KR100947645B1 - Manufacture method for FePt magnetic thin film - Google Patents

Manufacture method for FePt magnetic thin film Download PDF

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KR100947645B1
KR100947645B1 KR1020080018273A KR20080018273A KR100947645B1 KR 100947645 B1 KR100947645 B1 KR 100947645B1 KR 1020080018273 A KR1020080018273 A KR 1020080018273A KR 20080018273 A KR20080018273 A KR 20080018273A KR 100947645 B1 KR100947645 B1 KR 100947645B1
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thin film
magnetic thin
fept
electrolytic deposition
heat treatment
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KR20090092987A (en
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이찬규
페이 리
김태훈
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창원대학교 산학협력단
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
    • H01F41/26—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Abstract

본 발명은 FePt 자성박막의 제조방법을 제공하기 위한 것으로, 전해증착법을 이용하여 FePt 박막을 증착시키는 전해증착 단계와; 상기 전해증착 단계 후 열처리를 수행하여 규칙화된 상을 갖는 FePt 자성박막을 제조하는 열처리 단계;를 포함하여 구성함으로서, 전기화학적 방법인 전해증착법을 이용하고, 박막증착 후 열처리를 통하여 규칙화된 상을 얻어 수직자기 이방성을 가지는 L10 구조의 FePt 자성박막을 제조할 수 있게 되는 것이다.The present invention is to provide a method for producing a FePt magnetic thin film, an electrolytic deposition step of depositing a FePt thin film using an electrolytic deposition method; A heat treatment step of manufacturing a FePt magnetic thin film having a regularized phase by performing heat treatment after the electrolytic deposition step; and by using, an electrochemical deposition method, which is an electrochemical method, and a regular phase through heat treatment after thin film deposition The FePt magnetic thin film having an L1 0 structure having vertical magnetic anisotropy can be obtained.

FePt, 자성박막, 자기기록매체, 이방성, 보자력, 전해증착 FePt, magnetic thin film, magnetic recording medium, anisotropy, coercive force, electrolytic deposition

Description

ＦｅＰｔ 자성박막의 제조방법{Manufacture method for FePt magnetic thin film}Manufacture method for FePt magnetic thin film

본 발명은 FePt 자성박막의 제조방법에 관한 것으로, 특히 전기화학적 방법인 전해증착법을 이용하고, 박막증착 후 열처리를 통하여 규칙화된 상을 얻어 수직자기 이방성을 가지는 L10 구조(face-centered tetragonal phase)의 FePt 자성박막을 제조하기에 적당하도록 한 FePt 자성박막의 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a FePt magnetic thin film, and in particular, by using an electrochemical deposition method, an electrochemical deposition method, an L1 0 structure (face-centered tetragonal phase) having vertical magnetic anisotropy by obtaining a regular phase through heat treatment after thin film deposition. The present invention relates to a method for producing a FePt magnetic thin film, which is suitable for producing a FePt magnetic thin film.

일반적으로 FePt 자성박막은 자기기록매체에 적용된다.In general, FePt magnetic thin films are applied to magnetic recording media.

자기기록은 비휘발성, 대용량, 낮은 비트(Bit) 단가, 그리고 비교적 높은 액세스(access) 속도 등의 특징을 활용하며, 정보화 사회를 리드하는 중요한 메모리 기술로서 그 위치를 점유하고 있다.Magnetic recording takes advantage of nonvolatile, large capacity, low bit cost, and relatively high access speed and occupies its position as an important memory technology that leads the information society.

고밀도 자기기록매체로의 활용을 위하여 수직자기 이방성 및 높은 보자력을 가지는 FePt 자석박막의 제조기술에 대해서는 현재 많은 연구가 진행되고 있으나, 본 발명에서는 전기화학적인 방법인 전해증착법을 이용하였으며, 박막증착 후 열처리를 통하여 규칙화된 상을 얻는 방법적 특징을 갖는다.Currently, many researches have been conducted on the manufacturing technology of FePt magnetic thin films having vertical magnetic anisotropy and high coercivity in order to be used as a high density magnetic recording medium. It has a methodological characteristic of obtaining a regularized phase through heat treatment.

이에 본 발명은 상기와 같은 종래의 제반 문제점을 해결하기 위해 제안된 것으로, 본 발명의 목적은 전기화학적 방법인 전해증착법을 이용하고, 박막증착 후 열처리를 통하여 규칙화된 상을 얻어 수직자기 이방성을 가지는 L10 구조의 FePt 자성박막을 제조할 수 있는 FePt 자성박막의 제조방법을 제공하는데 있다.Therefore, the present invention has been proposed to solve the conventional problems as described above, and an object of the present invention is to use the electrochemical deposition method, which is an electrochemical method, and to obtain a normalized phase through heat treatment after thin film deposition, to obtain perpendicular magnetic anisotropy. It has to provide a method of manufacturing FePt magnetic thin film capable of producing an FePt magnetic thin film of the L1 0 structure.

도 1은 본 발명의 일 실시예에 의한 FePt 자성박막의 제조방법을 보인 흐름도이다.1 is a flowchart illustrating a method of manufacturing a FePt magnetic thin film according to an embodiment of the present invention.

이에 도시된 바와 같이, 전해증착법을 이용하여 FePt 박막을 증착시키는 전해증착 단계(ST1 ~ ST6)와; 상기 전해증착 단계 후 열처리를 수행하여 규칙화된 상을 갖는 FePt 자성박막을 제조하는 열처리 단계(ST7);를 포함하여 수행하는 것을 특징으로 한다.As shown therein, an electrolytic deposition step of depositing a FePt thin film using an electrolytic deposition method (ST1 to ST6); And a heat treatment step (ST7) of manufacturing a FePt magnetic thin film having a regular phase by performing heat treatment after the electrolytic deposition step.

상기 전해증착 단계는, 버퍼 폴리싱, 초음파 세척, 전해 폴리싱, 산세, 세척, 박막증착을 순차적으로 수행하는 것을 특징으로 한다.The electrolytic deposition step is characterized in that the buffer polishing, ultrasonic cleaning, electrolytic polishing, pickling, washing, thin film deposition are performed sequentially.

상기 전해증착 단계는, 양극으로는 Pt 와이어를 사용하고, 음극으로는 Cu 기판을 사용하며, 기준전극으로는 Ag.Agcl(SCE) 전극을 사용하고, Agar & KCL 브릿지를 음극과 양극 사이에 연결하고, 전해액이 첨가된 전해증착 장비를 이용하여 수행하는 것을 특징으로 한다.In the electrolytic deposition step, a Pt wire is used as an anode, a Cu substrate is used as a cathode, an Ag. Agcl (SCE) electrode is used as a reference electrode, and an Agar & KCL bridge is connected between the cathode and the anode. And, it is characterized in that performed using the electrolytic deposition equipment to which the electrolyte is added.

상기 전해액은, 0.5~5 mmol/l H2PtCl6, 0.5~5 mmol/l FeSO4, 0.125~1 mol/l Na2SO4, 및 0.1~0.5 mmol/l glycine으로 구성된 것을 특징으로 한다.The electrolyte solution is characterized by consisting of 0.5-5 mmol / l H 2 PtCl 6 , 0.5-5 mmol / l FeSO 4 , 0.125-1 mol / l Na 2 SO 4 , and 0.1-0.5 mmol / l glycine.

상기 전해액은, Fe2+의 산화방지를 위하여 소량의 시크린산이 첨가된 것을 특징으로 한다.The electrolyte solution is characterized in that a small amount of citric acid is added to prevent oxidation of Fe 2+ .

상기 전해액은, pH를 2~4로 조절하기 위하여 H2SO4 가 첨가된 것을 특징으로 한다.The electrolyte is characterized in that H 2 SO 4 is added to adjust the pH to 2-4.

상기 전해증착 단계는, 전해증착 중 전해액이 교반되도록 초고순도 질소가스를 주입하는 것을 포함하는 수행하는 것을 특징으로 한다.The electrolytic deposition step is characterized in that it comprises performing the injection of ultra-high purity nitrogen gas so that the electrolyte solution during electrolytic deposition.

상기 Cu 기판은, 증착면을 제외하고 실리콘 패킹된 것을 특징으로 한다.The Cu substrate is silicon-packed except for the deposition surface.

상기 열처리 단계는, 550도~650도에서 수행되는 것을 특징으로 한다.The heat treatment step is characterized in that performed at 550 ~ 650 degrees.

본 발명에 의한 FePt 자성박막의 제조방법은 전기화학적 방법인 전해증착법을 이용하고, 박막증착 후 열처리를 통하여 규칙화된 상을 얻어 수직자기 이방성을 가지는 L10 구조의 FePt 자성박막을 제조할 수 있는 효과가 있게 된다.FePt magnetic thin film manufacturing method according to the present invention using the electrochemical deposition method of the electrochemical method, by obtaining a regular phase through heat treatment after the thin film can be produced FePt magnetic thin film having an L1 0 structure having a perpendicular magnetic anisotropy It will work.

이와 같이 구성된 본 발명에 의한 FePt 자성박막의 제조방법의 바람직한 실시예를 첨부한 도면에 의거하여 상세히 설명하면 다음과 같다. 하기에서 본 발명을 설명함에 있어 관련된 공지 기능 또는 구성에 대한 구체적인 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우에는 그 상세한 설명을 생략할 것이다. 그리고 후술되는 용어들은 본 발명에서의 기능을 고려하여 정의된 용어들로서, 이는 사용자, 운용자의 의도 또는 판례 등에 따라 달라질 수 있으며, 이에 따라 각 용어의 의미는 본 명세서 전반에 걸친 내용을 토대로 해석되어야 할 것이다.A preferred embodiment of the method for producing a FePt magnetic thin film according to the present invention configured as described above will be described in detail with reference to the accompanying drawings. In the following description of the present invention, detailed descriptions of well-known functions or configurations will be omitted if it is determined that the detailed description of the present invention may unnecessarily obscure the subject matter of the present invention. In addition, terms to be described below are terms defined in consideration of functions in the present invention, which may vary according to intention or precedent of a user or an operator, and thus, the meaning of each term should be interpreted based on the contents throughout the present specification. will be.

먼저 본 발명은 수직자기 이방성을 가지는 L10구조(face-centered tetragonal phase)의 FePt 자성박막을 제조하고자 한 것이다. 고밀도 자기기록매체로의 활용을 위하여 수직자기 이방성 및 높은 보자력을 가지는 FePt 자성박막의 제조는 현재 많은 연구가 진행되고 있으나, 본 발명은 전기화학적 방법인 전해증착법을 이용하였으며, 박막증착 후 열처리를 통하여 규칙화된 상을 얻는 방법적 특징을 가진다.First, the present invention is to produce a FePt magnetic thin film of the L1 0 (face-centered tetragonal phase) structure having a perpendicular magnetic anisotropy. In order to use as a high density magnetic recording medium, the manufacture of FePt magnetic thin films having vertical magnetic anisotropy and high coercive force is currently being studied. However, the present invention uses an electrochemical deposition method, which is an electrochemical method. It has a methodological feature of obtaining a regularized phase.

도 1은 본 발명의 일 실시예에 의한 FePt 자성박막의 제조방법을 보인 흐름도이고, 도 2는 도 1에서 전해증착시 사용되는 전해증착 장비의 모식도이다.1 is a flow chart showing a method for manufacturing a FePt magnetic thin film according to an embodiment of the present invention, Figure 2 is a schematic diagram of the electrolytic deposition equipment used in the electrolytic deposition in FIG.

장비의 모식도는 도 2와 같으며, 양극으로는 순도 99.9%의 Pt wire를 사용하 였다. 음극으로는 90㎛ 두께의 얇은 Cu 기판을 사용하였고 순도는 역시 99.9%를 사용하였다. 기준전극으로 Ag.AgCl (SCE) 전극을 사용하였으며, Agar & KCl 브릿지를 음극과 양극 사이에 연결하여 측정하였다. 전해액의 구성은 다음과 같으며, Fe2+의 산화방지를 위하여 소량의 시크린산를 첨가하였으며, pH를 3으로 조절하기 위하여 H2SO4를 첨가하였다.The schematic diagram of the equipment is shown in FIG. 2, and a Pt wire of 99.9% purity was used as the anode. As a cathode, a thin Cu substrate having a thickness of 90 μm was used, and the purity was also 99.9%. Ag. AgCl (SCE) electrode was used as a reference electrode, and the Agar & KCl bridge was measured by connecting the cathode and the anode. The composition of the electrolyte was as follows. A small amount of cyclic acid was added to prevent oxidation of Fe 2+ , and H 2 SO 4 was added to adjust the pH to 3.

- 전해액의 구성 : 2 mmol/l H2PtCl6, 2 mmol/l FeSO4, 0.525 mol/l Na2SO4, and 0.2 mmol/l glycine (citric acid, H2SO4 첨가)-Composition of electrolyte: 2 mmol / l H 2 PtCl 6 , 2 mmol / l FeSO 4 , 0.525 mol / l Na 2 SO 4 , and 0.2 mmol / l glycine (added citric acid, H 2 SO 4 )

또한 증착 중 전해액의 교반을 위하여 초고순도 질소가스를 주입하였다.In addition, ultra-pure nitrogen gas was injected to stir the electrolyte during deposition.

Cu 기판은 증착면(지름 18mm)을 제외하고, 실리콘 패킹을 하였으며, 잔류응력 제거를 위하여 600℃에서 열처리 된 시편을 사용하였다.Cu substrates were silicon-packed, except for the deposition surface (diameter 18 mm), and specimens heat-treated at 600 ° C. were used to remove residual stress.

도 3은 본 발명에 의해 제조된 FePt 자성박막의 SEM 단면영상을 보인 도면이고, 도 4는 본 발명에 사용된 조성물의 상관관계를 보인 그래프이다.3 is a view showing a SEM cross-sectional image of the FePt magnetic thin film prepared by the present invention, Figure 4 is a graph showing the correlation of the composition used in the present invention.

도 3 및 도 4에서 보이는 바와 같이, -0.8V, 20min 의 조건에서 5:5의 FePt 합금박막을 제조하였다. 막 두께와 조성은 SEM(scanning electron microscopy)과 EDX(energy dispersive X-ray spectroscopy)로 조사하였다.As shown in FIG. 3 and FIG. 4, the FePt alloy thin film of 5: 5 was prepared at -0.8V and 20min. The film thickness and composition were examined by scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX).

도 5는 본 발명에 사용된 FePt 샘플의 전해증착 온도에 따른 XRD 패턴을 보인 그래프이다.5 is a graph showing the XRD pattern according to the electrolytic deposition temperature of the FePt sample used in the present invention.

그래서 열처리 온도에 따른 XRD Pattern을 도 5에서 보였는데, 열처리 온도 550도에서 (002)와 (202) 픽(규칙화 픽)이 분명히 분리되어 나타남에 따라, L10 구조의 박막이 제작되었다고 증명된다. 이는 기존 논문에서 알려진 700도~750도 규칙화 온도에 비하여 150~200도 낮은 온도로써, 규칙화 온도 저감화에 대한 특징적인 개발이 이루어졌음을 증명한다.So was the beam in Figure 5 the XRD Pattern of the heat treatment temperature, the heat treatment temperature of 550 degrees (002) and (202) pick (Rule screen picks) are clearly separated according to appear, a thin film of the L1 0 structure is demonstrated that the production . This is 150 ~ 200 degrees lower than the 700 ~ 750 degrees regular temperature known in the previous paper, which proves that the characteristic development of regularization temperature reduction has been made.

도 6은 본 발명에 의해 제조된 FePt 자성박막의 열처리 온도에 따른 박막 입도와 보자력을 보인 그래프이다.Figure 6 is a graph showing the particle size and coercive force of the FePt magnetic thin film prepared by the present invention according to the heat treatment temperature.

이러한 도 6에서 보여지는 바와 같이 550도 까지의 열처리를 통하여 보자력이 크게 증가하였음을 보여준다.As shown in FIG. 6, the coercive force is greatly increased through the heat treatment up to 550 degrees.

도 7은 본 발명에 의해 제조된 FePt 자성박막의 자기이력곡선을 보인 그래프이다.7 is a graph showing a magnetic history curve of the FePt magnetic thin film prepared according to the present invention.

그래서 도 7에서는 VSM(Vibrating Sample Magnetometer)을 이용한 수직, 수평 자기특성을 조사한 것인데, 보자력 차이를 통하여 수직이방성을 가지는 막의 구조가 형성되었음을 증명해준다.Therefore, in FIG. 7, vertical and horizontal magnetic properties were investigated by using a vibrating sample magnetometer (VSM), which demonstrates that a film having vertical anisotropy was formed through coercive force difference.

이상에서 실시예를 들어 본 발명을 더욱 상세하게 설명하였으나, 본 발명은 반드시 이러한 실시예로 국한되는 것은 아니고, 본 발명의 기술사상을 벗어나지 않는 범위 내에서 다양하게 변형실시될 수 있다. 따라서 본 발명에 개시된 실시예들은 본 발명의 기술적 사상을 한정하기 위한 것이 아니라 설명하기 위한 것이고, 이러한 실시예에 의하여 본 발명의 기술적 사상의 범위가 한정되는 것은 아니다. 본 발명의 보호범위는 청구범위에 의하여 해석되어야 하며, 그와 동등한 범위 내에 있 는 모든 기술적 사상은 본 발명의 권리범위에 포함되는 것으로 해석되어야 할 것이다.Although the present invention has been described in more detail with reference to the examples, the present invention is not necessarily limited to these embodiments, and various modifications can be made without departing from the spirit of the present invention. Therefore, the embodiments disclosed in the present invention are not intended to limit the technical idea of the present invention but to describe the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. The protection scope of the present invention should be interpreted by the claims, and all technical ideas within the equivalent scope should be interpreted as being included in the scope of the present invention.

도 1은 본 발명의 일 실시예에 의한 FePt 자성박막의 제조방법을 보인 흐름도이다.1 is a flowchart illustrating a method of manufacturing a FePt magnetic thin film according to an embodiment of the present invention.

도 2는 도 1에서 전해증착시 사용되는 전해증착 장비의 모식도이다.2 is a schematic view of the electrolytic deposition equipment used in the electrolytic deposition in FIG.

도 3은 본 발명에 의해 제조된 FePt 자성박막의 SEM 단면영상을 보인 도면이다.Figure 3 is a view showing an SEM cross-sectional image of the FePt magnetic thin film prepared by the present invention.

도 4는 본 발명에 사용된 조성물의 상관관계를 보인 그래프이다.4 is a graph showing the correlation of the composition used in the present invention.

도 5는 본 발명에 사용된 FePt 샘플의 전해증착 온도에 따른 XRD 패턴을 보인 그래프이다.5 is a graph showing the XRD pattern according to the electrolytic deposition temperature of the FePt sample used in the present invention.

도 6은 본 발명에 의해 제조된 FePt 자성박막의 열처리 온도에 따른 박막 입도와 보자력을 보인 그래프이다.Figure 6 is a graph showing the particle size and coercive force of the FePt magnetic thin film prepared by the present invention according to the heat treatment temperature.

도 7은 본 발명에 의해 제조된 FePt 자성박막의 자기이력곡선을 보인 그래프이다.7 is a graph showing a magnetic history curve of the FePt magnetic thin film prepared according to the present invention.

Claims (9)

삭제delete 삭제delete 전해증착법을 이용하여 FePt 박막을 증착시키는 전해증착 단계와;An electrolytic deposition step of depositing a FePt thin film using an electrolytic deposition method; 상기 전해증착 단계 후 열처리를 수행하여 규칙화된 상을 갖는 FePt 자성박막을 제조하는 열처리 단계;A heat treatment step of manufacturing a FePt magnetic thin film having a regular phase by performing heat treatment after the electrolytic deposition step; 를 포함하여 수행하고,Including, and 상기 전해증착 단계는,The electrolytic deposition step, 버퍼 폴리싱, 초음파 세척, 전해 폴리싱, 산세, 세척, 박막증착을 순차적으로 수행하고,Buffer polishing, ultrasonic cleaning, electrolytic polishing, pickling, washing, thin film deposition, 상기 전해증착 단계는,The electrolytic deposition step, 양극으로는 Pt 와이어를 사용하고, 음극으로는 Cu 기판을 사용하며, 기준전극으로는 Ag.Agcl(SCE) 전극을 사용하고, Agar & KCL 브릿지를 음극과 양극 사이에 연결하고, 전해액이 첨가된 전해증착 장비를 이용하여 수행하고,Pt wire is used as anode, Cu substrate is used as cathode, Ag.Agcl (SCE) electrode is used as reference electrode, Agar & KCL bridge is connected between cathode and anode, and electrolyte solution is added. Using electrolytic deposition equipment, 상기 Cu 기판은,The Cu substrate, 증착면을 제외하고 실리콘 패킹된 것을 특징으로 하는 FePt 자성박막의 제조방법.FePt magnetic thin film manufacturing method characterized in that the silicon-packed except the deposition surface. 청구항 3에 있어서,The method according to claim 3, 상기 전해액은,The electrolyte solution, 0.5~5 mmol/l H2PtCl6, 0.5~5 mmol/l FeSO4, 0.125~1 mol/l Na2SO4, 및 0.1~0.5 mmol/l glycine으로 구성된 것을 특징으로 하는 FePt 자성박막의 제조방법.Preparation of magnetic magnetic thin film characterized in that composed of 0.5 ~ 5 mmol / l H 2 PtCl 6 , 0.5 ~ 5 mmol / l FeSO 4 , 0.125 ~ 1 mol / l Na 2 SO 4 , and 0.1 ~ 0.5 mmol / l glycine Way. 청구항 3에 있어서,The method according to claim 3, 상기 전해액은,The electrolyte solution, Fe2+의 산화방지를 위하여 소량의 시크린산이 첨가된 것을 특징으로 하는 FePt 자성박막의 제조방법.FePt magnetic thin film manufacturing method characterized in that a small amount of citric acid is added to prevent the oxidation of Fe 2+ . 청구항 3에 있어서,The method according to claim 3, 상기 전해액은,The electrolyte solution, pH를 2~4로 조절하기 위하여 H2SO4 가 첨가된 것을 특징으로 하는 FePt 자성박막의 제조방법.Method for producing a magnetic magnetic thin film characterized in that H 2 SO 4 is added to adjust the pH to 2-4. 청구항 3에 있어서,The method according to claim 3, 상기 전해증착 단계는,The electrolytic deposition step, 전해증착 중 전해액이 교반되도록 초고순도 질소가스를 주입하는 것을 포함하는 수행하는 것을 특징으로 하는 FePt 자성박막의 제조방법.FePt magnetic thin film manufacturing method comprising the step of injecting ultra-high purity nitrogen gas so that the electrolyte solution is stirred during the electrolytic deposition. 삭제delete 청구항 3 내지 청구항 7 중 어느 하나의 항에 있어서,The method according to any one of claims 3 to 7, 상기 열처리 단계는,The heat treatment step, 550도~650도에서 수행되는 것을 특징으로 하는 FePt 자성박막의 제조방법.FePt magnetic thin film manufacturing method characterized in that carried out at 550 ~ 650 degrees.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005226156A (en) * 2004-01-16 2005-08-25 Canon Inc Plating liquid, manufacturing method of structure using the plating liquid and apparatus using the plating liquid
JP2005256045A (en) 2004-03-10 2005-09-22 Tanaka Kikinzoku Kogyo Kk Plating liquid for forming platinum-iron alloy film and plating method
KR100802009B1 (en) 2006-09-04 2008-02-12 창원대학교 산학협력단 Magnetism record medium using fept-b and method for manufacturing thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005226156A (en) * 2004-01-16 2005-08-25 Canon Inc Plating liquid, manufacturing method of structure using the plating liquid and apparatus using the plating liquid
JP2005256045A (en) 2004-03-10 2005-09-22 Tanaka Kikinzoku Kogyo Kk Plating liquid for forming platinum-iron alloy film and plating method
KR100802009B1 (en) 2006-09-04 2008-02-12 창원대학교 산학협력단 Magnetism record medium using fept-b and method for manufacturing thereof

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