KR100813816B1 - 고순도 철 및 고순도 철 타겟 - Google Patents
고순도 철 및 고순도 철 타겟 Download PDFInfo
- Publication number
- KR100813816B1 KR100813816B1 KR1020010059914A KR20010059914A KR100813816B1 KR 100813816 B1 KR100813816 B1 KR 100813816B1 KR 1020010059914 A KR1020010059914 A KR 1020010059914A KR 20010059914 A KR20010059914 A KR 20010059914A KR 100813816 B1 KR100813816 B1 KR 100813816B1
- Authority
- KR
- South Korea
- Prior art keywords
- iron
- copper
- high purity
- aqueous solution
- iron chloride
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
- C22B3/44—Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/226—Remelting metals with heating by wave energy or particle radiation by electric discharge, e.g. plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Manufacture Of Iron (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
원소 | 농도 (질량 ppm) | 원소 | 농도 (질량ppm) | 원소 | 농도 (질량ppm) | |
불순물농도 | Al As B Ba Be Bi Ca Cd Cl Cr Cu F | 0.380 <0.050 <0.010 <0.010 <0.010 0.012 0.110 0.120 <0.050 <0.020 <0.020 <0.050 | Co Ga Hf In K Li Mg Mn Mo Na Ni P | 0.035 0.050 <0.010 <0.020 0.015 <0.010 <0.010 <0.050 <0.050 <0.010 <0.020 0.740 | Rh Ru Sb Si Sn Th Ti U V Zn Zr Pb | <0.010 <0.010 <0.020 0.060 0.270 0.001 0.150 0.002 1.000 0.050 0.016 0.014 |
순도 | 99.9997% | |||||
잔류저항비 | 5500 |
Claims (13)
- 순도가 99.99 질량% 이상 99.9997 질량% 이하이고, 불순물인 구리의 농도가 20 질량ppb 이상 50 질량ppb 이하인 고순도 철.
- 잔류 저항비(residual resistivity ratio)가 3000 이상 5500이하이고, 불순물인 구리의 농도가 20 질량ppb 이상 50 질량ppb 이하인 고순도 철.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 순도가 99.99 질량% 이상 99.9997 질량% 이하이고, 불순물인 구리의 농도가 20 질량ppb 이상 50 질량ppb 이하인 고순도 철 타겟.
- 잔류 저항비가 3000 이상 5500이하이고, 불순물인 구리의 농도가 20 질량ppb 이상 50 질량ppb 이하인 고순도 철 타겟.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000301295A JP4323078B2 (ja) | 2000-09-29 | 2000-09-29 | 高純度鉄およびその製造方法ならびに高純度鉄ターゲット |
JPJP-P-2000-00301295 | 2000-09-29 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070109027A Division KR100854264B1 (ko) | 2000-09-29 | 2007-10-29 | 고순도 철의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020025752A KR20020025752A (ko) | 2002-04-04 |
KR100813816B1 true KR100813816B1 (ko) | 2008-03-17 |
Family
ID=18782856
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010059914A KR100813816B1 (ko) | 2000-09-29 | 2001-09-27 | 고순도 철 및 고순도 철 타겟 |
KR1020070109027A KR100854264B1 (ko) | 2000-09-29 | 2007-10-29 | 고순도 철의 제조 방법 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070109027A KR100854264B1 (ko) | 2000-09-29 | 2007-10-29 | 고순도 철의 제조 방법 |
Country Status (3)
Country | Link |
---|---|
US (2) | US20020117022A1 (ko) |
JP (1) | JP4323078B2 (ko) |
KR (2) | KR100813816B1 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4323078B2 (ja) * | 2000-09-29 | 2009-09-02 | ソニー株式会社 | 高純度鉄およびその製造方法ならびに高純度鉄ターゲット |
JP4954479B2 (ja) * | 2004-01-30 | 2012-06-13 | ソニー株式会社 | 高純度電解鉄の製造方法および高純度電解コバルトの製造方法 |
JP4664719B2 (ja) * | 2005-03-31 | 2011-04-06 | 鶴見曹達株式会社 | 塩化銅エッチング廃液の精製方法及び精製塩化銅溶液 |
JP5247986B2 (ja) * | 2006-03-03 | 2013-07-24 | 株式会社田中化学研究所 | 高純度酸化鉄の製造方法 |
JP4723629B2 (ja) * | 2008-11-13 | 2011-07-13 | Jx日鉱日石金属株式会社 | 陰イオン交換樹脂を用いた銀の回収方法 |
KR101403281B1 (ko) * | 2012-12-26 | 2014-06-03 | 재단법인 포항산업과학연구원 | 니켈 습식 제련 공정 부산물 회수 장치 |
US9738966B2 (en) * | 2014-09-04 | 2017-08-22 | Northwestern University | Chemically pure zero-valent iron nanofilms from a low-purity iron source |
US12046399B2 (en) * | 2022-01-27 | 2024-07-23 | Ford Global Technologies, Llc | Reduction of cracks in additively manufactured Nd—Fe—B magnet |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62161977A (ja) * | 1986-01-08 | 1987-07-17 | Showa Denko Kk | 高純度鉄の製法 |
JPH0413819A (ja) * | 1990-05-07 | 1992-01-17 | Nikko Kyodo Co Ltd | 高純度鉄の製造方法 |
JPH08253888A (ja) * | 1995-03-14 | 1996-10-01 | Japan Energy Corp | 高純度コバルトの製造方法 |
JP2000144305A (ja) * | 1998-11-12 | 2000-05-26 | Japan Energy Corp | 薄膜形成用高純度鉄材料及びその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3959096A (en) * | 1975-01-17 | 1976-05-25 | Langer Stanley H | Electrochemical recovery of copper from alloy scrap |
US4366129A (en) * | 1981-04-08 | 1982-12-28 | Tatabanyai Szenbanyak | Process for producing alumina and ferric oxide from aluminium carriers with high iron and silicon content |
US4666683A (en) * | 1985-11-21 | 1987-05-19 | Eco-Tec Limited | Process for removal of copper from solutions of chelating agent and copper |
US6153081A (en) * | 1995-01-12 | 2000-11-28 | Fukui; Atsushi | Method of recovering antimony and bismuth from copper electrolyte |
SE504959C2 (sv) * | 1995-03-03 | 1997-06-02 | Kemira Kemi Ab | Förfarande för rening av metallinnehållande lösningar, som innehåller järn- och zinksalter |
JPH11335821A (ja) * | 1998-05-20 | 1999-12-07 | Japan Energy Corp | 磁性薄膜形成用Ni−Fe合金スパッタリングターゲット、磁性薄膜および磁性薄膜形成用Ni−Fe合金スパッタリングターゲットの製造方法 |
US6514414B1 (en) * | 2000-09-08 | 2003-02-04 | Clariant Finance (Bvi) Limited | Process for separation and removal of iron ions from basic zinc solution |
JP4323078B2 (ja) * | 2000-09-29 | 2009-09-02 | ソニー株式会社 | 高純度鉄およびその製造方法ならびに高純度鉄ターゲット |
-
2000
- 2000-09-29 JP JP2000301295A patent/JP4323078B2/ja not_active Expired - Lifetime
-
2001
- 2001-09-27 KR KR1020010059914A patent/KR100813816B1/ko active IP Right Grant
- 2001-09-28 US US09/966,425 patent/US20020117022A1/en not_active Abandoned
-
2003
- 2003-05-28 US US10/446,427 patent/US20030206822A1/en not_active Abandoned
-
2007
- 2007-10-29 KR KR1020070109027A patent/KR100854264B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62161977A (ja) * | 1986-01-08 | 1987-07-17 | Showa Denko Kk | 高純度鉄の製法 |
JPH0413819A (ja) * | 1990-05-07 | 1992-01-17 | Nikko Kyodo Co Ltd | 高純度鉄の製造方法 |
JPH08253888A (ja) * | 1995-03-14 | 1996-10-01 | Japan Energy Corp | 高純度コバルトの製造方法 |
JP2000144305A (ja) * | 1998-11-12 | 2000-05-26 | Japan Energy Corp | 薄膜形成用高純度鉄材料及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20020025752A (ko) | 2002-04-04 |
US20030206822A1 (en) | 2003-11-06 |
US20020117022A1 (en) | 2002-08-29 |
JP2002105598A (ja) | 2002-04-10 |
KR20070108502A (ko) | 2007-11-12 |
KR100854264B1 (ko) | 2008-08-26 |
JP4323078B2 (ja) | 2009-09-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100860957B1 (ko) | 고순도 코발트의 제조 방법 | |
KR100854264B1 (ko) | 고순도 철의 제조 방법 | |
JP5751572B2 (ja) | α線量が少ないインジウム又はインジウムを含有する合金 | |
US4610720A (en) | Method for preparing high purity vanadium | |
EP0335987B1 (en) | Process for producing chevrel compounds | |
Mimura et al. | Preparation of high-purity cobalt | |
JP4954479B2 (ja) | 高純度電解鉄の製造方法および高純度電解コバルトの製造方法 | |
US12000020B2 (en) | Metal and tin alloy having low alpha-ray emission, and method for producing same | |
JP5530270B2 (ja) | コバルト粉末及びその製造方法 | |
Abdon et al. | Stabilization of Metal-Rich Compounds by Polar-Intermetallic Bonding. Synthesis, Structure, and Bonding in Hf5MTe3 (M= Fe, Co) | |
JP5759037B2 (ja) | α線量が少ないインジウム又はインジウムを含有する合金 | |
Kekesi et al. | Preparation of ultra-high-purity copper by anion exchange | |
JP3206432B2 (ja) | 低α低酸素金属スカンジウムとその製造方法 | |
Bender et al. | Structure and electronic properties of niobium-ruthenium alloys | |
Colombo | Systematic errors in vacuum and inert gas fusion analysis for oxygen in metals | |
US20200385843A1 (en) | METAL AND TIN ALLOY HAVING LOW alpha-RAY EMISSION, AND METHOD FOR PRODUCING SAME | |
JPS6119718B2 (ko) | ||
US4004987A (en) | Method for the preparation of rare and precious metals by electrolytical amalgamation using ion exchange membrane | |
Kekesi et al. | The Purification of Base Transition Metals | |
Kékesi | International Motivation and Cooperation for Research in the Ultra-High Purification of Metals | |
Salimov | Radiochemical neutron activation analysis of special pure rhenium, molybdenum, tellurium, titanium and vanadium | |
Pavlyuk et al. | PREPARATION OF MOLYBDENUM TRISULFIDE FROM INDUSTRIAL FERROMOLYBDENUM DUST | |
Brown et al. | Selective removal of metals from aqueous solutions with dithiophosphinic acids | |
Minczewski | Separation and enrichment of trace components in analytical chemistry | |
MORI et al. | Use and Evaluation of the Quality (Report I) f |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
A107 | Divisional application of patent | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130304 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20140228 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20150227 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20160310 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20170303 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20180302 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20190304 Year of fee payment: 12 |