KR100863341B1 - 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 - Google Patents

중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 Download PDF

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Publication number
KR100863341B1
KR100863341B1 KR1020080029120A KR20080029120A KR100863341B1 KR 100863341 B1 KR100863341 B1 KR 100863341B1 KR 1020080029120 A KR1020080029120 A KR 1020080029120A KR 20080029120 A KR20080029120 A KR 20080029120A KR 100863341 B1 KR100863341 B1 KR 100863341B1
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KR
South Korea
Prior art keywords
image
camera
scan
semiconductor wafer
lighting means
Prior art date
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KR1020080029120A
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English (en)
Korean (ko)
Inventor
홍기현
나상찬
김태홍
Original Assignee
와이즈플래닛(주)
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Application filed by 와이즈플래닛(주) filed Critical 와이즈플래닛(주)
Priority to KR1020080029120A priority Critical patent/KR100863341B1/ko
Application granted granted Critical
Publication of KR100863341B1 publication Critical patent/KR100863341B1/ko
Priority to PCT/KR2009/001234 priority patent/WO2009119983A2/ko
Priority to JP2011501713A priority patent/JP2011515865A/ja
Priority to CN2009800000812A priority patent/CN101681862B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection

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  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020080029120A 2008-03-28 2008-03-28 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 KR100863341B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020080029120A KR100863341B1 (ko) 2008-03-28 2008-03-28 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템
PCT/KR2009/001234 WO2009119983A2 (ko) 2008-03-28 2009-03-12 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼 검사시스템
JP2011501713A JP2011515865A (ja) 2008-03-28 2009-03-12 重複映像を用いたｆｐｄ基板及び半導体ウエハ検査システム
CN2009800000812A CN101681862B (zh) 2008-03-28 2009-03-12 利用重复图像的fpd基板及半导体晶片检查***

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080029120A KR100863341B1 (ko) 2008-03-28 2008-03-28 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템

Publications (1)

Publication Number Publication Date
KR100863341B1 true KR100863341B1 (ko) 2008-10-15

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ID=40153333

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080029120A KR100863341B1 (ko) 2008-03-28 2008-03-28 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템

Country Status (4)

Country Link
JP (1) JP2011515865A (zh)
KR (1) KR100863341B1 (zh)
CN (1) CN101681862B (zh)
WO (1) WO2009119983A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220149015A (ko) 2021-04-30 2022-11-08 주식회사 바이텍시스템 정전척 및 이를 이용한 기판 검사장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6465722B2 (ja) * 2015-04-06 2019-02-06 株式会社ディスコ 加工装置
KR101972517B1 (ko) * 2017-09-05 2019-05-02 주식회사 에이치비테크놀러지 검사대상체 표면 검사를 위한 듀얼 라인 광학 검사 시스템
JP7102271B2 (ja) * 2018-07-17 2022-07-19 ファスフォードテクノロジ株式会社 半導体製造装置および半導体装置の製造方法
CN111142315A (zh) * 2020-02-25 2020-05-12 北京工业大学 近地激光照明装置
CN113013048A (zh) * 2021-02-24 2021-06-22 上海华力集成电路制造有限公司 晶圆缺陷检测方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990039130A (ko) * 1997-11-10 1999-06-05 윤종용 납땜 검사 장치 및 이에 적합한 검사 방법
JP2000162146A (ja) * 1998-11-24 2000-06-16 Nippon Electro Sensari Device Kk 表面検査装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100345001B1 (ko) * 1998-08-27 2002-07-19 삼성전자 주식회사 기판 납땜 검사용 조명 및 광학 장치
JP3686329B2 (ja) * 2000-08-22 2005-08-24 シーシーエス株式会社 表面検査用照明装置及び表面検査装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990039130A (ko) * 1997-11-10 1999-06-05 윤종용 납땜 검사 장치 및 이에 적합한 검사 방법
JP2000162146A (ja) * 1998-11-24 2000-06-16 Nippon Electro Sensari Device Kk 表面検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220149015A (ko) 2021-04-30 2022-11-08 주식회사 바이텍시스템 정전척 및 이를 이용한 기판 검사장치

Also Published As

Publication number Publication date
WO2009119983A2 (ko) 2009-10-01
JP2011515865A (ja) 2011-05-19
CN101681862B (zh) 2011-08-31
WO2009119983A3 (ko) 2009-11-26
CN101681862A (zh) 2010-03-24

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