KR100863341B1 - 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 - Google Patents
중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 Download PDFInfo
- Publication number
- KR100863341B1 KR100863341B1 KR1020080029120A KR20080029120A KR100863341B1 KR 100863341 B1 KR100863341 B1 KR 100863341B1 KR 1020080029120 A KR1020080029120 A KR 1020080029120A KR 20080029120 A KR20080029120 A KR 20080029120A KR 100863341 B1 KR100863341 B1 KR 100863341B1
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- semiconductor wafer
- lighting means
- Prior art date
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
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- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080029120A KR100863341B1 (ko) | 2008-03-28 | 2008-03-28 | 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 |
PCT/KR2009/001234 WO2009119983A2 (ko) | 2008-03-28 | 2009-03-12 | 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼 검사시스템 |
JP2011501713A JP2011515865A (ja) | 2008-03-28 | 2009-03-12 | 重複映像を用いたfpd基板及び半導体ウエハ検査システム |
CN2009800000812A CN101681862B (zh) | 2008-03-28 | 2009-03-12 | 利用重复图像的fpd基板及半导体晶片检查*** |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080029120A KR100863341B1 (ko) | 2008-03-28 | 2008-03-28 | 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100863341B1 true KR100863341B1 (ko) | 2008-10-15 |
Family
ID=40153333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080029120A KR100863341B1 (ko) | 2008-03-28 | 2008-03-28 | 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼검사시스템 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2011515865A (zh) |
KR (1) | KR100863341B1 (zh) |
CN (1) | CN101681862B (zh) |
WO (1) | WO2009119983A2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220149015A (ko) | 2021-04-30 | 2022-11-08 | 주식회사 바이텍시스템 | 정전척 및 이를 이용한 기판 검사장치 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6465722B2 (ja) * | 2015-04-06 | 2019-02-06 | 株式会社ディスコ | 加工装置 |
KR101972517B1 (ko) * | 2017-09-05 | 2019-05-02 | 주식회사 에이치비테크놀러지 | 검사대상체 표면 검사를 위한 듀얼 라인 광학 검사 시스템 |
JP7102271B2 (ja) * | 2018-07-17 | 2022-07-19 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
CN111142315A (zh) * | 2020-02-25 | 2020-05-12 | 北京工业大学 | 近地激光照明装置 |
CN113013048A (zh) * | 2021-02-24 | 2021-06-22 | 上海华力集成电路制造有限公司 | 晶圆缺陷检测方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990039130A (ko) * | 1997-11-10 | 1999-06-05 | 윤종용 | 납땜 검사 장치 및 이에 적합한 검사 방법 |
JP2000162146A (ja) * | 1998-11-24 | 2000-06-16 | Nippon Electro Sensari Device Kk | 表面検査装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100345001B1 (ko) * | 1998-08-27 | 2002-07-19 | 삼성전자 주식회사 | 기판 납땜 검사용 조명 및 광학 장치 |
JP3686329B2 (ja) * | 2000-08-22 | 2005-08-24 | シーシーエス株式会社 | 表面検査用照明装置及び表面検査装置 |
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2008
- 2008-03-28 KR KR1020080029120A patent/KR100863341B1/ko not_active IP Right Cessation
-
2009
- 2009-03-12 WO PCT/KR2009/001234 patent/WO2009119983A2/ko active Application Filing
- 2009-03-12 CN CN2009800000812A patent/CN101681862B/zh not_active Expired - Fee Related
- 2009-03-12 JP JP2011501713A patent/JP2011515865A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990039130A (ko) * | 1997-11-10 | 1999-06-05 | 윤종용 | 납땜 검사 장치 및 이에 적합한 검사 방법 |
JP2000162146A (ja) * | 1998-11-24 | 2000-06-16 | Nippon Electro Sensari Device Kk | 表面検査装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220149015A (ko) | 2021-04-30 | 2022-11-08 | 주식회사 바이텍시스템 | 정전척 및 이를 이용한 기판 검사장치 |
Also Published As
Publication number | Publication date |
---|---|
WO2009119983A2 (ko) | 2009-10-01 |
JP2011515865A (ja) | 2011-05-19 |
CN101681862B (zh) | 2011-08-31 |
WO2009119983A3 (ko) | 2009-11-26 |
CN101681862A (zh) | 2010-03-24 |
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