위에 ITO를 sputter로 코팅한 면에 유전체용 페이스트를 스크린인쇄기로 인쇄 한 후, 건조 및 열처리하여 소다라임유리기판위에 PDP 투명 유전체층을 형성하였다.70 wt% glass powder, 10 wt% Al 2 O 3 filler as the composition for the transparent dielectric material, and a vehicle (binder: nitrocellulose, organic solvent: a-terpineol / butyl carbitol acetate) in which a binder was mixed 20 wt% was added and stirred sufficiently using a high speed mixer for 30 minutes. The sufficiently stirred slurry was milled using a 3-roll mill and then degassed using a vacuum pump to prepare a paste. After coating the transparent dielectric paste with SiO 2 or Al 2 O 3 on the soda-lime substrate, printing the dielectric paste with a screen printer on the surface coated with sputtered ITO thereon, drying and heat-treating the soda-lime glass A PDP transparent dielectric layer was formed on the substrate.

도 1은 급냉 용융물을 Ｘ선 회절 분석기에 의해 분석한 투명유전체 조성물의 상태도.1 is a state diagram of a transparent dielectric composition in which a quench melt is analyzed by an X-ray diffraction analyzer.

Claims (4)

P2O5, 30내지35몰%, Cao 10내지 20몰%, Zno 10내지 20몰% 이고 잔부는 SnO2인것을 특징으로 하는 소다 라임 유리 기판에 적용이 가능한 플라즈마 디스플레이 패널용 투명 유전체 조성물. P 2 O 5, 30 to 35 mol%, Cao 10 to 20 mol%, Zno 10 to 20 mol% and the balance is SnO 2 The transparent dielectric composition for a plasma display panel applicable to a soda lime glass substrate. 삭제delete 제 1항에 있어서,The method of claim 1, 상기 투명 유전체 조성물에 상기 유전체 조성물 대비 Al2O3필러를 5내지 10 중량% 첨가하는 것을 특징으로 하는 소다라임 유리기판에 적용이 가능한 플라즈마 디스플레이 패널용 투명 유전체 조성물.A transparent dielectric composition for plasma display panel, which is applicable to a soda lime glass substrate, characterized in that 5 to 10 wt% of Al 2 O 3 filler is added to the transparent dielectric composition. 제 1항의 투명 유전체 조성물에 유리분말 70중량%, Al2O3필러 5내지 10중량%, 잔부는 유기용매이고 환원재로 자당(sucrose)을 첨가하여 대기분위기하에서 900~1100℃로 가열하여 용융하고 공기로 급냉하는 것을 특징으로 하는 소다라임 유리기판에 적용이 가능한 플라즈마 디스플레이 패널용 투명유전체 제조방법. 70% by weight of the glass powder, 5 to 10% by weight of the Al 2 O 3 filler, the remainder of the transparent dielectric composition of claim 1, the remainder is an organic solvent, and sucrose is added as a reducing material and heated to 900 to 1100 ° C. under an air atmosphere for melting. And quenching with air, wherein the transparent dielectric manufacturing method for a plasma display panel is applicable to a soda lime glass substrate.
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